TW200919122A - Direct image exposure device - Google Patents

Direct image exposure device Download PDF

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Publication number
TW200919122A
TW200919122A TW97132899A TW97132899A TW200919122A TW 200919122 A TW200919122 A TW 200919122A TW 97132899 A TW97132899 A TW 97132899A TW 97132899 A TW97132899 A TW 97132899A TW 200919122 A TW200919122 A TW 200919122A
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TW
Taiwan
Prior art keywords
exposure
stage
head
illuminant
exposed
Prior art date
Application number
TW97132899A
Other languages
Chinese (zh)
Inventor
Yukio Nakano
Original Assignee
Adtec Eng Co Ltd
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Publication date
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Publication of TW200919122A publication Critical patent/TW200919122A/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/70391Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
  • Facsimile Heads (AREA)

Abstract

The exposure head assembly 1 has a plurality of exposure heads 10, 11, 12, 13 that are arranged toward the sub scanning direction Y in parallel with a head gap W. The exposure table 5 is movable under the exposure head assembly 1 toward the sub scanning direction Y and the printed circuit board 90 on the exposure table 5 is transferred under the exposure heads 10, 11, 12, 13 and the printed circuit board 90 is exposed successively by the exposure heads 10, 11, 12, 13. The exposure heads 10, 11, 12, 13 have an array of a LED 20 linearly arranged with the same pitches P, the LEDs 20 are arranged with the gap d between the exposure heads 10, 11, 12, 13 in the main scanning direction X and the same position towards sub scanning direction Y is exposed repeatedly by the exposure heads 10, 11, 12, 13, that can provide a high precision positioning exposure.

Description

200919122 九、發明說明: 【發明所屬之技術領域】 種直接於一 本發明係關於~ 曝光裝置。 物件上曝光影像之直接 【先前技術】 直接曝光裝置係將影像直接曝光於物件上,如印刷電 路板J採用糸外線雷射光源與多面體鏡(polygon mlrror)(參考1與2) ’或是採用由雷射光源或高壓水銀 燈管所提供之紫外線舆數位微型鏡裝置(腦)之 考3與4)。 前者線性地將雷射光掃瞒(主要掃晦)於物件上,利 用多面體鏡切換雷射光源之開與關,朝掃猫方向移動。切 換係為直接切換半導體雷射裝置或利用聲光調變器(Μ。 側調變(para-switch) —實體雷射光。 後者並不對光源進行開_關控制,而是利用控制 傾向之方式控制到達物件之光線,進行主掃瞒並使物件朝 次掃猫(sub scan)方向前進。 參考文獻包括日本早期公開專利第2〇〇4_5231 〇1號、 第2000-338432號、200-93624號,以及日本專利第324〜248 號。 採用多面體鏡之缺點為當曝光點遠離物件上之主掃 晦中心時,曝光品質會呈現下降狀態。 2099-9952-PF 5 200919122 【發明内容】 因此,本發明之一目的為提供一種用於產生及提供— 組隨意選擇之替代文字以代替使用者鍵入關鍵字詞之系 統及方法。此外,因曝光寬度因多面體鏡變寬而使加大裝 置尺寸,使裝置更難維護,也引起操作時之灰塵問題。 採用DMD方法之曝光區域依每一龍D解析度受限於約 數十mm至l〇〇mm之間,且為達擴大曝光寬度之目的,必 須配置數組具DMD之曝光單元,或將曝光單元朝主掃瞄方 向移動進行數次的次掃瞄。此外,亦須配置含數組鏡片之 光學裝置於DMD與物件之間。 此外,利用此兩種方法之裝置既複雜且昂貴。 本發明之目的即為解決上述習知技術之問題。 為達本發明之一目的,本發明提供一種直接影像曝光 裝置,包括一曝光台,一曝光物件嵌合於該曝光台上;複 數組曝光頭,平行於一方向配置;複數發光體,於垂直該 方向之另一方向線性地提供一曝光光源;以及一移動裝 置,於一方向移動一或二組該曝光頭與該曝光台,並將該 曝光物件之任意部分定位於該發光體可完成一曝光之一 特定位置;其中,該發光體發出之該曝光光源對該移動裝 置決定之該曝光物件之一特定部分進行曝光。 為達本發明之另-目的,本發明提供一種直接影像曝 光裝置’包括-曝光台,一曝光物件嵌合於該曝光台上; 複數組曝光頭,平行於-方向配置;複數發光體’於垂直 該方向之另-方向線性地提供—曝光光源;以及—移動裝 2099-9952-PF 6 200919122 :光1株方向t動一或二組該曝光頭與該曝光台,並將該 — 之&意部 > 定位於該I光體可完成-曝光之一 位置;其中’該發光體之位置在該等曝光頭間之該另 一方向位移一特定間格距離d。 t達本發明之另—目的,本發明之較佳實施例提供— 工制裝置’控制該發光體之開關與開關時間200919122 IX. Description of the invention: [Technical field to which the invention pertains] The invention relates directly to an exposure apparatus. Direct exposure of objects on objects [Prior Art] Direct exposure devices expose images directly onto objects, such as printed circuit board J using an external laser source and a polygon mlrror (references 1 and 2). Tests 3 and 4) of the ultraviolet ray digital micromirror device (brain) provided by a laser source or a high pressure mercury lamp. The former linearly sweeps the laser light (mainly broom) onto the object, and uses a polygon mirror to switch the opening and closing of the laser light source to move toward the sweeping cat. The switching is to directly switch the semiconductor laser device or use the acousto-optic modulator (Μ. para-switch-physical laser light. The latter does not control the light source on/off, but uses the control tendency to control Reach the light of the object, perform the main broom and advance the object in the direction of the sub scan. References include Japanese Laid-Open Patent Publication No. 2〇〇5_5231 No. 1, No. 2000-338432, No. 200-93624. And Japanese Patent No. 324 to No. 248. The disadvantage of using a polygon mirror is that the exposure quality is degraded when the exposure point is far from the center of the main broom on the object. 2099-9952-PF 5 200919122 [Invention] Accordingly, the present invention One of the purposes is to provide a system and method for generating and providing an alternative text of a random selection instead of a user typing a keyword. In addition, the device is enlarged in size due to the widening of the polygon mirror. It is more difficult to maintain and also causes dust problems during operation. The exposure area using the DMD method is limited by about tens of mm to l〇〇mm depending on the resolution of each dragon D, and For the purpose of expanding the exposure width, an array of DMD exposure units must be configured, or the exposure unit should be moved in the main scanning direction for several times of scanning. In addition, an optical device with array lenses should be disposed between the DMD and the object. Furthermore, the apparatus using the two methods is both complicated and expensive. The object of the present invention is to solve the above problems of the prior art. To achieve the object of the present invention, the present invention provides a direct image exposure apparatus including an exposure stage. a plurality of exposure objects are mounted on the exposure stage; a plurality of exposure heads are arranged parallel to one direction; a plurality of illuminators linearly providing an exposure light source in another direction perpendicular to the direction; and a moving device in one direction Moving one or two sets of the exposure head and the exposure stage, and positioning any portion of the exposure object to the illuminant to complete a specific position of an exposure; wherein the exposure light source emitted by the illuminant determines the mobile device Exposing a specific portion of the exposed object to the exposure. For the purpose of the present invention, the present invention provides a direct image exposure apparatus. 'including-exposure stage, an exposure object is fitted on the exposure stage; a plurality of array exposure heads are arranged parallel to the - direction; a plurality of illuminants 'linearly provided in the other direction perpendicular to the direction - an exposure light source; and - moving Install 2099-9952-PF 6 200919122 : Light 1 direction t moves one or two sets of the exposure head and the exposure stage, and locates the - & part > in the one of the I light body can be completed - exposure Position; wherein 'the position of the illuminant is displaced in the other direction between the exposure heads by a specific interval d. t is another aspect of the present invention, and a preferred embodiment of the present invention provides - a manufacturing apparatus' Controlling the switching and switching time of the illuminant

=該方向相對並依序地移動一或兩組該曝光頭= 二、口,W及該曝光台上之該物件對應該曝光頭依序移 ,並利用控制該發光體之開關與開關時間,透過一特定 圖案曝射該曝光光源’冑該物件進行曝光處理。= the direction is opposite and sequentially moving one or two sets of the exposure head = two, the mouth, and the object on the exposure table corresponding to the exposure head is sequentially shifted, and using the switch and switching time of controlling the illuminant, The exposure light source is exposed through a specific pattern to expose the object for exposure processing.

本發明之直接影像曝光裝置包含發光體,可由如LED等線 t生排列、組成’在主㈣方向Xji開關每一發光體以描緣圖 案。如印刷電路板等之物件谈於曝光台上,在與主掃晦方 =X相互垂直之次掃晦方向γ上移動,曝光台之移動即於 人掃晤方向執行掃瞄’且可於物件上直接曝光出任意的圖 案0 本發明之直接曝光裝置在主掃瞄方向無機械式移 動,且曝光頭組合僅有用以聚焦影像之光學裝置,或不需 光學裝置之曝光頭組合。此外,曝光頭組合可貼近物件距 離僅數餐米’且可微型化裝置並易於維護。曝光頭組合可 對應物件之寬度而放大,亦可依具數組元件之物件寬声 調整。 X 、LED輪出之可能因LED電極影響而呈現失真的型態, W而可採用重複地曝光解決此影響,達到高曝光品質的目 2099^-9952-pf 7 200919122 的。此外’亦可防止曝光頭組合位置正確性之影響。 典型的曝光頭組合有600DPI、1 200DPI、24〇〇Dpi,且 可對線寬與對應間隔P之閘極寬度(L/s )進行曝光。然 而’此間隔P無法有效地取得正確的位置。 本發明揭示具有如LED之間隔d之發光體之複數曝光 頭、、且δ ( N組)。假设此間隔d為LED間隔P之1 / n ,且當 物件朝次掃瞄方向移動時,裝置對間隔p/N之led開關, f 對物件進行N次曝光,接著在此物件之—點上,於主掃目苗 方向X與次掃瞄方向γ重複間隔p/N之N2次曝光。本發 明之操作改善對應間隔p之線寬與閘極寬度之i/n之位置 正確度。 任何熟知此技術領域者可依據透過實踐本發明而達 到本發明之實施例與圖示之所有特徵與優點。本發明之實 施例並未完全揭示可.能之目的與優點。此外,缺少或未採 用一或多項特徵亦/或優點亦可完成本發明。 &quot;再者,任何熟f此技藝者,在不脫離本發明之精神和 範圍内,當可作更動與潤飾,因此本發明之保護範圍 後附之申請專利範圍所界定者為準。 【實施方式】 讓本發明之上述和其他目的、特徵、和優點能更 曰易懂’下文特舉較佳實施例’並配合所附圖式,作詳 明如下。帛1與2圖係顯示本發明之直接影像曝光之 2099-9952, 8 200919122 罝接影像曝光奘要4 ^ + V 裝置A具有一基台6,配置於沿主掃瞄 方向X之曝光頭組合1 90 ^ - - έΗ /&gt; 且在曝先D 5上之印刷電路板 90係3又疋朝次掃瞄方向Y移動。 直接影像曝光之主掃晦係對曝光頭組合 發光體進行開關,&amp; Α β 心如LiiD之 仃開關,而次掃瞄為移動曝光台5。 曝光頭組合1具有曝光頭1 〇、u、1 2、1 3。本實於例 ^ 、且曝先碩以、U、12、13,但曝光S| 依實際需求調整。 只心数aj 且在!二!光頭^⑴⑴心沿主掃晦方…置, 人心方向γ上有相同的曝光頭平行間隔距離卜 曝光台5在曝光頭組合1 A , L 知皓方向Y移動, *先口 5上之印刷電路板9〇曝光頭1〇、⑴ 傳送,並依序由曝光頭卜W、13進行曝光。 =曝光频合i可取代曝光台5,且曝光 先頭組合1可相互朝次掃晦方向γ移動。 J' 曝光頭ι〇、η、12、13在主掃晦方 隔距離p之線性排列的發光體,每_ 口-間 需特疋波長之光線。-般採用紫外光線, 用可發出其他波長之光源。 攸而要採 之光源。反長之光/原此夕卜亦可採用LED 20以外 在主掃瞄方向X上,LED 20在曝光頭1〇、n、、 13間以間距d之差異排列。間距d係為d =〜 12 ^ 射頭之數目),曝光係在主掃瞄方向χ 為才又 ~ '•人輙瞄方向γ卜 進订間隔d之Ν2次光線發射。 9The direct image exposure apparatus of the present invention comprises an illuminator which can be arranged by a line such as an LED to form a 'finished pattern' in the main (four) direction Xji. Objects such as printed circuit boards are discussed on the exposure stage, moving in the secondary broom direction γ perpendicular to the main broom side = X, and the movement of the exposure stage is performed in the direction of the person sweeping and performing on the object Directly exposing any pattern 0 The direct exposure apparatus of the present invention has no mechanical movement in the main scanning direction, and the exposure head combination has only optical means for focusing the image, or an exposure head combination which does not require an optical device. In addition, the exposure head combination can be close to the object only a few meters away and can be miniaturized and easy to maintain. The combination of the exposure heads can be enlarged for the width of the object, or can be adjusted to a wide range according to the objects of the array elements. X, LED wheel out may be distorted by the influence of LED electrodes, W can be repeated exposure to solve this effect, to achieve high exposure quality of the 2099^-9952-pf 7 200919122. In addition, it can also prevent the influence of the correct position of the exposure head combination. A typical exposure head combination has 600 DPI, 1 200 DPI, 24 〇〇 Dpi, and can expose the line width and the gate width (L/s) of the corresponding interval P. However, this interval P cannot effectively obtain the correct position. The present invention discloses a plurality of exposure heads having an illuminant such as an interval d between LEDs, and δ (N group). Assume that the interval d is 1 / n of the LED interval P, and when the object moves in the secondary scanning direction, the device performs a N exposure on the led switch of the interval p/N, f, and then on the point of the object. , N2 exposures of the interval p/N are repeated in the main scanning direction X and the secondary scanning direction γ. The operation of the present invention improves the positional accuracy of the line width of the corresponding interval p and the i/n of the gate width. All of the features and advantages of the embodiments and illustrations of the present invention will be apparent to those skilled in the art. The embodiments of the present invention do not fully disclose the objects and advantages of the invention. Moreover, the invention may be practiced with or without one or more features and/or advantages. In addition, any skilled person will be able to make changes and refinements without departing from the spirit and scope of the invention, and therefore the scope of the invention is defined by the scope of the appended claims. The above and other objects, features and advantages of the present invention will become more <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt;帛1 and 2 show the direct image exposure of the present invention 2099-9952, 8 200919122 影像 影像 影像 4 4 4 ^ + V DEVICE A has a base 6 disposed in the main scanning direction X exposure head combination 1 90 ^ - - έΗ /&gt; and the printed circuit board 90 series 3 on the exposure D 5 moves again in the secondary scanning direction Y. The main image of the direct image exposure is to switch the exposure head combination illuminator, &amp; Α β heart as LiiD 仃 switch, and the second scan is to move the exposure stage 5. The exposure head combination 1 has exposure heads 1 〇, u, 1, 2, and 13. This example is ^, and exposed to the first, U, 12, 13, but the exposure S| adjusted according to actual needs. Only a few hearts aj and in! two! The optical head ^(1)(1) is placed along the main broom side. The human body direction γ has the same exposure head parallel spacing distance. The exposure table 5 is in the exposure head combination 1 A, L knows the direction Y moves, * the printed circuit on the opening 5 The plate 9 〇 exposure head 1 〇, (1) is transferred, and is sequentially exposed by the exposure heads W, 13. The exposure frequency combination i can replace the exposure stage 5, and the exposure head combination 1 can move toward the secondary broom direction γ. J' Exposure heads 〇, η, 12, 13 are linearly arranged illuminators at the distance of the main broom, and each wavelength is required to have a wavelength of light. Generally, ultraviolet light is used, and a light source that emits other wavelengths is used. The light source to be taken. The anti-long light/original can also be other than the LED 20. In the main scanning direction X, the LED 20 is arranged at a difference d between the exposure heads 1 〇, n, and 13. The spacing d is d = ~ 12 ^ the number of shots), the exposure is in the main scanning direction χ is only ~ '• 輙 方向 方向 γ 进 进 进 进 进 进 进 进 进 进 进 进 进 进 进 进 进9

