TW200951628A - Lithography apparatus using extreme UV radiation and having a volatile organic compounds sorbing member comprising a getter material - Google Patents

Lithography apparatus using extreme UV radiation and having a volatile organic compounds sorbing member comprising a getter material

Info

Publication number
TW200951628A
TW200951628A TW098104833A TW98104833A TW200951628A TW 200951628 A TW200951628 A TW 200951628A TW 098104833 A TW098104833 A TW 098104833A TW 98104833 A TW98104833 A TW 98104833A TW 200951628 A TW200951628 A TW 200951628A
Authority
TW
Taiwan
Prior art keywords
extreme
radiation
getter material
organic compounds
lithography apparatus
Prior art date
Application number
TW098104833A
Other languages
English (en)
Chinese (zh)
Inventor
Paolo Manini
Andrea Conte
Original Assignee
Getters Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Getters Spa filed Critical Getters Spa
Publication of TW200951628A publication Critical patent/TW200951628A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Tubes For Measurement (AREA)
TW098104833A 2008-02-22 2009-02-16 Lithography apparatus using extreme UV radiation and having a volatile organic compounds sorbing member comprising a getter material TW200951628A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT000282A ITMI20080282A1 (it) 2008-02-22 2008-02-22 Apparato per litografia con radiazione nell'uv estremo con un elemento assorbitore di idrocarburi comprendente un materiale getter

Publications (1)

Publication Number Publication Date
TW200951628A true TW200951628A (en) 2009-12-16

Family

ID=40291682

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098104833A TW200951628A (en) 2008-02-22 2009-02-16 Lithography apparatus using extreme UV radiation and having a volatile organic compounds sorbing member comprising a getter material

Country Status (10)

Country Link
US (1) US8399861B2 (enExample)
EP (1) EP2255252B1 (enExample)
JP (2) JP5411167B2 (enExample)
KR (1) KR101429440B1 (enExample)
CN (2) CN101971098B (enExample)
AT (1) ATE514973T1 (enExample)
CA (1) CA2711616A1 (enExample)
IT (1) ITMI20080282A1 (enExample)
TW (1) TW200951628A (enExample)
WO (1) WO2009103631A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0696395B2 (ja) 1991-04-30 1994-11-30 工業技術院長 形状可変型多輪全方向移動ビークル
JP5315100B2 (ja) * 2009-03-18 2013-10-16 株式会社ニューフレアテクノロジー 描画装置
ITMI20121732A1 (it) 2012-10-15 2014-04-16 Getters Spa Pompa getter
TWI660125B (zh) * 2014-04-03 2019-05-21 義大利商沙斯格特斯公司 吸氣泵
DE102016213830B3 (de) * 2016-07-27 2017-12-07 Carl Zeiss Smt Gmbh Quell-Hohlkörper sowie EUV-Plasma-Lichtquelle mit einem derartigen Quell-Hohlkörper
KR20220076913A (ko) 2020-12-01 2022-06-08 포항공과대학교 산학협력단 나노 리소그래피 장치
CN113042160A (zh) * 2021-03-10 2021-06-29 南京华东电子真空材料有限公司 一种应用于极紫外设备的吸气剂及制备装置
DE102021205985A1 (de) * 2021-06-11 2022-12-15 Carl Zeiss Smt Gmbh Optische Anordnung für die EUV-Lithographie und Verfahren zum Regenerieren eines gasbindenden Bauteils
DE102022102478A1 (de) * 2022-02-02 2023-08-03 Asml Netherlands B.V. EUV-Lithographiesystem mit einem gasbindenden Bauteil
DE102023200375A1 (de) * 2023-01-18 2024-07-18 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Kontaminationsreduzierung in einem optischen System für die Mikrolithographie

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Publication number Priority date Publication date Assignee Title
US4969556A (en) * 1988-05-10 1990-11-13 Hajime Ishimaru Vacuum container
US5911560A (en) * 1994-10-31 1999-06-15 Saes Pure Gas, Inc. Getter pump module and system
US5972183A (en) * 1994-10-31 1999-10-26 Saes Getter S.P.A Getter pump module and system
IT237018Y1 (it) * 1995-07-10 2000-08-31 Getters Spa Pompa getter perfezionata in particolare per uno strumento dianalisi chimiche portatile
IT1295340B1 (it) * 1997-10-15 1999-05-12 Getters Spa Pompa getter ad elevata velocita' di assorbimento di gas
US6391090B1 (en) * 2001-04-02 2002-05-21 Aeronex, Inc. Method for purification of lens gases used in photolithography
JP2004053264A (ja) 2002-07-16 2004-02-19 Konica Minolta Holdings Inc 放射線像変換パネルおよび製造方法
JP2004214480A (ja) 2003-01-07 2004-07-29 Nikon Corp 露光装置
KR101095394B1 (ko) * 2003-05-22 2011-12-16 코닌클리즈케 필립스 일렉트로닉스 엔.브이. 하나 이상의 광학 컴포넌트를 클리닝하기 위한 방법 및장치
TWI282488B (en) * 2003-11-11 2007-06-11 Asml Netherlands Bv Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby
JP2005244016A (ja) * 2004-02-27 2005-09-08 Nikon Corp 露光装置、露光方法、及び微細パターンを有するデバイスの製造方法
ATE555422T1 (de) * 2004-07-22 2012-05-15 Koninkl Philips Electronics Nv Optisches system mit einer reinigungsanordnung
US7868304B2 (en) * 2005-02-07 2011-01-11 Asml Netherlands B.V. Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2006245254A (ja) * 2005-03-03 2006-09-14 Nikon Corp 露光装置、露光方法、および微細パターンを有するデバイスの製造方法
JP2007018931A (ja) * 2005-07-08 2007-01-25 Canon Inc 光源装置、露光装置及びデバイス製造方法
US7473908B2 (en) * 2006-07-14 2009-01-06 Asml Netherlands B.V. Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface
DE102006036488A1 (de) 2006-08-04 2008-02-07 Carl Zeiss Smt Ag Optisches System, insbesondere Projektionsobjektiv in der Mikrolithographie
US20080050680A1 (en) * 2006-08-24 2008-02-28 Stefan Brandl Lithography systems and methods
US7959310B2 (en) * 2006-09-13 2011-06-14 Carl Zeiss Smt Gmbh Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element
DE102006044591A1 (de) 2006-09-19 2008-04-03 Carl Zeiss Smt Ag Optische Anordnung, insbesondere Projektionsbelichtungsanlage für die EUV-Lithographie, sowie reflektives optisches Element mit verminderter Kontamination
US7671348B2 (en) 2007-06-26 2010-03-02 Advanced Micro Devices, Inc. Hydrocarbon getter for lithographic exposure tools

Also Published As

Publication number Publication date
EP2255252B1 (en) 2011-06-29
CN103345127B (zh) 2016-01-20
JP2013165293A (ja) 2013-08-22
WO2009103631A1 (en) 2009-08-27
JP5411167B2 (ja) 2014-02-12
US20100309446A1 (en) 2010-12-09
CN103345127A (zh) 2013-10-09
JP5357356B2 (ja) 2013-12-04
KR20100119568A (ko) 2010-11-09
JP2011512684A (ja) 2011-04-21
KR101429440B1 (ko) 2014-08-12
ATE514973T1 (de) 2011-07-15
ITMI20080282A1 (it) 2009-08-23
US8399861B2 (en) 2013-03-19
CN101971098A (zh) 2011-02-09
CN101971098B (zh) 2013-07-10
CA2711616A1 (en) 2009-08-27
EP2255252A1 (en) 2010-12-01

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