TWM383450U - Stage for use in a dispenser - Google Patents

Stage for use in a dispenser Download PDF

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Publication number
TWM383450U
TWM383450U TW098224083U TW98224083U TWM383450U TW M383450 U TWM383450 U TW M383450U TW 098224083 U TW098224083 U TW 098224083U TW 98224083 U TW98224083 U TW 98224083U TW M383450 U TWM383450 U TW M383450U
Authority
TW
Taiwan
Prior art keywords
support
workbench
vacuum
plate
bag
Prior art date
Application number
TW098224083U
Other languages
Chinese (zh)
Inventor
Jae-Kwan Jung
Il-Sung Park
Jun-Mo Park
Byung-Hwan Kang
Original Assignee
Top Eng Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Top Eng Co Ltd filed Critical Top Eng Co Ltd
Publication of TWM383450U publication Critical patent/TWM383450U/en

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/062Easels, stands or shelves, e.g. castor-shelves, supporting means on vehicles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68785Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00Materials and properties
    • G02F2202/22Antistatic materials or arrangements

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Nonlinear Science (AREA)
  • Coating Apparatus (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

There is provided a stage for use in a dispenser, the stage including a base plate; a plurality of support blocks, each having a plurality of pockets, which are combined with the base plat; a plurality of support plates, each of which are inserted into each of the plurality of pockets to support a substrate; and a connection unit connecting the support plate and the support block. A component of the stage, when damaged, can be conveniently replaced with a new one, in a cost-effective way. The protective layer is formed only on the support plate which comes in contact with the substrate, thereby reducing a cost of coating.

Description

M383450 五、新型說明: 【新型所屬之技術領域】 本創作係關於用於塗佈機之工作台。 【先前技術】 液晶是結晶固體與等向性液體間的中間相,並結合了晶 體結構與變形流體的某些特性。液晶顯示器(LCD)利用液晶 的流體性與結晶特性相關的非等向性。液晶顯示器應用於手 機、可攜式電腦、桌上型監視器、以及LCD電視。 液晶顯示器由TFT陣列基板及彩色濾光片陣列基板所 構成。TFT陣列基板及彩色濾光片陣列基板以膠(或密封劑) 圖案彼此附接,而液晶層夾設於TFT陣列基板及彩色濾光 片陣列基板之間。 藉由控制施加於各像素之液晶層的電壓,可容許不同量 的光通過,藉此產生影像。 液晶顯示器的製造簡要說明如下。 ,複數TFT陣列形成於一個基板上。複數彩色濾光片陣 列=成於另一基板上。密封(膠)塗佈機塗佈膠以形成膠圖案 ^這兩個基板任一者上。膠圖案包含轉角為90度之四條直 、、泉膠,各與相對者具有相同長度。液晶(Lc)塗佈機以液滴形 式塗佈液晶到基板上膠圖案所界定的區域。這兩個基板結合 成母基板。此時’膠圖案作為黏著劑而將兩個基板彼此附 接。後續將母基板切割成離散的LCD面板。 工作台提供於密封塗佈機以及液晶塗佈機。為簡要說 明’以密封塗佈機(於後稱「塗佈機」)做為範例說明工作台。 圖1為塗佈機之透視圖。如圖1所示,塗佈機包含主框 架100、工作台200、塗佈頭單元支標框300、第一驅動單 元400、塗佈頭單元5〇〇、以及第二驅動單元6〇〇。 主框架1〇0具有支撐配置,以提供工作台200、塗佈頭 單元支撐框300、及塗佈頭單元5〇〇穩定性。 工作台200固定地或可移動地提供於主框架1〇〇上。 垂直部31〇 。塗佈頭單 塗佈頭單元找框300包含兩個彼此相距的垂直部 以及連接在兩_直部31G上·的水平部32g 牙王W可直線飾的方式提供於錄架1〇〇。 第一驅動單元_騎塗_單元支撐框300。M383450 V. New description: [New technical field] This creation is about the workbench used for coating machines. [Prior Art] Liquid crystal is an intermediate phase between a crystalline solid and an isotropic liquid, and combines some characteristics of a crystal structure and a deformed fluid. Liquid crystal displays (LCDs) utilize the anisotropy associated with the fluidity and crystallization characteristics of liquid crystals. Liquid crystal displays are used in mobile phones, portable computers, desktop monitors, and LCD TVs. The liquid crystal display is composed of a TFT array substrate and a color filter array substrate. The TFT array substrate and the color filter array substrate are attached to each other in a glue (or sealant) pattern, and the liquid crystal layer is interposed between the TFT array substrate and the color filter array substrate. By controlling the voltage applied to the liquid crystal layer of each pixel, a different amount of light can be allowed to pass, thereby generating an image. A brief description of the manufacture of the liquid crystal display is as follows. The plurality of TFT arrays are formed on one substrate. The complex color filter array = formed on another substrate. The seal (glue coater) coats the glue to form a glue pattern ^ on either of the two substrates. The glue pattern consists of four straight, spring glues with a corner angle of 90 degrees, each having the same length as the opposite. The liquid crystal (Lc) coater coats the liquid crystal in a droplet form to a region defined by the substrate sizing pattern. The two substrates are combined into a mother substrate. At this time, the glue pattern serves as an adhesive to attach the two substrates to each other. The mother substrate is subsequently cut into discrete LCD panels. The workbench is provided in a seal coater and a liquid crystal coater. For the sake of brevity, the workbench will be described as an example of a seal coater (hereinafter referred to as "coater"). Figure 1 is a perspective view of a coater. As shown in Fig. 1, the coater includes a main frame 100, a table 200, a coating head unit sub-frame 300, a first driving unit 400, a coating head unit 5A, and a second driving unit 6A. The main frame 110 has a support configuration to provide stability of the table 200, the coating head unit support frame 300, and the coating head unit 5. The table 200 is fixedly or movably provided on the main frame 1A. The vertical portion 31〇. Coating Head Unit The coating head unit frame 300 includes two vertical portions spaced apart from each other and a horizontal portion 32g connected to the two straight portions 31G. The tooth W can be provided in the carriage 1 in a straight manner. The first drive unit _ rides the _ unit support frame 300.

單元移動”軸方向,而塗佈頭 M383450 塗佈頭單元500包含可移動於 /下移動喷嘴之第三驅動單元。 万向之噴嘴,以及上 圖】所示之元件符號G表示基板。 %在描述具有上述組態之塗佈機的操作。 • 20〇r械手臂(未顯示)提升基板’並將基板裝設到工作台 操作第一驅動單元_及第二驅動私_,以根據預 定膠圖案的資料,移動魏有嘴嘴之塗佈頭單元·。2 佈機操作前,將預定膠圖案的資料輸人於控制單元(未顯 示)。根據預疋膠圖案,透過噴嘴塗佈膠到基板。 在基板上形成膠圖案後,機械手臂自工作台200拾起基 板,並將基板放到後續程序的其他設備上。 工作台200之一範例如圖2所示,係包含底板21〇以及 複數支撐塊220提供於底板21〇上。複數支撐塊22〇相對於 彼此以預定距離相隔設置,藉此在兩相鄰支撐塊間產生空 間。 支撐塊220為六面體形狀。支撐塊22〇内部具有真空通 道221,且在上表面具有複數孔222。 真空通道221連接複數孔222。支撐塊220利用螺絲(未 顯示)連接到底板210。支撐塊220具有與底板210相同的長 度。 基板裝設於支撐塊220的上表面上,然後藉由存在於真 空通道221内之真空’緊緊地吸到支撐塊22〇的上表面。 在兩相鄰支標塊220間存在有空間。機械手臂在空間中 來回移動及抽回,而將基板裝設於工作台2〇〇上或將基板自 工作台200提取。 土 支撐塊220的外表面以含氟物塗佈,而形成保謨;, 避免靜電射。 當支撐塊220上表面或氟保護層損壞時,必須供換新的 支撐塊。但是安裝新的支撐塊22〇到底板21〇上,而使支撐 ,220保持在水平可接受的程度,並不容易。甚至當受到小 量的物理衝擊時’形成於支撐塊22〇上的氟保護層會產生刮 痕。 形成氟保護層於支撐塊220的整個外表面,增加了製造 支樓塊220的成本。 【新型内容】 本創作目的在於便利地以新的元件更換工作台的受損 M383450 元件。 本創作之另一目的在於使工作台上欲形成保護層之外 表面儘可能的小。 根據本創作之一方面,提供一種用於塗佈機之工作台, 此工作台包含底板;複數支撐塊,各具有複數袋件,與底板 結合;複數支撐板,各插入複數個袋件之每一個,以支撐基 板;以及連接單元’連接支撐板及支撐塊。 支撐塊内部具有真空通道,以及支撐板於其上表面具有 複數穿孔。複數穿孔連接真空通道。 〃 一或更多的高度調整板提供於袋件底部及支撐板底侧 之間。 _ 根據本創作另一方面,提供一種用於塗佈機之工作△, 此工作台包含底板;複數支撑塊,各具有複數袋件及真^通 道’與底板結合,複數支樓板,各插入複數個袋件之每一個, 以支撐基板;高度調整單元,調整支撐板之高度;連接^元| 連接支撐板及支撐塊;以及真空防漏構件’提供於支撐=’ 袋件底部及支撑板底側之間,避免真空攻漏。 之 高度調整單元可包含複蚊位螺絲,各鎖人 紋孔,以及各螺絲之一端由袋件之底部支撐。、連接單元。” 含複數螺絲,各通過支撐板並鎖入支撐塊之螺紋孔。可c 7 M383450The unit moves in the "axis direction", and the coating head M383450 coating head unit 500 includes a third driving unit that can move the nozzle down/down. The nozzle of the universal direction, and the symbol G shown in the above figure, represent the substrate. Describe the operation of the coater having the above configuration. • 20 〇r arm (not shown) lifts the substrate 'and mounts the substrate to the table to operate the first drive unit _ and the second drive _ to the predetermined glue Pattern information, moving the coating head unit of Wei mouth. · 2 Before the cloth machine operation, the information of the predetermined rubber pattern is input to the control unit (not shown). According to the pre-rubber pattern, the glue is applied through the nozzle. Substrate After forming the glue pattern on the substrate, the robot picks up the substrate from the workbench 200 and places the substrate on other equipment of the subsequent program. An example of the workbench 200 is shown in Fig. 2, which includes the bottom plate 21〇 and A plurality of support blocks 220 are provided on the bottom plate 21A. The plurality of support blocks 22 are disposed at a predetermined distance from each other, thereby creating a space between the two adjacent support blocks. The support block 220 is in the shape of a hexahedron. The support block 22〇 Inside There is a vacuum channel 221 and a plurality of holes 222 on the upper surface. The vacuum channel 221 is connected to the plurality of holes 222. The support block 220 is connected to the bottom plate 210 by screws (not shown). The support block 220 has the same length as the bottom plate 210. On the upper surface of the support block 220, it is then tightly attracted to the upper surface of the support block 22 by the vacuum present in the vacuum channel 221. There is space between the two adjacent support blocks 220. The robot arm is The substrate is moved back and forth in the space, and the substrate is mounted on the table 2 or the substrate is extracted from the work table 200. The outer surface of the soil support block 220 is coated with fluorine to form a protective layer; Electrostatic radiation. When the upper surface of the support block 220 or the fluorine protective layer is damaged, a new support block must be provided. However, a new support block 22 is attached to the bottom plate 21, and the support 220 is maintained at an acceptable level. It is not easy. Even when subjected to a small amount of physical impact, the fluorine protective layer formed on the support block 22 is scratched. The fluorine protective layer is formed on the entire outer surface of the support block 220, and the manufacturing branch block is added. twenty two Cost of 0. [New content] The purpose of this creation is to conveniently replace the damaged M383450 component of the workbench with new components. Another purpose of this creation is to make the surface on the workbench to be as small as possible. According to one aspect of the present invention, a workbench for a coater is provided, the workbench including a bottom plate; a plurality of support blocks each having a plurality of bag members coupled to the bottom plate; and a plurality of support plates each inserting a plurality of bag members One to support the substrate; and the connecting unit 'connects the support plate and the support block. The support block has a vacuum passage inside, and the support plate has a plurality of perforations on the upper surface thereof. The plurality of perforations are connected to the vacuum passage. 〃 One or more height adjustment plates Provided between the bottom of the bag member and the bottom side of the support plate. According to another aspect of the present invention, there is provided a work for a coater, the workbench comprising a bottom plate; a plurality of support blocks each having a plurality of bag members and a true channel' combined with the bottom plate, a plurality of support plates, each inserting a plurality Each of the bag members supports the substrate; the height adjustment unit adjusts the height of the support plate; the connection unit | connects the support plate and the support block; and the vacuum leakage preventing member is provided at the support = 'the bottom of the bag member and the bottom of the support plate Avoid vacuum leaks between the sides. The height adjustment unit may include a mosquito bit screw, each of the lock holes, and one end of each screw is supported by the bottom of the bag member. , connecting unit. Include multiple screws, each through the support plate and locked into the threaded hole of the support block. Can be c 7 M383450

一個定位螺絲及鄰近定位螺絲之螺 絲可提供為成斜配 本創作前述及其他目的 以下詳細說明並配合伴隨圖 、特徵、觀點、以及優點 式,將更加清楚了解。 ,參考A locating screw and a screw adjacent to the locating screw can be provided as a slanting arrangement. The foregoing and other objects will be more clearly understood from the following detailed description and accompanying drawings, features, aspects, and advantages. ,reference

【實施方式】 參考伴隨圖式 實施例。 詳細說明本創_於塗佈機之工作台之 圖3為根據本創作第一實施例用於塗佈機之工作台之 透視圖。® 4為支魏之平面圖,其為根據本創作第^施 例用於塗佈機之玉作台之元件。圖5為切塊之橫截面圖, 其為根據本創作第一實施例用於塗佈機之工作台之元件。 如圖3、圖4、及圖5所示,第一實施例之工作台包含 底板710、支樓塊720、支樓板730、連接單元740。 底板為矩形形狀。 支撐塊720為六面體形狀,並於其上表面具有複數袋件 721。支撐塊720具有真空通道Η。真空應用於真空通道Η 以及自真空通道Η釋出。 複數袋件721相對於彼此縱向地以預定距離間隔設 置。袋件721由一側到另一側地橫越支撐塊720。 8 真空通道Η之一範例包含縱向通道722以及在袋件721 底部中之真空孔723 ’其中各縱向通道722從支撐塊720之 —蠕直線縱向地通到另一端。縱向通道722連接真空孔 723。真空通道H可更包含輔助通道724,橫向連接於縱向 通道722之間。 較佳地,提供兩個縱向通道722。這兩個縱向通道722 相對於彼此以預定距離相隔設置。較佳地,提供四個真空孔 723。兩個真空孔723連接一個縱向通道722,而剩餘的兩 個真空孔723連接另一縱向通道722。 真空通道Η連接真空產生裝置(未顯示)。 支標塊720利用螺絲或螺栓與螺帽連接到底板7。於 利用螺絲的案例巾’支撐塊72〇具有從上到下穿過的螺紋 孔,且底板710具有螺紋孔。螺絲通過支撐塊72〇中的螺紋 孔,並鎖入底板71〇的螺紋孔。於利用螺栓及螺帽的案例 中’ 士樓塊72〇具有從上到下穿過之步階式孔,且底板烟 具有穿孔。螺栓通過支撐塊72〇中的步階式孔及底板71〇 穿孔,以鎖入螺帽。 支撐塊720相對於彼此以預定距離相隔設置。如此 相鄰支撐塊72G之間產生空間。機械手臂(未顯示)在空間 中來回移動及抽回,以轉移裝設於工作台之基板。 M383450 支撐塊720及底板710可製成單一件。 支撐板730為六面體形狀,具有複數第一穿孔731。支 撐板730之截面在尺寸及形狀上可與袋件721相同。支撐板 730的厚度可略大於袋件721的深度。 支樓板730分別插入支撐塊720中各自配對的袋件 721。當支撐板730維持放在與其配對的袋件721中時,支 撐板730之上表面自支撐塊720之上表面突出,同時支撐板 730之第一穿孔731分別連接與其配對的真空孔723。支撐 板730利用連接單元740固定地連接到支標塊72〇。 連接單元740可包含複數螺絲。 於此類案例中,支撐塊720的袋件721底部具有複數螺 紋孔725,且支撐板730具有複數第二穿孔732。第二穿孔 732包含上孔及連接上孔之下孔。上孔的内徑大於下孔的内 徑,但是上孔及下孔為同心。如此使得第二穿孔732的輪廓 為步階式。螺絲頭安置於第二穿孔732内平表面上。 螺紋孔725與螺絲一樣多個,而第二穿孔732亦與螺絲 一樣多個。 ' ' 螺絲通過第二穿孔732並鎖入螺紋孔725。 基板裝設於支撐板730的上表面。 ▲保護層可形成於支撐板730的上表面或整個外表面。保 護層用以避免靜電。保護層可為氟層。 如圖6所示,一或更多的高度調整板75〇可提供於袋件 721底部及支撐板730底側之間。高度調整板750厚度一致, 用以調整支撐板730的高度使其維持水平。 現在說明根據本創作第二實施例用於塗佈機之工作台。 第二實施例之工作台包含底板、支撐塊、支撐板、連接[Embodiment] Reference is made to the accompanying drawings. DETAILED DESCRIPTION OF THE INVENTION The present invention is a perspective view of a workbench for a coater according to a first embodiment of the present invention. ® 4 is a plan view of Wei Wei, which is an element used in the jade table of the coating machine according to the second embodiment of the present invention. Figure 5 is a cross-sectional view of a dicing block, which is an element of a table for a coater according to the first embodiment of the present invention. As shown in Figs. 3, 4, and 5, the workbench of the first embodiment includes a bottom plate 710, a branch block 720, a branch floor 730, and a connecting unit 740. The bottom plate has a rectangular shape. The support block 720 has a hexahedral shape and has a plurality of pocket members 721 on its upper surface. The support block 720 has a vacuum channel. Vacuum is applied to the vacuum channel and released from the vacuum channel. The plurality of pocket members 721 are longitudinally spaced apart from each other by a predetermined distance. The pocket 721 traverses the support block 720 from side to side. An example of a vacuum channel 包含 includes a longitudinal channel 722 and a vacuum aperture 723' in the bottom of the pocket member 721, wherein each longitudinal channel 722 extends longitudinally from the support block 720 to the other end. The longitudinal passage 722 is connected to the vacuum hole 723. The vacuum passage H may further include an auxiliary passage 724 laterally connected between the longitudinal passages 722. Preferably, two longitudinal channels 722 are provided. The two longitudinal channels 722 are spaced apart from each other by a predetermined distance. Preferably, four vacuum holes 723 are