TW200944778A - Surface inspection apparatus and surface inspection method - Google Patents

Surface inspection apparatus and surface inspection method Download PDF

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Publication number
TW200944778A
TW200944778A TW98108054A TW98108054A TW200944778A TW 200944778 A TW200944778 A TW 200944778A TW 98108054 A TW98108054 A TW 98108054A TW 98108054 A TW98108054 A TW 98108054A TW 200944778 A TW200944778 A TW 200944778A
Authority
TW
Taiwan
Prior art keywords
light
inspection
organic
residue
polarizing filter
Prior art date
Application number
TW98108054A
Other languages
English (en)
Chinese (zh)
Inventor
Yasuo Mihara
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Publication of TW200944778A publication Critical patent/TW200944778A/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8803—Visual inspection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513—Liquid crystal panels

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Electroluminescent Light Sources (AREA)
TW98108054A 2008-03-12 2009-03-12 Surface inspection apparatus and surface inspection method TW200944778A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008062770 2008-03-12

Publications (1)

Publication Number Publication Date
TW200944778A true TW200944778A (en) 2009-11-01

Family

ID=41065145

Family Applications (1)

Application Number Title Priority Date Filing Date
TW98108054A TW200944778A (en) 2008-03-12 2009-03-12 Surface inspection apparatus and surface inspection method

Country Status (2)

Country Link
TW (1) TW200944778A (ja)
WO (1) WO2009113478A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI753739B (zh) * 2021-01-08 2022-01-21 閎康科技股份有限公司 物性分析方法、物性分析試片及其製備方法
CN114878523A (zh) * 2022-07-11 2022-08-09 常州凯得新材料科技有限公司 一种透明导电膜性能测试装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5686340A (en) * 1979-12-17 1981-07-14 Hitachi Ltd Automatic detector for foreign matter
JPS61182238A (ja) * 1985-02-07 1986-08-14 Sharp Corp レジスト等有機化合物残渣検査装置
JPH0688788A (ja) * 1992-09-07 1994-03-29 Nec Corp 洗浄装置
JP2000046748A (ja) * 1998-07-27 2000-02-18 Hitachi Ltd 導体パターンの検査方法およびその装置並びに多層基板の製造方法
US6916221B2 (en) * 2002-11-18 2005-07-12 Eastman Kodak Company Determining defects in OLED devices
JP4548385B2 (ja) * 2006-05-10 2010-09-22 株式会社ニコン 表面検査装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI753739B (zh) * 2021-01-08 2022-01-21 閎康科技股份有限公司 物性分析方法、物性分析試片及其製備方法
US11955312B2 (en) 2021-01-08 2024-04-09 Materials Analysis Technology Inc. Physical analysis method, sample for physical analysis and preparing method thereof
CN114878523A (zh) * 2022-07-11 2022-08-09 常州凯得新材料科技有限公司 一种透明导电膜性能测试装置

Also Published As

Publication number Publication date
WO2009113478A1 (ja) 2009-09-17

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