TW200829338A - Apparatus for jetting fluid - Google Patents

Apparatus for jetting fluid Download PDF

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Publication number
TW200829338A
TW200829338A TW096142825A TW96142825A TW200829338A TW 200829338 A TW200829338 A TW 200829338A TW 096142825 A TW096142825 A TW 096142825A TW 96142825 A TW96142825 A TW 96142825A TW 200829338 A TW200829338 A TW 200829338A
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Taiwan
Prior art keywords
fluid
substrate
nozzle
jetting
transmission mechanism
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TW096142825A
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Chinese (zh)
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TWI387488B (en
Inventor
Hyun-Ho Son
Chul-Sik Kim
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Dms Co Ltd
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Publication of TWI387488B publication Critical patent/TWI387488B/en

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B3/00Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements
    • B05B3/02Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements
    • B05B3/10Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements discharging over substantially the whole periphery of the rotating member, i.e. the spraying being effected by centrifugal forces
    • B05B3/1035Driving means; Parts thereof, e.g. turbine, shaft, bearings

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spray Control Apparatus (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)

Abstract

The present invention discloses a fluid jetting apparatus that jets an etchant fluid or a stripping fluid toward a substrate in an etching operation or a strip operation of a manufacturing process of the substrate for a flat display panel. The fluid jetting apparatus comprises an operation tank defining an operation space; nozzle for jetting a fluid; multiple jetting tubes arranged in a spaced manner inside the operation space; a power transmission mechanism that is coupled to the jetting tubes and causes change of a jetting angle of the nozzles by means of motions of link bars; and a driving source that generates power to allow the power transmission mechanism to induce the motions of the link bars.