provided. Two vacuum holes 723 are connected to one longitudinal passage 722, and the remaining two vacuum holes 723 are connected to the other longitudinal passage 722. The vacuum channel is connected to a vacuum generating device (not shown). The support block 720 is attached to the base plate 7 by screws or bolts and nuts. The case towel's support block 72'' has a threaded hole passing through from top to bottom, and the bottom plate 710 has a threaded hole. The screw passes through the threaded hole in the support block 72 and is locked into the threaded hole of the bottom plate 71. In the case of bolts and nuts, the 'Street Block 72' has a stepped hole that passes through from top to bottom, and the floor smoke has perforations. The bolt is perforated through the stepped hole in the support block 72 and the bottom plate 71 to lock the nut. The support blocks 720 are disposed at a predetermined distance from each other. Spaces are created between adjacent support blocks 72G. A robotic arm (not shown) moves back and forth in space to transfer the substrate mounted on the table. The M383450 support block 720 and the bottom plate 710 can be made in a single piece. The support plate 730 has a hexahedral shape with a plurality of first perforations 731. The cross section of the support plate 730 can be the same in size and shape as the bag member 721. The thickness of the support plate 730 may be slightly larger than the depth of the bag member 721. The slabs 730 are respectively inserted into the respective paired pocket members 721 in the support block 720. When the support plate 730 is held in the pocket member 721 paired therewith, the upper surface of the support plate 730 protrudes from the upper surface of the support block 720, while the first through holes 731 of the support plate 730 are respectively connected to the vacuum holes 723 paired therewith. The support plate 730 is fixedly coupled to the support block 72A by the connection unit 740. The connecting unit 740 can include a plurality of screws. In such cases, the bottom of the pocket 721 of the support block 720 has a plurality of threaded holes 725, and the support plate 730 has a plurality of second perforations 732. The second perforation 732 includes an upper aperture and a lower aperture connected to the upper aperture. The inner diameter of the upper hole is larger than the inner diameter of the lower hole, but the upper and lower holes are concentric. The outline of the second perforation 732 is thus stepped. The screw head is disposed on the flat surface of the second perforation 732. The threaded holes 725 are as many as the screws, and the second through holes 732 are also as many as the screws. The '' screw passes through the second perforation 732 and locks into the threaded hole 725. The substrate is mounted on the upper surface of the support plate 730. ▲ The protective layer may be formed on the upper surface or the entire outer surface of the support plate 730. The protective layer is used to avoid static electricity. The protective layer may be a fluorine layer. As shown in Fig. 6, one or more height adjustment plates 75A may be provided between the bottom of the bag member 721 and the bottom side of the support plate 730. The height adjustment plate 750 has the same thickness to adjust the height of the support plate 730 to maintain the level. A table for a coater according to a second embodiment of the present invention will now be described. The workbench of the second embodiment comprises a bottom plate, a support block, a support plate, and a connection

