TW200940949A - Light source for illumination and the pattern inspection apparatus using the same - Google Patents

Light source for illumination and the pattern inspection apparatus using the same Download PDF

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TW200940949A
TW200940949A TW98104058A TW98104058A TW200940949A TW 200940949 A TW200940949 A TW 200940949A TW 98104058 A TW98104058 A TW 98104058A TW 98104058 A TW98104058 A TW 98104058A TW 200940949 A TW200940949 A TW 200940949A
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field
illumination
light
same
light source
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TW98104058A
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Chinese (zh)
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TWI442016B (en
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Kentaro Nomoto
Ryozo Matsuda
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Ushio Electric Inc
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Abstract

The subject of the invention is to provide a means for illuminating any point within a photographing field at the same incident angle, and a pattern inspection apparatus capable of determining whether pits are good or not. To solve the problem, plural LEDs are arranged along an LED support part (3), and the illumination beams are emitted from the LEDs in parallel, thereby constituting each planar light source a-h incident at a specific angle <theta> to the photographing field (R). The field for arranging the LEDs is larger than the photographing field (R). The illumination beams are emitted from the eight planar light sources a-h in a parallel way, thereby entering the whole photographing field (R) at a specific angle <theta>. Therefore, at any point on BAC within a photographing field (R), illumination beams of the same angle are incident with the same intensity from all directions, resulting in the same condition for any point on the photographing field. Therefore, it is able to determine whether the whole field under inspection is good or not based on the brightness (luminescence) difference of the pits.

Description

200940949 六、發明說明 【發明所屬之技術領域】 本發明是關於一種爲了進行對象物的表面狀態的檢查 ,對於該表面從斜向照射照明光的照明用光源,及在形成 於基板的圖案照射照明光,取得被照明的圖案畫像而自動 ' 地進行檢查的圖案檢查裝置。 〇 【先前技術】 眾知在被形成於光透射性的基板上的圖案照射照明光 而依據所攝影的畫像來判定圖案的良否的圖案檢查裝置。 在此種圖案檢查裝置,從形成有基板的圖案的一邊藉 由反射照明手段,對於檢查領域斜向地入射方式進行照明 ,而藉由攝影手段,來攝影基板的圖案,由被攝影的畫像 的亮度分佈圖案,就可檢測出有沒有凹部或缺口。若在圖 案上有凹部,則有產生斷線的情形之故,因而必須檢測作 © 爲不良品。 如上述的照明手段,對於檢查對象作爲從全方向斜向 • 地照射照明光所用的照明手段,常使用著環形照明手段。 - 作爲使用環狀照明手段的檢查裝置,例如有專利文獻1。 依照上述公報,如第14(a)圖所示地,習知的環形照 明,在薄圓筒環狀的本體容器1 02中同心圓上地排列多數 LED103者。 又,如同圖(a)的a箭視圖的同圖(b),及b箭視圖的 同圖(c)所示地,各LED 103是以有角度地配置於圓的中心 200940949 〇方向’而對於欲進行檢查的工件,成爲從斜向可照射照 明光。 專利文獻1:日本特開2002-328094號公報 【發明內容】 ' 在上述圖案檢查裝置的的反射照明光,是在進行工件 的檢查的領域的任意點上,從全方向(3 60。方向)入射有 〇 同一入射角度的光’而從各方向所入射的光強度是必須相 同。 又’在檢查領域的任一點,其條件(從全方向入射有 同的入射角度之光’而從各方向所入射的光強度必須相同 )都必須相同。以下說明其理由。 (1)在上述的圖案檢查裝置,若在圖案上存在著凹部 ’則被攝影作爲亮(亮度高)部分。若明亮(亮度)大則凹部 的大小是大,而若明亮(亮度)小,則凹部是小。 ® 若爲小凹部,也有不作爲不良的情形,這時候,藉由 凹部的明亮(亮度)的大小來判定良否。 - (2)在檢查領域的某一點,若入射於該點的照明光的 . 強度藉由方向不相同,則即使凹部(缺口)的大小相同,利 用缺口所產生的方向,明亮(亮度)也會變更。 例如,如第1 5圖所示地,若照明光從右邊以強度強, 而從左邊以強度弱被照射。位於圖案Ρ右邊的凹部,是反 射強度強的照明光之故,因而變亮,相反地,位於圖案Ρ 左邊的凹部,反射強度弱的照明光之故,因而變暗。 -5- 200940949 亦即,缺口(凹部)的大小相同,明亮(亮度)也變不相 同,而無法實施正確的檢查(良否判定)。因此,照明光是 在檢查領域的任意點,必須從全方向(360 °方向)以相同 強度進行照明。 又,在圖案的表面有產生突起的情形。突起是產生斷 ' 線的可能性低之故,因而不必檢測出作爲不良。爲了區別 產生在圖案表面的凹部與突起而加以檢測出,照明反射照 Φ 明光,惟藉由角度,來區別凹部與突起會很難加以檢測出 。爲了將圖案表面的凹部與突起予以區別而加以檢測出, 必須以最適當的角度範圍來照射照明光,與上述同樣地, 不能有藉由產生缺口的方向而無法區別凹部與突起。因此 ’位在檢查領域的點,必須從全方向(360 °方向)入射有 同一入射度的光。 又’在檢查領域全體,若來自各方向的照明光的強度 或入射角度有參差不齊,則在相同大小的凹部也藉由部位 ® 而明亮(亮度)的大小也會變更,或無法作出與突起的區別 之故’因而無法做正確的檢查(良否判定)。因此,在檢查 ' 領域的任—部位(點),都泌須從全方向(3 6 0 °方向)入射同 • 一的入射角度的光,而從各方向所入射的光強度也都必須 相同。 在上述圖案檢查裝置,朝與線感測器延伸的方向正交 的方向掃描CCD線感測器的攝影手段,進行攝影檢查領 域全體。 第16圖是表示CCD線感測器(未圖示)同時地攝影的 200940949 細長領域的俯視圖。攝影領域的大小是例如長1 8mm,寬 度是2 μιη。 在同圖模式地表示,惟如上述所說明地,例如在攝影 領域的中心部A,又在左端部Β或右端部C,所入射的照 明光,都從全方向(3 60 °方向)以同一入射角度而從各方 ' 向所入射的光強度是必須相同。 但是,在第14圖所表示的習知的環形照明,各 ❿ LED103是具有角度配置於圓的中心〇方向。所以,如第 17圖所示地,來自各LED的光並不是平光而照明光是朝 向攝影領域的中心部A。 因此,檢查領域具有如第16圖的大小時,在中心部A ,從全方向照射均勻的強度與角度的光,惟此以外之點, 例如在兩端部B或C,所入射的光強度藉由方向不相同。 回到第1 7圖,在攝影領域的B,C,沒有例如從對於 CCD線感測器所延伸的方向正交的方向所入射的照明光 Φ (a),(b)(圖中以虛線表示)。所以,在B,C的位置,即使 有缺口朝(a)或(b)的方向的凹部,也沒有從該方向入射照 ' 明光之故,因而無法檢測出凹部。 . 亦即,在上述圖案檢查裝置中,作爲反射照明手段, 無法仍然使用習知的環形照明。 本發明是鑑於上述事情而發明者,本發明的目的是在 於提供一種在攝影的領域的任意點,從全方向(3 60 °方向 )入射有同一入射角度的光,從各方向所入射的光強度是 相同,且在攝影領域的任一點,可得其條件都相同的反射 -7- 200940949 照明手段,而且可進行使用該反射照明手段的凹部的正確 檢查(良否判定)的圖案檢查裝置。 發明人等,專心檢討的結果,發現了在攝影的領域的 任意點,從全方向(360 °方向)入射有同一入射角度的光 ' ,從各方向所入射的光強度是相同,且在檢查領域的任一 ' 點,爲了其條件(從全方向入射冋一的入射角度的光,而 從各方向所入射的光強度相同)都相同,對於所攝影的領 〇 域的縱橫大小,將與其相同或比其還要大且射出平行的光 的面光源作爲一個單位,而將被面光源複數環狀地圍繞攝 影領域的方式配置在攝影領域上部的同一平面上就可以。 使用第1圖來說明解決手段的原理。 第1(a)圖是表示從上方觀看線狀攝影領域R的俯視圖 ,準備與攝影領域R相同長度與寬度的6個線狀光源a,b ,c,d,e,f,表示配置成在攝影領域R上方的同一平面 上圍繞攝影領域R的狀態者。又,第1(b)圖是表示從側面 Φ 觀看第1(a)圖的側視圖。 如第1圖所示地,從線狀的光源a〜f以平行狀態射出 - 照明光,而以所定入射角度入射於攝影領域R的各點 . BAC。亦即,從各光源的中央部A’所射出的光是入射於 攝影領域R的中央部A。又從各光源的左端部B’所射出 的光是入射於攝影領域R的左端部B,又從各光源的右端 部C’所射出的光是入射於攝影領域R的右端部c。 如第1圖所示地,照明光的光路的A-A’及B-B’及C-C’是互相地平行’而各個長度從(光源至攝影領域爲止的 -8 - 200940949 距離)也相等之故,因而在攝影領域R的A,B,C的各點 ,從各方向(第1圖的情形爲6方向)入射有同一入射角度光 ,而從各方向所入射的光強度是相同。又,在攝影領域R 的任一點,也從全方向入射同一入射角度的光而從各方向 ' 所入射的光強度是相同。 • 在第1圖中,爲了不會把圖式成爲煩雜,將配置於攝 影領域R的周圍的光源數作成6個,惟其數量是愈多,從 〇 全方向入射有均勻的強度與角度的照明光。 第2圖是表示攝影領域爲矩形狀的情形的例子。 第2(a),(b)圖是與第1(a)圖同樣,從上方觀看長方形 狀的攝影領域R觀看的俯視圖,準備與攝影領域R相同 大小的8個長方形狀的面光源電弧,表示配置成在攝影領 域R上方的同一平面上圍繞攝影領域R的狀態者。又, 第3圖是表示從側面觀看第2(a)圖的側視圖。 由面光源a〜h的A,,B’,C’,D’,照明光以平行的 ® 狀態射出,而以所定的入射角度入射在攝影領域R的 ABCD各點。例如,如第2(a)圖所示地,在攝影領域R的 - 圖中左下D,入射有來自各面光源的左下D’的光(圖中以 . 虛線所表示)。又,如第2(b)圖所示地,在攝影領域R的 右上B,入射有來自各面光源的右上B’的光(圖中以一點 虛線所表示)。 同樣地,在攝影領域R的右下C,入射有來自面光源 的右下C’的照明光,在攝影領域R的左上A,入射有來 自面光源的左上A’的照明光。 -9- 200940949 第3圖是分別表示由面光源a與d的D’在攝影領域R 的D入射有照射光,而由C’在攝影領域R的C入射有照 明光的狀態。 照明光的光路的A-A’及B-B’及C-C’是互相地平行, 而各個長度從(光源至攝影領域爲止的距離)也相等之故, 因而在攝影領域R的A,B,C的各點,從各方向(第2圖 的情形爲8方向)入射有同一入射角度光,而從各方向所入 〇 射的光強度是相同。又,在攝影領域R的任一點,也從全 方向入射同一入射角度的光而從各方向所入射的光強度是 相同。 配置於攝影領域R的周圍的面光源數,是愈多,成爲 從全方向入射有均勻的強度與角度的照明光。但是,如下 述地,若增加面光源的數則其分量使得照明手段的直徑( 大小)變大,而裝置會大型化。 依照以上,在本發明中,如下地解決上述課題。 ® (1) 一種照明用光源,其特徵爲:照射平行於被照射 領域的光的面光源爲環狀地配置複數於同一平面上,各面 - 光源的大小,是來自被照射於被照明領域面上的各面光源 . 的光的照射領域,爲包含被照明領域全體的大小。 (2) 在上述(1)中,上述複數面光源,是將複數LED排 列複數於同一平面上者所構成。又,各面光源內的LED, 是來自各面光源的平行的光,被照明於被照明領域的方式 ,朝向各面光源所配置的環狀內側傾斜地排列。 (3) 在上述(1)中,上述複數的面光源,是將從複數 -10- 200940949 LED所射出的光射出作爲平行的光的稜鏡板環狀地配置複 數於複數LED的光射出側者所構成,構成各面光源的稜 鏡板,是來自各稜鏡板的平行光被照明在被照明領域的方 式,朝配置各面光源所的環狀內側折射從各LED所射出 的光者。 ' (4) 一種圖案檢査裝置,是具備:對於形成有圖案的 工件從斜向照射反射照明光的暗視野照明手段;及攝影藉 Φ 由上述暗視野照明手段所照明的上述圖案的攝影手段;及 保持工件的工件保持手段·,及依據藉由上述攝影手段所攝 影的圖像來判定圖案的良否的控制部,其特徵爲:作爲上 述暗視野照明手段,使用上述(1)〜(3)的照明用光源。 在本發明中,可得到以下的效果。 (1) 在攝影的領域的任意點,從全方向(360°方向)入 射有同一入射有同一入射角度的光,從各方向所入射的光 強度是相同,且在檢查領域的任一點,其條件都成爲相同 ® ’亦即,從全方向入射同一的入射角度的光,而從各方向 所入射的光強度相同的方式就可照明。 * 所以,所攝影的領域內的明亮(亮度)不會藉由部位有 . 所改變,而在檢查領域的任一點,都以同一條件可進行攝 影。 (2) 藉由將本發明的照明光源使用作爲圖案檢查裝置 的暗視野照明手段,在進行檢查的全領域,由攝影的畫像 ’來區別凹部與突起,而藉由凹部的明亮(亮度)的不相同 就可判定良否。 -11 - 200940949 【實施方式】 以下,針對於本發明的實施形態的照明手段的光源部 的具體性構成例加以說明。第4圖是表示構成本發明的第i 實施例的照明手段的面光源的構成的圖式,傾斜地排列使 ' 得複數LED的方向成爲平行,而照明光以平行狀態射出 ,表示以所定的入射角度入射於攝影領域的面光源的實施 ❹ 例。 第4(a)是從下方(攝影領域側)觀看照明用的面光源的 俯視圖,第4(b)圖是表示從A方向觀看第4(a)圖的光源的 側視圖,第4(c)圖是表示從B方向觀看第4(a)圖的光源的 前視圖。又,這些圖式,是用以容易說明的模式圖,實際 的LED是縮短間隔排列多數。 如同圖所示地,在本實施例中,來自各LED2的照明 光的主光線以平行狀態射出,而以所定的入射角度0入射 ® 於攝影領域R的方式構成面光源1。又,在LED2與攝影 領域R之間,設置擴散板4成爲表示於同圖的虛線也可以 * 〇 . 如第4(a)圖所示地,從各LED2射出多數LED2的光中 ’最強的光成分(主光線)互相地平行的方式排列於LED支 撐構件3上。又,在攝影領域R,必須有平行光從該面光 源1入射之故,因而排列LED2的領域大小,是作成比攝影 領域R的大小還要大。 將如此構成的面光源1,圍繞攝影領域的方式環狀地 -12- 200940949 配置複數於塊狀地攝影領域上的平面內。所以,支撐構件 3是形成扇形較方便。 如第4(b)圖所示地,LED2是照明光對於攝影領域R 的入射角度成爲所期望的角度0的方式,傾斜配置朝著攝 影領域R。 ' 從 LED2所射出的光是指向性高之故,因而來自各 LED2的光,是以大約平行的狀態入射於攝影領域R。 Φ 將如此所構成的面光源1,圍繞攝影領域R的方式環 狀地配狀地配置複數攝影領域R上的同一平面內。 第5圖及第6圖是模式地表示將第4圖的面光源均等地 配置8個,45°的狀態的圖式。第5(a)圖與第6圖是俯視圖 ,而第5(b)圖是側視圖。又,在LED2與攝影領域R之間 ,與第4圖同樣,如同圖的虛線所示地設置擴散板4也可以 〇 第5圖是表示對於線狀的攝影領域R,從8個各面光源 〇 Ι-a〜Ι-h照射著照射光的狀態。在第1圖〜第3圖中,將攝 影領域R與面光源1的大小說明作爲相同者,惟在本圖中 - ’面光源1的面積比攝影領域R的面積還要大。 . 實際上,很難將攝影領域R的大小與面光源1的大小 作成一致,爲了以均勻照度入射平行於攝影領域R全體, 將面光源1的面積作成比攝影領域的面積稍大較有利。 在第5圖中,從8個面光源有照明光以平行的狀態射出 ’以所定的角度Θ入射於攝影領域R的全體。因此,在攝 影領域R的BAC上的任意點中,從全方向(360°方向)有 -13- 200940949 相同角度的照明光以相同照射強度入射,而在攝影領域任 一點,其條件[從全方向(360°方向)有相同角度的照明光 以相同照射照度入射的情形]也成爲相同。 第6圖是表示對於矩形狀攝影領域R,從8個各面光源 * a〜h照射著照明光的狀態。與第5圖的情形同樣地,從8 * 個面光源,有照明光以平行狀態射出,而以所定角度0入 射於攝影領域R的全體。 φ 因此,在以攝影領域R的ABCD所圍繞的領域的任 意點中,從全方向(3 60 °方向)有相同角度的照明光以相 同照射強度入射,而在攝影領域R的任一點,其條件也成 爲相同。亦即,從全方向(3 60 °方向)有相同角度的照明 光以相同照射強度入射。 以下,針對於本發明的第2實施例的照明手段加以說 明。 在本實施例中,組合LED與稜鏡板加以使用。 與第1實施例同樣地,將多數LED環狀排列在平面的 支撐構件上,配置於攝影領域上。但是,led是未給予角 * 度,分別配置成爲朝正下方。因此,從各led所射出的 _ 光中,最強的光成分(主光線)是成爲互相地平行。 第7 (a)圖是表示從下方觀看如此地所配置的光源的俯 視圖,第7(b)圖是第7圖的A-A側斷面圖。又’同圖是表 示容易加以說明所用的模式圖’實際上’ LED是縮短間隔 排列多數。 如第7(b)圖所示地在本實施例中,LED2是對於支撐構 -14- 200940949 件3,被安裝成從LED2所射出的光的主光線,對於包含有 攝影領域的平面成爲正交。 在該光源的光射出側,將稜鏡板予以分割而被安裝。 如下述地,分割的稜鏡板是比攝影領域還要大,作成將光 射出部分割成均等角度的形狀。 ' 棱鏡板,是在透明的板的一邊,長軸方向成爲平行地 排列多數斷面呈三角形的稜鏡者,所謂山與谷直線狀地連 φ 續所形成者。稜鏡板是例如在液面顯示畫面,爲了將液晶 面板的明亮作成均勻,設於背面光與液晶面板之間。 如第8圖所示地,將此種稜鏡板切出成欲形成的面光 源的大小,並將此準備複數,如第8圖所示地,稜鏡板, 是被形成於稜鏡板5的稜鏡的長軸方向,與扇形面光源的 中心軸r-r大約正交的方向被切出。 亦即,將稜鏡板安裝於上述光源時,從稜鏡板所射出 的平行光以大約相等的入射角度入射於攝影領域R的方式 ® 被切出。 又,如第9圖所示地,安裝於表示於第7圖的光源的光 • 射出側。在第9圖中,安裝有8枚稜鏡板5,照明手段是成 . 爲與第1實施例同樣的以45°均等配置8個面光源的狀態。 第10圖是擴大表示安裝有光源的1枚稜鏡板的部分的 圖式。第10(a)圖是從下方觀看照明光源的俯視圖,第 10(b)圖是從 A方向觀看第10(a)圖的光源的側視圖,第 10(c)圖是從B方向觀看第10(a)圖的光源的前視圖。 如第l〇(b),(c)圖所示地,稜鏡板5是經由支柱6安裝 -15- 200940949 於LED支撐構件3。又,如同圖的虛線所示地在稜鏡板5 與LED2之間設置擴散板4也可以。 如第10(b)圖所示地,從各LED2所出的主光線呈平行 的照明光,是入射於稜鏡板5的稜鏡斜面而折射,被保持 ' 平行的狀態下朝2方向分岐。所分岐的一方的光成分以入 射角度0照明著攝影領域R。所分岐的另一方的光成分是 未被使用。稜鏡板5的稜鏡角度是設計成入射角度0成爲 ❹ 所期望的數値。 第11圖是表示在第10圖所使用的稜鏡板的變形例。第 10圖的情形,入射於稜鏡板5的光是被分成2方向之故,因 而從LED2所射出的光中,一半未被使用。所以光的利用 效率較差。 爲了解決此問題,將稜鏡板5的斷面形狀成爲直角三 角形。藉由此,入射於稜鏡的光是僅朝一方向折射,而可 利用從LED2所射出的所有光。 ❹ 在第12圖表示觀察使用表示於第10圖的第2實施例的 照明手段產生於圖案上的凹部的實驗結果。又,在本實驗 、 例中,如第12(c)圖所示地,使用稜鏡板5所分割的照明光 . 源的數是12個,亦即,以30°均等配置12個面光源的狀態 〇 第12(a)圖是表示將產生於某一圖案的凹部(觀察物), 攝影手段(CCD線感測器)的視野左邊(相當於攝影領域R 的B的位置),視野的中央(相當於攝影領域R的a的位 置)’視野的右邊(相當於攝影領域R的C的位置)的各個 -16- 200940949 位置旋轉360°時,攝影手段顯像的凹部的亮度變化的圖 表。在同圖中,縱軸是亮度(相對値),橫軸是凹部(觀察 物)的旋轉角度。 在攝影領域R的任意點,從全方向(360°方向)入射 有同一入射角度的光,若從各方向所入射的光強度是相同 * ,即使使之旋轉,在凹部的亮度應不會有變化。 藉由表示於第1 4圖的習知例的照明手段進行照明的情 〇 形,若在視野中央(A)旋轉凹部,亮度變化是大約±8%。 對此,在本發明中’如第1 2(a)圖所示地,即使旋轉凹部 ’在視野右邊(B),視野中央(A),視野右邊(C)的任一部 位’亮度變化也少。亮度的變化是在任一位置,都在大約 ± 3 %,而與習知例相比較可減低至一半以下。 第12(b)圖是表示將產生在某一圖案的凹部(觀察物), 變更在攝影手段的視野左邊(B),視野中央(A),視野右邊 (C)時的亮度變化的圖表。在同圖中,縱軸是表示亮度(相 Φ 對値’而橫軸是表示攝影手段的位置。從所標繪的點的左 邊爲視野左邊(B),視野中央(A),視野右邊(C)。亦即, . 在視野(B),視野中央(A),視野右邊(C)觀察相同凹部時 . 的亮度不相同。 檢查領域全體以相同條件進行照明,即使變更放置凹 部(觀察物)的位置(在檢查手段的視野的任一位置),因所 觀看者爲相同凹部,因此其亮度應不會改變。 又’问圖中以一'點鍵線所表不的「(旧)」的圖表,是 藉由表示於第14圖的習知例的照明手段進行照明的情形的 -17- 200940949 實驗結果。 如第1 2 (b)圖所示地,習知例的情形,當移動凹部的 位置,則亮度有很大變大。尤其是,在視野中央(A),亮 度會上昇,而如在視野左邊(B),視野右邊(C)地成爲視野 * (攝影領域)的端,亮度會降低。亮度的變化是大約±8%。 • 對此,在本發明中,在視野中央(A),亮度會上昇, 而在視野左邊(B),視野右邊(C)有降低的趨勢,惟其變化 φ 是大約上4.5%,則與習知例相比較,可減低至一半左右。 又,將照明光源以稜鏡板進行之際,亦即面光源的數 是愈多會對於攝影領域愈多從全方向可照射均勻的照明光 〇 但是,如上述地,必須將平行的光照射在攝影領域全 體之故,因而面光源的大小,是必須與攝影領域的大小相 同或是比其還要大。 因此,若增加面光源數,則其份量會使照明手段的直 Φ 徑(大小)變大,使得裝置變大型化。因此,欲分割照明手 段的數(面光源的數),防止裝置的大型化的觀點上有限制 * ’而以上述實驗例中所表示的12分割(12個面光源)可能適 • 當。 本發明的照明光源是可適用於用以檢查對象物的表面 狀態的檢查裝置,以下,針對於本發明的照明用光源適用 於圖案檢查裝置的情形加以說明。 第13圖是表示將本發明的照明手段適用於圖案檢查裝 置的情形的實施例的圖式,同圖是從側面觀看本實施例的 -18- 200940949 檢查裝置的圖式。 在第1 3圖中,照射反射照明光的暗視野照明手段(反 射照明手段)10’是表示於第1或第2實施例的照明光源’ 而環狀地設於攝影單元11的周圍,由攝影單元的3 60°全 * 方位來照射工件W。 . 攝影單元11是由:攝影元件的CCD線感測器1 la,及 具有將工件W的圖案予以成像在該CCD線感測器1 la上 φ 的光學元件的透鏡單元11b所構成。 在攝影單元11,安裝有攝影單元機構12,藉由掃描手 段13來驅動攝影單元驅動機構12,由此,攝影單元11是朝 同圖箭號方向被掃描。 設有檢查對象的配線等的圖案的工件W,是被載置於 工件保持手段(工件平台)1 4上,而藉由攝影單元11在工件 W上進行掃描,而形成於工件W上的配線等的圖案被攝 影。 Φ 上述掃描手段13,攝影單元11,暗視野照明手段10等 是藉由控制部1 5,被控制。 - 在第13圖中,當工件W被載置於工件保持手段(工件 . 平台)14上’則暗視野照明手段(反射照明手段)10被點燈 〇 然後’攝影單元11是藉由掃描手段13,朝工件w的 寬度方向’由一方的一邊朝另一方的一邊(同圖由右向左) 被掃描。藉由暗視野照明手段1 〇所照明的工件w上的配 線圖案像’被顯像於攝影單元11的CCD線感測器11a,而 -19- 200940949 在控制部1 5被記憶。 當完成配線圖案的攝影,則暗視野照明手段1 〇被熄燈 〇 控制部15是畫像處理藉由攝影單元11被攝影的畫像圖 ' 案,俾檢測出有無圖案上的缺陷。又,若有異常就輸出警 • 報等。 若完成該圖案的檢查,則進行下一檢查的工件W被 φ 載置於工件保持手段14上,以下’重複上述的動作。 又,在上述中,針對於基板的圖案檢查加以說明,惟 在薄膜狀工件的圖案檢查的情形’設有薄膜狀工件的移送 機構之處有所不同,惟以同樣的裝置可實現。 【圖式簡單說明】 第1(a),(b)圖是表示說明本發明的原理的圖式(攝影 領域爲線狀的情形)。 φ 第2(a),(b)圖是表示說明本發明的原理的圖式(攝影 領域爲矩狀的情形)。 • 第3(c)圖是表示第2(a)圖的側視圖。 第4(a)〜(〇圖是表示構成本發明的第1實施例的照曰月 手段的面光源的構成的圖式。 第5(a),(b)圖是均等地配置8個第4圖的面光源的情形 的圖式。 第6(a) ’(b)圖是表示說明對於矩形狀的攝影領域R, 從8個各面光源照射照明光的情形的圖式。 -20- 200940949 第7(a),(b)圖是表示說明構成本發明的第2實施例的 照明手段的光源的構成的圖式。 第8圖是表示說明的稜鏡板的切出的圖式。 第9圖是表示說明對於圖示於第7圖的光源的稜鏡板的 * 安裝的圖式。 • 第10(a)〜(c)圖是擴大表示構成第2實施例的照明手段 的面光源的圖式。 φ 第11(a)〜(c)圖是表示在第10圖所使用的稜鏡板的變 形例的圖式。 第12(a)〜(c)圖是表示使用第2實施例的照明手段來觀 察凹部的實驗結果的圖式。 第13圖是表示將本發明的照明手段適用於圖案檢查裝 置的情形的實施例的圖式。 第14(a)〜(c)圖是表示說明習知的環形照明手段的圖 式。 φ 第15圖是表示說明即使凹部(缺口)的大小相同,藉由 產生缺口的方向,明亮(亮度)也變更的情形的圖式。 . 第16圖是表示CCD線感測器同時地攝影的細長領域 的俯視圖。 第1 7圖是表示說明在習知的環形照明手段使得照明光 朝攝影領域的中心部的圖式° 【主要元件符號說明】 1 :面光源 -21 - 200940949BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an illumination light source for illuminating illumination light from an oblique direction on a surface of an object, and illumination of a pattern formed on the substrate. Light, a pattern inspection device that automatically checks for the image of the illuminated image. [Prior Art] A pattern inspection device that determines the quality of a pattern based on a photographed image is known in which a pattern formed on a light-transmissive substrate is irradiated with illumination light. In the pattern inspection apparatus, the pattern of the substrate is illuminated by oblique illumination from the side where the pattern of the substrate is formed by the reflection illumination means, and the pattern of the substrate is photographed by the photographing means. With the brightness distribution pattern, it is possible to detect the presence or absence of a recess or a notch. If there is a recess in the pattern, there is a case where a disconnection occurs, so it is necessary to detect that it is a defective product. As the illumination means described above, an annular illumination means is often used for an illumination means for illuminating illumination light obliquely from the omnidirectional direction. - As an inspection apparatus using an annular illumination means, for example, Patent Document 1 is known. According to the above publication, as shown in Fig. 14 (a), a conventional ring-shaped illumination is obtained in which a plurality of LEDs 103 are arranged concentrically in a thin cylindrical annular body container 102. Further, as shown in the same figure (b) of the arrow view of Fig. (a) and the same figure (c) of the arrow view of b, each of the LEDs 103 is disposed at an angle of the center of the circle 200940949. For the workpiece to be inspected, the illumination light can be illuminated from an oblique direction. [Patent Document 1] Japanese Laid-Open Patent Publication No. 2002-328094 [Claim of the Invention] The reflected illumination light of the above-described pattern inspection device is an omnidirectional direction (3 60 direction) at any point in the field of inspection of a workpiece. The light incident on the same incident angle is incident, and the light intensity incident from each direction must be the same. Further, at any point in the inspection field, the conditions (lights incident from the same direction at the same incident angle and the light incident from the respective directions must be the same) must be the same. The reason is explained below. (1) In the above-described pattern inspection device, if a concave portion is present on the pattern, it is photographed as a bright (high luminance) portion. If the brightness (brightness) is large, the size of the concave portion is large, and if the brightness (brightness) is small, the concave portion is small. ® If it is a small concave part, there is also a case where it is not bad. At this time, the brightness (brightness) of the concave portion is used to judge whether it is good or not. - (2) At a certain point in the inspection field, if the intensity of the illumination light incident on the point is different by the direction, even if the size of the concave portion (notch) is the same, the direction generated by the notch is bright (brightness). Will change. For example, as shown in Fig. 15, if the illumination light is strong from the right side, it is irradiated with weak intensity from the left side. The concave portion located on the right side of the pattern 是 is an illumination light having a strong reflection intensity, and thus becomes bright. Conversely, the concave portion located on the left side of the pattern , reflects the illumination light having a weak intensity, and thus becomes dark. -5- 200940949 That is, the size of the notch (concave portion) is the same, and the brightness (brightness) is also different, and the correct inspection (good or bad judgment) cannot be performed. Therefore, the illumination light is at any point in the inspection field and must be illuminated at the same intensity from the omnidirectional direction (360° direction). Further, there is a case where a protrusion is generated on the surface of the pattern. The protrusion is less likely to generate a broken line, and thus it is not necessary to detect it as a defect. In order to distinguish between the concave portions and the projections generated on the surface of the pattern, the illumination reflects the light Φ, but it is difficult to detect the concave portion and the protrusion by the angle. In order to distinguish the concave portion and the projection on the surface of the pattern, it is necessary to irradiate the illumination light at an optimum angular range. Similarly to the above, the recessed portion and the projection cannot be distinguished by the direction in which the notch is formed. Therefore, at the point of the inspection field, light of the same incident degree must be incident from the omnidirectional direction (360° direction). In addition, in the entire inspection field, if the intensity or incident angle of the illumination light from each direction is uneven, the size of the bright portion (brightness) in the concave portion of the same size is also changed or cannot be made. The difference between the protrusions' is therefore impossible to make a correct inspection (good or bad judgment). Therefore, in the inspection of the 'any part of the field (point), it is necessary to inject the same angle of incidence from the omnidirectional direction (360° direction), and the light intensity incident from all directions must also be the same. . In the above-described pattern inspection device, the photographing means of the CCD line sensor is scanned in a direction orthogonal to the direction in which the line sensor extends, and the entire photographing inspection area is performed. Figure 16 is a plan view showing the elongated field of 200940949 in which a CCD line sensor (not shown) is simultaneously photographed. The size of the field of photography is, for example, 18 mm long and 2 μιη wide. In the same figure, as described above, for example, in the center portion A of the photographing field, and at the left end portion or the right end portion C, the incident illumination light is from the omnidirectional direction (3 60 ° direction). The intensity of light incident from the parties to the same incident angle must be the same. However, in the conventional ring illumination shown in Fig. 14, each of the LEDs 103 has an angle disposed in the center 〇 direction of the circle. Therefore, as shown in Fig. 17, the light from each LED is not flat light and the illumination light is directed toward the center portion A of the field of photography. Therefore, when the inspection field has the size as shown in Fig. 16, at the center portion A, light of uniform intensity and angle is irradiated from all directions, but other points, for example, at the both ends B or C, the incident light intensity By direction is not the same. Returning to Fig. 17, in the field of photography, B, C, there is no illumination light Φ (a), (b), for example, from a direction orthogonal to the direction in which the CCD line sensor extends. Express). Therefore, at the positions of B and C, even if there is a recess in the direction of (a) or (b), the light is not incident from the direction, and the recess cannot be detected. That is, in the above-described pattern inspection device, as a reflection illumination means, conventional ring illumination cannot be used. The present invention has been made in view of the above circumstances, and an object of the present invention is to provide light incident from all directions from the same direction of incidence from the omnidirectional direction (3 60° direction) at any point in the field of photography. The intensity is the same, and at any point in the field of photography, a reflection--7-200940949 illumination means having the same conditions can be obtained, and a pattern inspection device for correct inspection (goodness determination) of the concave portion using the reflection illumination means can be performed. The inventors, etc., focused on the results of the review and found that at any