Description

200829338 九、發明說明: 【發明所屬之技術領域】 本發明涉及一種流體喷射裝置,尤其涉及一種適用於 利用噴射流體而製造平板顯示面板基板之技術(etching、 stdp )中的流體喷射裝置,特別是基於喷嘴擺動() 動作的可變式喷射方式,而均勻供給流體之流體喷射裝 置。 【先前技術】 LCD等液晶顯示裝置一般利用隨著基於電信號之施加 電壓而發生變化的液晶透射率來顯示影像信號,該液晶顯 不裝置一般包括背光模組、液晶顯示面板及外殼。 該液晶顯示面板使用具有多層結構的功能性薄膜的基 板。該基板藉由薄膜蒸鏟製程、照相平版印刷製程、以及 姓^及剝離製程*製造。其中,該照相平版印刷製程則對 鍵=進行曝光及顯影作業後形成光刻膠掩膜(Phcnc>rrkask) 圖案’該㈣及剝離製程則用於在基板上形成真正的薄膜 在^該製程中,_及剝離製程為直接將具有預 向基板噴射C 基板上的製程,該製程則採用 /、、 次或剥離液等流體的公知方式。 /Λ ΰ亥蝕刻製程藉由蝕刻液的化學反應作用而/ Α 板上留下蔆聪从、 J υ子久愚TF用而在基 ._ 4ϊ 、的必要部分,並選擇性地去除不必要1八· 而該剝離芻招即^ a ’丁 r I砟分, 、^用剝離液去除蝕刻製程後殘留在基板蝕 5 200829338 刻層上的光刻膠掩膜β 因此,該蝕刻及剝離製程則在具有用於喷射蝕刻液或 剝離液等流體的喷射裝置(喷射管及嘴嘴)的作業槽内進 行。其中,該噴射裝置的噴嘴位置或噴射角度對基板的餘 刻及剝離品質産生較大的影響。 _但是,絕大部分的喷射裝置採用的是固定噴嘴喷射流 體:方式。這種結構在進行基板製造製程中蝕刻或剝離: 馨 業時存在以下缺點。 ^首先,向基板噴射流體時,會使流體集中供給到各噴 嘴的噴射角度所覆蓋的區域中。 因此,在對基板進行蝕刻或剝離作業時,難以對基板 的整個表面均勻噴射流體,因此在餘刻或剝離作業後會産 生過多的不良品。 例如,若對基板的整個表面噴射的流體不均勻,則會 使基板的钱刻面呈不規則狀,或者難以從基板的整個表: φ 順利去除殘留的光刻膠。 +而且’在該©定喷嘴之相隔酉己置狀態,會導致相鄰 貝為的噴射角度在基板上重疊的區域中供給過多流體的 象。 因此,如果利用該固定式噴射裝置對基板進行蝕刻或 j離作t,則由於流體的供給不肖句,㈣以獲得令人滿 意的作業及生産效率。 【發明内容】 6 200829338 u鑒於現有技術中所存在的上述問題,本發明提供一種 可對基板的整個表面上均勻供給流體的流體噴射裝置。該 裝置通過噴嘴擺動動作,而實現可變式喷射方式。 ^ 爲了貫現上述目的,本發明採取以下技術手段。本發 明的流體噴射裝置包括:具有作業空間的作業槽,·具有用又 2噴射流體的喷嘴且相隔配置在該作業空間的多個噴射 吕,與该噴射官相連接且藉由連桿運動使該喷嘴的噴射姿 Φ =發生變化的動力傳遞機構;爲使該動力傳遞機構進行連 桿運動而產生動力的驅動源。 本發明的流體噴射裝置具備能夠在基板的製造技術中 如钱刻或剝離等需要喷麗流體之製程中,向基板的某一個 表面的全部區域均勻喷射流體的機構,因此,可進一 高作業效率。 乂长 一特別是,該機構可使喷嘴在橫越基板的輸送方向 2文勢’並産生連續的擺動動作,從而藉由可變噴射方 射流體,因而,解決現有技術中利用固定噴嘴二 疋式貝射方式所導致的品質問題。 l貫施方式】 以下,參照附圖說明本發明的較佳具體實施例,並在 :領域的技術人員能夠容易實施本發明的範圍内進行說 =由於本發明的具體實施例可以用多種形式加以實施°, 例,本發明的申請專利範圍並不局限於下述具體實施 7 200829338 圖1疋本發明的一具體實施例所涉及的流體喷射裝置 的整體結構示意圖。圖中元件符號2表示作業槽。、 、該作業槽2由常規結構構成,其内部具有作業空間s, 可進行用於製造平柄顯千哭、 制4 面板基板G(以下稱爲基板) 衣程争的钱刻(etehing)或剝離(stHp)作業。 該作業槽2的内部設有用於輸送基板G的輸送裝置4。 置4採用包括多個輸送輥規結構的親 同式輸機。 該輸送農置4,可】g彳两a # ^過㊅規方法從電機(未圖示)接 收動力以使該輸送親R旌產轰 疋轉’亚猎此從該作業空間s的左 側向右側輸送基板G (以圖1爲基準時)。 該基板G在其接受餘刻或剝離處理的某一個被處理面 G1朝上的狀態下,按昭 …、女圖1所不方式沿著該輸送裝置4 移動。 具體實施例所涉及的流體喷射裝 的内部贺射流體w的多個噴射管BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a fluid ejection device, and more particularly to a fluid ejection device suitable for use in a technique for manufacturing a flat panel display panel substrate using an ejection fluid (etching, stdp), particularly A fluid ejection device that uniformly supplies a fluid based on a variable injection mode of nozzle swing () operation. [Prior Art] A liquid crystal display device such as an LCD generally displays a video signal by a liquid crystal transmittance which changes in accordance with an applied voltage based on an electric signal. The liquid crystal display device generally includes a backlight module, a liquid crystal display panel, and a casing. The liquid crystal display panel uses a substrate of a functional film having a multilayer structure. The substrate is manufactured by a film shovel process, a photolithography process, and a surname & stripping process*. Wherein, the photolithography process forms a photoresist mask (Phcnc>rrkask) pattern after the key=exposure and development operation, and the stripping process is used to form a real film on the substrate. The _ and the stripping process are processes in which the substrate is directly ejected onto the C substrate, and the process is carried out in a known manner using a fluid such as /, or a stripping solution. /Λ ΰ 蚀刻 etch process by the chemical reaction of the etchant / Α 留下 菱 菱 菱 、 、 、 、 、 TF TF TF TF TF TF TF TF TF TF TF TF TF TF TF TF TF TF TF TF TF TF 1 八 · The stripping 刍 即 ^ ^ ^ r r I 砟 、 、 ^ 用 用 用 用 用 用 用 用 用 用 用 用 用 用 用 用 用 用 用 用 用 用 用 用 用 用 用 用 用 光刻 光刻 光刻 光刻 光刻 光刻 光刻 光刻 光刻 光刻 光刻 光刻 光刻This is carried out in a working tank having an injection device (ejection tube and nozzle) for ejecting a fluid such as an etching liquid or a peeling liquid. Among them, the nozzle position or the ejection angle of the ejection device has a large influence on the residual and peeling quality of the substrate. _ However, most of the injection devices use a fixed nozzle jet fluid: mode. This structure has the following disadvantages in