TW201004934A - Sulfonium derivatives and the use therof as latent acids - Google Patents

Sulfonium derivatives and the use therof as latent acids Download PDF

Info

Publication number
TW201004934A
TW201004934A TW098119527A TW98119527A TW201004934A TW 201004934 A TW201004934 A TW 201004934A TW 098119527 A TW098119527 A TW 098119527A TW 98119527 A TW98119527 A TW 98119527A TW 201004934 A TW201004934 A TW 201004934A
Authority
TW
Taiwan
Prior art keywords
group
alkyl
interrupted
nr5r6
acid
Prior art date
Application number
TW098119527A
Other languages
English (en)
Chinese (zh)
Inventor
Yuichi Nishimae
Toshikage Asakura
Hitoshi Yamato
Original Assignee
Ciba Holding Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Holding Inc filed Critical Ciba Holding Inc
Publication of TW201004934A publication Critical patent/TW201004934A/zh

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Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D339/00Heterocyclic compounds containing rings having two sulfur atoms as the only ring hetero atoms
    • C07D339/08Six-membered rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D327/00Heterocyclic compounds containing rings having oxygen and sulfur atoms as the only ring hetero atoms
    • C07D327/02Heterocyclic compounds containing rings having oxygen and sulfur atoms as the only ring hetero atoms one oxygen atom and one sulfur atom
    • C07D327/06Six-membered rings
    • C07D327/08[b,e]-condensed with two six-membered carbocyclic rings
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
TW098119527A 2008-06-12 2009-06-11 Sulfonium derivatives and the use therof as latent acids TW201004934A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP08158090 2008-06-12

Publications (1)

Publication Number Publication Date
TW201004934A true TW201004934A (en) 2010-02-01

Family

ID=40469989

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098119527A TW201004934A (en) 2008-06-12 2009-06-11 Sulfonium derivatives and the use therof as latent acids

Country Status (7)

Country Link
US (1) US20110171569A1 (enExample)
EP (1) EP2288599A1 (enExample)
JP (1) JP2011523971A (enExample)
KR (1) KR20110025211A (enExample)
CN (1) CN102056913A (enExample)
TW (1) TW201004934A (enExample)
WO (1) WO2009150074A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5622448B2 (ja) 2010-06-15 2014-11-12 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法、高分子化合物、化合物
JP6002705B2 (ja) * 2013-03-01 2016-10-05 富士フイルム株式会社 パターン形成方法、感活性光線性又は感放射線性樹脂組成物、レジスト膜、及び、電子デバイスの製造方法
TWI575566B (zh) * 2014-02-24 2017-03-21 東京威力科創股份有限公司 與光敏化化學放大光阻化學品及程序一起使用的方法及技術
DE112015000546T5 (de) 2014-02-25 2016-11-10 Tokyo Electron Limited Chemische Verstärkungsverfahren und -methoden für entwickelbare untere Antireflexbeläge und gefärbte Implantationsresists
US10429745B2 (en) 2016-02-19 2019-10-01 Osaka University Photo-sensitized chemically amplified resist (PS-CAR) simulation
US10048594B2 (en) 2016-02-19 2018-08-14 Tokyo Electron Limited Photo-sensitized chemically amplified resist (PS-CAR) model calibration
TWI662360B (zh) 2016-05-13 2019-06-11 東京威力科創股份有限公司 藉由使用光劑之臨界尺寸控制
TWI657314B (zh) 2016-05-13 2019-04-21 東京威力科創股份有限公司 藉由使用光敏化學品或光敏化學增幅型光阻劑之臨界尺寸控制
WO2021034567A1 (en) 2019-08-16 2021-02-25 Tokyo Electron Limited Method and process for stochastic driven defectivity healing
JP2022164585A (ja) * 2021-04-15 2022-10-27 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
US20230004084A1 (en) * 2021-05-06 2023-01-05 Sumitomo Chemical Company, Limited Salt, acid generator, resist composition and method for producing resist pattern
JP7687292B2 (ja) * 2021-07-28 2025-06-03 信越化学工業株式会社 ネガ型レジスト材料及びパターン形成方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7541131B2 (en) * 2005-02-18 2009-06-02 Fujifilm Corporation Resist composition, compound for use in the resist composition and pattern forming method using the resist composition
US7901867B2 (en) * 2005-07-01 2011-03-08 Basf Se Sulphonium salt initiators
CN101466804B (zh) * 2006-04-13 2012-02-22 西巴控股有限公司 硫鎓盐引发剂
JP2009541254A (ja) * 2006-06-20 2009-11-26 チバ ホールディング インコーポレーテッド オキシムスルホネート及び潜酸としてのその使用
EP2125713B1 (en) * 2006-10-04 2012-04-18 Basf Se Sulphonium salt photoinitiators
EP2197839B1 (en) * 2007-10-10 2013-01-02 Basf Se Sulphonium salt initiators
EP2197869B1 (en) * 2007-10-10 2013-04-24 Basf Se Sulphonium salt initiators
WO2009047151A1 (en) * 2007-10-10 2009-04-16 Basf Se Sulphonium salt initiators

Also Published As

Publication number Publication date
US20110171569A1 (en) 2011-07-14
CN102056913A (zh) 2011-05-11
JP2011523971A (ja) 2011-08-25
EP2288599A1 (en) 2011-03-02
WO2009150074A1 (en) 2009-12-17
KR20110025211A (ko) 2011-03-09

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