2099-9952-PF 200919122 所述,曝光台5在曝光頭1〇、^、Μ 朝次掃瞄方向y相對地移動,並 光頭…^、以曝光光線^印刷電路板…由曝 ϊ 1 ' 12 &gt; η ^ I ϋη ,’進行曝光。曝光頭ίο、 配置,相ru 20在主掃瞄方向X上以間隔d之距離 重複地曝光,藉此達到精衫位曝光之目Θ 13 路板:3上圖::曝光的狀態。第3(a)圖係顯示在印刷電 路板90上由曝光頭10曝光之狀態,第“… n ^ ^ I. Λ 弟(b )圖係顯示在 相同位置朝次掃瞄方向γ,由 杜 丼通1 1 、n , 、位移間^ d之LED 20之曝 先頭11進仃曝光之狀態。利 # ii 19^ 1 q ^ , J的方法’依序使用曝 先頭12與13進行曝光而形成第 此類曝光係朝次掃瞄方向γ以 /、 、之狀態。 完成所有的掃猫。任何圖荦;之距離重複曝光,並 的方式描繪。 圖案身可對應圖案以開關LED 20 曝光頭1 0、11、W9 +如 率以及其他條件決定。Μ 目了依據曝光時間、功 &quot;、12、13,但—二:例雖僅有4組曝光頭1〇、 身又可採用1 〇組曝光頭。 因曝光處理可佑卜、七士 2〇 . , ^ ^ 述方式在同一位置重複處理,led 1率輸出可由十次的片 一 密度。 仪逆风-人曝先所需之能量 本實施例具有曝光頭定位調整裝置15,調整 5 1之位置朝上或下移動,並依據曝光頭组合k隹距調 整LED 20與印刷雷枚4 ηΛ 1之焦距調 J電路板90間之距離(一般為數 可朝主掃猫方向x與次掃聪方向γ調整曝光頭組合::2099-9952-PF 200919122, the exposure stage 5 is relatively moved in the scanning direction y, Μ, Μ toward the scanning direction y, and the optical head ... ^, to expose the light ^ printed circuit board ... by exposure 1 ' 12 &gt; η ^ I ϋη , 'Exposure. The exposure head ίο, the configuration, the phase ru 20 is repeatedly exposed in the main scanning direction X by the distance d, thereby achieving the goal of the fine-shirt exposure. 13-plate: 3 Above: Exposure state. The third (a) diagram shows the state of being exposed by the exposure head 10 on the printed circuit board 90, and the "...n ^ ^ I. Λ ( (b) diagram is displayed at the same position toward the secondary scanning direction γ, by Du丼通1 1 , n , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The first type of exposure is in the direction of the secondary scanning direction γ in /, .. Complete all the sweeping cats. Any image; the distance is repeated exposure, and the way to draw. The pattern body can correspond to the pattern to switch the LED 20 exposure head 1 0, 11, W9 + rate and other conditions are determined. According to the exposure time, power &quot;, 12, 13, but - two: although there are only 4 sets of exposure head 1 〇, body can also use 1 〇 group Exposure head. Due to exposure processing, you can use Bud, Qi Shi 2〇. , ^ ^ The method is repeated at the same position, and the led 1 rate output can be ten times the density of the sheet. The example has an exposure head positioning adjustment device 15, and the position of the adjustment 51 is moved upward or downward, and the k-pitch is combined according to the exposure head. 90 from the LED 20 and the whole printing gold mine focus adjustment J 4 ηΛ 1 of the circuit board to adjust the exposure head assembly γ (typically several scannable toward the main and sub scan direction x cat Cong direction ::

2099-9952-PF 10 200919122 曝光台5可由定位調整裝置調整定位,在主掃瞄 ° /、X y平面之旋轉方向調整定位。利用曝光資料旋 轉之方式可省去旋轉調整裝置之步驟。 第4圖係顯示實施例之區塊圖。 直接影像曝光裝置A由控制器30所控制,控制器3〇 、&amp; [仙驅動器21控制曝光頭組合1之每一 led 20, J用對應特定圖案開關每一 LED 2〇之方式,描繪並對印 刷電路板90上之圖案進行曝光。 描繪的圖案儲存於圖案記憶體4 0中,控制器3 0則依 據指令讀出特定圖案。 制二3 0具有光照計時調整裝置31,用以調整開關 LED 20之時間,以及具有光照密度調整裝置μ,用以調 整光照之密度。 輸出偵測器22具有影像擷取裝置或相似之裝置,用 乂僧測LED 20之實際光照位置與光照密度,並將该測值 ,送至控制器3Q。控制器3()依據測得之實際光照位置計 :LED 20之定位差異’光照計時調整裝置31依據上述之 定位差異調整LED20之光照時間以補償在次掃瞒方向¥上 之定位差異。 ^用光照計時調整裝置3卜⑽2G在次㈣方向γ 上之定位差異可得以校正,且可補償機械性的失誤。 光照密度調整裝置32依據輸出侦測器22測得之光昭 密度值以調整每一 ΙΕί) 2〇之光昭 ”·、 兀1…、在度,並自LED 20取得 一致地輸出。利用光照密度調整 门登裝置32,可補償LED 202099-9952-PF 10 200919122 The exposure table 5 can be adjusted by the positioning adjustment device to adjust the positioning in the direction of rotation of the main scanning ° /, X y plane. The step of rotating the adjustment device can be omitted by rotating the exposure data. Figure 4 is a block diagram showing an embodiment. The direct image exposure device A is controlled by the controller 30, and the controller 3〇, &amp; [Sen driver 21 controls each of the LEDs 20, J of the exposure head combination 1 to draw and control each LED 2〇 corresponding to a specific pattern. The pattern on the printed circuit board 90 is exposed. The depicted pattern is stored in the pattern memory 40, and the controller 30 reads a specific pattern in accordance with the instruction. The system 230 has an illumination timing adjustment device 31 for adjusting the time of the switch LED 20 and an illumination density adjustment device μ for adjusting the density of the illumination. The output detector 22 has an image capture device or the like for detecting the actual illumination position and illumination density of the LED 20 and sending the measurement to the controller 3Q. The controller 3() is based on the measured actual illumination position: the difference in position of the LED 20'. The illumination timing adjustment device 31 adjusts the illumination time of the LED 20 in accordance with the above-described difference in positioning to compensate for the difference in positioning in the secondary broom direction ¥. ^ The difference in positioning of the light timing adjustment device 3 (10) 2G in the secondary (four) direction γ can be corrected, and the mechanical error can be compensated. The illumination density adjusting device 32 adjusts the light density value measured by the output detector 22 to adjust each light ” ) · 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 Door-on device 32 that compensates for LED 20

20 99-9952-PF 200919122 之亮度散射。 由控制30所控制,並調整 及主掃瞄方向X與次掃瞄方 曝光頭定位調整裝置15 曝光頭組合1之垂直定位,以 向Y之定位。 控制器30控制移動裝置5〇,並控制朝次掃瞎方向^ ㈣之曝光台5°_曝光台5在直接影像曝光開始前完 成加速’並在曝光期間定速移動。實際上,此處可能存在 移料度的失誤,控制器3Q偵測移動量並調整控制計時。 定位調整裝置51用以調整主掃猫方向χ與旋轉的定 位0 第5圖顯示LED 20 之曝光頭組合1之陣列 P 之 1/10。 之光線輪廓圖,模擬採用十組LED ’且光射定位間隔設定為間隔距離 第 央描繪 素,而 1/10。 6圖係顯示光射圖宰之眘制_,+ 固系々貝科,在100X5像素區域中 81XI 0像素之垂直線條。 _ ^ …、暗&amp;顯不被光射之像 白色區則為被光射。像素之門 π Κ間隔為間隔距離ρ之 第7圖顯示第6圖圖牵姆楚上,上丄 _系左第5圖之光線輪廓照射後所 :積之能量。假設第7圖之一半高度為曝光所必須之能 量’顯見重複曝光可完成第6圖所示之圖案結果。 本實施例還包括瘦線化裝置(1 . . fining device) 3 3 ’以下將詳述。本發明之亩接旦彡你β ,丄 直接衫像曝光方法利用上述重 ’但重複曝光無可避免地 特徵部分會明顯地肥大。 複曝光方式達到能量累積之目的 造成描線上的問題,尤其在L圖形 2099-9952'PF 12 200919122 第8圖顯示L圖形特徵部分,第9圖顯示模擬後的結 果。痩線化裝置33可在曝光前將L圖形特徵部分與小弧 度部分之圖案資料瘦化,避免造成過肥大的圖案。 第10圖係顯示經瘦線化裝置33修正後之資料,第n 圖則顯示模擬後之結果。 任何熟習此技藝者,启^;盼—n ^ ^在不脫離本發明之精神和範圍 内,當可作更動與潤飾,因此本發 保羞乾圍當視後附 之申睛專利靶圍所界定者為準。 【圖式簡單說明】 第1圖係顯示本發明之—實施例之結構圖。 第2圖係顯示本發明之訾_ :月之實施例中曝光頭組合之細部圖 第3圖係顯示本發明之實施例之操作示意圖。 第4圖係顯示本發明之實施例之結構區塊圖。 第5圖係顯示LED射出光線之輪廓圖。 第6圖係顯示曝光資料示意圖。 第 第 第 第 第 7圖係顯示射出光線模擬之3D圖。 8圖係顯示L圖形之圖案資料示意圖。 9圖係顯示L圖形射^線模擬之等高輪靡圖。 10圖係顯示經修改之資料示意圖。 11圖係顯示經修改之射出# 射出先線模擬之等高輪廓圖20 99-9952-PF 200919122 Brightness scattering. Controlled by the control 30, and adjusted and the primary scanning direction X and the secondary scanning side exposure head positioning adjustment device 15 vertical positioning of the exposure head combination 1 to position Y. The controller 30 controls the moving device 5 and controls the exposure table 5 toward the secondary broom direction (4). The exposure table 5 completes the acceleration before the start of the direct image exposure and moves at a constant speed during the exposure. In fact, there may be a loss of the transfer degree here, and the controller 3Q detects the amount of movement and adjusts the control timing. The positioning adjustment means 51 is used to adjust the orientation of the main sweeping direction and the rotation 0. Figure 5 shows 1/10 of the array P of the exposure head combinations 1 of the LEDs 20. The ray profile is simulated using ten sets of LEDs and the light locating interval is set to the distance of the central characterization, and 1/10. The 6-picture shows the light-shooting pattern of the _, + solid-system 々, the vertical line of 81XI 0 pixels in the 100X5 pixel area. _ ^ ..., dark &amp; not visible by light. The white area is lighted. The pixel gate π Κ interval is the separation distance ρ. Figure 7 shows the energy of the product after the ray contour of the upper 丄 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Assume that one half of the height of Fig. 7 is the energy necessary for the exposure. It is obvious that the repeated exposure can complete the pattern result shown in Fig. 6. This embodiment also includes a thinning device (3. fining device) 3 3 ' which will be described in detail below. The acupuncture of the present invention β β β β β β β 丄 丄 丄 丄 丄 丄 丄 丄 丄 丄 丄 丄 丄 丄 丄 丄 丄 丄 丄 丄 丄 丄 丄 丄The double exposure method achieves the purpose of energy accumulation, causing problems on the trace line, especially in the L pattern 2099-9952 'PF 12 200919122 Fig. 8 shows the L pattern feature portion, and Fig. 9 shows the simulated result. The twisting device 33 can thin the pattern data of the L pattern feature portion and the small arc portion before exposure to avoid causing an excessively large pattern. Fig. 10 shows the data corrected by the thinning device 33, and the nth image shows the results after the simulation. Anyone who is familiar with this skill, Kai^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^ The definition is subject to change. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a structural view showing an embodiment of the present invention. Fig. 2 is a view showing the outline of the exposure head in the embodiment of the present invention. Fig. 3 is a view showing the operation of the embodiment of the present invention. Figure 4 is a block diagram showing the structure of an embodiment of the present invention. Figure 5 shows the outline of the light emitted by the LED. Figure 6 shows a schematic diagram of the exposure data. Fig. 7 is a 3D view showing the simulation of the emitted light. The figure 8 shows a schematic diagram of the pattern data of the L pattern. The 9-picture shows the contour rim diagram of the L-pattern shot line simulation. Figure 10 shows the modified data diagram. Figure 11 shows the modified contour shot of the modified shot line

【主要元件符號說明】 2099-9952-PF 200919122 A〜直接影像曝光裝置; X〜掃瞄方向; Y〜次掃瞄方向; P、W、d〜間距; 1〜曝光頭組合; 5〜曝光台; 6〜基台; 1 0、11、12、1 3〜曝光頭; 15〜曝光頭定位調整裝置; 20〜LED ; 21〜LED驅動器; 22〜輸出偵測器; 30〜控制器; 31〜光照計時調整裝置; 3 2〜光照密度調整裝置; 33〜瘦線化裝置; 40〜圖案記憶體; 5 0〜移動裝置; 5 1〜定位調整裝置; 9 0〜印刷電路板。 2099-9952-PF 14[Main component symbol description] 2099-9952-PF 200919122 A~Direct image exposure device; X~scan direction; Y~scan direction; P, W, d~ pitch; 1~exposure head combination; 5~ exposure table 6~Abutment; 1 0,11,12,1 3~exposure head; 15~exposure head positioning adjustment device; 20~LED; 21~LED driver; 22~output detector; 30~ controller; 31~ Light timing adjustment device; 3 2 ~ light density adjustment device; 33 ~ thin wire device; 40 ~ pattern memory; 5 0 ~ mobile device; 5 1 ~ positioning adjustment device; 9 0 ~ printed circuit board. 2099-9952-PF 14

Claims (1)

200919122 十、申請專利範圍: 1. 一種直接影像曝光裝置,包括: 一曝光台,一曝光物件嵌合於該曝光台上 複數組曝光頭,平行於—方向配置; 複數發光體 曝光光源;以及 於垂直該方向 之另一方向線性地提供一 -移動裝置H向移動—或二組該曝光頭與該曝 光台’並將該曝光物件之任意部分定位於該發光體可完成 一曝光之一特定位置; 其中’該I务光體發出之該㈣光源對該㈣裝置決定 之該曝光物件之一特定部分進行曝光。 2. —種直接影像曝光裝置,包括: 一曝光台,一曝光物件嵌合於該曝光台上; 複數組曝光頭’平行於一方向配置;200919122 X. Patent application scope: 1. A direct image exposure device comprising: an exposure stage, an exposure object is fitted on the exposure stage, and a plurality of exposure heads are arranged parallel to the direction; a plurality of illuminant exposure light sources; Vertically providing the other direction of the direction of the mobile device H to move - or two sets of the exposure head and the exposure table - and positioning any portion of the exposed object to the illuminant to complete a specific position of an exposure Wherein the (four) light source emitted by the optical light body exposes a specific portion of the exposed object determined by the (four) device. 2. A direct image exposure apparatus comprising: an exposure stage, an exposure object is fitted to the exposure stage; the complex array exposure head is disposed parallel to one direction; 複數發光體,於垂直該方向之另一方向線性地提供一 曝光光源;以及 一移動裝置,於一方向移動一或二組該曝光頭與該曝 光台,並將該曝光物件之任意部分定位於該發光體可完成 一曝光之一特定位置; 其中,該發光體之位置在該等曝光頭間之該另一方向 位移一特定間格距離d。 3.如申明專利範圍第1或2項所述之接影像曝光裝 置,其中還包括: 一控制裝置’控制該發光體之開關。 2099-9952-PF 15 200919122 4·如申請專利範圍第1或2項所述之接影像曝光裝 其中還包括: 一控制裝置,控制該發光體之開關時間。 5.如申請專利範圍第1或2項所述之接影像曝光裝 其中還包括: 一控制裝置’控制該發光體之開關與開關時間,其中: 該移動裝置於該方向相對並依序地移動—或兩組該 曝光頭與該曝光台;以及 該曝光台上之該物件對應該曝光頭依序移動,並利用 控制該發光體之開關與開關時間’透過一特定圖案曝射該 曝光光源,對該物件進行曝光處理。 6·如申π專利範圍第1或2項所述之接影像曝光裳 其中還包括: 控制裝置’控制該發光體之之一輸出。 ==利範圍第1或2項所述之接影像曝光襄 -修正裝置’用以預先修正用於曝光該曝光物件之— 置 置 置 置 圖案 2099-9952-PFa plurality of illuminators, linearly providing an exposure light source in another direction perpendicular to the direction; and a moving device for moving one or two sets of the exposure head and the exposure stage in one direction, and positioning any portion of the exposure object The illuminator can perform a specific position of an exposure; wherein the position of the illuminator is displaced by a specific inter-cell distance d in the other direction between the exposure heads. 3. The image exposure apparatus of claim 1 or 2, further comprising: a control device 'switching the illuminant. 2099-9952-PF 15 200919122 4. The image exposure apparatus according to claim 1 or 2, further comprising: a control device for controlling the switching time of the illuminant. 5. The image exposure apparatus of claim 1 or 2, further comprising: a control device 'controlling a switch and a switch time of the illuminator, wherein: the mobile device moves relative to each other in the direction - or two sets of the exposure head and the exposure stage; and the object on the exposure stage corresponds to the exposure head sequentially moving, and the exposure light source is exposed through a specific pattern by controlling the switch and switching time of the illuminant, The object is exposed to light. 6. The image exposure apparatus of claim 1 or 2, further comprising: controlling the output of one of the illuminants. == The image exposure described in item 1 or 2 of the profit range 修正 - correction device is used to pre-correct the exposure for exposing the exposed object - setting setting pattern 2099-9952-PF
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KR20090042711A (en) 2009-04-30
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CN101419410A (en) 2009-04-29
CN101419410B (en) 2013-12-04

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