tID 早元、高度調整單元、以及真空防漏構件。 底板710與第一實施例工作台之底板71〇相同。 支撐塊720如圖7所示為六面體形狀,並於其上表面具 有複數袋件721。支撐塊720具有真空通道Η。真空應用於 真空通道Η以及自真空通道Η釋出。 複數袋件721相對於彼此縱向地以預定距離間隔設 置。袋件721由一側到另一側地橫越支撐塊720。 真空通道Η之一範例包含縱向通道722以及在袋件721 底部中之真空孔723 ’其中各縱向通道722從支撐塊72〇之 —端直線縱向地通到另一端。縱向通道722連接真空孔 723。真空通道Η可更包含輔助通道724,橫向連接於縱向 M383450 通道722之間。 較佳地,提供兩個縱向通道722 ^這兩個縱向通道722 相對於彼此以預定距離相隔設置。較佳地,提供四個直允孔 723。兩個真空孔723連接一個縱向通道722,而剩餘^兩 個真空孔723連接另一縱向通道722。 真空通道Η連接真空產生裝置(未顯示)。 支標塊720利用螺絲或螺栓與螺帽連接到底板71〇。於 利用螺絲的案例中,支撐塊72〇具有從上到下穿過的螺紋 孔,且底板710具有螺紋孔。螺絲通過支樓塊,中的螺紋 孔,並鎖入底板710的螺紋孔。於利用螺栓及螺帽的案例 中’支樓塊720具有從上到下穿過之步階纽,且底板71〇 具有穿孔。螺栓通過支樓塊72〇中的步階式孔及底板71〇之 穿孔,以鎖入螺帽。 支撐塊720相對於彼此以預定距離相隔設置。如此在兩 相鄰支魏720之間產生空間。機械手臂(未顯示)在空間 中來回移動及抽回,以轉移裝設於卫作台之基板。支撐塊 720與底板710可製成單一件。 支撐板730為六面體形狀,具有複數第一穿孔731。支 樓板730之截面在尺寸及形狀上可與袋件72 1相同。支樓 板730的厚度可略大於袋件721的深度。 M383450 支撐板730分別插入支撐塊72〇中各自配對的袋件 721。當支撐板730維持放在與其配對的袋件721中時,支 撐板730之上表面自支撐塊72〇之上表面突出,同時支撐板 730之第一穿孔731分別連接與其配對的真空孔723。 支樓板730利用連接單元74〇固定地連接到支撐塊72〇。 連接單元740可包含複數螺絲。 於此類案例中,支撐塊720的袋件721底部具有複數螺 紋孔725,且支撐板730具有複數第二穿孔732。第二穿孔 732包含上孔及連接上孔之下孔。上孔的内徑大於下孔的内 徑,但是上孔及下孔為同心。如此使得第二穿孔的輪廊 為步階式。螺絲頭安置於第二穿孔732内平表面上。 螺紋孔725與螺絲一樣多個,而第二穿孔732亦與螺絲 一樣多個。 螺絲通過第二穿孔732並鎖入螺紋孔725。 、真空防漏構件760提供於支撐塊720之袋件721底部及 支樓板73G底側之間。真空防漏構件避免真空透過在 720底部及支撐板73〇底側間之縫隙洩漏出。 士 ^空防漏構件760如圖8所示可包含密封環。當安裝 時’在封環環繞第一穿孔73】之下開口及真空孔723之上開 M383450 Π 〇 於此案例中,圓形溝槽726環繞支撐塊720之真空孔 723之上開口形成,而密封環插入圓形溝槽726。當支撐板 插入袋件721時,第一穿孔731連接真空孔723,同時 达、封環壓抵支標板730底側。此時,密封環環繞第一穿孔 731之下開口。 回度凋整單元770之一範例可包含複數定位螺絲,各鎖 入支撐板730之螺紋孔,以及各螺絲之一端由袋件721之底 部支撐。 於此案例中,支撐板73〇具有從上到下穿過的螺紋孔。tID early element, height adjustment unit, and vacuum leakproof member. The bottom plate 710 is the same as the bottom plate 71 of the table of the first embodiment. The support block 720 has a hexahedral shape as shown in Fig. 7, and has a plurality of pocket members 721 on its upper surface. The support block 720 has a vacuum channel. The vacuum is applied to the vacuum channel and released from the vacuum channel. The plurality of pocket members 721 are longitudinally spaced apart from each other by a predetermined distance. The pocket 721 traverses the support block 720 from side to side. An example of a vacuum channel 包含 includes a longitudinal channel 722 and a vacuum aperture 723' in the bottom of the pocket member 721, wherein each longitudinal channel 722 extends longitudinally from the end of the support block 72 to the other end. The longitudinal passage 722 is connected to the vacuum hole 723. The vacuum channel 更 may further include an auxiliary channel 724 laterally connected between the longitudinal M383450 channel 722. Preferably, two longitudinal channels 722 are provided. The two longitudinal channels 722 are spaced apart from one another by a predetermined distance. Preferably, four straight holes 723 are provided. Two vacuum holes 723 are connected to one longitudinal passage 722, and the remaining two vacuum holes 723 are connected to the other longitudinal passage 722. The vacuum channel is connected to a vacuum generating device (not shown). The support block 720 is coupled to the bottom plate 71 by screws or bolts and nuts. In the case of using a screw, the support block 72 has a threaded hole passing through from top to bottom, and the bottom plate 710 has a threaded hole. The screw passes through the threaded hole in the branch block, and is locked into the threaded hole of the bottom plate 710. In the case of the use of bolts and nuts, the 'building block 720 has stepped steps from top to