point in the field of photography, light of the same incident angle is incident from the omnidirectional direction (360° direction), and the intensity of light incident from each direction is the same, and is inspected. Any point in the field is the same for its condition (the light incident from the omnidirectional direction is the same as the incident light from all directions), and the vertical and horizontal dimensions of the photographed collar are A surface light source which is the same or larger than the light and emits parallel light may be disposed as one unit, and may be disposed on the same plane on the upper portion of the photographing field in a manner that the surface light source is annularly surrounded by the photographing field. Use Figure 1 to illustrate the principle of the solution. Fig. 1(a) is a plan view showing the linear imaging field R viewed from above, and six linear light sources a, b, c, d, e, and f having the same length and width as the imaging field R are prepared, and are arranged to be arranged at The state surrounding the photographic field R on the same plane above the photographic field R. Further, Fig. 1(b) is a side view showing the first (a) view from the side surface Φ. As shown in Fig. 1, the linear light sources a to f emit the illumination light in a parallel state, and are incident on the respective points of the imaging region R at a predetermined incident angle. BAC. That is, the light emitted from the central portion A' of each light source is incident on the central portion A of the photographing field R. Further, the light emitted from the left end portion B' of each light source is incident on the left end portion B of the imaging region R, and the light emitted from the right end portion C' of each light source is incident on the right end portion c of the imaging region R. As shown in Fig. 1, the A-A' and B-B' and C-C' of the optical path of the illumination light are parallel to each other', and the lengths are from -8 - 200940949 distance from the light source to the field of photography. Since they are equal, each point of A, B, and C in the field of photography R is incident on the same incident angle light from each direction (the six directions in the first figure), and the light intensity incident from each direction is the same. . Further, at any point in the imaging field R, light of the same incident angle is incident from all directions, and the light intensity incident from each direction 'is the same. • In the first figure, in order to avoid confusing the pattern, the number of light sources arranged around the photographing field R is made six, but the number is larger, and uniform illumination of the intensity and angle is incident from the 〇 all directions. Light. Fig. 2 is a view showing an example of a case where the field of photography is rectangular. The second (a) and (b) are plan views of the rectangular image field R viewed from above in the same manner as in the first (a), and eight rectangular surface light sources having the same size as the image field R are prepared. Indicates a state that is arranged to surround the photographic field R on the same plane above the photographic field R. 3 is a side view showing the second (a) view from the side. The illumination lights are emitted in parallel ® states by A, B', C', D' of the surface light sources a to h, and are incident on the ABCD points of the photographing field R at a predetermined incident angle. For example, as shown in Fig. 2(a), light from the lower left D' of each surface light source (indicated by a broken line in the figure) is incident on the lower left side D of the image field R. Further, as shown in Fig. 2(b), light from the upper right B' of each surface light source is incident on the upper right B of the image field R (indicated by a dashed line in the figure). Similarly, in the lower right C of the photographing field R, illumination light from the lower right C' of the surface light source is incident, and illumination light from the upper left A' of the surface light source is incident on the upper left A of the photographing region R. -9- 200940949 Fig. 3 is a view showing a state in which illumination light is incident on D in the imaging region R by D' of the surface light sources a and d, and illumination light is incident on C in the imaging region R by C'. The A-A' and B-B' and C-C' of the optical path of the illumination light are parallel to each other, and the respective lengths are equal from the distance from the light source to the field of photography. Therefore, in the field of photography R, At each point of B and C, light of the same incident angle is incident from each direction (eight directions in the second drawing), and the intensity of light emitted from each direction is the same. Further, at any point in the imaging field R, light of the same incident angle is incident from the entire direction, and the light intensity incident from each direction is the same. The more the number of surface light sources arranged around the photographing field R, the more the illumination light is incident from the omnidirectional direction with uniform intensity and angle. However, as will be described below, if the number of surface light sources is increased, the component of the illumination means increases the diameter (size) of the illumination means, and the apparatus is enlarged. According to the above, in the present invention, the above problems are solved as follows. (1) A light source for illumination, characterized in that a surface light source that illuminates light parallel to an area to be illuminated is arranged in a ring shape on a same plane, and the size of each surface-light source is from being irradiated to the illuminated area. The surface of the light source on the surface is the size of the entire area to be illuminated. (2) In the above (1), the plurality of surface light sources are configured by arranging a plurality of LEDs on the same plane. Further, the LEDs in the respective surface light sources are parallel light from the respective surface light sources, and are illuminating in the illuminated region, and are arranged obliquely toward the inner side of the annular surface on which the respective surface light sources are arranged. (3) In the above (1), the plurality of surface light sources are configured such that the light emitted from the plurality of-10-200940949 LEDs is emitted as a parallel plate, and the light emitting side of the plurality of LEDs is arranged in a ring shape. In the configuration, the slabs constituting the respective surface light sources are such that the parallel light from each of the slabs is illuminated in the illuminated area, and the light emitted from each of the LEDs is refracted toward the annular inner side of each of the surface light sources. (4) A pattern inspection device comprising: a dark-field illumination means for illuminating the illumination light obliquely from the workpiece on which the pattern is formed; and a photographing means for photographing the pattern illuminated by the dark-field illumination means; And a control unit for holding the workpiece holding means and determining whether the pattern is good or not based on the image captured by the photographing means, wherein the (1) to (3) are used as the dark-field illumination means. Light source for lighting. In the present invention, the following effects can be obtained. (1) At any point in the field of photography, light incident on the same incident angle is incident from the omnidirectional direction (360° direction), and the intensity of light incident from each direction is the same, and at any point in the inspection field, The conditions are the same ® 'that is, the light of the same incident angle is incident from all directions, and the light intensity incident from each direction is the same. * Therefore, the brightness (brightness) in the field of photography is not changed by the location, and at any point in the inspection field, the same condition can be taken. (2) By using the illumination source of the present invention as a dark-field illumination means as a pattern inspection device, the concave portion and the projection are distinguished from the photographed image in the entire field of inspection, and the brightness (brightness) of the concave portion is utilized. It is not the same as to judge whether it is good or not. -11 - 200940949 [Embodiment] Hereinafter, a specific configuration example of a light source unit of an illumination device according to an embodiment of the present invention will be described. Fig. 4 is a view showing a configuration of a surface light source constituting the illumination means of the i-th embodiment of the present invention, obliquely arranged such that the directions of the plurality of LEDs are parallel, and the illumination light is emitted in a parallel state, indicating a predetermined incident. An example of the implementation of a surface light source whose angle is incident on the field of photography. The fourth (a) is a plan view of the surface light source for illumination from the lower side (the field of imaging), and the fourth (b) is a side view of the light source of the fourth (a) view viewed from the A direction, and the fourth (c) The figure is a front view showing the light source of Fig. 4(a) viewed from the B direction. Moreover, these drawings are schematic diagrams for easy explanation, and the actual LEDs are arranged in a large number of shortened intervals. As shown in the figure, in the present embodiment, the chief ray of the illumination light from each of the LEDs 2 is emitted in a parallel state, and the surface light source 1 is configured so that the incident angle 0 is incident on the photographic field R. Further, between the LED 2 and the imaging region R, the diffusion plate 4 is provided as a broken line shown in the same figure. * As shown in Fig. 4(a), among the lights of the plurality of LEDs 2 emitted from the respective LEDs 2, the strongest The light components (principal rays) are arranged on the LED supporting member 3 in parallel with each other. Further, in the field of photography R, parallel light must be incident from the surface light source 1, and thus the size of the area in which the LEDs 2 are arranged is made larger than the size of the photographing field R. The surface light source 1 thus constructed is arranged in a plane in the form of a block on the photographic field in the form of a ring-shaped -12-200940949 around the field of photography. Therefore, it is convenient for the support member 3 to form a fan shape. As shown in Fig. 4(b), the LED 2 is a mode in which the incident angle of the illumination light to the imaging region R becomes a desired angle 0, and the oblique arrangement is directed to the imaging region R. Since the light emitted from the LED 2 has high directivity, the light from each of the LEDs 2 is incident on the imaging region R in a state of approximately parallel. Φ The surface light source 1 thus constructed is arranged in a ring shape around the imaging region R so as to be arranged in the same plane on the plurality of imaging regions R. Fig. 5 and Fig. 6 are diagrams schematically showing the state in which the surface light sources of Fig. 4 are equally arranged in eight, 45° state. 5(a) and 6 are top views, and Fig. 5(b) is a side view. Further, between the LED 2 and the imaging region R, as in the fourth embodiment, the diffusion plate 4 may be provided as indicated by a broken line in the figure. FIG. 5 is a view showing the linear imaging region R from eight light sources. 〇Ι-a~Ι-h illuminates the state of the illuminating light. In the first to third figures, the description of the size of the image field R and the surface light source 1 is the same, but in the figure, the area of the surface light source 1 is larger than the area of the image field R. Actually, it is difficult to match the size of the photographing field R with the size of the surface light source 1, and it is advantageous to make the area of the surface light source 1 slightly larger than the area of the photographing field in order to be incident parallel to the entire photographing area R with uniform illumination. In Fig. 5, illumination light is emitted from eight surface light sources in a parallel state, and is incident on the entire image field R at a predetermined angle. Therefore, in any point on the BAC of the field of photography R, illumination light of the same angle from -13 to 200940949 from the omnidirectional direction (360° direction) is incident at the same illumination intensity, and at any point in the field of photography, the condition [from the whole The case where the illumination light having the same angle in the direction (360° direction) is incident at the same illumination illuminance] is also the same. Fig. 6 is a view showing a state in which illumination light is irradiated from eight surface light sources * a to h in the rectangular image field R. Similarly to the case of Fig. 5, illumination light is emitted in parallel from 8* surface light sources, and is incident on the entire image field R at a predetermined angle 0. φ Therefore, in any point in the field surrounded by ABCD in the field of photography R, illumination light having the same angle from the omnidirectional direction (3 60° direction) is incident at the same illumination intensity, and at any point in the field of photography R, The conditions are also the same. That is, illumination light having the same angle from the omnidirectional direction (3 60 ° direction) is incident at the same irradiation