TW200934821A - Monomer composition for preparing brightness enhancement film and application thereof - Google Patents

Monomer composition for preparing brightness enhancement film and application thereof

Info

Publication number
TW200934821A
TW200934821A TW097104210A TW97104210A TW200934821A TW 200934821 A TW200934821 A TW 200934821A TW 097104210 A TW097104210 A TW 097104210A TW 97104210 A TW97104210 A TW 97104210A TW 200934821 A TW200934821 A TW 200934821A
Authority
TW
Taiwan
Prior art keywords
monomer
monomer composition
acrylate
composition according
methacrylate
Prior art date
Application number
TW097104210A
Other languages
English (en)
Chinese (zh)
Other versions
TWI372162B (https=
Inventor
guang-rong Li
Wen-Wei Hu
ming-hui Zeng
Original Assignee
Efun Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Efun Technology Co Ltd filed Critical Efun Technology Co Ltd
Priority to TW097104210A priority Critical patent/TW200934821A/zh
Priority to JP2008176535A priority patent/JP5205148B2/ja
Priority to US12/218,168 priority patent/US20090197986A1/en
Priority to KR1020080072027A priority patent/KR101002140B1/ko
Publication of TW200934821A publication Critical patent/TW200934821A/zh
Application granted granted Critical
Publication of TWI372162B publication Critical patent/TWI372162B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04Acids; Metal salts or ammonium salts thereof
    • C08F220/06Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/20Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/0008Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025Crosslinking or vulcanising agents; including accelerators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
TW097104210A 2008-02-04 2008-02-04 Monomer composition for preparing brightness enhancement film and application thereof TW200934821A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
TW097104210A TW200934821A (en) 2008-02-04 2008-02-04 Monomer composition for preparing brightness enhancement film and application thereof
JP2008176535A JP5205148B2 (ja) 2008-02-04 2008-07-07 光学組成物、該組成物を用いて製造された集光シート及び集光シートの製造方法
US12/218,168 US20090197986A1 (en) 2008-02-04 2008-07-11 Polymerizable optical composition, optical sheet and method for making the optical sheet
KR1020080072027A KR101002140B1 (ko) 2008-02-04 2008-07-24 중합반응형 광조성물, 광시트 및 광시트의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW097104210A TW200934821A (en) 2008-02-04 2008-02-04 Monomer composition for preparing brightness enhancement film and application thereof

Publications (2)

Publication Number Publication Date
TW200934821A true TW200934821A (en) 2009-08-16
TWI372162B TWI372162B (https=) 2012-09-11

Family

ID=40932333

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097104210A TW200934821A (en) 2008-02-04 2008-02-04 Monomer composition for preparing brightness enhancement film and application thereof

Country Status (4)

Country Link
US (1) US20090197986A1 (https=)
JP (1) JP5205148B2 (https=)
KR (1) KR101002140B1 (https=)
TW (1) TW200934821A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI422600B (zh) * 2010-05-05 2014-01-11 Benq Materials Corp 高折射率組成物及應用其之光學膜
CN105319852A (zh) * 2014-06-27 2016-02-10 奇美实业股份有限公司 感光性树脂组合物、保护膜及具有保护膜的元件

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8530595B2 (en) * 2008-12-22 2013-09-10 3M Innovative Properties Company Microstructured optical films comprising polymerizable ultraviolet absorber
TWI490194B (zh) * 2009-09-18 2015-07-01 Eternal Chemical Co Ltd 可聚合組合物及其用途
KR101246684B1 (ko) * 2009-12-23 2013-03-21 제일모직주식회사 광학필름용 수지 조성물, 이를 이용한 광학필름 및 그 제조 방법
CN103097456A (zh) * 2010-08-09 2013-05-08 株式会社大赛璐 固化性组合物及其固化物
US8809413B2 (en) * 2011-06-29 2014-08-19 Chau Ha Ultraviolet radiation-curable high refractive index optically clear resins
TWI443465B (zh) 2012-04-23 2014-07-01 Chi Mei Corp 感光性聚矽氧烷組成物、保護膜及具有保護膜的元件
TWI474118B (zh) * 2012-05-15 2015-02-21 奇美實業股份有限公司 感光性聚矽氧烷組成物、保護膜及具有保護膜的元件
KR102080721B1 (ko) * 2017-11-17 2020-04-28 원광대학교산학협력단 3d 프린팅용 의치상 레진
EP4160312A1 (en) * 2021-10-04 2023-04-05 Joanneum Research Forschungsgesellschaft mbH Elastic embossing lacquer having high optical dispersion
CN113999565B (zh) * 2021-12-10 2023-10-20 西安思摩威新材料有限公司 一种紫外光可固化的高折射率油墨及材料层

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07196751A (ja) * 1993-12-28 1995-08-01 Mitsubishi Rayon Co Ltd プラスチックレンズ成形用組成物及びそれを用いたプラスチックレンズ
CA2170918C (en) * 1996-03-04 2000-01-11 James Stanley Podger Double-delta turnstile antenna
JP2000007741A (ja) * 1998-06-25 2000-01-11 Kyoeisha Chem Co Ltd 耐擦傷性に優れた高屈折率樹脂組成物
US6777070B1 (en) * 1998-10-14 2004-08-17 Tomoegawa Paper Co., Ltd. Antireflection material and polarizing film using the same
JP4535307B2 (ja) * 2000-12-20 2010-09-01 日本化薬株式会社 樹脂組成物、レンズ用樹脂組成物及びその硬化物
US6833391B1 (en) * 2003-05-27 2004-12-21 General Electric Company Curable (meth)acrylate compositions
JP2005272773A (ja) * 2004-03-26 2005-10-06 Toagosei Co Ltd 活性エネルギー線硬化型光学材料用組成物
US7312290B2 (en) * 2004-09-24 2007-12-25 General Electric Company Curable formulations, cured compositions, and articles derived thereform
US7294657B2 (en) * 2005-03-07 2007-11-13 General Electric Company Curable acrylate compositions, methods of making the compositions and articles made therefrom
US20060293463A1 (en) * 2005-06-28 2006-12-28 General Electric Company Compositions for brightness enhancing films
JP4831464B2 (ja) * 2005-08-26 2011-12-07 大日本印刷株式会社 高屈折率ハードコート層

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI422600B (zh) * 2010-05-05 2014-01-11 Benq Materials Corp 高折射率組成物及應用其之光學膜
CN105319852A (zh) * 2014-06-27 2016-02-10 奇美实业股份有限公司 感光性树脂组合物、保护膜及具有保护膜的元件

Also Published As

Publication number Publication date
JP2009185272A (ja) 2009-08-20
US20090197986A1 (en) 2009-08-06
KR20090085501A (ko) 2009-08-07
JP5205148B2 (ja) 2013-06-05
KR101002140B1 (ko) 2010-12-17
TWI372162B (https=) 2012-09-11

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees