TW201031968A - Stage for a dispenser and method for controlling movements of the stage and a dispensing head unit in the dispenser - Google Patents

Stage for a dispenser and method for controlling movements of the stage and a dispensing head unit in the dispenser Download PDF

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Publication number
TW201031968A
TW201031968A TW099104699A TW99104699A TW201031968A TW 201031968 A TW201031968 A TW 201031968A TW 099104699 A TW099104699 A TW 099104699A TW 99104699 A TW99104699 A TW 99104699A TW 201031968 A TW201031968 A TW 201031968A
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Taiwan
Prior art keywords
platform
coating
head unit
coating head
substrate
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TW099104699A
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Chinese (zh)
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TWI531834B (en
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Dae-Hoon Suh
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Top Eng Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1341Filling or closing of cells

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Coating Apparatus (AREA)
  • Liquid Crystal (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

There is provided a stage for a dispenser, including, a plate; a plurality of support poles, provided on the plate, on which to mount a substrate; and a compressed-air supply unit supplying compressed air to the lower surface of the substrate, to support the substrate. Physical support of the stage by only the support poles can minimize occurrence of static electricity when the robot lifts up the substrate from the stage. And, there is provided a method for controlling movements of a stage and a dispensing head unit in a dispenser, comprising moving the stage and at the same time moving the dispensing head unit with a nozzle in the direction opposite to the direction in which the stage is moved. Simultaneous movements of the stage and the dispensing head unit in opposite directions enable the stage or the dispensing head unit to travel shorter distance direction than the stage or the dispensing head unit would do otherwise.

Description

201031968 六、發明說明: 【發明所屬之技術領域】 本發明係關於塗佈機之平台以及控制塗佈機之平台及 塗佈頭單元移動之方法。 【先前技術】 液晶是結晶固體與等向性液體間的中間相,並結合了晶 體結構與變形流體的某些特性。液晶顯示器(LCD)利用液晶 的流體性與結晶特性相關的非等向性。液晶顯示器應用於手 機、可攜式電腦、桌上型監視器、以及u:D電視。 液晶顯示器由利用膠(或密封劑)圖案彼此附接之Τρτ 陣列基板及彩色濾光片陣列基板所構成,而液晶層夾設於 TFT陣列基板及彩色濾光片陣列基板之間。 藉由控制施加於各像素之液晶層的電壓,可容許不同量 的光通過’藉此產生影像。 液晶顯示器的製造簡述如下。 複數TFT陣列形成於-個基板上。複數彩色瀘光片陣 列2成於另一基板上。密封(膠)塗佈機塗佈膠以形成膠圖案 於这兩個基板任一者上。膠圖案包含轉角為9〇度之四條直 線膠’各與相對者具有相同長度。液晶(LC)塗佈機以液滴形 式塗佈液晶到基板上膠圖案所界定的面板區域。這兩個基板 結合成母基板。此時,顧案作為黏著劑而將兩個基板彼此 附接。後續將母基板切割成離散的LCd面板。 平台可提供於密封塗佈機以及液晶塗佈機。為簡明之 故’利用液晶塗佈機(於後稱「塗佈機」)作為塗佈機的範例, 201031968 來說明平台。 圖1為塗佈機範例之透視圖。如圖丨所示’塗佈機包含 主框架100、平台200、第一驅動單元3〇〇、塗佈頭單元支 樓框400、第二驅動單元500、塗佈頭單元6〇〇、以及第三 驅動單元700。201031968 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a platform for a coater and a method for controlling the platform of the coater and the movement of the coating head unit. [Prior Art] Liquid crystal is an intermediate phase between a crystalline solid and an isotropic liquid, and combines some characteristics of a crystal structure and a deformed fluid. Liquid crystal displays (LCDs) utilize the anisotropy associated with the fluidity and crystallization characteristics of liquid crystals. LCD monitors are used in mobile phones, portable computers, desktop monitors, and u:D TVs. The liquid crystal display is composed of a τρτ array substrate and a color filter array substrate which are attached to each other by a glue (or sealant) pattern, and the liquid crystal layer is interposed between the TFT array substrate and the color filter array substrate. By controlling the voltage applied to the liquid crystal layer of each pixel, a different amount of light can be allowed to pass through, thereby generating an image. The manufacture of the liquid crystal display is briefly described below. A plurality of TFT arrays are formed on one of the substrates. The plurality of color calender arrays 2 are formed on another substrate. A seal coater coats the glue to form a glue pattern on either of the two substrates. The glue pattern comprises four linear glues having a corner angle of 9 degrees each having the same length as the opposite. A liquid crystal (LC) coater coats the liquid crystal in a droplet form to a panel region defined by a substrate sizing pattern. The two substrates are combined into a mother substrate. At this time, the two substrates are attached to each other as an adhesive. The mother substrate is subsequently cut into discrete LCd panels. The platform can be provided in a seal coater as well as a liquid crystal coater. For the sake of brevity, a liquid crystal coater (hereinafter referred to as "coater") is used as an example of a coater, and 201031968 is used to illustrate the platform. Figure 1 is a perspective view of an example of a coater. As shown in FIG. 2, the applicator includes a main frame 100, a platform 200, a first driving unit 3A, a coating head unit branch frame 400, a second driving unit 500, a coating head unit 6〇〇, and a Three drive unit 700.

❿ 平台200提供於主框架1〇〇上,而使平台2〇〇可直線移 動。平台200可固定地提供於主框架1〇〇。第一驅動單元3〇〇 提供於主框架100。第一驅動單元3〇〇移動平台2〇〇。 塗佈頭單元支撐框400包含兩個彼此相隔的垂直部 410,以及連接在兩個垂直部41〇上部間之水平部42〇。塗 佈碩單元支撐框400提供於主框架1〇〇,而使塗佈頭單元支 撐框400可直線移動。平台2〇〇位於兩個垂直部41〇之間。 第一驅動單元500移動塗佈頭單元支撐框4〇〇。 塗饰頭單元600提供於塗佈頭單元支撐框4〇〇的水平部 420 ’而使塗佈頭單元㈣可直線鑛。第三驅動單元· 提供於塗佈頭單元支撐框_的水平部。第三驅動單元 700移動塗佈頭單元6〇〇。 塗佈頭單元支撑框4GG移動於γ轴方向,而塗佈單 元600移動於X軸方向。 塗佈頭單元600包含喷嘴(未顯示)。 圖2所示 220與底板21〇 距預定距離。 ,平台200包含底板210、一或更多的支撐塊 的上表面結合。支撐塊配置成相對於彼此相 支撐塊220於内部具有真空通道22ί,而於上側具有複 5 $ 201031968 數個孔222連接真空通道22I 空通道221。 。真空產生器(未顯示)連接真平台 The platform 200 is provided on the main frame 1〇〇, so that the platform 2〇〇 can be moved linearly. The platform 200 can be fixedly provided to the main frame 1〇〇. The first drive unit 3 is provided to the main frame 100. The first driving unit 3 〇〇 moves the platform 2 〇〇. The coating head unit support frame 400 includes two vertical portions 410 spaced apart from each other, and a horizontal portion 42A connected between the upper portions of the two vertical portions 41. The coated unit support frame 400 is provided to the main frame 1〇〇, so that the coating head unit support frame 400 can be linearly moved. The platform 2〇〇 is located between the two vertical portions 41〇. The first driving unit 500 moves the coating head unit support frame 4A. The coating head unit 600 is provided on the horizontal portion 420' of the coating head unit support frame 4'' to allow the coating head unit (4) to be linearly ore. The third driving unit is provided in the horizontal portion of the coating head unit support frame_. The third driving unit 700 moves the coating head unit 6A. The coating head unit support frame 4GG is moved in the γ-axis direction, and the coating unit 600 is moved in the X-axis direction. The coating head unit 600 includes a nozzle (not shown). The 220 shown in Fig. 2 is spaced apart from the bottom plate 21 by a predetermined distance. The platform 200 includes a bottom plate 210, an upper surface combination of one or more support blocks. The support blocks are configured to have a vacuum passage 22 ί internally with respect to each other, and have a plurality of holes 222 connected to the vacuum passage 22I 221 on the upper side. . Vacuum generator (not shown) connected true

如圖4所示 基板G放置於支撐塊22〇的上表面。真空產生器操作 ,在真工通道221及複數孔222内產生真空,藉此緊緊地將 基板下表面吸到支撐塊220的上表面。 主辟相鄰支樓塊220間存在有空間223。空間223是機械 (顯不)必須定位放置基板G於平台2〇〇 ㈨ 提升基板G的地方》 現在說明塗佈機的操作。 機械^臂拾取基板G,然後將基板G放置於平台2〇〇。 真空產生器操作’而在真空通道221及複數孔222内產生真 空’藉此緊緊地將基板G的下表面吸到支禮塊22〇的上 面。 如圖3所示’第—鶴單元3⑻直線移 =軸方向至财距離,且塗佈頭單元支撐框彻保= 晶滴。::22〇〇〇〇3期間二塗佈頭單元_透過噴嘴滴落液 (:)γ轴方\二佈頭早凡_⑽移動的方向定義為正 定義為貞^;^細缝佈鮮元6⑻㈣軸的方向 乐二驅勁早元7〇〇直線移動塗佈 _於正⑽軸方向至預定距離。當移動時,塗g = 噴嘴滴落液晶滴。平台綱或塗佈頭單元_從卢 =右移動的方向定以正(+)χ軸方向。平台 ς 單元_向右到左移_方向錢為負㈠X財向佈頭 6 201031968 如圖5所示,第一驅動單元3〇〇直線移動平台2〇〇於負 ㈠Y轴方向至預定距離。在平台2〇〇移動期間,塗佈頭單元 600透過喷嘴滴落液晶滴。 如圖6所不,第三驅動單元7〇〇直線移動塗佈頭單元 600於正(+)χ軸方向至預定距離。當移動時,塗佈頭單元 600透過喷嘴滴落液晶滴。 如圖7所示,第一驅動單元3〇〇直線移動平台2〇〇於正 (+)Υ軸方向至預定距離,且塗佈頭單元支撐框4〇〇保持不 動。當移動時,塗佈頭單元_透過喷嘴滴落液晶滴。 如上所述,平台2〇〇及塗佈頭單元6〇〇以重複方式移 動,直到塗佈頭單元_滴落預定數目的液晶滴到基板g 上界定的各面板區域。 平台200及塗佈頭單元6〇〇必須分別在γ軸方向及χ 軸方向高速移動’以縮短塗佈頭單元議滴落預定數目的液 晶滴^基板G上界定的各面板區域之咖。此時,透過應 用真空,基板G的下表面必須緊緊地向下吸到平台雇的 上表面。結果’甚至在平台2〇〇快速移動時,基板 固定不動。 然而,僅有平台200移動於γ軸方向。因此,平台2〇〇 在Υ軸方向行進的距離越長,支樓平台200的主框架長度 2須越長。如此增加了主框架的尺寸,進而增加了塗 佈機的尺寸。 平、台200或塗佈頭單元當到達轉折點時必須大大 牛低速纟2s離開轉折點肖,就必須大大地增加速度。 斤點為移動於Y轴方向的平台200必須停止而塗佈頭單 7 201031968 開始移動於x輛方向之處,或移動於x轴方向 軸方必須停止而平台_必須開始移動於γ =200或塗佈鮮元㈣因為在轉折點㈣較大 〆或增加速度,而振動並發生雜_,_產生微粒 的重量越重,平台在減少或增加速麟的振As shown in Fig. 4, the substrate G is placed on the upper surface of the support block 22''. The vacuum generator operates to create a vacuum in the working channel 221 and the plurality of holes 222, thereby sucking the lower surface of the substrate tightly to the upper surface of the support block 220. There is a space 223 between the adjacent branch blocks 220. The space 223 is mechanical (not shown) where the substrate G must be positioned on the platform 2 (9) where the substrate G is lifted. The operation of the coater will now be described. The mechanical arm picks up the substrate G, and then places the substrate G on the stage 2〇〇. The vacuum generator operates 'to create a vacuum in the vacuum channel 221 and the plurality of holes 222' thereby sucking the lower surface of the substrate G to the upper side of the support block 22''. As shown in Fig. 3, the -th crane unit 3 (8) moves linearly = the axial direction to the financial distance, and the coating head unit support frame is guaranteed = crystal droplets. ::22〇〇〇〇3 period two coating head unit _ through the nozzle dripping liquid (:) γ axis square / two cloth head early _ (10) moving direction is defined as positively defined as 贞 ^; ^ fine seam cloth fresh elements 6 (8) (four) the direction of the shaft, the second drive, the early 7-inch linear movement coating _ Yu Zheng (10) axis direction to the predetermined distance. When moving, apply g = nozzle to drop the liquid crystal droplets. Platform or coating head unit _ from the direction of Lu = right to the direction of the positive (+) χ axis. Platform ς Unit _ right to left _ direction money is negative (1) X financial head 6 201031968 As shown in Fig. 5, the first driving unit 3 〇〇 linear moving platform 2 〇〇 in the negative (1) Y-axis direction to a predetermined distance. During the movement of the platform 2, the coating head unit 600 drops liquid crystal droplets through the nozzle. As shown in Fig. 6, the third driving unit 7 linearly moves the coating head unit 600 to a positive (+) x-axis direction to a predetermined distance. When moving, the coating head unit 600 drops liquid crystal droplets through the nozzle. As shown in Fig. 7, the first driving unit 3 〇〇 linearly moves the platform 2 to the positive (+) Υ axis direction to a predetermined distance, and the coating head unit support frame 4 〇〇 remains stationary. When moving, the coating head unit _ drops the liquid crystal droplets through the nozzle. As described above, the stage 2 and the coating head unit 6 are moved in a repeated manner until the coating head unit _ drops a predetermined number of liquid crystal droplets onto the respective panel regions defined on the substrate g. The stage 200 and the coating head unit 6 must be moved at high speed in the γ-axis direction and the 轴-axis direction, respectively, to shorten the number of the panel areas defined on the liquid crystal droplet substrate G by the coating head unit. At this time, through the application vacuum, the lower surface of the substrate G must be sucked down tightly to the upper surface of the platform. As a result, the substrate is fixed even when the platform 2 is moving rapidly. However, only the platform 200 moves in the gamma axis direction. Therefore, the longer the distance traveled by the platform 2〇〇 in the x-axis direction, the longer the main frame length 2 of the platform platform 200 must be. This increases the size of the main frame, which in turn increases the size of the applicator. When the flat, table 200 or coating head unit reaches the turning point, it must be greatly slowed down by 2s to leave the turning point, and the speed must be greatly increased. The pinch point is that the platform 200 moving in the Y-axis direction must be stopped and the coating head sheet 7 201031968 starts moving in the x direction, or the axis in the x-axis direction must stop and the platform _ must start moving at γ = 200 or Coating fresh elements (4) because the turning point (four) is larger or increases the speed, and the vibration and the occurrence of impurities _, _ the heavier the weight of the particles, the platform is reducing or increasing the speed of the speed

,一驅動單元300及第三驅動單元各需要高容量馬 ,。此乃因為第-驅動單元_及第三驅動單元7⑻必須以 尚速分別移動平台200及塗佈頭單元6〇〇。 在真空從支撐塊200的真空通道221及複數孔222釋出 後,機械手臂從平台200提升基板G時,會發生靜電。 【發明内容】 本發明目的在於在塗佈操作期間,儘可能大大地降低平 台的振動。 本發明之另一目的在於當基板從平台提升時,避免產生 靜電。 根據本發明之一方面,提供一種塗佈機之平台,包含: =三複數支撐柱,提供於板上,其上供裝設基板、以及壓縮 空氣供應單元,供應壓縮空氣到基板之下表面,以支撐基板。 此板可具有空氣通道於内部以及孔於上表面,各空氣通 運連接各孔,壓縮空氣供應單元透過通道及孔供應壓縮空氣 到基板之下表面。 8 201031968 離子產生翠元可連接板,而在板與基板間產生離子。 塗 佈頭二面含=;!:_之平台及 之塗佈頭單元於與平台移動方向相;之方:時移動具有嘴嘴 的相::向及具有喷嘴之塗佈頭單元可分別移動於⑽向 ❿ 的相=具有嘴嘴之塗佈頭單元可分別移動於 X轴方向 界定=:區塗域佈頭單元滴落預定數目的液晶滴到基板上 塗佈頭單元的數量可《是2個或更多個 根據本發明另一方面,裎 佈頭單元移動的方法,包含 1 控制塗佈機之平台及塗 板之平台於γ軸方向U .fr步驟,移動其上供裳設基 嘴之塗佈頭單元於平台移第動-方預: 步驟,移動具有嘴 第= 弟二預定距離;第三步驟, I轴方向至 塗饰頭單元於平台移動具有喷嘴之 四步驟,軸财料之塗 距離;第 定距離;以及第五步驟 二疋於χ幸由方向至第六預 四步驟,但最後行數重複執行第—步驟至第 钒仃弟一步驟至第三步驟。 9 201031968 透過嘴嘴’塗佈頭單元滴落預定數目的液 界定的各面板區域。 曰曰 滴到基板上 目的、特徵、觀點、以及優點,參考 隨圖式,將更加清楚了解。A drive unit 300 and a third drive unit each require a high capacity horse. This is because the first drive unit _ and the third drive unit 7 (8) must move the platform 200 and the coating head unit 6 分别 at a constant speed. After the vacuum is released from the vacuum passage 221 and the plurality of holes 222 of the support block 200, static electricity is generated when the robot arm lifts the substrate G from the stage 200. SUMMARY OF THE INVENTION It is an object of the present invention to reduce the vibration of a platform as much as possible during a coating operation. Another object of the present invention is to avoid the generation of static electricity when the substrate is lifted from the platform. According to an aspect of the present invention, there is provided a platform for a coater comprising: a triple complex support column provided on a board on which a substrate is mounted, and a compressed air supply unit supplies compressed air to a lower surface of the substrate, To support the substrate. The plate may have an air passage in the interior and a hole in the upper surface, each of the air being connected to each of the holes, and the compressed air supply unit supplies the compressed air to the lower surface of the substrate through the passage and the hole. 8 201031968 Ion-generated Cuiyuan can connect plates and generate ions between the plates and the substrate. The two sides of the coating head include the platform of the coating head and the coating head unit in the direction of movement of the platform; the side: the phase with the nozzle is moved: the coating head unit with the nozzle and the nozzle can be moved separately The phase of the (10) ❿ = = coating head unit having a mouth can be respectively moved in the X-axis direction defined =: the area coated with the cloth head unit drops a predetermined number of liquid crystal droplets onto the substrate, the number of coating head units can be "2" According to another aspect of the invention, the method for moving the head unit comprises: 1 controlling the platform of the coater and the platform of the coated plate in the γ-axis direction U.fr step, moving the coating on the base for the skirt The cloth head unit moves in the platform-pre-step: step, the movement has the mouth = the second two predetermined distance; the third step, the I-axis direction to the coating head unit moves on the platform with the nozzle four steps, the coating of the shaft material The distance; the first distance; and the fifth step two are fortunately from the direction to the sixth pre-four steps, but the last line number repeats the first step to the vanadium step from the first step to the third step. 9 201031968 The panel area defined by the predetermined number of liquids is dropped through the nozzle 'coating head unit.目的 The purpose, characteristics, viewpoints, and advantages of dropping onto the substrate will be more clearly understood by reference to the drawings.

【實施方式】 例。參考本發月較佳實施例的細節,及顯示於伴隨圖式的範 塗佑,=主框架100、平台800、第-驅動單元3〇〇、 塗佈頭早兀支撐框400、第二驅動單元5 _、以及第三驅動單元7⑻。錄架腦 3〇〇、塗佈頭單从撐框·、第二驅動單元、塗^ J;[Embodiment] An example is given. Referring to the details of the preferred embodiment of the present month, and the description of the accompanying drawings, Fan Tuyou, = main frame 100, platform 800, first drive unit 3, coating head early support frame 400, second drive Unit 5_, and third drive unit 7(8). Recording brain 3〇〇, coating head single from the brace frame, second drive unit, coating ^ J;

本發明前述及其他 以下詳細說明並配合伴 、以及第三驅動單元700與「先前技術」所述者相同。 二佈機可更包含第四驅動單元(未_),㈣平台於乂轴方 向。 如圖8所不,根據本發明平台包含板81〇、複數支撐柱 820、以及壓縮空氣供應單元83〇。 板810於上表面具有複數凹槽811。複數凹槽8ιι配置 成相對於彼此相距預定距離。各凹槽811為一直線。凹槽 811的深度及寬度一致。 曰 四個支撐柱820提供於板810的四個角落,各角落設置 201031968 一個。支撐柱820的上部可水平地彎曲。 頂上。藉由四個支撐柱 或自支撐柱820提升基 基板G裝設於四個支撐柱82〇 820支撐基板G ’可避免裝設基板G 板G時發生靜電。 各支樓柱820沿長度可具有穿孔。於此類案例中,板 810内部具有通道’連接支雜_ _孔 元(未顯示)連接通道。 具供應事The foregoing and other detailed descriptions of the present invention and the third driving unit 700 are the same as those described in the "Prior Art". The second cloth machine may further include a fourth driving unit (not _), and (4) the platform is in the 乂 axis direction. As shown in Fig. 8, the platform according to the present invention comprises a plate 81, a plurality of support columns 820, and a compressed air supply unit 83A. The plate 810 has a plurality of grooves 811 on the upper surface. The plurality of grooves 8 ι are arranged to be apart from each other by a predetermined distance. Each groove 811 is a straight line. The depth and width of the groove 811 are uniform.四个 Four support columns 820 are provided at the four corners of the board 810, and each corner is set to 201031968. The upper portion of the support column 820 can be horizontally curved. Top. Lifting the base substrate G by the four support columns or the self-supporting post 820 is mounted on the four support posts 82 820 to support the substrate G ′ to prevent static electricity from occurring when the substrate G plate G is mounted. Each of the pillars 820 can have perforations along its length. In such cases, the plate 810 has a channel' connection __ hole (not shown) connection channel inside. Supply

中的通道及支撐柱820 下表面緊緊地向下吸到 真空供應單元操作,而在板810 中的穿孔内產生真空。結果基板G 支撐柱820頂上。 壓縮空氣供應單元830提供於板81〇。板81〇具有空氣 通道812於内部,以及具有孔813於上表面,各空氣通道 812連接各孔813。壓縮空氣供應單元透過空氣通道812 及孔813供應壓縮空氣到基板G的下表面,以支撐基板g。 壓縮空氣供應單元830連接板81〇中的空氣通道812。 於一範例中,壓縮空氣供應單元83〇包含空氣壓縮機831及 連接空氣通道812的管線832。 風扇(未顯示)可提供於主框架1〇〇。由於壓縮空氣持續 地從板810的孔流出,而平台周圍發生旋轉渦流時,風扇作 用而迫使空氣自然地循環。 板810可連接到離子產生單元(未顯示)。於此類案例 中,板810具有離子通道840於内部,並具有離子孔於上表 201031968 面,各離子通道840連接各離子孔。離子產生單元連接離子 通道840。 壓縮空氣供應單元83〇透過離子通道84〇及離子孔,供 應離子到基板G的下表面,㈣除發生在機械手臂與基板G 間的靜電。 現說明根據本發明控制塗佈機之平台及塗佈頭元移 動的方法之第一實施例。 基板G裝設於根據本發明之平台8〇〇上。The lower channel and the lower surface of the support post 820 are drawn down tightly to the vacuum supply unit operation, while a vacuum is created in the perforations in the plate 810. As a result, the substrate G is supported on top of the column 820. A compressed air supply unit 830 is provided on the plate 81A. The plate 81 has an air passage 812 inside, and has a hole 813 on the upper surface, and each air passage 812 connects the holes 813. The compressed air supply unit supplies compressed air to the lower surface of the substrate G through the air passage 812 and the hole 813 to support the substrate g. The compressed air supply unit 830 connects the air passages 812 in the plate 81A. In one example, the compressed air supply unit 83 includes an air compressor 831 and a line 832 that connects the air passages 812. A fan (not shown) can be provided in the main frame 1〇〇. As the compressed air continues to flow out of the aperture of the plate 810 and a swirling vortex occurs around the platform, the fan acts to force the air to circulate naturally. Plate 810 can be coupled to an ion generating unit (not shown). In such a case, the plate 810 has an ion channel 840 inside and has an ion hole in the surface of the above table 201031968, and each ion channel 840 is connected to each ion hole. The ion generating unit is connected to the ion channel 840. The compressed air supply unit 83 passes through the ion channel 84 and the ion hole to supply ions to the lower surface of the substrate G, and (4) the static electricity generated between the robot arm and the substrate G. A first embodiment of a method of controlling the platform of a coater and the movement of a coating head according to the present invention will now be described. The substrate G is mounted on a platform 8A according to the present invention.

平台800 移動於正(+)γ軸方向 如圖9所示’第一驅動單元3〇〇移動平台_於γ袖 動於負(-)Υ軸方向。 而塗佈頭單元600移 不然,平台800 6〇〇移動於正(+)γ軸方向。 可移動於負(-)γ軸方向,而塗佈頭單元 爭元的數量可以是2個或更多個。 _移動於正(價財向 塗佈頭單元600透過喷嘴滴落液晶 塗佈頭單元 當平台 移動於負㈠Υ軸方向時, 滴。 ,同時塗佈頭單元600 在塗佈頭單元60〇 完成滴落預定數目 的液晶滴到基板 12 201031968 上界定的各面板區域後,機械手臂自平台8〇〇拾取基板G, 並將基板G轉移到後續程序的機器。 一第一驅動單元300移動平台800於又軸方向,同時第 二驅動單元700移動具有喷嘴之塗佈頭單元6〇〇於平台8〇〇 移動方向相反之方向。 現說明控制塗佈機之平台及塗佈頭單元移動的方法之 第二實施例。The platform 800 moves in the positive (+) γ-axis direction as shown in Fig. 9 'The first driving unit 3 〇〇 the moving platform _ γ is sleeved in the negative (-) Υ axis direction. While the coating head unit 600 is not moved, the platform 800 6 〇〇 moves in the positive (+) γ-axis direction. It may be moved in the negative (-) γ-axis direction, and the number of the coating head unit contending elements may be two or more. _ moves to the positive (the price of the coating head unit 600 drops the liquid crystal coating head unit through the nozzle when the platform moves in the negative (one) Υ axis direction, while the coating head unit 600 is finished in the coating head unit 60 滴After a predetermined number of liquid crystals are dropped onto the panel areas defined on the substrate 12 201031968, the robot arm picks up the substrate G from the platform 8 and transfers the substrate G to the machine of the subsequent program. A first driving unit 300 moves the platform 800 to In the axial direction, the second driving unit 700 moves the coating head unit 6 having the nozzle in the opposite direction of the movement direction of the platform 8. The method for controlling the movement of the coating machine platform and the coating head unit is described. Two embodiments.

基板G裝设於根據本發明之平台 上 如圖10所示,第一驅動單元3⑻移動平台_於正⑴Y ^方^第—預定距離’同時第二驅動單元·移動塗佈頭 框400以及塗佈頭單元_於負㈠γ軸方向至第二 頭單元_之喷嘴練剛好在基板G 二==標點上方(第-步驟)。第-預定距離可與第The substrate G is mounted on the platform according to the present invention. As shown in FIG. 10, the first driving unit 3 (8) moves the platform _ to the positive (1) Y ^ square ^ - predetermined distance ' while the second driving unit · the mobile coating head frame 400 and the coating The head unit _ in the negative (1) γ-axis direction to the second head unit _ nozzle is just above the substrate G == punctuation (step - step). The first-predetermined distance can be

晶 移動軸方向’瞻佈頭單元_ 滴。員()Y轴方向時’塗佈頭單元透過喷嘴滴落液 如圚U所示 框400之水平Λρ 42(^:早元7〇0沿著塗佈頭單元支撐 至第三預定距離正⑽轴方向 WX轴方步驟)。塗佈頭單元_移動於正 轴方向%,可透過喷嘴滴落液晶滴,或可 13 201031968 ^圖12所示’第三驅動單元3⑻移動平台_於負㈠γ 距離’同時第二驅動單元500移動塗佈頭 及塗佈頭單元議於正(+)γ轴方向至第Crystal moving axis direction 'Knowledge head unit _ drop. When the member () is in the Y-axis direction, the coating head unit passes through the nozzle dripping liquid as shown by 圚U. The level of the frame 400 is Λρ 42 (^: early 7〇0 is supported along the coating head unit to the third predetermined distance (10) Axis direction WX axis step). The coating head unit _ moves in the positive axis direction %, can drop liquid crystal droplets through the nozzle, or can be 13 201031968 ^ shown in FIG. 12 'the third driving unit 3 (8) moves the platform _ at the negative (one) γ distance ' while the second driving unit 500 moves The coating head and the coating head unit are oriented in the positive (+) γ-axis direction to the first

夕’而將塗佈鮮元_之噴嘴定侧好在基板G 的另一目標點上方(第三步驟)。第四預定距離可 與第五預疋距離相同。 平。800移動於負㈠γ軸方向,同時塗佈頭單元刪移 =於正(+)Υ财向時,塗佈料元_透射嘴滴落液晶 滴0 如圖13所不,第三驅動單元7〇〇沿著塗佈頭單元支撐 框400之水平部42〇移動塗佈頭單元6〇〇於正(+)χ軸方向 至第六預定距離,而料嘴定蝴好在基板G之面板區域 的另一目標點上方(第四步驟)。塗佈頭單元6〇〇移動於正 (+)X軸方向時,可透過噴嘴滴落液晶滴,或可不這樣做。 以預定次數重複執行第一步驟至第四步驟,但最後一次 參 執行第一步驟至第三步驟(第五步驟)。 於第五步驟中之預定次數根據滴落液晶滴到基板G上 界定的各面板區域的預定數目而異。 於第二步驟’第三驅動單元7〇〇可沿塗佈頭單元支撐框 400之水平部420,移動塗佈頭單元6〇〇於正(+)χ軸方向至 第三預定距離的一半,並同時第四驅動單元(未顯示)可移動 平台800於負㈠X轴方向至第三預定距離的一半’而將塗佈 頭單元600之喷嘴定位剛好在基板〇之面板區域的另—目 14 201031968 標點上方。 於第四步驟,第三驅動單元700可沿塗佈頭單元支撐框 4〇〇之水平部420 ’移動塗佈頭單元600於正(+)χ轴方向至 第六預定距離的一半,並同時第四驅動單元可移動平台8〇〇 於負(-PC轴方向至第六預定距離的一半,而將塗佈^單元 600之噴嘴定位剛好在基板G之面板區域的另一目標點上 方。 不‘’ • 塗佈頭單元600的數量可為1個或更多個。 ,塗佈頭單元600完成滴落預定數目的液晶滴到基板 上界定的各面板區域後,機械手臂自平台8〇〇拾取基板G, 並將基板G轉移到後續程序的機器。 平台800及塗佈頭單元6〇〇可直線移動或曲線移動。 現說明控制塗佈機之平台及塗佈頭單元移動的方法之 第三實施例。 第三實施例包含第一步驟、第二步驟、以及第三步驟。 於第三實施例中第-步驟至第三步驟與第二實施例中的第 一步驟到第三步驟相同。因此,為簡明之故,省略第三實施 例之第一步驟至第三步驟的說明。 現說明控制塗佈機之平台及塗佈頭單元移動的方法之 第四實施例。 第四實施例包含第一步驟、第二步驟、第三步驟、第四 步驟、以及第五步驟。於第四實關中第—步驟至第四步驟 15 201031968 與第二實施例中的第—步驟到第四步驟相同。因此,為簡明 之故,省略第四實施例之第—步驟至第四步驟的說明。於第 五步驟,僅再次執行第一步驟。 、步 現說明根據本發明之平台以及控制塗佈機之平台及塗 佈頭單元移動之方法的優點。On the other hand, the nozzle of the coated fresh element is set to be positioned above the other target point of the substrate G (third step). The fourth predetermined distance may be the same as the fifth predetermined distance. level. 800 moves in the negative (a) γ-axis direction, while the coating head unit is deleted = in the positive (+) Υ rich direction, the coating material element _ transmitting nozzle drops the liquid crystal droplet 0 as shown in Fig. 13, the third driving unit 7〇 〇 moving the coating head unit 6 along the horizontal (42) axis direction of the coating head unit support frame 400 to a sixth predetermined distance, and the nozzle is fixed to the panel area of the substrate G. Above the other target point (fourth step). When the coating head unit 6 is moved in the positive (+) X-axis direction, the liquid crystal droplets may be dropped through the nozzle, or may not be used. The first step to the fourth step are repeatedly executed a predetermined number of times, but the first step to the third step (fifth step) are performed last time. The predetermined number of times in the fifth step differs depending on the predetermined number of drop panel liquid droplets to the respective panel regions defined on the substrate G. In the second step, the third driving unit 7 can move the coating head unit 6 in the positive (+) x-axis direction to half of the third predetermined distance along the horizontal portion 420 of the coating head unit support frame 400. At the same time, the fourth driving unit (not shown) can move the platform 800 to the negative (a) X-axis direction to half of the third predetermined distance' while the nozzle of the coating head unit 600 is positioned just in the panel area of the substrate 14 14 2010 31968 Above the punctuation. In the fourth step, the third driving unit 700 can move the coating head unit 600 along the horizontal (420) direction of the coating head unit support frame 4 to half of the sixth predetermined distance, and simultaneously The fourth driving unit movable platform 8 is disposed at a negative (-PC axis direction to a half of a sixth predetermined distance, and the nozzle of the coating unit 600 is positioned just above another target point of the panel region of the substrate G. '' The number of the coating head units 600 may be one or more. The coating head unit 600 finishes dropping a predetermined number of liquid crystal droplets onto the panel areas defined on the substrate, and the robot arm is from the platform 8〇〇 Pick up the substrate G and transfer the substrate G to the machine of the subsequent program. The platform 800 and the coating head unit 6〇〇 can be moved linearly or curvedly. The method for controlling the movement of the coating machine platform and the coating head unit will now be described. Third Embodiment The third embodiment includes a first step, a second step, and a third step. The first to third steps in the third embodiment are the same as the first to third steps in the second embodiment Therefore, for the sake of brevity, A description of the first to third steps of the third embodiment. A fourth embodiment of a method of controlling the movement of the coating machine platform and the coating head unit will now be described. The fourth embodiment comprises a first step and a second step. The third step, the fourth step, and the fifth step. In the fourth actual step, the first step to the fourth step 15 201031968 are the same as the first step to the fourth step in the second embodiment. Therefore, for the sake of simplicity The description of the first to fourth steps of the fourth embodiment is omitted. In the fifth step, only the first step is performed again. Step by step, the platform and the coating head unit for controlling the coater according to the present invention are explained. The advantages of the method of moving.

平台800及塗佈頭單元_啊移動於γ軸方向的相 ^方向,使平台或塗佈頭單比平台及塗佈頭單元_ 八中之-不移動的平台及塗佈頭單元_,行進更短的距離 ,。結^ ’支撐平台_的主框架1〇〇可製造成有較小的 尺寸’因為相較於習知的平台,平台麵於γ轴方向行進 較短的距離。 再者,平台800及塗佈頭單元_可比僅其中之一移動 低的速度移動,而將塗佈頭料_的喷嘴定位剛好 在基板之面板區域的歡點上方,因為平台_及塗佈頭單 =6〇〇在相反方向義—半的預定輯。平台_及塗 :元_的低速,使得到達或離開轉折點時有較小程度的振 動:如此,免因為平台_摩損而產生微粒,並避免因為搖 晃塗佈頭單元6⑻时嘴而使液晶贿在錯朗 ρ 巧=單元:的低速’使第一驅動單元3〇〇、第二驅: =、以及苐三驅動私的馬鱗應需要較小的容 "平台麵及塗佈頭單元_以高速移動時,塗佈頭單 滴落預定數目的液晶滴到基板G之各面板 的%間較少。四個支撐柱82G切基板g,在裝設基板 16 201031968 G於四個支撐柱820頂上或自四個支撐柱820提升基板G 時,避免產生靜電。 雖然本發明可以許多形式實施而不.障離其精神及重要 特徵,亦應了解除非有特別指明不然上述實施例不受限制於 剷述說明的任何細節,而應在所附申請專利範圍之精神與範 _下做廣義的解釋,因此所有落在不恃離本發明申請專利範 圍界定之精神與範疇下或落在此類界定範疇或精神之均等 物内之變化及修改,均意欲涵蓋在所附申請專利範圍。 【圖式簡單說明】 包含所附圖式提供對本發明的進一步了解,並結合構成 本發明之一部分來顯示本發明實施例,且與詳細說明用以 釋本發明原則。 於圖式中: 圖1為塗佈機範例之透視圖; φ 圖2為塗佈機之習知平台之透視圖; 圖3至圖7為顯示利用習知方法操作塗佈機時平台 佈頭單元移動方向的圖式; 圖8為根據本㈣之塗佈機之平台實施例之前視圖; 圖9為顯示利用本發明操作塗佈機之方法實施例時 台及塗佈頭單元移動方向的圖式; τ 圖1〇至圖13為顯示利用本發明操作 實施例時,平台及塗佈頭單元移動方向的圖式t及 圖Η為顯示利用本發明操作塗佈機之方法實施 平台及塗佈頭單元移動方向的放大圖式。 、 17 201031968The platform 800 and the coating head unit _ ah move in the direction of the γ-axis direction, so that the platform or the coating head is simpler than the platform and the coating head unit _ eight of the - non-moving platform and coating head unit _, marching Shorter distance. The main frame 1 of the support platform _ can be manufactured to have a smaller size because the platform surface travels a shorter distance in the γ-axis direction than the conventional platform. Furthermore, the platform 800 and the coating head unit _ can be moved at a lower speed than only one of them, and the nozzle of the coating head _ is positioned just above the fascia of the panel area of the substrate because of the platform _ and the coating head Single = 6 〇〇 in the opposite direction - half of the predetermined series. The low speed of the platform _ and 涂: yuan _, so that there is a small degree of vibration when reaching or leaving the turning point: thus, avoiding the generation of particles due to the platform _ wear, and avoiding the liquid crystal bribe because the mouth of the coating head unit 6 (8) is shaken Wrong ρ 巧 = unit: the low speed 'make the first drive unit 3 〇〇, the second drive: =, and 苐 three drive private scales should require a smaller capacity " platform surface and coating head unit _ When moving at a high speed, the coating head drops a predetermined amount of liquid crystal droplets to less than % of each panel of the substrate G. The four support posts 82G cut the substrate g to avoid static electricity when the substrate 16 is mounted on the top of the four support columns 820 or the support columns 820 are lifted from the four support posts 820. While the present invention may be embodied in many forms without departing from the spirit and essential characteristics thereof, it should be understood that the invention is not limited to the details of the description, but should be in the spirit of the appended claims. And the scope and spirit of the scope of the invention and the equivalents and modifications of the scope of the scope of the invention are intended to be encompassed. Attached to the scope of the patent application. BRIEF DESCRIPTION OF THE DRAWINGS The accompanying drawings are included to provide a In the drawings: Figure 1 is a perspective view of a coating machine example; φ Figure 2 is a perspective view of a conventional platform of a coater; Figures 3 to 7 are diagrams showing a platform cloth head unit when the coater is operated by a conventional method; Figure 8 is a front view of a platform embodiment of the coater according to the present invention (4); Figure 9 is a view showing a moving direction of the stage and the coating head unit of the method for operating the coater by the present invention; FIG. 1A to FIG. 13 are diagrams showing the movement direction of the platform and the coating head unit when the embodiment of the present invention is used, and FIG. 13 is a diagram showing the method and the coating head for performing the coating machine using the present invention. An enlarged view of the direction in which the unit moves. , 17 201031968

【主要元件符號說明】 100 主框架 200 平台 210 底板 220 支撐塊 221 真空通道 222 子L 223 空間 300 第一驅動單元 400 塗佈頭單元支樓框 410 垂直部 420 水平 500 第二驅動單元 600 塗佈頭單元 700 第三驅動單元 800 平台 810 板 811 凹槽 812 空氣通道 813 孔 820 支撐柱 830 壓縮空氣供應單元 831 空氣壓縮機 832 管線 840 離子通道 G 基板 18[Main component symbol description] 100 Main frame 200 Platform 210 Base plate 220 Support block 221 Vacuum channel 222 Sub L 223 Space 300 First drive unit 400 Coating head unit Branch frame 410 Vertical portion 420 Horizontal 500 Second drive unit 600 Coating Head unit 700 third drive unit 800 platform 810 plate 811 groove 812 air channel 813 hole 820 support column 830 compressed air supply unit 831 air compressor 832 line 840 ion channel G substrate 18

Claims (1)

201031968 七、申請專利範圍: 1. 一種一塗佈機之平台,包含: 一板; 複數支撐柱’提供於該板上,其上供裝設一基板;以及 一壓縮空氣供應單元,供應壓縮空氣到該基板之下表 面’以支撐該基板。201031968 VII. Patent application scope: 1. A coating machine platform comprising: a plate; a plurality of support columns 'provided on the plate for mounting a substrate; and a compressed air supply unit for supplying compressed air To the lower surface of the substrate 'to support the substrate. 2.如申請專利範圍第1項所述之平台,其中該板具有空氣通道 於!! °卩以及孔於上表面,各空氣通道連接各孔,該壓縮空氣供 應單元透過該通道及該孔供應該壓縮空氣到該基板之下表面。 3\如申請專利範圍第1項所述之平台,其中一離子產生單元連 接該板’而在該板與該基板間產生離子。 4. 含銘ΓίΓ—塗佈機之—平台及—塗佈鮮元移_方法,包 平台二 具有一喷嘴之該塗佈頭單元於與該 5元1動申==、ΓΓΓ項所述之控制塗佈機之平台及塗佈頭單 動的方法,其中該平台及具有該喷 移動於Υ轴方向_反方向 4佈頭早兀分別 元二申^範ΓίΛ項所述之控制塗佈機之平台及塗_ 移動於X軸方向’的相::二及具有該喷嘴之該塗佈頭單元分別 含 種控制一塗佈機之一平台及一 單元鶴的方法,包 19 201031968 一第一步驟,移動其上供裝設一基板之該平台於γ轴方 向至一第一預定距離,並同時移動具有一喷嘴之該塗佈頭單元 於該平台移動方向相反之方向至一第二預定距離; 一第二步驟,移動具有該喷嘴之該塗佈頭單元於X軸方 向至一第三預定距離; 一第二步驟,移動該平台於與該第一步驟中該平台移動 方白相反之方向至一第四預定距離,並同時移動具有該喷嘴之2. The platform of claim 1, wherein the plate has an air passage in the !! ° 卩 and the hole is on the upper surface, each air passage is connected to each hole, and the compressed air supply unit is provided through the passage and the hole. Air should be compressed to the lower surface of the substrate. 3. The platform of claim 1, wherein an ion generating unit is coupled to the plate to generate ions between the plate and the substrate. 4. Including the Γ Γ 涂布 - coating machine - platform and - coating fresh element shift _ method, the package platform 2 has a nozzle of the coating head unit and the 5 yuan 1 a method for controlling the platform of the coating machine and the single movement of the coating head, wherein the platform and the control coating machine having the spray movement in the direction of the x-axis and the opposite direction of the cloth are as described in the second paragraph The platform and the coating _ moving in the X-axis direction of the phase:: 2 and the coating head unit having the nozzle respectively comprise a method for controlling a platform of a coating machine and a unit crane, package 19 201031968 a first step Moving the platform on which a substrate is mounted to a first predetermined distance in the γ-axis direction, and simultaneously moving the coating head unit having a nozzle in a direction opposite to the moving direction of the platform to a second predetermined distance; a second step of moving the coating head unit having the nozzle to a third predetermined distance in the X-axis direction; a second step of moving the platform in a direction opposite to the moving white of the platform in the first step to a fourth predetermined distance, and at the same time moving the tool Have the nozzle 該塗佈頭單70於該平台移動方向相反之方向至—第 離; 一第四步驟,移動具有該喷嘴之該塗佈頭單元於該X軸 方向至一第六預定距離;以及 一第五步驟,以預定次數重複執行該第一步驟至該第四 步驟,但最後—次執行該第—步驟至該第三步驟。 8. 〜如申請專利範圍第7項所述之控餘佈機之平台及塗佈頭 動的方法,其中於該第二步驟,移動具有該喷嘴之該塗 =方湖恢該塗佈頭單 9元7項所述之控制塗佈機之平台及塗佈頭單 於該第四步驟’移動具有該嘴嘴之該塗佈 移動==:=具有該喷嘴之該塗佈頭單元 以及:佈頭 該塗佈頭單元分別移動於正㈩γ軸 軸=噴嘴之 —該平台及具有該喷嘴之該塗移: 20 201031968 負 含::制塗佈機之—平台及一塗佈頭單元移動的方法包 軸方向至 -第L預動其上供裝設—基板之該平台於正(+)Υ 單元於方向該塗佈頭The coating head unit 70 is in the opposite direction of the moving direction of the platform to the first direction; a fourth step of moving the coating head unit having the nozzle to the sixth predetermined distance in the X-axis direction; and a fifth In the step, the first step to the fourth step are repeatedly performed a predetermined number of times, but the first step to the third step are performed last time. 8. The method for controlling the platform and the coating head of the controlled cloth machine according to claim 7, wherein in the second step, the coating having the nozzle is changed. The platform and coating head of the control coating machine described in item 7 are in the fourth step of 'moving the coating movement with the nozzle==:= the coating head unit having the nozzle and the cloth head coating The head unit moves to the positive (ten) γ axis = nozzle - the platform and the coating with the nozzle: 20 201031968 Negative:: the coating machine - the platform and a coating head unit moving method To the -Lth pre-action on which the platform for mounting the substrate is in the positive (+) 单元 unit in the direction of the coating head (_)γ輪方向及正(+)γ軸方向 轴方向至^^定^噴嘴之該塗佈頭單元於鄉 距離,並同時移動具袖方向至-第四預定 至-第五預定距離。、狀该塗佈頭早兀於正WY軸方向(_) γ wheel direction and positive (+) γ axis direction The axis direction is to the coating head unit of the nozzle to the home distance, and simultaneously move the sleeve direction to - fourth predetermined to - fifth predetermined distance. The coating head is in the direction of the positive WY axis 21twenty one
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CN201063083Y (en) * 2007-06-07 2008-05-21 东捷科技股份有限公司 Air-float type worktable for locating LCD panel

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CN101804399A (en) 2010-08-18
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TWI531834B (en) 2016-05-01

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