bottom, and the bottom plate 71 has perforations. The bolt passes through the stepped hole in the branch block 72 and the perforation of the bottom plate 71 to lock the nut. The support blocks 720 are disposed at a predetermined distance from each other. This creates a space between two adjacent branches 720. A robotic arm (not shown) moves back and forth in space to transfer the substrate mounted on the table. The support block 720 and the bottom plate 710 can be made in a single piece. The support plate 730 has a hexahedral shape with a plurality of first perforations 731. The cross section of the slab 730 can be identical in size and shape to the pocket member 72 1 . The thickness of the slab 730 may be slightly greater than the depth of the pocket 721. The M383450 support plates 730 are respectively inserted into the respective paired pocket members 721 in the support block 72A. When the support plate 730 is held in the pocket member 721 paired therewith, the upper surface of the support plate 730 protrudes from the upper surface of the support block 72, while the first through holes 731 of the support plate 730 are respectively connected to the vacuum holes 723 paired therewith. The slab 730 is fixedly coupled to the support block 72 by a connecting unit 74. The connecting unit 740 can include a plurality of screws. In such cases, the bottom of the pocket 721 of the support block 720 has a plurality of threaded holes 725, and the support plate 730 has a plurality of second perforations 732. The second perforation 732 includes an upper aperture and a lower aperture connected to the upper aperture. The inner diameter of the upper hole is larger than the inner diameter of the lower hole, but the upper and lower holes are concentric. This makes the second perforated porch stepped. The screw head is disposed on the flat surface of the second perforation 732. The threaded holes 725 are as many as the screws, and the second through holes 732 are also as many as the screws. The screw passes through the second perforation 732 and locks into the threaded hole 725. The vacuum leakage preventing member 760 is provided between the bottom of the bag member 721 of the support block 720 and the bottom side of the branch floor 73G. The vacuum leakage preventing member prevents the vacuum from leaking through the gap between the bottom of the 720 and the bottom side of the support plate 73. The air leakage preventing member 760 may include a seal ring as shown in FIG. When installed, the opening under the sealing ring around the first perforation 73 and the vacuum hole 723 open M383450. In this case, the circular groove 726 is formed around the opening of the vacuum hole 723 of the supporting block 720, and The seal ring is inserted into the circular groove 726. When the support plate is inserted into the pocket member 721, the first through hole 731 is connected to the vacuum hole 723 while the seal ring is pressed against the bottom side of the support plate 730. At this time, the seal ring is opened around the lower side of the first through hole 731. An example of the return grading unit 770 can include a plurality of set screws, each of which is threaded into the threaded bore of the support plate 730, and one end of each of the screws is supported by the bottom of the pocket member 721. In this case, the support plate 73 has a threaded hole that passes through from top to bottom.