etching or peeling during the substrate manufacturing process: ^ First, when a fluid is ejected to a substrate, the fluid is concentratedly supplied to a region covered by the ejection angle of each nozzle. Therefore, when the substrate is etched or peeled off, it is difficult to uniformly eject the entire surface of the substrate, so that excessive defects are generated after the remaining or peeling operation. For example, if the fluid ejected on the entire surface of the substrate is not uniform, the money facet of the substrate may be irregular, or it may be difficult to smoothly remove the residual photoresist from the entire surface of the substrate: φ. + and the state in which the respective nozzles are separated from each other causes the adjacent ejection angle to supply an image of excessive fluid in a region overlapping on the substrate. Therefore, if the substrate is etched or separated by t using the fixed ejection device, the supply of the fluid is not ambiguous, and (4) satisfactory work and production efficiency are obtained. SUMMARY OF THE INVENTION 6 200829338 In view of the above problems in the prior art, the present invention provides a fluid ejecting apparatus which can uniformly supply a fluid to the entire surface of a substrate. The device is oscillated by a nozzle to realize a variable injection mode. In order to achieve the above object, the present invention adopts the following technical means. The fluid ejecting apparatus of the present invention comprises: a working tank having a working space, a nozzle having two nozzles for ejecting fluid, and a plurality of jets arranged in the working space, connected to the jetting officer and being moved by the link The injection posture of the nozzle Φ = a power transmission mechanism that changes, and a drive source that generates power for causing the power transmission mechanism to perform a link motion. The fluid ejecting apparatus according to the present invention is provided with a mechanism capable of uniformly ejecting a fluid to all areas of one surface of a substrate in a process of manufacturing a substrate, such as money cutting or peeling, etc., so that a high working efficiency can be achieved. . In particular, the mechanism can make the nozzle traverse the conveying direction of the substrate 2 and generate a continuous oscillating motion, thereby utilizing the variable injection of the ejector fluid, thereby solving the prior art using the fixed nozzle 疋Quality problems caused by the way of shelling. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings, and can be easily made by those skilled in the art within the scope of the present invention. The embodiment of the present invention is not limited to the following specific embodiment 7 200829338. Fig. 1 is a schematic view showing the overall structure of a fluid ejecting apparatus according to an embodiment of the present invention. The symbol 2 in the figure indicates a work slot. The working tank 2 is composed of a conventional structure, and has a working space s therein, and can be used for manufacturing an etehing for making a flat handle, a four-plate substrate G (hereinafter referred to as a substrate), or Stripping (stHp) work. A conveying device 4 for conveying the substrate G is provided inside the working tank 2. Set 4 uses a similar conveyor that includes multiple conveyor roller gauge configurations. The transporting farm 4 can be used to receive power from a motor (not shown) to make the transport pro-R旌 疋 ' 亚 亚 亚 此 从 从 from the left side of the working space s The substrate G is transported on the right side (when based on FIG. 1). The substrate G is moved along the transporting device 4 in a state in which the one of the processed surfaces G1 that have undergone the residual or peeling treatment is facing upward. A plurality of injection tubes of the internal white fluid w of the fluid ejection device according to the specific embodiment

