TW200833467A - Friction sensor for polishing system - Google Patents
Friction sensor for polishing systemInfo
- Publication number
- TW200833467A TW200833467A TW096144337A TW96144337A TW200833467A TW 200833467 A TW200833467 A TW 200833467A TW 096144337 A TW096144337 A TW 096144337A TW 96144337 A TW96144337 A TW 96144337A TW 200833467 A TW200833467 A TW 200833467A
- Authority
- TW
- Taiwan
- Prior art keywords
- polishing
- substrate
- contacting member
- polishing system
- top surface
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N19/00—Investigating materials by mechanical methods
- G01N19/02—Measuring coefficient of friction between materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/013—Devices or means for detecting lapping completion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/16—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49764—Method of mechanical manufacture with testing or indicating
- Y10T29/49778—Method of mechanical manufacture with testing or indicating with aligning, guiding, or instruction
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49826—Assembling or joining
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49826—Assembling or joining
- Y10T29/49895—Associating parts by use of aligning means [e.g., use of a drift pin or a "fixture"]
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Automation & Control Theory (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/562,602 US7727049B2 (en) | 2003-10-31 | 2006-11-22 | Friction sensor for polishing system |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200833467A true TW200833467A (en) | 2008-08-16 |
Family
ID=39430571
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096144337A TW200833467A (en) | 2006-11-22 | 2007-11-22 | Friction sensor for polishing system |
Country Status (3)
Country | Link |
---|---|
US (3) | US7727049B2 (zh) |
TW (1) | TW200833467A (zh) |
WO (1) | WO2008064268A2 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI482966B (zh) * | 2011-03-10 | 2015-05-01 | Hon Hai Prec Ind Co Ltd | 測試裝置 |
TWI818319B (zh) * | 2020-09-25 | 2023-10-11 | 大陸商富聯裕展科技(深圳)有限公司 | 打磨裝置、方法、輔助打磨的裝置、系統及方法 |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101152747B1 (ko) * | 2003-10-31 | 2012-06-18 | 어플라이드 머티어리얼스, 인코포레이티드 | 마찰 센서를 이용한 폴리싱 종료점 탐지 시스템 및 방법 |
US7727049B2 (en) * | 2003-10-31 | 2010-06-01 | Applied Materials, Inc. | Friction sensor for polishing system |
US20080138988A1 (en) * | 2006-12-07 | 2008-06-12 | Jeffrey Drue David | Detection of clearance of polysilicon residue |
JP2008205464A (ja) * | 2007-02-20 | 2008-09-04 | Hitachi Chem Co Ltd | 半導体基板の研磨方法 |
US9131543B2 (en) * | 2007-08-30 | 2015-09-08 | Goji Limited | Dynamic impedance matching in RF resonator cavity |
US9134214B2 (en) * | 2008-02-29 | 2015-09-15 | Juozas Padgurskas | Device for measuring the influence of friction force on wear characteristics of a material surface with high frequency loading force |
US20110169520A1 (en) * | 2010-01-14 | 2011-07-14 | Mks Instruments, Inc. | Apparatus for measuring minority carrier lifetime and method for using the same |
US9358660B2 (en) | 2011-11-07 | 2016-06-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | Grinding wheel design with elongated teeth arrangement |
US9960088B2 (en) * | 2011-11-07 | 2018-05-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | End point detection in grinding |
CN103837468B (zh) * | 2014-02-27 | 2016-04-20 | 东北大学 | 一种检测端部摩擦效应及减摩材料性能的试验方法 |
JP6327958B2 (ja) * | 2014-06-03 | 2018-05-23 | 株式会社荏原製作所 | 研磨装置 |
JP6546845B2 (ja) * | 2015-12-18 | 2019-07-17 | 株式会社荏原製作所 | 研磨装置、制御方法及びプログラム |
