TW200905018A - Apparatus for plating and method for controlling plating - Google Patents

Apparatus for plating and method for controlling plating Download PDF

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Publication number
TW200905018A
TW200905018A TW097115399A TW97115399A TW200905018A TW 200905018 A TW200905018 A TW 200905018A TW 097115399 A TW097115399 A TW 097115399A TW 97115399 A TW97115399 A TW 97115399A TW 200905018 A TW200905018 A TW 200905018A
Authority
TW
Taiwan
Prior art keywords
plating
plating solution
solution
amount
electroplating
Prior art date
Application number
TW097115399A
Other languages
English (en)
Chinese (zh)
Inventor
Fumito Shoji
Yoshio Kasai
Kazuhiro Murakami
Original Assignee
Toshiba Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Kk filed Critical Toshiba Kk
Publication of TW200905018A publication Critical patent/TW200905018A/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electrodes Of Semiconductors (AREA)
TW097115399A 2007-04-25 2008-04-25 Apparatus for plating and method for controlling plating TW200905018A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007115599A JP4940008B2 (ja) 2007-04-25 2007-04-25 めっき成膜装置および成膜制御方法

Publications (1)

Publication Number Publication Date
TW200905018A true TW200905018A (en) 2009-02-01

Family

ID=39938778

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097115399A TW200905018A (en) 2007-04-25 2008-04-25 Apparatus for plating and method for controlling plating

Country Status (3)

Country Link
US (1) US20080271989A1 (enExample)
JP (1) JP4940008B2 (enExample)
TW (1) TW200905018A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI413708B (zh) * 2010-08-20 2013-11-01 Zhen Ding Technology Co Ltd 電鍍裝置及電鍍方法
TWI479054B (zh) * 2010-10-27 2015-04-01 Tokyo Electron Ltd 電鍍處理裝置及電鍍處理方法以及記錄電鍍處理程式的記錄媒體

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5446126B2 (ja) * 2008-05-13 2014-03-19 富士通セミコンダクター株式会社 電解メッキ方法および半導体装置の製造方法
JP2012182169A (ja) * 2011-02-28 2012-09-20 Toshiba Corp 半導体装置の製造方法、半導体装置の製造装置および半導体装置
TW201251094A (en) * 2011-06-07 2012-12-16 Hon Hai Prec Ind Co Ltd Electrode of dye-sensitized solar cells manufacturing equipment
US9469913B2 (en) * 2013-12-05 2016-10-18 Applied Materials, Inc. Closed loop electrolyte analyzer
CN110218992A (zh) * 2019-05-08 2019-09-10 金驰 一种基于远程操控的钢材化学镀层系统及其工作方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5352350A (en) * 1992-02-14 1994-10-04 International Business Machines Corporation Method for controlling chemical species concentration
JP2720130B2 (ja) * 1992-03-17 1998-02-25 株式会社三井ハイテック 電気めっき用の電源装置
US5368715A (en) * 1993-02-23 1994-11-29 Enthone-Omi, Inc. Method and system for controlling plating bath parameters
US6267853B1 (en) * 1999-07-09 2001-07-31 Applied Materials, Inc. Electro-chemical deposition system
JP2001073200A (ja) * 1999-08-30 2001-03-21 Ebara Corp めっき液管理方法及び管理装置
US6458262B1 (en) * 2001-03-09 2002-10-01 Novellus Systems, Inc. Electroplating chemistry on-line monitoring and control system
JP3694001B2 (ja) * 2003-03-07 2005-09-14 松下電器産業株式会社 メッキ方法、半導体装置の製造方法およびメッキ装置
JP2006291289A (ja) * 2005-04-11 2006-10-26 Renesas Technology Corp 半導体装置の製造装置及び製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI413708B (zh) * 2010-08-20 2013-11-01 Zhen Ding Technology Co Ltd 電鍍裝置及電鍍方法
TWI479054B (zh) * 2010-10-27 2015-04-01 Tokyo Electron Ltd 電鍍處理裝置及電鍍處理方法以及記錄電鍍處理程式的記錄媒體

Also Published As

Publication number Publication date
JP4940008B2 (ja) 2012-05-30
US20080271989A1 (en) 2008-11-06
JP2008274313A (ja) 2008-11-13

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