intensity. Hereinafter, the illumination means of the second embodiment of the present invention will be described. In this embodiment, the LED and the fascia are combined for use. In the same manner as in the first embodiment, a plurality of LEDs are arranged in a ring shape on a flat support member, and are placed in the field of photography. However, the LED is not given an angle of * degrees, and is arranged to be directly below. Therefore, among the _ light emitted from each led, the strongest light components (principal rays) are parallel to each other. Fig. 7(a) is a plan view showing the light source arranged as viewed from below, and Fig. 7(b) is a cross-sectional view taken along line A-A of Fig. 7. Further, the same figure shows a pattern diagram which is easy to explain. In fact, the LEDs are arranged in a shortened interval. As shown in Fig. 7(b), in the present embodiment, the LED 2 is a chief ray that is mounted to the light emitted from the LED 2 for the support structure -14, 2009,949, 3, and becomes positive for the plane containing the photographic field. cross. The raft is divided and mounted on the light exit side of the light source. As described below, the divided fascia is larger than the photographic field, and is formed into a shape in which the light emitting portion is divided into equal angles. The prism plate is formed on one side of the transparent plate, and the long axis direction is arranged in parallel with a plurality of triangular cross-sections. The so-called mountain and valley are connected in a straight line. The seesaw is, for example, a liquid level display screen, and is provided between the back light and the liquid crystal panel in order to make the brightness of the liquid crystal panel uniform. As shown in Fig. 8, such a seesaw is cut out into the size of the surface light source to be formed, and this is prepared in plural. As shown in Fig. 8, the seesaw is formed on the edge of the seesaw 5. The long axis direction of the mirror is cut out in a direction approximately orthogonal to the central axis rr of the sector light source. That is, when the seesaw is attached to the light source, the parallel light emitted from the seesaw is cut out by being incident on the photographing field R at an approximately equal incident angle. Further, as shown in Fig. 9, it is attached to the light emitting side of the light source shown in Fig. 7. In Fig. 9, eight fascias 5 are attached, and the illumination means is a state in which eight surface light sources are equally arranged at 45 degrees in the same manner as in the first embodiment. Fig. 10 is a view showing an enlarged view of a portion of a fascia in which a light source is mounted. Fig. 10(a) is a plan view of the illumination source viewed from below, and Fig. 10(b) is a side view of the light source of Fig. 10(a) viewed from the direction A, and Fig. 10(c) is a view from the B direction. A front view of the light source of Figure 10(a). As shown in the figure (b) and (c), the seesaw 5 is mounted on the LED support member 3 via the struts 6 -15-200940949. Further, a diffusion plate 4 may be provided between the seesaw 5 and the LED 2 as indicated by a broken line in the figure. As shown in Fig. 10(b), the chief ray emitted from each of the LEDs 2 is parallel illumination light, which is incident on the slanted surface of the sill 5 and refracted, and is branched in two directions while being held in parallel. The light component of the divided one illuminates the photographing field R at the incident angle 0. The light component of the other side of the branch is unused. The 稜鏡 angle of the rafter 5 is designed to have an incident angle of 0 which is the desired number of ❹. Fig. 11 is a view showing a modification of the seesaw used in Fig. 10. In the case of Fig. 10, the light incident on the seesaw 5 is divided into two directions, so that half of the light emitted from the LED 2 is not used. Therefore, the utilization of light is inefficient. In order to solve this problem, the cross-sectional shape of the seesaw 5 is a right-angled triangle. Thereby, the light incident on the crucible is refracted only in one direction, and all the light emitted from the LED 2 can be utilized. ❹ In Fig. 12, an experimental result of observing the concave portion generated on the pattern by the illumination means of the second embodiment shown in Fig. 10 is observed. Further, in the present experiment and example, as shown in Fig. 12(c), the illumination light divided by the seesaw 5 is used. The number of sources is 12, that is, 12 surface light sources are equally arranged at 30°. State 〇12(a) is a concave portion (observation) which is generated in a certain pattern, and the left side of the field of view of the photographing means (CCD line sensor) (corresponding to the position of B in the photographing field R), the center of the field of view (corresponding to the position of a in the field of photography R) A graph showing the change in the brightness of the concave portion of the image capturing means when the position of the right side of the field of view (corresponding to the position of C in the field of photography R) is rotated by 360°. In the same figure, the vertical axis is the brightness (relative to 値), and the horizontal axis is the rotation angle of the concave portion (observation). At any point in the field of photography R, light of the same incident angle is incident from the omnidirectional direction (360° direction). If the light intensity incident from each direction is the same*, even if it is rotated, the brightness in the concave portion should not be Variety. The illumination is changed by the illumination means of the conventional example shown in Fig. 4, and when the concave portion is rotated in the center of the field of view (A), the luminance change is about ± 8%. On the other hand, in the present invention, as shown in Fig. 12(a), even if the rotating concave portion 'is on the right side of the visual field (B), the center of the visual field (A) and the right side of the visual field (C) change in brightness. less. The change in brightness is at about ± 3 % at any position, and can be reduced to less than half as compared with the conventional example. Fig. 12(b) is a graph showing changes in luminance when a concave portion (observation) of a certain pattern is changed to the left side (B) of the field of view of the photographing means, the center of the field of view (A), and the right side of the field of view (C). In the same figure, the vertical axis indicates the brightness (phase Φ vs. ' and the horizontal axis indicates the position of the photographing means. From the left side of the plotted point to the left side of the field of view (B), the center of the field of view (A), and the right side of the field of view ( C). That is, in the field of view (B), the center of the field of view (A), and the right side of the field of view (C), when the same concave portion is observed, the brightness is different. The entire inspection area is illuminated under the same conditions, even if the concave portion is changed (observation) The position (any position in the field of view of the inspection means), since the viewer is the same recess, the brightness should not change. Also, 'I ask the picture to indicate "(old) with a 'point line' The graph is an experiment result of -17-200940949 which is illuminated by the illumination means of the conventional example shown in Fig. 14. As shown in Fig. 1 2 (b), the case of the conventional example, when When the position of the concave portion is moved, the brightness is greatly increased. In particular, in the center of the field of view (A), the brightness rises, and as in the left side of the field of view (B), the right side of the field of view (C) becomes the field of view* (the field of photography). At the end, the brightness will decrease. The change in brightness is about ±8%. In the present invention, in the center of the field of view (A), the brightness rises, and on the left side of the field of view (B), the right side of the field of view (C) has a tendency to decrease, but the change φ is about 4.5%, which is compared with the conventional example. The comparison can be reduced to about half. Moreover, the more the number of surface light sources is when the illumination source is carried out as a seesaw, the more the illumination field can be illuminated from all directions in the field of photography, but as described above. The parallel light must be irradiated in the whole field of photography, so the size of the surface light source must be the same as or larger than the size of the photography field. Therefore, if the number of surface light sources is increased, the weight will make the illumination The straight Φ diameter (size) of the means is increased, and the size of the apparatus is increased. Therefore, there is a limitation in the viewpoint of dividing the number of illumination means (the number of surface light sources) to prevent an increase in size of the apparatus. The 12 divisions (12 surface light sources) indicated may be suitable. The illumination source of the present invention is an inspection apparatus applicable to the surface state of an object to be inspected, and hereinafter, the illumination light for the present invention is used. Fig. 13 is a view showing an embodiment of a case where the illumination means of the present invention is applied to a pattern inspection apparatus, and the same figure is a view of the -18-200940949 inspection of the present embodiment viewed from the side. In the third embodiment, the dark-field illumination means (reflective illumination means) 10' for reflecting the reflected illumination light is shown in the first embodiment or the second embodiment as the illumination source" and is annularly disposed in the imaging unit. Around the 11th, the workpiece W is irradiated by the 3 60° full* orientation of the photographing unit. The photographing unit 11 is composed of: a CCD line sensor 1 la of the photographing element, and having a pattern of the workpiece W imaged on the CCD line The lens unit 11b of the optical element of φ on the sensor 1 la is constituted. In the photographing unit 11, a photographing unit mechanism 12 is attached, and the photographing unit drive mechanism 12 is driven by the scanning means 13, whereby the photographing unit 11 is scanned in the direction of the arrow in the same figure. The workpiece W having a pattern of wiring or the like to be inspected is placed on the workpiece holding means (workpiece stage) 14 and is formed on the workpiece W by scanning the workpiece W by the photographing unit 11. The pattern of the image is photographed. Φ The scanning means 13, the photographing unit 11, the dark-field illumination means 10, and the like are controlled by the control unit 15. - In Fig. 13, when the workpiece W is placed on the workpiece holding means (workpiece. platform) 14, the dark field illumination means (reflective illumination means) 10 is turned on and then the 'photographing unit 11 is by means of scanning 13, in the width direction of the workpiece w' is scanned from one side to the other side (the right side is right to the left). The line pattern image ' on the workpiece w illuminated by the dark field illumination means 1 is imaged on the CCD line sensor 11a of the photographing unit 11, and -19-200940949 is memorized in the control unit 15. When the photographing of the wiring pattern is completed, the dark-field illumination means 1 is turned off. The control unit 15 detects the presence or absence of a defect in the pattern by the image processing of the image processing by the photographing unit 11. Also, if there is an abnormality, the alarm will be output. When the inspection of the pattern is completed, the workpiece W subjected to the next inspection is placed on the workpiece holding means 14 by φ, and the above operation is repeated hereinafter. Further, in the above description, the pattern inspection of the substrate is described. However, in the case of the pattern inspection of the film-like workpiece, the transfer mechanism of the film-like workpiece is different, but the same apparatus can be realized. BRIEF DESCRIPTION OF THE DRAWINGS First (a) and (b) are diagrams showing the principle of the present invention (in the case where the photographing field is linear). φ 2(a) and (b) are diagrams showing the principle of the present invention (the case where the photographing field is a rectangular shape). • Figure 3(c) is a side view showing the second (a) figure. 4(a) to (b) are diagrams showing the configuration of the surface light source constituting the illuminating means according to the first embodiment of the present invention. The fifth (a) and (b) are arranged in an equal manner. Fig. 6(a)'(b) is a view showing a state in which illumination light is irradiated from eight surface light sources for a rectangular image field R. -20- 200940949 Fig. 7(a) and Fig. 7(b) are views showing the configuration of a light source constituting the illumination means according to the second embodiment of the present invention. Fig. 8 is a view showing the cut-out of the illustrated seesaw. Fig. 9 is a view showing the mounting of the slab of the light source shown in Fig. 7. Fig. 10(a) to (c) are enlarged views showing the surface light source constituting the illumination means of the second embodiment. Fig. 11(a) to (c) are diagrams showing a modification of the seesaw used in Fig. 10. Figs. 12(a) to (c) are diagrams showing the use of the second embodiment. Fig. 13 is a view showing an embodiment of a case where the illumination means of the present invention is applied to a pattern inspection device. Fig. 14(a)~ c) Fig. 15 is a view showing a conventional ring illumination means. Fig. 15 is a view showing a state in which the brightness (brightness) is changed by the direction in which the notch is generated even if the size of the concave portion (notch) is the same. Fig. 16 is a plan view showing a slender field in which a CCD line sensor is simultaneously photographed. Fig. 17 is a view showing a pattern in which a conventional ring illumination means makes illumination light toward a central portion of a photographing field. Description of component symbols] 1 : Surface light source - 21 - 200940949

