TW200946427A - Semiconductor die pickup device and pickup metho - Google Patents
Semiconductor die pickup device and pickup metho Download PDFInfo
- Publication number
- TW200946427A TW200946427A TW097136280A TW97136280A TW200946427A TW 200946427 A TW200946427 A TW 200946427A TW 097136280 A TW097136280 A TW 097136280A TW 97136280 A TW97136280 A TW 97136280A TW 200946427 A TW200946427 A TW 200946427A
- Authority
- TW
- Taiwan
- Prior art keywords
- semiconductor die
- cover
- suction opening
- picked
- semiconductor
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0442—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7402—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7412—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support the auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
- H10P72/7414—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support the auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support the auxiliary support including means facilitating the selective separation of some of a plurality of devices from the auxiliary support
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7416—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Die Bonding (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008121460A JP4198745B1 (ja) | 2008-05-07 | 2008-05-07 | 半導体ダイのピックアップ装置及びピックアップ方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200946427A true TW200946427A (en) | 2009-11-16 |
| TWI353957B TWI353957B (https=) | 2011-12-11 |
Family
ID=40239520
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW097136280A TW200946427A (en) | 2008-05-07 | 2008-09-22 | Semiconductor die pickup device and pickup metho |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4198745B1 (https=) |
| KR (1) | KR20110014569A (https=) |
| TW (1) | TW200946427A (https=) |
| WO (1) | WO2009136450A1 (https=) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI475606B (zh) * | 2011-02-28 | 2015-03-01 | 晟碟半導體(上海)有限公司 | 非均勻真空分佈晶粒附著尖端 |
| TWI485786B (zh) * | 2012-04-16 | 2015-05-21 | Gallant Micro Machining Co Ltd | Grain Stripping Method and Device |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG163493A1 (en) | 2009-01-22 | 2010-08-30 | Esec Ag | Die ejector |
| JP4397429B1 (ja) | 2009-03-05 | 2010-01-13 | 株式会社新川 | 半導体ダイのピックアップ装置及びピックアップ方法 |
| CN108962807B (zh) * | 2018-09-07 | 2024-08-30 | 先进光电器材(深圳)有限公司 | 自动抓取机构 |
| CN113109357B (zh) * | 2021-04-09 | 2021-11-23 | 徐州盛科半导体科技有限公司 | 一种可拆卸的半导体分析装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003264203A (ja) * | 2002-03-11 | 2003-09-19 | Hitachi Ltd | 半導体装置の製造方法 |
| JP4457715B2 (ja) * | 2003-04-10 | 2010-04-28 | パナソニック株式会社 | チップのピックアップ装置およびピックアップ方法 |
| JP3999744B2 (ja) * | 2004-01-05 | 2007-10-31 | 芝浦メカトロニクス株式会社 | 半導体チップのピックアップ装置 |
-
2008
- 2008-05-07 JP JP2008121460A patent/JP4198745B1/ja not_active Expired - Fee Related
- 2008-06-26 KR KR1020107023438A patent/KR20110014569A/ko not_active Withdrawn
- 2008-06-26 WO PCT/JP2008/061610 patent/WO2009136450A1/ja not_active Ceased
- 2008-09-22 TW TW097136280A patent/TW200946427A/zh not_active IP Right Cessation
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI475606B (zh) * | 2011-02-28 | 2015-03-01 | 晟碟半導體(上海)有限公司 | 非均勻真空分佈晶粒附著尖端 |
| US9038264B2 (en) | 2011-02-28 | 2015-05-26 | Sandisk Semiconductor (Shanghai) Co., Ltd. | Non-uniform vacuum profile die attach tip |
| TWI485786B (zh) * | 2012-04-16 | 2015-05-21 | Gallant Micro Machining Co Ltd | Grain Stripping Method and Device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009272430A (ja) | 2009-11-19 |
| WO2009136450A1 (ja) | 2009-11-12 |
| TWI353957B (https=) | 2011-12-11 |
| JP4198745B1 (ja) | 2008-12-17 |
| KR20110014569A (ko) | 2011-02-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |