TW200910015A - Drawing system, drawing apparatus and drawing method - Google Patents

Abstract

The invention provides a drawing system, a drawing device, and a drawing method. The drawing system can carry out drawing processing and other processing using light from one source in a plurality of drawing devices or a plurality of drawing processing parts, so as to improve the working efficiency of the laser and the production efficiency of the substrate. The drawing system (100) divides the pulsed light emitted from the laser oscillator (110) into primary pulsed light and secondary pulsed light, and alternately distributes the primary pulsed light and the secondary pulsed light to a first drawing device (1a) and a second drawing device (1b).; Therefore, the drawing processing using primary pulsed light and the correction processing using secondary pulsed light can be carried out in parallel and alternately in two drawing devices (1a, 1b), so that the working efficiency of the laser oscillator and the production efficiency of the substrate are enhanced.

Description

200910015 IX. OBJECTS OF THE INVENTION: TECHNICAL FIELD The present invention relates to a drawing system, a drawing device, and a drawing method, which are provided by a glass substrate for a color filter, a liquid crystal display device, and a plasma for a liquid crystal display device. A flat panel display (FPD) such as a display device irradiates a light beam with a substrate such as a glass substrate, a semiconductor substrate, or a printed substrate, and draws a specific pattern on the photosensitive material formed on the substrate. [Prior Art] In the manufacturing step of the substrate, a drawing device is used which draws a specific pattern on the photosensitive material formed on the substrate by irradiating the substrate with a light beam. For example, the device has a platform, for example, The substrate is held in a horizontal posture, and the substrate is moved in a horizontal plane; a laser oscillator as a light source; and an illumination head that irradiates the beam emitted from the laser oscillator into a specific pattern while irradiating the upper surface of the substrate. When the substrate is processed in such a drawing device, first, the drawing device carries the substrate by a specific transport mechanism, and the substrate is placed on the stage. Further, the drawing device aligns the substrates placed on the platform. After the alignment of the I-plate is completed, the trace device-surface causes the substrate and the platform to move, and the surface is intermittently emitted by the laser oscillator to produce a beam on the upper surface of the substrate (4). Thereafter, the drawing device carries out the substrate on which the drawing process is completed by a specific transport mechanism. Further, the riding device performs a correction process (correction process) on the illumination state of the irradiation head as needed. This prior description (4) is disclosed, for example, in the patent text |U. Further, Patent Document 2 discloses an example in which a light beam emitted from a light source of 130516.doc 200910015 is irradiated onto the upper surface of the substrate in the same manner as the green display device. [Patent Document 1] Japanese Patent Laid-Open No. Hei. No. 2006-145745 (Patent Document 2) Japanese Patent Laid-Open No. 61-1617 No. 19--A SUMMARY OF INVENTION [Problems to be Solved by the Invention] As described above, in the drawing device In the operation time, in addition to the time for causing the laser oscillator to perform the rendering process, there is also no laser oscillator f

The time for loading, unloading, and aligning the substrate is performed by the operation. Further, one laser oscillator has been previously provided in one drawing device. As a result, the operating rate of the laser oscillator is low, and the manufacturing efficiency of the number of substrates to the laser oscillator is not good. On the other hand, the drawing device may be processed using a light beam from a laser oscillator as in the above-described correction processing as in the above-described correction processing, as in the case of the above-described correction processing. Therefore, only by simply switching the light beams from the laser oscillators of the turntable to the plurality of stocking devices in sequence, it is impossible to perform drawing processing and other processing in parallel with the plurality of drawing devices. The present invention has been made in view of such circumstances, and the object of the present invention is to provide a system for depicting a system, a stalking device, and a method for drawing and drawing a plurality of devices. In the continuation/processing unit, the drawing process is performed in parallel with other processes using light from a single light source, and the efficiency is improved. In order to solve the above problems, the invention of the book is a depiction system, and the invention is based on the fact that the operation rate of the Aray shot and the substrate are solved. A drawing device for drawing a specific pattern on a photosensitive material formed on a substrate I30516.doc 200910015 by irradiating light onto a substrate, and comprising: a light source; the distributing device dividing the light emitted from the light source into a plurality of Dividing light and distributing the plurality of divided lights to a plurality of optical paths; and a plurality of the drawing devices respectively disposed in the plurality of optical paths _; wherein the plurality of divided lights comprise i beams having higher light intensities than other divided lights The dividing light is drawn, and the distribution device sequentially distributes the divided light for the shaking into the plurality of optical paths. The invention of claim 2 is the drawing system of claim 1, wherein each of the plurality of finder devices has a correction mechanism for correcting an illumination state of the light to the substrate by using the split light other than the financial division light. The invention of claim 3 is a drawing system comprising: a green device for drawing a specific pattern on a photosensitive material formed on a substrate by irradiating light onto a substrate, and comprising: a light source; The device divides the light emitted from the light source into the W-cut light having a high light intensity and the second split light having a low light intensity, and distributes the divided light and the second split light into the two optical paths. And two of the above-described edge devices are disposed on the two optical paths, and the distribution device alternately distributes the divided light and the second divided light to the two optical paths. The invention of claim 4 is the green system of claim 3, wherein the two drawing devices alternately perform drawing processing, and the distributing device supplies the i-th drawing to the drawing device that performs the edge processing on the two drawing devices The method of dividing the light 'distributes the first divided light and the second divided light to the two optical paths. The invention of claim 5 is the drawing system of claim 4, wherein each of the two 130516.doc 200910015 drawing devices has a correcting mechanism </ RTI> which uses the second split light to correct the illumination state of the light to the substrate. The invention of claim 6, wherein the distribution device of any one of claim 3 to claim 5 includes: a light division unit that divides light emitted from the light source into orthogonal to the optical axis and The first divided light and the second divided light that advance in opposite directions, and a rotating mechanism that rotates the light dividing unit around the optical axis.

The invention of claim 7 is the drawing system of any one of claim 3 to claim 5 wherein the above-mentioned dispensing device comprises: 帛ι partial transmission mirror, which is a degree equivalent to the light reflection of the above-mentioned divided light And the light intensity corresponds to the transmission of the light of the second divided light, and the second partial transmission mirror transmits the light intensity to the light of the second divided light, and the light intensity corresponds to the second divided light. The light reflection and the arrangement mechanism selectively dispose the first-stage 4th transmission mirror and the second in-situ transmission mirror on the optical path of the light emitted from the light source. The invention of the present invention is characterized in that it is a method for drawing a specific pattern on a photosensitive material formed on a substrate by irradiating light onto a substrate, and includes: a light source; a distribution mechanism, Dividing the light emitted from the light source into a plurality of divided lights, wherein the plurality of divided lights are distributed to the plurality of optical paths; and a plurality of drawing processing units respectively disposed on the plurality of optical paths; and the plurality of divided lights The splitting light includes a bundled riding light having a light intensity higher than that of the pitted light, and the distributing means sequentially distributes the divided light for the drawing to the plurality of optical path commands. The invention is characterized in that: the invention of claim 9 is a drawing device 130516.doc 200910015, which is characterized in that a specific pattern is drawn on a photosensitive material which is formed on the substrate by irradiating light onto the substrate, and includes: a light source The distribution cover knife-distributing mechanism divides the light emitted from the light source into a light intensity of the guest eve #, person *丨, ^ * X, the first split light and the second split light having a lower light intensity And assigning the first splitter 1丨# heart spear 1 knife and the second split light to the 2 optical paths; and the two edge processing units respectively disposed on the upper beam optical path; The distribution unit alternately distributes the first divided light and the second divided light to the two optical paths. The invention of claim H) is characterized in that the edge processing is sequentially performed in a plurality of edge processing units, and the image processing is performed on the substrate by irradiating the substrate 1 Depicting a specific pattern on the material; and comprising: a dividing step of dividing the light emitted from the specific light source into a plurality of divided lights; and an assigning step of allocating the plurality of divided lights to the plurality of drawing processing units In the above-described plurality of drawing processing units, the light intensity in the divided light for the above-described stroke is higher than the divided light for drawing the other divided light beams. [Effects of the Invention] According to the invention of claim 2, the drawing system divides the light beam emitted from the light source into a plurality of divided lights, and sequentially distributes the divided light having a higher light intensity than the other divided lights to a plurality of depictions. In the device. Therefore, it is possible to sequentially perform the drawing processing using the divided light for drawing while using a plurality of drawing devices, and to use other divided light paths in parallel with other drawing devices. Thereby, the operation rate of the light source and the manufacturing efficiency of the substrate can be improved. In particular, according to the invention of claim 2, the drawing device corrects the illumination state of the light to the substrate by using the split light other than the splitting light for drawing. Therefore, I305l6.doc •10- 200910015 can be processed in parallel with other trimming devices to perform the correction light irradiation state. , the real two! = The invention of claims 3 to 7, the system will emit from the light source. The second point: the light for the light and the second split light, and the first split light and the set: are assigned to two (four) sets. Therefore, it is possible to alternately perform parallel processing of the drawing process and the other processing of the cut light by the two brothers in the two sculpt devices. Thereby, the operation rate of the light source and the manufacturing efficiency of the substrate can be improved. In particular, according to the invention of claim 4, the distribution device distributes the first divided light and the second divided light by providing the dividing device for the riding device in the two drawing devices. Therefore, the split light can be appropriately allocated according to the timing of the drawing process. In particular, according to the invention of claim 5, the striking device corrects the illumination state of the light to the substrate by using the second split light. Therefore, the processing can be started in parallel with the drawing processing in the i-picture drawing device. In particular, according to the invention of claim 6, the distribution device includes a light dividing unit that divides the light beam emitted from the light source into orthogonal to the optical axis and advances in opposite directions to each other. The first divided light and the second divided light; and the rotating mechanism rotates the first divided portion around the light extraction. Therefore, the first divided light and the second divided light can be appropriately and easily distributed to the two optical paths. In particular, according to the invention of claim 7, the distribution device is provided with: The partial transmission mirror 'reflects the light intensity corresponding to the first split light beam, and the light intensity corresponds to the second split light beam transmission; and the second partial transmission mirror makes the 130516.doc 200910015 first intensity equivalent to the first split light The light beam is transmitted, and the light beams of the light intensity phase == are reflected; and the arrangement mechanism 'selects the first partial through (four) and the second local light mirror selectively on the optical path of the light beam emitted from the light source, thereby being appropriate And the ith division light and the second division are easily distributed to the two optical paths. ° & According to the invention of claim 8, the first beam emitted from the light source is divided into a plurality of divided lights, and the divided light whose light intensity is higher than that of the other divided lights is sequentially distributed to a plurality of stroke processing. In the ministry. Therefore, in the plurality of drawing processing units, the processing of cutting the light during the drawing (4) can be sequentially performed in the other drawing processing units in parallel with the other cutting processing. According to the invention of claim 9, the drawing device divides the light beam emitted from the light source into the i-th split light and the second split light, and the first! The divided light and the second divided light are alternately distributed to the two drawing processing units. Therefore, the other processing using the i-th split light drawing process and the younger two-divided light can be alternately performed in parallel in the two edge processing sections. Thereby, the operation rate of the light source and the manufacturing efficiency of the substrate can be improved. According to the invention of claim 1G, the riding method divides the first beam from the light source into a plurality of divided lights' and distributes the light beams with the light intensity higher than the other beams of light to the riding processing unit in turn. in. In the plurality of drawing processing units, the drawing processing using the drawing is sequentially performed, and the processing using the other knife cutting light is performed in parallel in the other green processing units. Thereby, the operating rate of the light source and the manufacturing efficiency of the substrate can be improved. [Embodiment] Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. &lt;1 _Drawing device configuration&gt;

Fig. 1 and Fig. 2 are a side view and a plan view of a drawing device 1 constituting a drawing system 1 according to an embodiment of the present invention. This drawing device is a device for drawing a specific pattern on the surface of a color filter glass substrate (hereinafter referred to as &quot;substrate&quot;) 9 in the color filter step of manufacturing a liquid crystal display device. As shown in FIGS. 1 and 2, the drawing device 丨 mainly includes a stage 1A for holding the substrate 9, a platform driving unit 2〇 connected to the stage 1〇, and illumination light for introducing pulsed light supplied from the light source into the device. The system 3A, the irradiation head 40 that irradiates the pulsed light toward the upper surface of the substrate 9, the imaging unit 5 that photographs the irradiation head 4, and the device controller 6A that controls each part in the apparatus. The platform 10 has a flat outer shape and is used to hold the substrate 9 on the upper surface thereof in a horizontal posture. A photosensitive material such as a photoresist is applied in advance to the upper surface of the substrate 9 to be processed. A plurality of suction holes (not shown) are formed on the upper surface of the platform 1A. Therefore, when the substrate 9 is placed on the stage (7), the substrate 9 is fixedly held on the upper surface of the stage 10 by the suction pressure of the suction holes. The stage drive unit 20 is a mechanism for moving the stage in the main scanning direction (γ-axis direction), the sub-scanning direction (X-axis direction), and the rotation direction (rotation direction around the x-axis). The platform drive unit 20 includes a rotation mechanism 21 that rotates the platform 1 , a support plate 22 that can support the rotation of the support plate 1 , a sub-sweeping mechanism 23 that moves the support plate Μ in the sub-scanning direction, and a sub-scanner support. The base plate 24 of the holding plate 22 and the main scanning mechanism 25 for moving the bottom plate 24 in the main scanning direction are provided with a linear motor 21a, which is mounted on the platform 10 The moving member of the Y-side end portion and the fixing member attached to the upper surface of the support plate 22. Further, a rotating shaft 21b is provided between the lower surface side of the central portion of the stage 10 and the support plate 22. Therefore, when the linear motor 21a is operated, the moving member moves in the X-axis direction along the fixing member, and the stage 10 rotates within a specific angle range around the rotating shaft 21b on the supporting plate 22. The sub-scanning mechanism 23 is provided with a linear motor 23a including a moving member mounted on the lower surface side of the support plate 22 and a fixing member attached to the upper surface of the bottom plate 24. Further, a pair of guide portions 23b extending in the sub-scanning direction is provided between the support plate 22 and the bottom plate 24. Therefore, when the linear motor 23a is operated, the support plate 22 moves in the sub-scanning direction along the guide portion 23b on the bottom plate 24. The main scanning mechanism 25 is provided with a linear motor 25a which is constituted by a moving member attached to the bottom surface of the bottom plate 24 and a fixing member which is laid on the base 7 of the apparatus. Further, between the bottom plate 24 and the base 70, a pair of guide portions 25b extending in the main scanning direction are provided. Therefore, when the linear motor 25a is operated, the bottom plate faces the main scanning portion along the guide portion 25b on the base port 70. Move in direction. The illumination optical system 30 is for introducing the pulse light supplied from the laser oscillator 11 described below and supplied through the light distribution unit 丨2 下述 to the optical system of the illumination head 4A. Inside the illumination optical system 30, a spectroscope that divides incident light into a plurality of bundles of pulsed light having an equal amount of light, an attenuator for adjusting the intensity of the divided pulsed light, and a light intensity distribution of each pulsed light are disposed. Even homogenizer and so on. 130516.doc 14- 200910015 A plurality of illumination heads 40 are mechanisms for irradiating the pulsed light transmitted through the illumination optical system 3 into a specific pattern beam while irradiating the pattern beam onto the upper surface of the substrate 9 held on the stage 10. . A plurality of illumination heads 4 are fixed to the frame 80 mounted on the base 70 so as to straddle the platform 10 and the platform drive unit 20. As shown in Fig. 1, a diaphragm unit 41 and a projection optical system 42 are provided inside each of the illumination heads 4''. The diaphragm unit 41 includes a diaphragm 41a as a glass plate and a support portion 41b that supports the diaphragm 41a, in which a specific shielding pattern is formed. Further, the projection optical system 42 includes zoom lenses 42a and 42b, focusing mirrors 42c and 42d, and the like. The pulse light introduced into the illumination head 4 is partially shielded when it passes through the aperture 41a supported by the support portion, and is irradiated downward by the pattern light formed into a specific pattern shape. Further, the pulse light transmitted through the diaphragm 41a is adjusted by the zoom lenses 42a and 42b of the projection optical system 42 and the focusing mirrors 42A and 42d, and the adjusted pulse light is irradiated onto the upper surface of the substrate 9. A drive mechanism 4ic is connected to the support portion 41b of the aperture unit 41. When the driving mechanism 41c is operated, the diaphragm 41&amp; on the support portion 41b and the support portion 41b moves in the main scanning direction, the sub-scanning direction, and the rotation direction. Thereby, the aperture unit 41 can select a pattern to be projected, or adjust the projection position of the pattern. Further, in Fig. 1, the drive mechanism 41c is conceptually shown for convenience of illustration. Actually, the drive mechanism 41 is realized by a mechanism such as a linear motor and is fixed to the frame 80. Drive mechanisms 42e and 42f for individually changing the heights of the zoom lenses 42a and 42b are connected to the zoom lens 42a'42b. When the drive mechanisms 426, 4 are engaged 130516.doc • 15 - 200910015, the heights of the zoom lenses 42a, 42b are changed, whereby the pattern magnification projected on the upper surface of the substrate 9 can be adjusted. Further, the focus mirror 42c' 42 is connected to a drive mechanism 42g for shifting the same in the main scanning direction as a whole. When the driving mechanism 42g is operated, the optical path length is changed by the position of the focusing mirrors 42A and 42d, and the focus position of the pulse light is adjusted. Further, in order to facilitate the illustration, the drive mechanisms 42e to 42g are conceptually shown. Actually, the drive mechanisms 42e to 42g are realized by a mechanism using a motor and a ball screw, and are fixed to the frame 8A.

The plurality of illumination heads 40 are arranged at equal intervals in the sub-scanning direction (e.g., at intervals of two jaws). If the surface 1G is moved in the main scanning direction and the pulse light is intermittently irradiated by the respective illumination heads 40, a plurality of intermittently exposed specific widths can be drawn on the upper surface of the substrate 9 (for example, 5 〇 瓜 瓜Width) pattern group. When the ice of the material device is in the direction of the scanning, at the end of the secondary stroke, the platform 10 is moved only in the sub-scanning direction by the amount of the irradiation width of the irradiation head 4〇, and the surface 1G is moved again in the main scanning direction. The pulse light is intermittently irradiated by each of the irradiation heads 40. Thereby, the drawing device is configured such that the substrate 9 is shifted by the '-plane in the sub-scanning direction with respect to the irradiation width of the irradiation head 40, and the pattern in the main scanning direction is read (four times) a specific number of times (for example, four times), whereby the substrate 9 is formed. The entire surface is formed with a mechanism for photographing the pulsed light irradiated by each of the irradiation heads 40 by the regular imaging unit 50 for the color filter and the irradiation state of the pulsed light and various parameters. The photographing unit is called a camera that shoots a pulsed light, and a moving mechanism 52 that moves the photographing machine 51 in the sub-scanning direction. The moving mechanism 52 is disposed on the guide rail 52a of the +Y side of the bottom plate 24 of the 130516.doc -16-200910015, and the camera 51 is moved along the guide rail 52a by the driving force of the linear motor or the like. . The photographing_ is constituted by, for example, a CCD (array coupled device 'charge coupled device) camera, and is set such that its viewing angle faces upward.

When photographing is performed by the photographing unit 50, first, the stage 1 is moved in the main scanning direction so that the photographing (four) 51 is positioned below the irradiation head 40 (the state of Fig. 2 and Fig. 2). Then, by moving the moving mechanism 52, the camera 51 is moved in the sub-scanning direction along the guide rail 52a, and the pulsed light is irradiated by the respective irradiation heads 4, and the irradiated pulsed light is imaged by the camera 51. Further, the photographing unit 50 transmits the photographing result of the camera 51 to the device controller 6A. Fig. 3 is a view showing an example of the light intensity distribution of the pulsed light taken by the camera 51. The horizontal axis of Fig. 3 indicates the position in the sub-scanning direction, and the vertical axis of Fig. 3 indicates the light intensity. Device control Please analyze the shooting results obtained in photography (4) to obtain the laser power of the light source (the product of the light intensity of all pulsed light) and the width of the pulse light as a whole in the sub-scanning direction (XI in Figure 3). The amount of change in the light intensity of each pulsed light (the amount of change of yi to y7 in Fig. 3), the width of the saliva of each pulsed light (Δ in Fig. 3) to Δ?, and the absolute position of the pulsed light (Fig. 3) In the xa) and other information. The device controller 60 is a processing unit that controls the operation of each part in the device. Figure 4 shows the depiction device! A block diagram of the connection between the above components and the device controller 6. As shown in Fig. 4, the device controller 6 is electrically connected to the linear motors 21a, 23a, 25a, the drive mechanisms 仏, 42e, 42f, the camera 51, and the moving mechanism 52 to control the operations thereof. The device controller 60 includes, for example, a computer having a CPU (Central prGeessing coffee, central processing 130516.doc 200910015 unit) and a memory, which is input by the computer according to the red type and various commands installed in the computer. In the case of the above system, the above-mentioned parts are controlled. &lt;2. Composition of the drawing system Fig. 5 shows the entanglement of the drawing system 100 of the present invention. As shown in Fig. 5, the drawing device 1 and the 泠# of the system configuration are depicted. (8) and 2 drawing devices (1st ia and 2nd drawing device lb △ light distribution unit 12〇. The old... The laser illuminator 110 and the above-described ribbing device (4) have the same structure: the wide and the second finder device 1b each have::==:1 - 1 - The laser oscillator 110 is connected to the laser controller 111. Further, the laser controller ui盥/, the first drawing device 1a, and the device controller 6 of the second drawing device 1b are connected to the laser controller 111 to communicate with each device controller 60, and according to each drawing field The processing of the devices la, lb is performed to transmit the driving signal to the laser oscillator 110, thereby causing the laser "U0 to emit pulsed light. The pulsed light emitted from the laser oscillator 11", The light distribution unit U0 is an optical unit for dividing the pulse light emitted from the laser oscillation into the main pulse light and the sub-pulse light, and dividing the divided pulses. The light is distributed to the two optical paths facing the i-th drawing device 1& and the second drawing device lb. Figure 6 scars; A schematic perspective view of the distribution of the soap element 120. Further, Fig. 7 and Fig. 8 are sectional views showing the internal structure of the light distribution unit 12A. As shown in Fig. 6 to Fig. 8, the 弁 刀 刀 配 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 The optical axis A is a frame 121 that is rotated centrally. 130516.doc -18- 200910015 The frame 121 is provided with an injection unit 121a that intercepts the pulsed light emitted from the laser oscillator 11 and the inside of the frame 121, and the divided main The pulse light is emitted to the main pulse light emission window mb outside the frame 121, and the divided sub-pulse light is emitted to the sub-pulse light emission window 121c outside the frame 121. The main pulse light emission window 121b and the sub-pulse light emission window 12lc are via The incident optical axis A is formed on the wall surface opposite to the frame 121. As shown in FIGS. 7 and 8, a partial mirror 122 and three mirrors 123 to 125 are disposed inside the frame 121. The partial mirror 122 and Each of the three mirrors 123 to 125 is fixed to the frame m by a nut or the like. The partial mirror 122 reflects a part (for example, 9%) of the incident pulse light, and transmits the remaining portion (for example, 10%). The reflected beam in mirror 122 acts as The main pulse light having a relatively high intensity is emitted from the autonomous pulsed light exiting window 121b toward the outside of the frame 121. On the other hand, the light beam transmitted through the partial mirror 122 is sequentially reflected in the mirrors 123, 124, and 125 as a light intensity. The lower sub-pulsed light is emitted from the sub-pulse light exiting window 121 (outward toward the outside of the frame 121. The light distributing unit 120 has a ring motor 126 that rotates the frame 121 around the incident optical axis a. As the ring motor 126, it can be used. For example, an ultrasonic motor that rotates a motor by ultrasonic vibration. The ring motor 126 is electrically coupled to the motor controller 126a. When the drive signal is transmitted from the motor controller uga to the ring motor 丨 26, the ring motor 126 operates to rotate the frame 121 about the incident optical axis A. Thereby, the state in which the main pulse light is supplied to the second drawing device and the sub-pulse light is supplied to the second drawing device ilb (the state of FIG. 7, hereinafter referred to as &quot;first state&quot;) and the second drawing can be described. The device u supplies the sub-pulse light and switches the state in which the device 1 b is supplied with the main pulse light (the state of Fig. 8, hereinafter referred to as &quot; the second state &quot;) in the 130516.doc -19-200910015 2 . The distribution unit 12A includes a detection sensor 127 for detecting the rotational posture of the frame 121. The detection sensor 127 detects which state of the first state and the second state the frame 121 is by detecting a specific portion ' of the frame 121. The detecting sensor 127 can be constructed using, for example, an optical non-contact sensor. As shown in Fig. 5, the 'motor controller 126a and the detecting sensor 127 are respectively connected to the shared distribution controller 128. The distribution controller 128 is based on the self-detecting sensor 127. The detection signal received therein controls the motor controller 126a. Thereby, the ring motor 126 can be operated at an appropriate angle, so that the rotational posture of the frame 121 can be controlled to an expected state (first state or second state). The distribution controller 128 is connected to each device controller 60 of the first drawing device 1a and the second drawing device 1] 3. The distribution controller 128 communicates with each device controller, and performs status according to the processing of each drawing device 1a, 1b. The rotation posture of the frame is controlled. <3. Operation of the drawing system> Next, the flow of the stroke system 1〇〇 will be described with reference to the flowchart of Fig. 9. Further, the operation described below is performed by the distribution controller. 128, the motor controller 126a, the laser controller (1) and the riding device u, ^ each device control theft 6 0 - face each other, the same batch of instructions, the main control, the control sequence, while controlling the various parts. The first system 10 0 first rotates the frame 121 by the operation of the circle % motor 126 by the circle E, and causes the light distribution unit 12 to smear the scent of the squid ', υ von second state (step SA1). The drawing system 130516.doc -20-200910015 and gram are in a state in which the first light drawing unit 120 irradiates the first drawing device !a with the sub-pulse light having a relatively low light intensity, and the second light drawing unit 120 pairs the second drawing device 1 bThe light intensity is relatively high Then, the drawing system 100 performs correction processing using the sub-pulse light (correction processing of the pulse light irradiated from the plurality of irradiation heads 4〇) in the second drawing device 1 &amp; (step SB1). The sub-pulse light irradiated by the edge device 1a is divided into a plurality of beams by the illumination optical system 30, and then irradiated downward through the respective irradiation heads 40. The first drawing device 13 is disposed below the plurality of illumination heads 4〇 to cause the camera 51 The sub-scanning direction is moved, and the illumination light from each of the illumination heads 40 is taken by the camera $! Further, the device controller 60 of the first drawing device 1a analyzes the imaging result taken from the camera 51, and acquires the laser power of the sub-pulse light, the amount of change in the intensity of the illumination width, the amount of the edge, and the absolute position of the illumination light. News. In turn, the device controller 60 controls the drive mechanisms 4U, 42e, 42f, 42g such that the parameters each approach the target value. Thereby, the irradiation state of the pulse light irradiated by the plurality of irradiation heads 40 can be corrected. After the correction processing in the first drawing device 1a is completed, the drawing system 1 搬 carries the substrate 9 to be processed into the second drawing device 1 &amp; (step SB2). Specifically, the first! The drawing device 1a mounts the substrate 9 on the upper surface of the stage 10 by a specific transport mechanism (not shown), and adsorbs and fixes the substrate 9 on the upper surface of the stage 10. Further, the second drawing device &amp; adjusts (aligns) the position and inclination of the substrate 9 by operating the stage driving unit 20. Then, the drawing system 100 rotates the frame 130516.doc 21 200910015 121 by operating the ring motor 126, and causes the light distribution unit 12 to be in the first state (step SA2). In other words, the drawing system 100 is in a state in which the first drawing device 1a is irradiated with the main pulse light having a relatively high light intensity from the light distribution unit 120, and the light intensity of the second drawing device ib is relatively low from the light distributing unit i2. The secondary pulsed light.

Next, the drawing system 100 performs drawing processing using the main pulse light in the second drawing device 13 (step SB3). The main pulse light irradiated to the second drawing device 丨a is divided into a plurality of beams by the illumination optical system 3G, and then passed through the respective irradiation heads 4. Down, ,,, and shoot. The first drawing device 丨a irradiates the upper surface of the substrate 9 with pulse light from the plurality of irradiation heads 4 while moving the stage 丨〇 in the main scanning direction and the scanning direction (the main pulse light is divided into the respective divided lights of the plurality of beams) Therefore, the regular pattern for the color filter can be drawn on the upper surface of the substrate 9 held on the platform 1 of the second drawing device. In addition, the drawing system 100 is in the first drawing device. The second drawing device 1b performs the correction processing using the sub-pulse light (step SC1). The second pulse (b) of the sub-pulse light is divided into a plurality of beams in the Zhaoming optical system 3G. The lens 40 is irradiated downward through each of the illumination heads 40 to face the plurality of illumination head buckles. The lower machine 51 moves the product pull hill in the sub-scanning direction to move the camera, and the camera 40 shoots the camera 40. The illumination of the light. ..., the device controller of the 1st 1b is taken from the camera 5艸, and the analysis is performed to obtain the laser power of the sub-pulse light, the amount of change in the light intensity, and the amount of the side. And the absolute position of the illumination After that, the mounting position of the controller 60 controls the driving mechanisms 41c, 42e, 42g' so that the parameters are long and the respective values are close to the target value. 130516.doc -22- 200910015 The irradiation state of the pulsed light irradiated by the plurality of irradiation heads 40. After the correction processing in the second drawing device lb is completed, the drawing system 〇〇 loads the substrate 9 as the processing target into the second In the drawing device 1b (step SC2), specifically, the second drawing device 113 mounts the substrate 9 on the upper surface of the stage 10 by a specific transport mechanism (not shown), and adsorbs and fixes the substrate 9 to the stage 10 Further, the second drawing device 113 adjusts (aligns) the position and the inclination of the substrate 9 by operating the stage driving unit 20. Then, the drawing system 100 operates by the ring motor 126. When the frame 121 is rotated, the light distribution unit 120 is brought into the second state (step SA3). That is, the drawing system 100 is in a state in which the first drawing device 1a is irradiated with the sub-pulse light having a relatively low light intensity from the light distribution unit 12A. Self-light distribution unitΗ The second drawing device 1b is irradiated with main pulse light having a relatively high light intensity. Then, the drawing system 100 performs drawing processing using the main pulse light in the second drawing device 1b (step SC3). The main pulse light is divided into a plurality of beams in the illumination optical system 3A, and then irradiated downward through the respective irradiation heads 4〇. The second drawing device 1b faces the main scanning direction and the field scanning direction. The surface of the upper surface of the substrate 9 is irradiated with pulse light (the main pulse light is divided into the divided lights of the plurality of beams) from the plurality of irradiation heads 4, whereby the substrate 9 held on the stage 1 of the second drawing device 1b can be held. The upper surface 'depicts a regular pattern for color filters. On the other hand, the drawing system 100 performs the drawing processing on the second drawing device 11 to carry out the substrate 9 on which the drawing process has been completed in the first drawing device 1a (step SB4). Specifically, the first drawing device 1a releases the fixing of the base plate 130516.doc -23· 200910015 on the platform 10, and the substrate 9 is carried out from the upper surface of the platform 10 by a specific transport mechanism (not shown). Thereafter, the drawing device performs the sub-pulse light processing (step SB5) and the sub-pulse light irradiated to the first tracing device 1a in the illumination optical system 30. After the beam, it is irradiated downward through each of the irradiation heads 4〇. In the first description, the device la-plane is moved below the plurality of illumination heads 4' to move the camera 51 in the sub-scanning direction, and the illumination light from each of the illumination heads 40 is taken by the camera 51. In addition, the device control (10) of the device 1 is used to analyze the image taken from the camera, and the laser power, the illumination width, the amount of change in the light intensity, the amount of the edge, and the absolute position of the illumination are obtained. The resource ff is followed by the device controller 60 controlling the drive mechanisms 41c, 42e, 42f, 42 § 'to make these parameters each close to the target value. Thereby, the irradiation state of the pulse light irradiated from the plurality of irradiation heads 40 can be corrected. After the correction processing in the first drawing device 1a is completed, the drawing system 1 搬 moves the new substrate 9 into the i-th drawing device u (step SB6). Specifically, the first drawing device 1a mounts the substrate 9 on the upper surface of the stage 1〇 by a specific transport mechanism (not shown), and adsorbs and fixes the substrate 9 on the upper surface of the stage 1〇. Further, the first drawing device 1a adjusts (aligns) the position and the inclination of the substrate 9 by operating the stage driving unit 2〇. Then, the drawing system 100 rotates the frame 121 by operating the ring motor 126, thereby causing the light distributing unit 12 to be in the first state (step SA4). In other words, the drawing system 100 is in a state in which the first drawing device 1a is irradiated with the main pulse light having a relatively high light intensity from the light distribution unit 120, and the second drawing device 1b is irradiated from the light distributing unit 130516.doc-24-200910015. A sub-pulse light having a relatively low light intensity. Then, the drawing system 100 performs drawing processing using the main pulse light in the first drawing device 1 & (step SB7). Further, the drawing device 1 carries out the drawing processing in the first greening device 1a, and carries out the drawing-processed substrate 9 in the second drawing device ratio (step SC4). Thus, the drawing system 1 divides the pulse light emitted from the laser oscillator 11A into main pulse light and sub-pulse light, and alternately distributes the main pulse light and the sub-pulse light to the first drawing device 1a and the 2 depicts device lb. Therefore, the drawing processing using the main pulse light and the correction processing using the sub-pulse light can be alternately performed in parallel in the two drawing devices ia, lb. Thereby, the operation rate of the laser oscillator 110 and the manufacturing efficiency of the substrate 9 can be improved. &lt;4. Modifications&gt; Although an embodiment of the present invention has been described above, the present invention is not limited to the above examples. The drawing system 1 is configured to distribute the main pulse light and the sub-pulse light to the two drawing devices 1a, 1b by rotating the light distributing unit 120. However, the main pulse light and the sub-pulse light may be distributed by other methods. For example, as shown in FIG. 10, two partial mirrors 131 and 132° having different reflectances may be selectively disposed on the optical path of the pulsed light emitted from the laser oscillator 11A. 131 transmits light having a light intensity equivalent to that of the main pulsed light and transmits light having a light intensity equivalent to that of the secondary pulsed light. Therefore, if the partial mirror 131 is disposed on the optical path of the laser oscillator 11, the reflected beam in the partial mirror 13 1 will be irradiated to the first drawing device 1 as the main pulse light, and the partial mirror will be transmitted through the partial mirror. The beam of 131 is irradiated to the second drawing device 1b as a sub-pulse light after being reflected in the mirror 14 130 130516.doc -25- 200910015. On the other hand, the partial mirror 132 reflects the light beam having a light intensity equivalent to that of the sub-pulse light, and causes the light intensity to be equivalent to that of the main pulse light. Therefore, if the partial mirror 132 is disposed on the optical path of the laser oscillator no, the reflected beam in the partial mirror 131 will illuminate the first drawing device 1 a as the sub-pulse light through the partial mirror 13 The light beam of 1 is reflected by the mirror 14A, and then irradiated to the second drawing device 1b as main pulse light. The switching of the partial mirrors 131, 132 can be realized by, for example, the switching mechanisms 133 to 135 shown in Figs. The switching mechanism 133 of FIGS. 11 and 12 is configured such that the state of the partial mirror 131 (the state of FIG. 2) and the laser are arranged on the optical path of the laser oscillator 110 by moving the partial mirrors 131 and 132 arranged up and down as a whole. The state of the partial mirror 132 (the state of FIG. 12) is arranged on the optical path of the oscillator 110 to be switched. The switching mechanism 134 of Fig. 13 has a turntable 134a that rotates about a specific central axis, and a partial mirror 131 and a partial mirror 132 are fixedly disposed in an upright position on the upper surface of the turntable 134a. The switching mechanism 134 is configured to rotate the turntable 134a to configure the partial mirror 131 on the optical path of the laser oscillator 11 (the sadness of FIG. 13) and the partial mirror on the optical path of the laser expander 110. The state of 132 (not shown) is switched. Further, the switching mechanism 135 of FIG. 14 has a rotating frame 135a. The rotating frame 135a has a specific inclination with respect to the optical path of the laser oscillator 11 and rotates around the central axis, and is formed in two through holes of the rotating frame, respectively. The entrance partial mirror 131 and the partial mirror 132. The switching mechanism 135 configures the state of the partial mirror 131 (the state of FIG. 14) and the laser oscillator on the optical path of the laser oscillator 11 by rotating the frame 135a. "The state in which the partial mirror 132 is disposed on the optical path of ο (not shown) is switched. Further, the drawing system 1 performs the correction processing every time before the drawing processing. However, it is not necessary to perform the correction processing every time, as needed. In addition, the respective drawing devices 1a and 1b of the drawing system may perform processing other than the correction processing using the sub-pulse light. For example, maintenance processing such as optical axis adjustment may be performed using the sub-pulse light. Although two drawing devices 1a and 1b are provided for the laser oscillator, the drawing device 1a and lb are provided, but three or more drawing devices 1 can be provided for the laser oscillator 11. Fig. 15 shows the relative i stage. The laser oscillator 11 is a diagram showing an example of three drawing systems 2a for drawing devices ia, ib, and ic. The drawing system 200 emits pulses from the laser oscillator by means of the light distributing portion 15 Light split into 1 beam of light a relatively high main pulse light and two sub-pulse lights of relatively low light intensity. Then, the system 2 is depicted to supply the main pulse light to three drawing devices ia, lb, 1 (; In this way, the three divided lights are distributed to the three drawing devices 1a, 1b, and 1c. Thus, the drawing processing on the substrate 9 can be sequentially performed in the three drawing devices 1a, 1b, and 1c, and the remaining two drawing devices can be used. The correction processing and the maintenance processing are performed in parallel. In the drawing system 200 of Fig. 15, the light intensity ratio β of the main pulse light and the two sub-pulse light may be, for example, 5%. Further, in the light distribution unit 1, The main pulse light and the two sub-pulse lights are divided into a ratio, and are mounted on the attenuators of the illumination optical system 3 at each drawing device la, lb, and lc, and the light intensity of the main pulse light or the sub-pulse light is finally reduced. In the above-described drawing systems 100 and 2, the laser oscillator 11 is used as a light source device, but LED (Light Emitting Diode) or LED (Light Emitting Diode) or Other illuminators such as mercury lamps are used as light source devices. The apparatus 1 irradiates a plurality of beams simultaneously on the upper surface of the substrate 9. However, the drawing device constituting the drawing system of the present invention is not limited to such a multi-head drawing device, and the upper surface of the substrate 9 may be irradiated with a beam of light. In the drawing device 1 described above, the glass substrate 9 for a color filter is used as a processing target. However, the substrate to be processed 9 may be another substrate such as a semiconductor substrate, a printed substrate, or a glass substrate for a plasma display device. Although the drawing systems 100 and 200 of the drawing device have been described, an equivalent configuration may be provided in one drawing device. In other words, it is also possible to arrange a light distribution unit for the main pulse light and the sub-pulse light for each of the drawing processing portions in one drawing device having a plurality of drawing processing units (platforms). In this way, in the drawing device, the drawing processing is sequentially performed in a plurality of drawing processing units, and the correction processing and the like are performed in parallel in the other drawing processing units. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a side view depicting a device. Figure 2 is a top plan view of the device. Fig. 3 is a view showing an example of light intensity distribution of pulsed light taken by a camera. Figure 4 is a block diagram showing the connection structure between various parts of the apparatus and the device controller. Figure 5 is a diagram showing the structure of the system. Fig. 6 is a schematic perspective view of a light distribution unit. 130516.doc -28- 200910015 Figure 7 is a cross-sectional view of the light distribution unit in the first state. Fig. 8 is a cross-sectional view showing the light distributing unit in the second state. Figure 9 is a flow chart showing the flow of the system operation. Fig. 1 is a diagram showing the structure of a drawing system of a modification. 11 is a view showing an example of a switching mechanism of two partial mirrors. FIG. 12 is a view showing an example of a switching mechanism of two partial mirrors. FIG. 13 is a view showing an example of a switching mechanism of two partial mirrors. FIG. 15 showing an example of a switching mechanism of two partial mirrors is a view showing a configuration of a drawing system of a modification. [Description of main component symbols] 1. la, lb, lc drawing device 9 substrate 10 platform 20 platform driving portion 21 rotating mechanism 21a linear motor 21b rotating shaft 22 support plate 23 sub-scanning mechanism 23a linear motor 23b guide portion 24 bottom plate 25 main scanning Mechanism 25a Linear motor 130516.doc 200910015 25b Guide 30 illumination optical system 40 illumination head 41 aperture unit 41a aperture 41b support portion 41c drive mechanism 42 projection optical system 42a, 42b zoom lens 42c, 42d focusing mirror 42e, 42f, 42g drive mechanism 50 Photographing unit 51 Camera 52 Moving mechanism 52a Guide rail 60 Device controller 70 Base station 80 Frame 100, 200 Drawing system 110 Laser oscillator 111 Laser controller 120 Light distribution unit 121 Frame 121a Injection unit 130516.doc -30- 200910015 121b 121c 122 123~125 126 126a 127 128 C&quot; 131, 132

133~135 134a 135a 140 150 A main pulse light exit window sub-pulse light exit window partial mirror mirror ring motor motor controller detection sensor distribution controller partial mirror switching mechanism turntable rotating frame mirror light distribution part incident light axis

130516.doc -31 -

Claims (1)

200910015, the scope of application for patents: 1. The description of the invention is characterized in that it includes a device for depicting a specific pattern by illuminating the substrate with a photosensitive material which is formed on the substrate, and includes: a light source; an eight-knife device for dividing light emitted from the light source into a plurality of force cuts, and distributing the plurality of split lights to a plurality of light paths; and a plurality of the drawing devices respectively configured The plurality of optical paths include: the plurality of divided lights include split light for beam drawing having higher light intensity than the other divided lights; and the distribution device sequentially distributes the divided light for drawing to the plurality of optical paths. 2. The drawing system of claim 1, wherein each of the plurality of drawing devices has a correction mechanism that corrects an illumination state of the light to the substrate by using the divided light other than the green divided light. 3. A drawing system, comprising: a device for drawing a specific pattern on a photosensitive material formed on a substrate by irradiating a substrate, and comprising: a light source; a knife matching device The light emitted from the above light source is divided into the light intensity higher! Dividing the second split light having a low light and light intensity, and assigning the first split light and the second split light to the two optical paths in the upper 130516.doc 200910015; and the two drawing devices are respectively arranged in the above Two optical paths: The distribution device alternately distributes the above-mentioned 丨#g U &lt;Le 1 knife first and the second divided light to the two optical paths. 4. The drawing system of claim 3, wherein the two drawing devices alternately perform drawing processing; and the distributing device provides the second divided light by a drawing device that performs a edge processing on the two drawing devices. The first divided light and the second divided light are distributed to the two optical paths. 5. The drawing system of claim 4, wherein each of the two drawing devices has a correction mechanism that corrects an illumination state of the light to the substrate by using the second divided light. 6. The drawing system according to any one of claims 3 to 5, wherein the distribution device comprises: a light dividing unit that divides light emitted from the light source into a parent to the optical axis and advances in opposite directions to each other. The second divided light and the second divided light; and a rotating mechanism that rotates the light dividing unit around the optical axis. 7. The drawing system according to any one of claims 3 to 5, wherein the dispensing device comprises: a first partial transmission mirror that reflects light having a light intensity corresponding to the second divided light and makes the light intensity equivalent The second split light is transmitted through 130516.doc 200910015; the second partial transmission mirror is configured to transmit light having a light intensity corresponding to the second split light and to reflect the light intensity corresponding to the second split light. ;and The arrangement mechanism selectively disposes the second partial transmission mirror and the second partial transmission mirror on an optical path of light emitted from the light source. a patterning crack, characterized in that it is a person who draws a specific pattern on a photosensitive material formed on a substrate by irradiating light onto the substrate, and includes: a light source; a distribution mechanism that emits light from the light source Dividing into a plurality of divided lights, and distributing the plurality of divided lights into a plurality of optical paths; and a plurality of drawing processing units respectively disposed on the plurality of optical paths; wherein the plurality of divided lights include higher light intensity than other segments The splitting light for drawing of the light is divided; the distributing means sequentially distributes the dividing light for drawing to the plurality of optical paths. 9_ A drawing device characterized in that it draws a specific pattern on a photosensitive material formed on a substrate by irradiating light onto the substrate, and includes: a light source; a distribution mechanism that splits the light emitted from the light source a first split light having a higher light intensity 130516.doc 200910015 and a second split light having a lower light intensity, and the first split light and the second split light are distributed to two optical paths; and two drawing processes The first portion is disposed on the two optical paths, and the distribution unit alternately distributes the second divided light and the second divided light to the two optical paths. 10. A rider 4 characterized in that a drawing process is sequentially performed in a plurality of tracing processing sections for drawing a specific pattern on a photosensitive material formed on a substrate by irradiating light onto a substrate. And including: a dividing step of dividing the light emitted from the specific light source into a plurality of divided lights; and a knife matching step of allocating the plurality of divided lights to the plurality of drawing processing units; In the above-described drawing, the divided light for drawing in which the light intensity of the divided light is higher than the other cut light is sequentially distributed to the plurality of drawing processing units. 130516.doc