TW200952019A - Ion source - Google Patents

Ion source Download PDF

Info

Publication number
TW200952019A
TW200952019A TW98107332A TW98107332A TW200952019A TW 200952019 A TW200952019 A TW 200952019A TW 98107332 A TW98107332 A TW 98107332A TW 98107332 A TW98107332 A TW 98107332A TW 200952019 A TW200952019 A TW 200952019A
Authority
TW
Taiwan
Prior art keywords
plasma
filament
hot electrons
ion source
pair
Prior art date
Application number
TW98107332A
Other languages
English (en)
Chinese (zh)
Inventor
Yasuyuki Tsuji
Original Assignee
Mitsui Engineering & Shipbuilding Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Engineering & Shipbuilding Co Ltd filed Critical Mitsui Engineering & Shipbuilding Co Ltd
Publication of TW200952019A publication Critical patent/TW200952019A/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0815—Methods of ionisation
    • H01J2237/082—Electron beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
TW98107332A 2008-03-07 2009-03-06 Ion source TW200952019A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008058059A JP4463310B2 (ja) 2008-03-07 2008-03-07 イオン源

Publications (1)

Publication Number Publication Date
TW200952019A true TW200952019A (en) 2009-12-16

Family

ID=41056059

Family Applications (1)

Application Number Title Priority Date Filing Date
TW98107332A TW200952019A (en) 2008-03-07 2009-03-06 Ion source

Country Status (5)

Country Link
JP (1) JP4463310B2 (ja)
KR (1) KR101120075B1 (ja)
CN (1) CN101960553B (ja)
TW (1) TW200952019A (ja)
WO (1) WO2009110506A1 (ja)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101898487B1 (ko) 2010-10-28 2018-10-04 엘지전자 주식회사 진공공간부를 구비하는 냉장고
CN102867721A (zh) * 2011-07-05 2013-01-09 北京中科信电子装备有限公司 一种带状束流离子源电源控制系统
DE102011112759A1 (de) * 2011-09-08 2013-03-14 Oerlikon Trading Ag, Trübbach Plasmaquelle
CN103094033A (zh) * 2011-11-07 2013-05-08 北京中科信电子装备有限公司 一种双灯丝离子源弧流平衡调节方法
JP2015088218A (ja) * 2011-12-28 2015-05-07 キヤノンアネルバ株式会社 イオンビーム処理装置及び中和器
CN103871809A (zh) * 2012-12-11 2014-06-18 北京中科信电子装备有限公司 一种用于离子注入机的宽束离子源装置
CN104425198B (zh) * 2013-08-20 2017-08-08 中芯国际集成电路制造(上海)有限公司 离子源以及离子注入装置
CN106498360B (zh) * 2015-09-06 2019-01-25 中芯国际集成电路制造(上海)有限公司 离子形成容器以及离子源
TWI550678B (zh) * 2016-05-11 2016-09-21 粘俊能 離子源及其熱電子產生方法
TWI592972B (zh) * 2016-07-18 2017-07-21 粘俊能 具雙熱電子源之離子源及其熱電子產生方法
CN107182165B (zh) * 2017-06-20 2024-05-14 华中科技大学 一种基于热电子发射阴极的等离子体发射装置
US11798775B2 (en) * 2021-09-30 2023-10-24 Axcelis Technologies, Inc. Extended lifetime dual indirectly-heated cathode ion source
CN114340124B (zh) * 2021-12-30 2024-02-27 中国科学院合肥物质科学研究院 一种钠离子发射体及其制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06325712A (ja) * 1993-05-18 1994-11-25 Ishikawajima Harima Heavy Ind Co Ltd イオン源
JP3254819B2 (ja) * 1993-06-10 2002-02-12 石川島播磨重工業株式会社 イオン源装置
JPH0963981A (ja) * 1995-08-29 1997-03-07 Hitachi Ltd イオン発生装置およびそれを用いたイオン注入装置
US6184532B1 (en) 1997-12-01 2001-02-06 Ebara Corporation Ion source
JP3640947B2 (ja) * 2002-10-07 2005-04-20 株式会社東芝 イオン源、イオン注入装置、半導体装置の製造方法
JP4359131B2 (ja) * 2003-12-08 2009-11-04 株式会社日立ハイテクノロジーズ 液体金属イオン銃、及びイオンビーム装置
JP2005294090A (ja) * 2004-04-01 2005-10-20 Nissin Ion Equipment Co Ltd イオン注入装置

Also Published As

Publication number Publication date
CN101960553A (zh) 2011-01-26
JP2009217985A (ja) 2009-09-24
KR20100105895A (ko) 2010-09-30
JP4463310B2 (ja) 2010-05-19
CN101960553B (zh) 2012-12-26
WO2009110506A1 (ja) 2009-09-11
KR101120075B1 (ko) 2012-03-30

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