ATE555422T1 - Optisches system mit einer reinigungsanordnung - Google Patents

Optisches system mit einer reinigungsanordnung

Info

Publication number
ATE555422T1
ATE555422T1 AT05758710T AT05758710T ATE555422T1 AT E555422 T1 ATE555422 T1 AT E555422T1 AT 05758710 T AT05758710 T AT 05758710T AT 05758710 T AT05758710 T AT 05758710T AT E555422 T1 ATE555422 T1 AT E555422T1
Authority
AT
Austria
Prior art keywords
optical system
cleaning arrangement
contaminants
detached
getter
Prior art date
Application number
AT05758710T
Other languages
English (en)
Inventor
Peter Zink
G H Derra
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Application granted granted Critical
Publication of ATE555422T1 publication Critical patent/ATE555422T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning In General (AREA)
AT05758710T 2004-07-22 2005-07-18 Optisches system mit einer reinigungsanordnung ATE555422T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP04103506 2004-07-22
PCT/IB2005/052379 WO2006011105A2 (en) 2004-07-22 2005-07-18 Optical system having a cleaning arrangement

Publications (1)

Publication Number Publication Date
ATE555422T1 true ATE555422T1 (de) 2012-05-15

Family

ID=34993296

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05758710T ATE555422T1 (de) 2004-07-22 2005-07-18 Optisches system mit einer reinigungsanordnung

Country Status (7)

Country Link
US (1) US7732789B2 (de)
EP (1) EP1774406B1 (de)
JP (1) JP5122952B2 (de)
CN (1) CN100573334C (de)
AT (1) ATE555422T1 (de)
TW (1) TWI410751B (de)
WO (1) WO2006011105A2 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7355672B2 (en) * 2004-10-04 2008-04-08 Asml Netherlands B.V. Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
US7750326B2 (en) * 2005-06-13 2010-07-06 Asml Netherlands B.V. Lithographic apparatus and cleaning method therefor
US8097092B2 (en) 2005-06-21 2012-01-17 Kninklijke Philips Electronics N.V. Method of cleaning and after treatment of optical surfaces in an irradiation unit
EP1896904B1 (de) 2005-06-21 2012-09-19 Philips Intellectual Property & Standards GmbH Verfahren zur reinigung von optischen flächen einer strahlungseinheit in einem zweistufigen verfahren
US7462850B2 (en) * 2005-12-08 2008-12-09 Asml Netherlands B.V. Radical cleaning arrangement for a lithographic apparatus
US7473908B2 (en) 2006-07-14 2009-01-06 Asml Netherlands B.V. Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface
JP5178724B2 (ja) * 2006-09-04 2013-04-10 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 汚染物質又は望ましくない物質で覆われた表面領域をクリーニングする方法
US7671348B2 (en) * 2007-06-26 2010-03-02 Advanced Micro Devices, Inc. Hydrocarbon getter for lithographic exposure tools
JP4973425B2 (ja) * 2007-10-03 2012-07-11 ウシオ電機株式会社 極端紫外光光源装置における集光光学手段のクリーニング方法及び極端紫外光光源装置
ITMI20080282A1 (it) * 2008-02-22 2009-08-23 Getters Spa Apparato per litografia con radiazione nell'uv estremo con un elemento assorbitore di idrocarburi comprendente un materiale getter
NL2003152A1 (nl) 2008-08-14 2010-02-16 Asml Netherlands Bv Radiation source, lithographic apparatus and device manufacturing method.
JP5559562B2 (ja) * 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
JP5709546B2 (ja) * 2011-01-19 2015-04-30 キヤノン株式会社 エネルギービーム描画装置及びデバイス製造方法
US8790603B2 (en) 2012-06-27 2014-07-29 Kla-Tencor Corporation Apparatus for purifying a controlled-pressure environment
CN103230901B (zh) * 2013-04-28 2015-02-04 哈尔滨工业大学 一种保持激光传输光学系统中洁净度的冲扫装置和方法
CN103230900B (zh) * 2013-04-28 2015-03-04 哈尔滨工业大学 一种用于保持大口径光学元件表面洁净的冲扫装置
US8901523B1 (en) * 2013-09-04 2014-12-02 Asml Netherlands B.V. Apparatus for protecting EUV optical elements
US9560730B2 (en) * 2013-09-09 2017-01-31 Asml Netherlands B.V. Transport system for an extreme ultraviolet light source
US9776218B2 (en) 2015-08-06 2017-10-03 Asml Netherlands B.V. Controlled fluid flow for cleaning an optical element
KR102655267B1 (ko) * 2017-06-26 2024-04-08 에이에스엠엘 네델란즈 비.브이. 냉각 장치 및 냉각 장치용 플라즈마-세정 스테이션
DE102021213613A1 (de) 2021-12-01 2022-09-15 Carl Zeiss Smt Gmbh Verfahren zum Aufbringen eines Getter-Materials auf eine Oberfläche eines Bauteils für ein Lithographiesystem