2 : LED 3 :支撐構件 4 :擴散板 5 :稜鏡板 ' 6 :支撐構件 1 〇 :暗視野照明手段(反射照明手段) 1 1 :攝影單元 0 1 la : CCD線感測器 1 lb :透鏡單元 1 2 :攝影單元驅動機構 1 3 :掃描手段 14 :工件保持手段(工件平台) 1 5 :控制部 R :攝影領域 W :工件 〇 a〜h :面光源 -22-2 : LED 3 : support member 4 : diffuser plate 5 : seesaw ' 6 : support member 1 〇 : dark field illumination means (reflective illumination means) 1 1 : photographing unit 0 1 la : CCD line sensor 1 lb : lens Unit 1 2 : Photographic unit drive mechanism 1 3 : Scanning means 14 : Workpiece holding means (workpiece platform) 1 5 : Control part R : Photographic field W : Work piece 〇 a ~ h : Surface light source -22 -

Claims (1)

200940949 七、申請專利範圍: 1 · 一種照明用光源,其特徵爲: 照射平行於被照射領域的光的面光源爲環狀地配置複 數於同一平面上, 各面光源的大小,是來自被照射於被照明領域面上的 各面光源的光的照射領域,爲包含被照明領域全體的大小 0 φ 2.如申請專利範圍第1項所述的照明用光源,其中, 上述複數面光源,是將複數LED排列複數於同一平 面上者所構成, 各面光源內的LED,是來自各面光源的平行的光,被 照明於被照明領域的方式,朝向各面光源所配置的環狀內 側傾斜地排列。 3 ·如申請專利範圍第1項所述的照明用光源,其中, 上述複數的面光源,是將從上述複數LED所射出的 Ο 光射出作爲平行的光的稜鏡板環狀地配置複數於複數LED 的光射出側者所構成, * 構成各面光源的稜鏡板,是來自各稜鏡板的平行光被 . 照明在被照明領域的方式,朝配置各面光源的環狀內側折 射從各LED所射出的光者。 4. 一種圖案檢查裝置,是具備: 對於形成有圖案的工件從斜向照射反射照明光的暗視 野照明手段;及 攝影藉由上述暗視野照明手段所照明的上述圖案的攝 -23- 200940949 影手段;及 保持工件的工件保持手段;及 依據藉由上述攝影手段所攝影的圖像來判定圖案的良 否的控制部,其特徵爲: 暗視野照明手段是記載於如申請專利範圍第1項,第 2圖或第3項的照明用光源。200940949 VII. Patent application scope: 1 · A light source for illumination, characterized in that: a surface light source that illuminates light parallel to the field to be illuminated is arranged in a ring shape on the same plane, and the size of each surface light source is from the illuminated The illumination light source of each of the surface light sources on the surface of the illumination area is a light source for illumination according to the size of the entire illumination field. The illumination source according to claim 1, wherein the plurality of surface light sources are The plurality of LEDs are arranged in a plurality of planes on the same plane, and the LEDs in the surface light sources are parallel light from the surface light sources, and are illuminated in the illumination area, and are inclined toward the inner side of the annular surface in which the surface light sources are arranged. arrangement. The light source for illumination according to the first aspect of the invention, wherein the plurality of surface light sources are arranged in a plurality of turns in a circular shape in which the pupil light emitted from the plurality of LEDs is emitted as parallel light. The light is emitted from the side of the LED. * The fascia that forms the light source of each surface is the illuminating field in which the parallel light from each slab is illuminated. The light that is emitted. 4. A pattern inspection device comprising: a dark-field illumination means for illuminating an illumination light obliquely from a workpiece on which a pattern is formed; and photographing a pattern of the pattern illuminated by the dark-field illumination means And a control unit for determining the quality of the pattern based on the image captured by the photographing means, wherein the dark field illumination means is described in item 1 of the patent application scope. Light source for illumination according to Fig. 2 or 3. -24--twenty four-
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Cited By (1)

* Cited by examiner, † Cited by third party
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TWI622765B (en) * 2016-02-29 2018-05-01 斯庫林集團股份有限公司 Lighting apparatus and inspection apparatus

Families Citing this family (11)

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JP5560171B2 (en) * 2010-11-25 2014-07-23 麒麟麦酒株式会社 Glass bottle inspection equipment
CN102121602B (en) * 2011-01-06 2012-07-04 天津必利优科技发展有限公司 Reflection-free light source device
JP5770495B2 (en) * 2011-03-11 2015-08-26 一般社団法人モアレ研究所 Shape measuring device and lattice projection device
CN102829447B (en) * 2012-08-10 2014-04-02 昆山市和博电子科技有限公司 Three-point and one-line type light source mounting mechanism
CN103743751A (en) * 2014-01-15 2014-04-23 唐山英莱科技有限公司 Unbeveledend butt weld detection system based on reflecting two-way converging adjustable light path
CN104154466B (en) * 2014-05-20 2016-04-27 大连日佳电子有限公司 For the Optical devices of 3D tin cream thickness inspection machine illumination
CN105372266A (en) * 2015-12-01 2016-03-02 中国科学院上海技术物理研究所 Apparatus and method for fast imaging of cadmium zinc telluride wafer corrosion morphology
CN107228864A (en) * 2016-03-24 2017-10-03 苍南县三维电子塑胶有限公司 The detecting system of panel surface defect
CN108107050A (en) * 2016-11-25 2018-06-01 上海微电子装备(集团)股份有限公司 Adjust the method for beam tilts and the lighting device of adjustment beam tilts
JP6926822B2 (en) * 2017-08-25 2021-08-25 Jfeスチール株式会社 Metal strip surface inspection method and inspection equipment
JP6488056B1 (en) * 2018-07-31 2019-03-20 メトラス株式会社 Light irradiation device and method of manufacturing light irradiation device

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3570815B2 (en) * 1996-04-26 2004-09-29 松下電器産業株式会社 Image pickup device for component mounting machine
US5690417A (en) * 1996-05-13 1997-11-25 Optical Gaging Products, Inc. Surface illuminator with means for adjusting orientation and inclination of incident illumination
JP3726150B2 (en) * 1997-06-12 2005-12-14 株式会社ダイレクトコミュニケーションズ Micro-area illumination device
JP2002328094A (en) * 2001-05-02 2002-11-15 Nidec Tosok Corp Led ring lighting and image inspecting device with it
AU2003251878A1 (en) * 2002-07-12 2004-02-02 Electro Scientific Industries, Inc. Method and apparatus for uniform lighting source
JP2005337957A (en) * 2004-05-28 2005-12-08 Dainippon Screen Mfg Co Ltd Substrate inspection device
KR100737758B1 (en) * 2004-06-30 2007-07-10 아주하이텍(주) Automated optical inspection system including lighting device and method for inspecting of the same
JP4670375B2 (en) * 2005-02-03 2011-04-13 パナソニック株式会社 Imaging device
JP4953086B2 (en) * 2007-10-25 2012-06-13 キリンテクノシステム株式会社 PTP sheet inspection equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI622765B (en) * 2016-02-29 2018-05-01 斯庫林集團股份有限公司 Lighting apparatus and inspection apparatus

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CN101551078B (en) 2013-05-08

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