,支撐板730之螺紋孔733定位成鄰近第二穿孔&。當 鎖入螺紋孔733時’定位螺絲定位成鄰近縣。—個定位^ 絲及-個螺絲成對提供。高度調整單元與獅—樣多個。' 在調整支樓板73〇高度之前,必須旋轉鬆開螺絲 位螺絲’以調整支樓板73G的高度,使其維持水平。 :支撐板73〇高相制可料範晴,必彡貞反向 、·糸,將支撐板730固定在位置。 ” 基板裝設於支撐板730的上表面。 保護層可形成於支樓板730的上表面或整個外表面。保 14 5蔓層用以避免靜電。保護層可為氟層。 現在說明根據本創作工作台之操作。 機械手臂(未顯示)提升基板,並將基板放到工作台上。 操作真空產生裝置,以應用真空到真空通道Η以及第一穿 孔731 ’藉此緊緊地將基板吸到支撐板73〇的上表面。 a操作第一驅動單元400及第二驅動單元600,以根據預 定膠圖案的資料,移動裝配有喷嘴之塗佈頭單元500。在塗 佈機操作前,將預定膠圖案的資料輸入於控制單元(未顯 示)。根據預定膠圖案,透過喷嘴塗佈膠到基板。 ‘· 知止操作真空產生裝置,以完全自真空通道Η及第一 穿孔731釋放出真空。 汉弟 機械手臂自工作台拾起基板,然後將基板轉移到後續程 序的其他設備上。 ,根據本創作之工作台的優點如下。當支撐板73。之上表 面受到喷嘴損壞時,必·做的僅僅是更換新的支撑板 730曰。當形成於支撐板73〇之保護層到傷時,必須要做的僅 僅是更換上有保護層形成的新支撑板。亦即,當支撑板謂 之上表面糾噴嘴損壞時’或當形成於支撐板73g之保護詹 寺’不需要更換新的支撐塊n保護層僅形成於與 基板接觸的支撐板73〇上。如此節省製造具有保護層之支樓 M383450 塊的時間及成本。 不論安裝多小的支撐板730,調整其高度而在可容許範 圍維持水平,是容易又便利的。 雖然本創作可以許多形式實施而不悖離其精神及重要 f徵’亦應了解除非有特別指明不然上述實施例不受限制於 前述說明的任何細節,而應在所附申請專利範圍之精神與範 脅下做廣A的解釋,因此所有落在轉離本創作申請專矛: 圍界定之精神與範嘴下或落在此類界定範4或精神之均』 物内之變化及修改,均意欲涵蓋在所附申請專利範圍。= 【圖式簡單說明】 包含所附圖式提供對本創作的進一步了解,並結合 於圖式中: 圖1為塗佈機之透視圖; 圖2為用於塗佈機之習知工作台之透視圖;The threaded hole 733 of the support plate 730 is positioned adjacent to the second perforation & When the screw hole 733 is locked, the positioning screw is positioned adjacent to the county. A positioning wire and a screw are provided in pairs. The height adjustment unit is lion-like. 'Before adjusting the height of the slab 73〇, the screw screw ' must be loosened' to adjust the height of the slab 73G to maintain it level. : The support plate 73 is high in phase and can be reversible, and the support plate 730 is fixed in position. The substrate is mounted on the upper surface of the support plate 730. The protective layer may be formed on the upper surface or the entire outer surface of the support floor 730. The vine layer may be used to avoid static electricity. The protective layer may be a fluorine layer. Operation of the workbench. A robotic arm (not shown) lifts the substrate and places the substrate on the workbench. Operates the vacuum generating device to apply vacuum to the vacuum channel and the first perforation 731' thereby sucking the substrate tightly The upper surface of the support plate 73. The first driving unit 400 and the second driving unit 600 are operated to move the coating head unit 500 equipped with the nozzle according to the data of the predetermined glue pattern. The data of the glue pattern is input to a control unit (not shown). The glue is applied to the substrate through the nozzle according to the predetermined glue pattern. '· The vacuum generating device is operated to completely release the vacuum from the vacuum channel and the first through hole 731. Handi mechanical arm picks up the substrate from the workbench and then transfers the substrate to other equipment of the subsequent program. The advantages of the workbench according to the present creation are as follows: when the support plate 73. When the surface is damaged by the nozzle, all that is necessary is to replace the new support plate 730. When the protective layer formed on the support plate 73 is damaged, all that has to be done is to replace the new support plate formed with the protective layer. That is, when the support plate is said that the upper surface correcting nozzle is damaged, or when the protection formed on the support plate 73g does not need to be replaced with a new support block, the n protective layer is formed only on the support plate 73 which is in contact with the substrate. This saves time and cost in manufacturing the M383450 block with the protective layer. It is easy and convenient to adjust the height of the support plate 730 with a small support to maintain the level within the allowable range. Although this creation can be implemented in many forms. Without departing from its spirit and significance, it should be understood that the above embodiments are not limited to the details of the foregoing description unless otherwise specified, and should be made under the spirit and scope of the appended claims. Explain, therefore, all changes and modifications that fall within the scope of this creative application: the spirit of the definition and the scope of the definition or the standard of the four or the spirit of the spirit are intended to be Included in the scope of the appended claims. = [ BRIEF DESCRIPTION OF THE DRAWINGS] The accompanying drawings are provided to provide a further understanding of the present invention and are incorporated in the drawings: Figure 1 is a perspective view of a coating machine; a perspective view of the machine's familiar workbench;

圖3為根據本創作第—實施例用於塗佈機之 透視圖; f I 於二==圖’其為根據本創作第-實施例用 用於其城縣卿第—實施例 例用其為根據本創作第-實施 16 M383450 圖7為支撐塊之透面圖,其為根據本創作第二實施例用 於塗佈機之工作台之元件; 圖8為真空防漏構件之裁面圖,其為根據本創作第二實 施例用於塗佈機之工作台之元件;以及 圖9為高度調整單元之截面圖,其為根據本創作第二實 施例用於塗佈機之工作台之元件。Figure 3 is a perspective view of a coating machine according to the first embodiment of the present invention; f I is in the second == figure, which is used in the first embodiment of the present invention for its city county FIG. 7 is a perspective view of a support block according to the present invention, which is a component of a workbench for a coater according to a second embodiment of the present invention; FIG. 8 is a plan view of a vacuum leakproof member. It is an element for a workbench of a coater according to the second embodiment of the present invention; and FIG. 9 is a cross-sectional view of the height adjustment unit, which is a workbench for a coater according to the second embodiment of the present creation. element.

【主要元件符號說明】 100 主框架 200 工作台 210 底板 220 支撐塊 221 支撐塊 222 子L 300 塗佈頭單元支樓框 310 垂直部 320 水平部 400 第一驅動單元 500 第一驅動單元 600 第二驅動單元 710 底板 720 支撐塊 721 袋件 722 縱向通道 723 真空孔 724 輔助通道 M383450 725 螺紋孔 726 圓形溝槽 730 支撐板 731 第一穿孔 732 第二穿孔 733 螺紋孔 740 連接單元 750 高度調整板 760 真空防漏構件 770 高度調整單元 G 基板 Η 真空通道[Main component symbol description] 100 Main frame 200 Workbench 210 Base plate 220 Support block 221 Support block 222 Sub L 300 Coating head unit Branch frame 310 Vertical portion 320 Horizontal portion 400 First drive unit 500 First drive unit 600 Second Drive unit 710 bottom plate 720 support block 721 bag member 722 longitudinal channel 723 vacuum hole 724 auxiliary channel M383450 725 threaded hole 726 circular groove 730 support plate 731 first perforation 732 second perforation 733 threaded hole 740 connection unit 750 height adjustment plate 760 Vacuum leakage prevention member 770 height adjustment unit G substrate 真空 vacuum passage

Claims (1)

M383450 六、申請專利範圍: 1.一種用於塗佈機之工作台,該工作台包含: 一底板; 複數支撐塊’各具有複數袋件,與該底板結合; 複數支撐板’各插入該複數個袋件之每一個,以支撑一 基板;以及 一連接單元,連接該支撐板及該支撐塊。M383450 VI. Patent application scope: 1. A workbench for a coating machine, the workbench comprising: a bottom plate; a plurality of support blocks each having a plurality of bag members combined with the bottom plate; a plurality of support plates each inserting the plurality Each of the bag members supports a substrate; and a connecting unit connects the support plate and the support block. 2. 如申請專利範圍第1項所述之用於塗佈機之工作台,其中該 j塊内部具有-真空通道,以及該支撐板於其上表面具有複 數穿孔,該複數穿孔連接該真空通道。 3. 如申請專利範圍第】顿述之用於塗佈機之卫作台,直中一 或更多的高度調整板提供浦袋件絲及财雜底側之間。 4. 一種用於塗佈機之工作台,該工作台包含: 一底板;2. The workbench for a coater according to claim 1, wherein the j-block has a vacuum passage inside, and the support plate has a plurality of perforations on an upper surface thereof, the plurality of perforations connecting the vacuum passages . 3. As claimed in the patent application section, the one or more height adjustment plates are provided between the bottom of the bag and the bottom side of the bag. 4. A workbench for a coater, the workbench comprising: a bottom plate; 結合;魏,各具有複㈣件及—真空通道 咖======蝴,各支 向度調整單S ’調整該支擇板^言$ · :=槿„板及該支二及 樓板底側錢撐塊之該袋件底部及該支 ▲D申請專利範圍第4項所述之用於 向度調整單元包含複數定位螺絲,各1佈機之工作台’其中該 谷鎖入該支撐板之一螺紋 19 6.如申請專利棚第5項所述之用於塗佈機之卫作4,其令一 個定位獅及㈣奴㈣狀闕絲提料成對二置、。 7.如申請專利細第5項所述之驗塗佈機之工作台,其中該 真空防漏構件包含—密封環環_切板之該穿孔。Combination; Wei, each with complex (four) pieces and - vacuum channel coffee ====== butterfly, each degree adjustment single S 'adjust the selection board ^言$ · :=槿„ board and the second and floor The base of the bottom side of the bag and the directional adjustment unit according to item 4 of the ▲D application scope includes a plurality of positioning screws, and a table of each of the two machines, wherein the valley is locked into the support One thread of the plate 19 6. As shown in the fifth application of the patent shed, the utility model 4 for the coating machine, which makes a positioning lion and (4) slave (four) quilting wire material in pairs, 7. The workbench of the coating machine described in claim 5, wherein the vacuum leakage preventing member comprises the perforation of the sealing ring ring-cutting plate. 8. 如申請專利範圍第!及4項任—項所述之用於塗佈機之工作 〇其中g該支樓板維持放在與其配對的袋件時,該 上表面由該支撐塊之上表面突出。 板 9. 如申請專職圍第丨及4項任—項所述之用於塗佈機之工作 台,其中該支撐塊及該底板製成單一件。 10. 如申請專利範圍第項任__項所述之餘塗佈機之工 作台’其巾敎避紐生靜電之—紐層,形成於該支樓塊之 外表面。 208. If you apply for a patent scope! And the operation of the coating machine described in the above-mentioned four items, wherein the upper surface is protruded from the upper surface of the support block when the supporting slab is placed on the bag member to be mated thereto. Plate 9. For the work platform for a coater as described in the full-time and fourth-parts, wherein the support block and the bottom plate are made in a single piece. 10. If the application of the remaining coating machine described in item __ of the scope of the patent application is </ RTI> </ RTI> </ RTI> it is formed on the outer surface of the building block. 20
TW098224083U 2008-12-29 2009-12-23 Stage for use in a dispenser TWM383450U (en)

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