另外’該本發明的一 置包括用於在該作業槽2 P。 個分別具有一個以上噴嘴N, P位於該作業空間S中該輸送裝 該多個噴射管p中每 且如圖1所不’該噴射管 置4的上方。 如圖2所示, 地點相隔一定距離 示方式進行排列。 忒噴射官p在基板G輸送區的前後兩處 ,並在基板G的移動方向上按照圖中所 這種結構與該噴射管 P例如以橫越基板 G移動方方之 8 200829338 狀L而進订配置的結構(未圖示)相比,即使在基板〇的 輸运過程中發生時間差,也可在最大限度内減少流體臂在 基板G上之分佈不均勻現象。 邊噴射官P,其内部具有流體流動通道,並且如圖3 所示,與供給管L相連接。 而且,該供給管L與裝有流體W的儲存槽T相連接, 桅而使彳于用於常規蝕刻或剝離作業的流體w從該儲存槽 魯 τ供給到該噴射管P。 该贺嘴Ν在與該噴射管ρ的内部通道連通的狀態下結 合在,射管Ρ的外表面,從而以預定壓力喷射供給到該喷 射管Ρ的流體W。 、 如圖2所示,一個以上的噴嘴Ν結合於各該喷射管ρ 上:且以呈“之,,字型排列。該喷嘴Ν以可向沿該輸送裝置 4移動的基板G上面喷射流體w的狀態下位在該作業空Further, a portion of the invention includes for use in the work slot 2 P. There are one or more nozzles N, P respectively located in the working space S, which are transported in the plurality of injection pipes p and are not above the injection pipe 4 as shown in Fig. 1. As shown in Figure 2, the locations are arranged at a distance. The jetting officer p is in front of and behind the substrate G transporting zone, and moves in the moving direction of the substrate G according to the structure shown in the drawing and the jetting pipe P, for example, by moving across the substrate G. Compared with the configuration (not shown) of the configuration, even if a time difference occurs during the transport of the substrate, the uneven distribution of the fluid arms on the substrate G can be minimized. The side jetting officer P has a fluid flow path inside and is connected to the supply pipe L as shown in FIG. Further, the supply pipe L is connected to the storage tank T containing the fluid W, so that the fluid w for the conventional etching or peeling operation is supplied from the storage tank τ to the injection pipe P. The mouthpiece is coupled to the outer surface of the nozzle tube in a state of being communicated with the inner passage of the injection pipe ρ, thereby ejecting the fluid W supplied to the nozzle tube at a predetermined pressure. As shown in FIG. 2, more than one nozzle Ν is coupled to each of the spray tubes ρ: and arranged in a zigzag pattern. The nozzle 喷射 is capable of ejecting a fluid onto the substrate G moving along the transport device 4. The status of w is in the empty position of the job.

S内部。 工B • 雖然未圖示,結合於該噴射管P的噴嘴N具有能夠以 輻射狀喷灑流體w的噴嘴孔。 如圖1所示,該多個喷射管P的兩端分別插入並固定 於设置在該作業槽2内部的支架6之支承孔Η内,使得喷 射管Ρ可以以其中心軸線爲基準而旋轉。 、 各該支架6,其一端分別固定於該作業空間s上方, 從而將各喷射管P以水平懸掛於該作業空間s上方的狀態 進行固定及支承。 & 而且,如圖4所示,該支承孔H内可進一步安裝有轴 9 200829338 承8 〇 該轴承8可使用常規的徑向軸承(radial bearing), 其用於支承該噴射管中被插入的端部,以使該噴射管P的 旋轉更爲順利。 ^各該噴射管p在該作業空間s内部以其兩端分別插入 該支架6的狀態下獲得固定及支承,並且以其軸線爲基準 而旋轉。 本發明的一具體實施例所涉及的該流體噴射裝置包括 動力傳遞機構10。 ^邊動力傳遞機構10可傳遞動力,以使該多個噴射管P 藉由連桿運動以其中心軸線爲基準而旋轉。 θ爲此’如圖5所示,本具體實施例中設置有藉由該連 才干14而與各該噴射f ?的—端相連接的移動桿從而 藉由該連桿丨4和移動桿12的連桿運動而傳遞動力。S internal. B: Although not shown, the nozzle N coupled to the injection pipe P has a nozzle hole capable of spraying the fluid w in a radial manner. As shown in Fig. 1, both ends of the plurality of injection pipes P are inserted and fixed in the support holes of the bracket 6 provided inside the work tank 2, so that the injection pipe can be rotated with reference to the center axis thereof. Each of the brackets 6 has one end fixed to the upper side of the working space s, and the respective injection pipes P are fixed and supported in a state of being horizontally suspended above the working space s. And, as shown in FIG. 4, the support hole H may be further mounted with a shaft 9 200829338. The bearing 8 may use a conventional radial bearing for supporting the injection tube to be inserted therein. The end portion makes the rotation of the spray pipe P smoother. Each of the injection pipes p is fixed and supported in the working space s with its both ends inserted into the holder 6, and is rotated about its axis. The fluid ejection device according to an embodiment of the present invention includes a power transmission mechanism 10. The side power transmission mechanism 10 can transmit power to rotate the plurality of injection pipes P by the movement of the link with reference to the center axis thereof. θ is such that, as shown in FIG. 5, in the present embodiment, a moving rod connected to the end of each of the jets f? by the connector 14 is provided by the link 丨4 and the moving rod 12 The connecting rod moves to transmit power.

該移動桿12在該作業槽2中,橫越^置在於該基板G 的輸送區域中前後配置的噴射管p之間。 而且,該連桿14的一端與該移動桿12鉸接,另一端 與該噴射管P的一端固定連接。 士以圖6爲基準,在該移動桿12進行左右方向往返運動 ',該連桿14的連接㈣發生變化,從而進行連桿運動。 黑X動力傳遞機構10則藉由該連桿運動而使該每個喷射 官p以其中心爲基準而旋轉。 、 本么月之/、體貝施例所涉及的該流體噴射裝置包括 驅動源M,其産生能夠驅使該動力傳遞機構1〇進行連桿 200829338 運動的動力。 $ β動源Μ可使用常規的電機,並且如 了把動力傳遞到該 口 3所不,爲 的某-端相、查社 動源M與該移動桿12 、如。連接並設置在該作業槽2的外侧。 件18如圖二所示’該驅動源ΜΊ5Γ藉由旋轉盤16和聯” 件 而向該移動桿12傳遞動力。 、、°°Ρ 該联it盤16的中心與該驅動源Μ的電機軸相連,而 外…牛18的—端則固定連接於 的位置處。 -皿16中心 的一該聯結部件18的另—端固定連接在該移動桿12 接頭::1、广件18可使用能夠改變連接角度之常規的萬向 M_UmVei"SaljQint),其兩端分別與該旋轉盤16和兮 矛夕動桿1 2鉸接。 落 、為P結部件18用於變換該旋轉盤16和該移動桿u 連接角度,從而順利傳遞動力。 、 亥疑轉盤16起到偏心盤作用,其根據該驅動源μ 生的紋軺動力’以其中心爲基準而旋轉,從而向一 白推拉該聯結部件1 8的一端。 亦即,以圖6爲基準,當該驅動源Μ驅動 藉由該聯結部件18的推拉力,而向左右方向進= 定位移之往返運動。 ^ +而且%上述’當該移動桿12進行直線往返運動時, 5亥育射管P藉由該連桿14的連桿運動而接收動力,從而 11 200829338 义/、中〜軸線馬基準而左右轉動, π L 如圖7所示般。 因此,該噴嘴N可藉由今疮 J糟由该貰射管ρ的 的可變角度Α範圍内改變其姿墊,、 , ^ ’、 ,U完成連續擺動動作。 ^ ^ ^ ▼射官P的多個喷嘴N的 擺動動作所貫現的可變式喰鉍古 貝耵万式,而對該作業空間S中 所移動的基板G上表面進行_或制離作業。 這^變式噴射結構可解決利用具有多個固定喷嘴的 現有嘴射^進行㈣或_作業時,由於流體w對基板 G的育射里不均勻而引起的諸多問題。 而且,根據基板G的尺寸或作堂 飞作業%境,可適當調節該 喷嘴N的可變喷射角度a,並在办你&丁 & 長此狀悲下進行喷射作業, 因此可進一步提高作業相容性。 另外,根據該移動桿12的允X必去,扣 的彺返移動間距,可適當調節 該噴嘴N的可變角度A。 例如,如果該移動# 12@往返移動間距設定得較長, 該喷嘴N可變角度A就變大,反之亦然。 另外’該移動桿12的移動間距可藉由連接該聯結部件 18的一端與該旋轉盤16而以調節偏心距離等方式而加以 改變。 上述内容中以驅動源馗採用電機並藉由該電機的旋轉 動力來使該動力傳遞機構10進行連桿運動的方式係為進 行說明之例示,並把這種結構表現在圖中,但本發明並不 局限於此。 例如,如圖8所示,該驅動源M1也可使用常規的氣 12 200829338 叙。 …亦即’本發明也可以按照圖8所示方式連接氣紅的活 基桿及該動力傳遞機構1G之移動桿12的—端,從而,藉 由驅動氣缸而實現連桿運動。 曰 這種動力傳遞方式直接連接氣缸的活塞桿,從而直接 把直線移動動力傳遞到動力傳遞機構1 0。 另外’雖然未圖示,除了電機或氣缸以外,還可以使 用能夠滿足本發明目的的各種動力産生裝置。 【圖式簡單說明】 圖1是本發明的流體喷射裝置的整體結構示意圖。 圖2是用以說明本發明流體喷射裝置的噴射管排列狀 態的示意圖。 圖3是圖1所示流體喷射裝置的侧剖視圖。 圖4是用以說明本發明流體喷射裝置的噴射管固定狀 態的示意圖。 圖5是用以說明本發明流體喷射裝置的動力傳遞機構 結構的示意圖。 圖6是用以說明圖5所示動力傳遞機構作用之示意圖。 圖7是用以說明在圖5所示動力傳遞機構作用下喷射 管擺動狀態的示意圖。 圖8是用以說明本發明流體噴射裝置之驅動源的另— 具體實施例之示意圖。 13 200829338In the working tank 2, the moving rod 12 is placed between the injection pipes p disposed in the front and rear of the conveyance region of the substrate G. Further, one end of the link 14 is hinged to the moving rod 12, and the other end is fixedly coupled to one end of the injection pipe P. With reference to Fig. 6, the moving rod 12 is reciprocated in the right and left direction, and the connection (four) of the link 14 is changed to perform the link motion. The black X power transmission mechanism 10 rotates the respective sprayers p based on the center thereof by the movement of the link. The fluid ejection device involved in the present embodiment of the present invention includes a drive source M that generates power that can drive the power transmission mechanism 1 to perform the movement of the link 200829338. The $β source can use a conventional motor, and if the power is transmitted to the port 3, it is a certain end phase, the source M and the moving rod 12, for example. Connected and disposed outside the working tank 2. As shown in FIG. 2, the drive source ΜΊ5Γ transmits power to the moving rod 12 by rotating the disk 16 and the joint. The center of the joint disk 16 and the motor shaft of the drive source Μ Connected, and the outer end of the cow 18 is fixedly connected to the position. - The other end of the coupling member 18 at the center of the dish 16 is fixedly connected to the moving rod 12 joint: 1:, the wide piece 18 can be used A conventional universal M_UmVei"SaljQint) for changing the connection angle is respectively hinged at both ends to the rotary disk 16 and the ramming rod 1 2. The falling, P-junction member 18 is used to transform the rotary disk 16 and the moving rod. u connects the angle to smoothly transmit the power. The suspicion turntable 16 functions as an eccentric disk, and rotates according to the center of the crease power of the drive source, thereby pushing and pulling the coupling member to a white That is, with reference to Fig. 6, when the driving source Μ drives the pushing and pulling force of the coupling member 18, the reciprocating motion of the displacement is made to the left and right direction. ^ + and % of the above 12 when performing a linear reciprocating motion, the 5 ray ray tube P is used by the connecting rod The link of 14 is moved to receive the power, so that 11 200829338 is converted to the left and right by the reference axis, and the π L is as shown in Fig. 7. Therefore, the nozzle N can be broken by the sputum tube The variable angle of ρ changes its position cushion, , , ^ ', , U completes the continuous swing motion. ^ ^ ^ ▼ The variable motion of the multiple nozzles N of the shot officer P The Gubei 耵 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , During the operation, there are many problems caused by unevenness in the growth of the substrate G by the fluid w. Further, depending on the size of the substrate G or the % of the operation, the variable injection angle a of the nozzle N can be appropriately adjusted, and In the case of doing this, you can carry out the spraying operation, so that the work compatibility can be further improved. In addition, according to the allowable X of the moving rod 12, the returning movement distance of the buckle can be appropriately adjusted. The variable angle A of the nozzle N. For example, if the move #12@round The moving pitch is set longer, the nozzle N variable angle A becomes larger, and vice versa. In addition, the moving pitch of the moving rod 12 can be adjusted by eccentrically connecting one end of the coupling member 18 with the rotating disk 16. The distance is changed by the manner of the distance. In the above description, the driving source is driven by the driving source, and the power transmission mechanism 10 is caused to move in the link by the rotational power of the motor, and the structure is illustrated. In the drawings, the present invention is not limited thereto. For example, as shown in FIG. 8, the driving source M1 can also be used with conventional gas 12 200829338. That is, the present invention can also connect the gas red active base rod and the end of the moving rod 12 of the power transmission mechanism 1G in the manner shown in Fig. 8, thereby effecting the link movement by driving the cylinder.曰 This power transmission method directly connects the piston rod of the cylinder to directly transmit the linear moving power to the power transmission mechanism 10 . Further, although not shown, in addition to the motor or the cylinder, various power generating devices capable of satisfying the object of the present invention can be used. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing the overall configuration of a fluid ejecting apparatus of the present invention. Fig. 2 is a schematic view for explaining an arrangement state of an injection pipe of the fluid ejecting apparatus of the present invention. Figure 3 is a side cross-sectional view of the fluid ejection device of Figure 1. Fig. 4 is a schematic view for explaining a state in which the injection pipe of the fluid ejecting apparatus of the present invention is fixed. Fig. 5 is a schematic view for explaining the structure of a power transmission mechanism of the fluid ejecting apparatus of the present invention. Fig. 6 is a schematic view for explaining the action of the power transmission mechanism shown in Fig. 5. Fig. 7 is a schematic view for explaining a state in which the spray pipe is swung under the action of the power transmission mechanism shown in Fig. 5. Fig. 8 is a schematic view showing another embodiment of a driving source of the fluid ejecting apparatus of the present invention. 13 200829338

【主要元件符號說明】 2 作業槽 4 輸送裝置 6 支架 8 軸承 10 動力傳遞機構 12 移動桿 14 連桿 16 旋轉盤 18 聯結部件 A 可變角度 G(G1) 基板 Η 支承孔 L 供給管 M(M1) 驅動源 P 喷射管 N 喷嘴 R 輸送輥 S 作業空間 T 儲存槽 W 流體[Description of main components] 2 Working tank 4 Conveying device 6 Bracket 8 Bearing 10 Power transmission mechanism 12 Moving rod 14 Connecting rod 16 Rotating disc 18 Coupling part A Variable angle G (G1) Substrate 支承 Support hole L Supply tube M (M1 Drive source P injection pipe N nozzle R conveyor roller S working space T storage tank W fluid

Claims (1)

200829338 十、申請專利範圍: 1·一種流體喷射裝置,包括: 具有作業空間的作業槽; 具有用於噴射流體的多個喷嘴且相互隔開而設置在該 作業空間的多個噴射管; /、忒喷射言相連接,並藉由連桿運動使該噴嘴的噴射 '^勢發生變化的動力傳遞機構; 爲使忒動力傳遞機構進行連桿運動而産生動力的驅動 源。 中: 2·如申請專利範圍第1項所述之流體噴射裝置,其 該等多個噴射管相隔排列設置,並以可旋轉方式被支 承,以使該喷嘴的噴射角度能夠發生變化。 3 ·如申明專利範圍第1項所述之流體噴射裝置,其中: +在每個該噴射管上相隔設置有一個以上之該噴嘴,該 貝觜被配置成其可向基板的上表面噴射流體。 4·如申請專利範圍帛1項所述之流體噴射裝置,其中, 該動力傳遞機構包括· 括.以預疋間距進行往返運動的移動 運干動=^該料桿與料多㈣㈣錢其進行連桿 時 中 在4私動#藉由該驅動源的動力而進行直線往返 ’該等多個噴射管葬由 ® 心而旋轉預定角度。 釉線爲 5 ·如申請專利範圍第 1項所述之流體喷射裝置,其中 15 200829338 該驅動源爲電機或氣缸。 十一、國式: 如次頁200829338 X. Patent application scope: 1. A fluid ejection device comprising: a working tank having a working space; a plurality of injection pipes having a plurality of nozzles for injecting fluid and spaced apart from each other and disposed in the working space; The squib is connected to the power transmission mechanism that changes the injection force of the nozzle by the movement of the link; and the drive source that generates power for the 忒 power transmission mechanism to perform the link motion. The fluid ejecting apparatus according to claim 1, wherein the plurality of ejecting tubes are arranged side by side and rotatably supported so that the ejection angle of the nozzle can be changed. 3. The fluid ejecting apparatus according to claim 1, wherein: + one or more of the nozzles are disposed on each of the ejecting tubes, the bellows being configured to eject a fluid to an upper surface of the substrate . 4. The fluid ejecting apparatus according to claim 1, wherein the power transmitting mechanism comprises: a moving movement that performs a reciprocating motion at a pre-twisting distance = ^ the material is more than the material (four) (four) In the case of the connecting rod, the four private movements are linearly reciprocated by the power of the driving source. The plurality of jetting tubes are rotated by the predetermined angle by the heart. The glaze line is 5. The fluid ejecting apparatus according to claim 1, wherein 15 200829338 is a motor or a cylinder. 11. National style: as the next page 1616
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Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101872953B1 (en) * 2011-11-22 2018-08-02 세메스 주식회사 Apparatus for spary
CN103207540A (en) * 2012-01-13 2013-07-17 昆山允升吉光电科技有限公司 Developing machine spraying device realizing uniform and stable development
KR101338491B1 (en) * 2012-04-27 2013-12-10 (주)하나에프엠케이 Apparatus to inject fluid for cleaning machine parts
CN106807563A (en) * 2017-02-22 2017-06-09 南通市广益机电有限责任公司 Atomization multidirectional rotary shower nozzle
CN109225713A (en) * 2017-04-28 2019-01-18 均豪精密工业股份有限公司 Platform-type flusher
CN109549589B (en) * 2017-09-26 2021-10-26 青岛海尔洗碗机有限公司 Spraying system and dish washing machine
CN108262208A (en) * 2018-03-29 2018-07-10 蚌埠抒阳自动化设备制造有限公司 One kind is used for door-plate machining production line
CN111085369A (en) * 2020-01-17 2020-05-01 浙江万木新材料科技股份有限公司 PVC is shower nozzle device for coated fabric
CN112091710A (en) * 2020-08-11 2020-12-18 珠海格力电器股份有限公司 Cleaning device and machine tool

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100451843C (en) * 2000-01-21 2009-01-14 友达光电股份有限公司 Liquid sprayer
JP3518676B2 (en) * 2000-05-11 2004-04-12 東京化工機株式会社 Surface treatment equipment for printed wiring board materials
JP4849199B2 (en) * 2000-08-02 2012-01-11 永田醸造機械株式会社 Cleaning device with nozzle moving in an arc
JP2003084125A (en) * 2001-07-04 2003-03-19 Seiko Epson Corp Method and device for manufacturing color filter, method and device for manufacturing liquid crystal display device, method and device for manufacturing substrate for installing el (electroluminescence) light emitting layer, method and device for manufacturing el light emitting device, method and device for film forming
JP3922177B2 (en) * 2002-02-12 2007-05-30 セイコーエプソン株式会社 Film forming method, film forming apparatus, droplet discharge apparatus, color filter manufacturing method, display apparatus manufacturing method
JP4244176B2 (en) * 2002-10-25 2009-03-25 大日本スクリーン製造株式会社 Substrate processing equipment
KR100618577B1 (en) * 2002-11-13 2006-08-31 엘지.필립스 엘시디 주식회사 Dispenser of liquid crystal display panel and dispensing method using the same
JP2004273984A (en) * 2003-03-12 2004-09-30 Dainippon Screen Mfg Co Ltd Method and device for substrate processing
KR200404745Y1 (en) * 2005-10-20 2005-12-27 주식회사 거송시스템 Two-Fluid Injection Nozzle

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CN101216672A (en) 2008-07-09
TWI387488B (en) 2013-03-01

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