US10875149B2 (en) * | 2017-03-30 | 2020-12-29 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus and method for timed dispensing various slurry components |
JP6989317B2 (ja) * | 2017-08-04 | 2022-01-05 | キオクシア株式会社 | 研磨装置、研磨方法、およびプログラム |
KR20200108098A (ko) * | 2018-02-05 | 2020-09-16 | 어플라이드 머티어리얼스, 인코포레이티드 | 3d 프린트된 cmp 패드들을 위한 압전 엔드포인팅 |
US11701749B2 (en) * | 2018-03-13 | 2023-07-18 | Applied Materials, Inc. | Monitoring of vibrations during chemical mechanical polishing |
WO2020046502A1 (en) | 2018-08-31 | 2020-03-05 | Applied Materials, Inc. | Polishing system with capacitive shear sensor |
JP7155035B2 (ja) * | 2019-02-18 | 2022-10-18 | 株式会社荏原製作所 | 研磨装置および研磨方法 |
CN110281151A (zh) * | 2019-08-16 | 2019-09-27 | 龙泉越来自动化技术有限公司 | 一种磨砂盘自动变速的打磨装置 |
WO2022186993A1 (en) | 2021-03-03 | 2022-09-09 | Applied Materials, Inc. | Motor torque endpoint during polishing with spatial resolution |
Family Cites Families (43)
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JPS63191550A (ja) | 1987-01-30 | 1988-08-09 | Okuma Mach Works Ltd | 摺動面の摩擦抵抗検出センサ |
US5036015A (en) | 1990-09-24 | 1991-07-30 | Micron Technology, Inc. | Method of endpoint detection during chemical/mechanical planarization of semiconductor wafers |
US5069002A (en) | 1991-04-17 | 1991-12-03 | Micron Technology, Inc. | Apparatus for endpoint detection during mechanical planarization of semiconductor wafers |
US5445996A (en) | 1992-05-26 | 1995-08-29 | Kabushiki Kaisha Toshiba | Method for planarizing a semiconductor device having a amorphous layer |
US5700180A (en) | 1993-08-25 | 1997-12-23 | Micron Technology, Inc. | System for real-time control of semiconductor wafer polishing |
US5486129A (en) | 1993-08-25 | 1996-01-23 | Micron Technology, Inc. | System and method for real-time control of semiconductor a wafer polishing, and a polishing head |
JP3740702B2 (ja) | 1994-02-25 | 2006-02-01 | 旭硝子株式会社 | 破損検出手段付き研磨装置 |
JP3637977B2 (ja) | 1995-01-19 | 2005-04-13 | 株式会社荏原製作所 | ポリッシングの終点検知方法 |
US5623096A (en) | 1995-06-19 | 1997-04-22 | The United States Of America As Represented By The Secretary Of The Navy | Orthogonal shear stress measurement probe assembly for boundary layer flow |
JPH0970751A (ja) | 1995-09-06 | 1997-03-18 | Ebara Corp | ポリッシング装置 |
JP3649493B2 (ja) | 1995-11-02 | 2005-05-18 | 株式会社荏原製作所 | ポリッシングの終点決定方法及び装置 |
US5743784A (en) | 1995-12-19 | 1998-04-28 | Applied Materials, Inc. | Apparatus and method to determine the coefficient of friction of a chemical mechanical polishing pad during a pad conditioning process and to use it to control the process |
US5738562A (en) | 1996-01-24 | 1998-04-14 | Micron Technology, Inc. | Apparatus and method for planar end-point detection during chemical-mechanical polishing |
US5647952A (en) | 1996-04-01 | 1997-07-15 | Industrial Technology Research Institute | Chemical/mechanical polish (CMP) endpoint method |
US5846882A (en) | 1996-10-03 | 1998-12-08 | Applied Materials, Inc. | Endpoint detector for a chemical mechanical polishing system |
JPH10256209A (ja) | 1997-03-17 | 1998-09-25 | Toshiba Corp | 研磨装置 |
JP2842865B1 (ja) | 1997-08-22 | 1999-01-06 | 九州日本電気株式会社 | 研磨装置 |
JPH1187286A (ja) | 1997-09-05 | 1999-03-30 | Lsi Logic Corp | 半導体ウエハの二段階式化学的機械的研磨方法及び装置 |
JP2000052233A (ja) * | 1998-08-10 | 2000-02-22 | Sony Corp | 研磨装置 |
JP3999886B2 (ja) | 1998-08-21 | 2007-10-31 | 富士通株式会社 | 摩擦係数測定方法および磁気ディスク装置用ヘッドスライダ |
US6046111A (en) | 1998-09-02 | 2000-04-04 | Micron Technology, Inc. | Method and apparatus for endpointing mechanical and chemical-mechanical planarization of microelectronic substrates |
US6191037B1 (en) | 1998-09-03 | 2001-02-20 | Micron Technology, Inc. | Methods, apparatuses and substrate assembly structures for fabricating microelectronic components using mechanical and chemical-mechanical planarization processes |
JP4484370B2 (ja) | 1998-11-02 | 2010-06-16 | アプライド マテリアルズ インコーポレイテッド | 基板上のメタル層の化学機械研磨に関して終点を決定するための方法及び基板のメタル層を研磨するための装置 |
US6283829B1 (en) | 1998-11-06 | 2001-09-04 | Beaver Creek Concepts, Inc | In situ friction detector method for finishing semiconductor wafers |
US6283828B1 (en) | 1998-11-09 | 2001-09-04 | Tokyo Seimitsu Co., Ltd. | Wafer polishing apparatus |
JP3731411B2 (ja) | 1998-11-09 | 2006-01-05 | 株式会社東京精密 | ウェーハ研磨装置 |
JP2000348397A (ja) * | 1999-03-29 | 2000-12-15 | Tdk Corp | 情報媒体、情報再生方法および情報再生装置 |
US6623334B1 (en) | 1999-05-05 | 2003-09-23 | Applied Materials, Inc. | Chemical mechanical polishing with friction-based control |
US6306008B1 (en) | 1999-08-31 | 2001-10-23 | Micron Technology, Inc. | Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
US6206754B1 (en) | 1999-08-31 | 2001-03-27 | Micron Technology, Inc. | Endpoint detection apparatus, planarizing machines with endpointing apparatus, and endpointing methods for mechanical or chemical-mechanical planarization of microelectronic substrate assemblies |
US6492273B1 (en) | 1999-08-31 | 2002-12-10 | Micron Technology, Inc. | Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies |
JP4476398B2 (ja) | 1999-11-02 | 2010-06-09 | 三菱マテリアル株式会社 | ウェーハ研磨装置及び研磨状態検出方法 |
JP2001096455A (ja) * | 1999-09-28 | 2001-04-10 | Ebara Corp | 研磨装置 |
JP3506114B2 (ja) | 2000-01-25 | 2004-03-15 | 株式会社ニコン | モニタ装置及びこのモニタ装置を具えた研磨装置及び研磨方法 |
US6485354B1 (en) | 2000-06-09 | 2002-11-26 | Strasbaugh | Polishing pad with built-in optical sensor |
US6520834B1 (en) | 2000-08-09 | 2003-02-18 | Micron Technology, Inc. | Methods and apparatuses for analyzing and controlling performance parameters in mechanical and chemical-mechanical planarization of microelectronic substrates |
US6572444B1 (en) * | 2000-08-31 | 2003-06-03 | Micron Technology, Inc. | Apparatus and methods of automated wafer-grinding using grinding surface position monitoring |
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US6494765B2 (en) | 2000-09-25 | 2002-12-17 | Center For Tribology, Inc. | Method and apparatus for controlled polishing |
JP4051872B2 (ja) * | 2000-09-29 | 2008-02-27 | 株式会社ジェイテクト | 加工部の測定方法及び加工方法 |
US20020090889A1 (en) | 2001-01-10 | 2002-07-11 | Crevasse Annette M. | Apparatus and method of determining an endpoint during a chemical-mechanical polishing process |
KR101152747B1 (ko) * | 2003-10-31 | 2012-06-18 | 어플라이드 머티어리얼스, 인코포레이티드 | 마찰 센서를 이용한 폴리싱 종료점 탐지 시스템 및 방법 |
US7727049B2 (en) * | 2003-10-31 | 2010-06-01 | Applied Materials, Inc. | Friction sensor for polishing system |
-
2006
- 2006-11-22 US US11/562,602 patent/US7727049B2/en not_active Expired - Fee Related
-
2007
- 2007-11-20 WO PCT/US2007/085305 patent/WO2008064268A2/en active Application Filing
- 2007-11-22 TW TW096144337A patent/TW200833467A/zh unknown
-
2009
- 2009-04-30 US US12/433,433 patent/US8342906B2/en active Active
-
2012
- 2012-12-13 US US13/714,202 patent/US8758086B2/en active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI482966B (zh) * | 2011-03-10 | 2015-05-01 | Hon Hai Prec Ind Co Ltd | 測試裝置 |
TWI818319B (zh) * | 2020-09-25 | 2023-10-11 | 大陸商富聯裕展科技(深圳)有限公司 | 打磨裝置、方法、輔助打磨的裝置、系統及方法 |
Also Published As
Publication number | Publication date |
---|---|
US7727049B2 (en) | 2010-06-01 |
US8342906B2 (en) | 2013-01-01 |
US8758086B2 (en) | 2014-06-24 |
US20130167614A1 (en) | 2013-07-04 |
WO2008064268A2 (en) | 2008-05-29 |
US20070087662A1 (en) | 2007-04-19 |
WO2008064268A3 (en) | 2008-09-04 |
US20090253351A1 (en) | 2009-10-08 |
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