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Publication number Priority date Publication date Assignee Title
US6452199B1 (en) * 1997-05-12 2002-09-17 Cymer, Inc. Plasma focus high energy photon source with blast shield
JP2000088999A (ja) * 1998-09-14 2000-03-31 Nikon Corp Ｘ線装置
EP1182510B1 (de) 2000-08-25 2006-04-12 ASML Netherlands B.V. Lithographischer Projektionsapparat
DE60118669T2 (de) * 2000-08-25 2007-01-11 Asml Netherlands B.V. Lithographischer Projektionsapparat
DE10061248B4 (de) 2000-12-09 2004-02-26 Carl Zeiss Verfahren und Vorrichtung zur In-situ-Dekontamination eines EUV-Lithographiegerätes
US6772776B2 (en) * 2001-09-18 2004-08-10 Euv Llc Apparatus for in situ cleaning of carbon contaminated surfaces
US6923625B2 (en) * 2002-01-07 2005-08-02 Integrated Sensing Systems, Inc. Method of forming a reactive material and article formed thereby
US6968850B2 (en) 2002-07-15 2005-11-29 Intel Corporation In-situ cleaning of light source collector optics
JP4105616B2 (ja) * 2002-08-15 2008-06-25 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフ投影装置およびこの装置用の反射鏡アセンブリ
SG129259A1 (en) * 2002-10-03 2007-02-26 Asml Netherlands Bv Radiation source lithographic apparatus, and device manufacturing method
EP1406124A1 (de) 2002-10-03 2004-04-07 ASML Netherlands B.V. Strahlungsquelle, lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
EP1939690A1 (de) 2002-12-13 2008-07-02 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60323927D1 (de) * 2002-12-13 2008-11-20 Asml Netherlands Bv Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
KR101095394B1 (ko) 2003-05-22 2011-12-16 코닌클리즈케 필립스 일렉트로닉스 엔.브이. 하나 이상의 광학 컴포넌트를 클리닝하기 위한 방법 및장치
EP1531365A1 (de) * 2003-11-11 2005-05-18 ASML Netherlands B.V. Lithographischer Apparat mit Unterdrückung von Kontamination
US7567379B2 (en) * 2004-04-29 2009-07-28 Intel Corporation Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system
US7355672B2 (en) 2004-10-04 2008-04-08 Asml Netherlands B.V. Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus

Also Published As

Publication number Publication date
JP5122952B2 (ja) 2013-01-16
TWI410751B (zh) 2013-10-01
WO2006011105A2 (en) 2006-02-02
EP1774406A2 (de) 2007-04-18
CN100573334C (zh) 2009-12-23
EP1774406B1 (de) 2012-04-25
US20090014666A1 (en) 2009-01-15
TW200615702A (en) 2006-05-16
CN1989458A (zh) 2007-06-27
US7732789B2 (en) 2010-06-08
WO2006011105A3 (en) 2006-10-12
JP2008507840A (ja) 2008-03-13

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