CN103207540A - Developing machine spraying device realizing uniform and stable development - Google Patents
Developing machine spraying device realizing uniform and stable development Download PDFInfo
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- CN103207540A CN103207540A CN2012100650015A CN201210065001A CN103207540A CN 103207540 A CN103207540 A CN 103207540A CN 2012100650015 A CN2012100650015 A CN 2012100650015A CN 201210065001 A CN201210065001 A CN 201210065001A CN 103207540 A CN103207540 A CN 103207540A
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Abstract
The invention discloses a developing machine spraying device realizing uniform and stable development. The developing machine spraying device realizing uniform and stable development comprises a plurality of spraying pipes. The developing machine spraying device is provided with double control on a direction perpendicular to a delivery direction of the developing machine, wherein the double control comprises a swing control of a swing and a sector liquid spray control of nozzles. According to the invention, the developing machine spraying device is provided with double control on the direction perpendicular to the delivery direction of the developing machine, and the double control comprises the swing control of the swing and the sector liquid spray control of nozzles, such that the developing liquid can be more uniformly sprayed on a direction perpendicular to a developing machine delivery direction. Therefore, developing machine development capacity is stable and uniform.
Description
Technical field
The invention belongs to the developing technique field of mask to print plate, relate in particular to a kind of developing machine spray equipment of realizing uniform and stable development.
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Background technology
Along with the quickening day by day of electron trade development, the application of printed wire mask plate more and more widely, this also requires its relevant technology can satisfy the growth requirement of renewal day by day accordingly.
The technological process that the printed-wiring board (PWB) template construct often adopts substrate to paste dry film → exposure → development → electroforming is made, and electroforming template open pore wall is smooth, precision size, and tin was good down during template was used.High-quality electrotyping plate requires to have high-quality development figure to shift, require development capability uniform and stable in the developing process, the a part of regional graphics dry film of the unstable appearance easily of development capability is crossed apparent or underdevelop, plating can appear in the electroforming process, cause the electroforming template opening made rough, jagged, influence product quality.
Spray is important step in the developing process, to development capability is uniform and stable great influence is arranged.Present nozzle of the prior art generally is arranging of matrix form, every jet pipe top nozzle is evenly equidistantly arranged by identical rule, the injector configuration of adjacent jet pipe does not have staggered, when hydrojet is that wide-angle is when fan-shaped, collision phenomenon can appear in the developer solution of the adjacent two nozzles ejection on adjacent two jet pipes, can influence the local pressure of hydrojet.
So the defective at nozzle in the present prior art exists is necessary the developing machine spray equipment is studied, and provides a kind of scheme, to solve the defective that exists in the above-mentioned prior art.
Summary of the invention
For addressing the above problem, the object of the present invention is to provide a kind of developing machine spray equipment of realizing uniform and stable development, it makes developing machine possess uniform and stable development capability by the arrangement mode of developing machine nozzle is adjusted.
For achieving the above object, technical scheme of the present invention is:
A kind of developing machine spray equipment of realizing uniform and stable development includes a plurality of jet pipes, and wherein, the vertical developing machine direction of transfer of described developing machine spray equipment is provided with dual control, the covering of the fan hydrojet control of waving control and nozzle of namely waving.
Further, described waving of waving is controlled to be: the spray dish that nozzle will be installed is fixed on the track perpendicular to direction of transfer, and the spray dish is driven by an eccentric wheel, and motor is housed on the eccentric wheel; After the developing machine start, motor start-up drives wobbler action, eccentric wheel drives the spray dish and moves reciprocatingly, and waves automatically to begin, and solution sprays, waving is along perpendicular to line direction before the substrate, and whole spray dish is reciprocating, makes each place of whole base plate can both receive identical spray pressure.
Further, described spray dish is provided with some jet pipes that are parallel to each other and are parallel to the developing machine direction of transfer, and described jet pipe equal intervals is provided with nozzle, and stagger mutually in the position of adjacent two jet pipe top nozzles, and the staggered positions unanimity; During developing machine work, the solution shape that the nozzle of described developing machine gushes out is covering of the fan, and covering of the fan is perpendicular to the developing machine direction of transfer.
Shadow machine spray equipment of the present invention adopts dual control mode at vertical developing machine direction of transfer, the covering of the fan hydrojet control of waving control and nozzle of namely waving, make developer solution more even perpendicular to the sprinkling of developing machine direction of transfer, thereby arrive developing machine development capability stabilized uniform effect.
Description of drawings
Fig. 1 is the combination diagram of shadow machine spray equipment of the present invention.
Fig. 2 is the jet pipe diagram of shadow machine spray equipment of the present invention.
The sparge pipe positive diagram of hydrojet (along A-A ' direction among Fig. 1) when Fig. 3 is developing machine of the present invention work.
Embodiment
In order to make purpose of the present invention, technical scheme and advantage clearer, below in conjunction with drawings and Examples, the present invention is further elaborated.Should be appreciated that specific embodiment described herein only in order to explaining the present invention, and be not used in restriction the present invention.
The vertical developing machine direction of transfer of developing machine spray equipment of the present invention is provided with dual control, the covering of the fan hydrojet control of waving control and nozzle of namely waving.Wherein, waving of waving is controlled to be: the spray dish that nozzle will be housed is fixed on the track perpendicular to direction of transfer, and the spray dish is driven by an eccentric wheel, and motor is housed on the eccentric wheel.After the developing machine start, motor start-up drives wobbler action, and eccentric wheel drives the spray dish and moves reciprocatingly.Wave automatically and begin, solution sprays, and waving is along perpendicular to line direction before the substrate, and whole spray dish is reciprocating, makes each place of whole base plate can both receive identical spray pressure.And the covering of the fan hydrojet of nozzle control to be particular design by nozzle reach, after hydrojet reached certain pressure, the liquid that nozzle sprays out was covering of the fan, can control the sector angle of covering of the fan by regulating pressure.By this dual control mode, make developer solution more even perpendicular to the sprinkling of developing machine direction of transfer, thereby arrive developing machine development capability stabilized uniform effect.
Shown in Fig. 1-3, the embodiment of the invention is that example describes with the surface development, and being when developing when namely developer solution only sprays from lower to upper, has a developing apparatus by the upper-spraying type surface development in the developing machine developing room.As shown in Figure 1, it is the part synoptic diagram of spray equipment in the surface development machine developing room.Developing machine spray equipment of the present invention installs at developing machine developing room low inside and is equipped with a spray dish 11, and described spray dish 11 is fixed on and waves, and it can swing back and forth with certain frequency on perpendicular to the developing machine direction of transfer; Described spray dish 11 is provided with some jet pipes 12 that are parallel to each other and are parallel to the developing machine direction of transfer, and as shown in Figure 2, it shows the part synoptic diagram of jet pipe 12; Described jet pipe 12 equal intervals are provided with nozzle 13, and stagger mutually in the position of adjacent two jet pipe 12 top nozzles 13, and the staggered positions unanimity; During developing machine work, the solution shape that the nozzle 13 of described developing machine gushes out is covering of the fan, and covering of the fan is perpendicular to the developing machine direction of transfer.
The synoptic diagram in sparge pipe hydrojet front when Figure 3 shows that developing machine work, nozzle 13 is installed on each parallel nozzle 12, and jet pipe 12 is fixed on the spray dish 11, on the spray web jet pipe feed liquor is arranged, the whole spray dish 11 in start back that develops begins swing, and nozzle 13 can not independently moving.Simultaneously, developing machine is opened, motor start-up, and the pump entry into service, pump pumps solution from reservoir, by nozzle 13 ejections.The solution of nozzle 13 ejection forms covering of the fan one by one, along with the motion of waving, and the covering of the fan solution of ejection sweeping back and forth.When development substrate 31 entered from the front end of spray dish 11, covering of the fan solution swept back and forth, with being dissolved in the unexposed dry film dissolving of developer solution on the substrate 31, entered in the solution, and the exposure dry film that is insoluble to developer solution is stayed on the substrate 31, forms needed figure.
Can control the developing machine development capability by what adjust nozzle 13 and the distance L of core, the angle θ of covering of the fan, adjacent two nozzles 13 apart from the wobble frequency of S and spray dish 11 etc.Because when adopting covering of the fan spray mode, the pressure in fan-shaped zone line opposite edges zone is big, the amount of contact developing solution is more, its corresponding on the centre position development capability strong.As preferably, during developing machine work, be provided with intersection 32 to a certain degree between the covering of the fan solution spraying edges of regions of adjacent jet pipe 12 top nozzles 13 ejections.
When developing for two-sided development, it is the spray that the two sides of substrate all is subjected to developer solution, two liquid-jet devices are arranged in the developing machine developing room, the structural entity of two devices is identical up and down, also the developing device structure with above-mentioned surface development is identical, the top liquid-jet device of two-sided development that different is is opposite with lower part spray direction, so repeat no more.
The above only is preferred embodiment of the present invention, not in order to limiting the present invention, all any modifications of doing within the spirit and principles in the present invention, is equal to and replaces and improvement etc., all should be included within protection scope of the present invention.
Claims (8)
1. the developing machine spray equipment that can realize uniform and stable development, include a plurality of jet pipes, it is characterized in that: the vertical developing machine direction of transfer of described developing machine spray equipment is provided with dual control, the covering of the fan hydrojet control of waving control and nozzle of namely waving.
2. the developing machine spray equipment of realizing uniform and stable development as claimed in claim 1, it is characterized in that: described waving of waving is controlled to be: the spray dish that nozzle will be installed is fixed on the track perpendicular to direction of transfer, the spray dish is driven by an eccentric wheel, and motor is housed on the eccentric wheel; After the developing machine start, motor start-up drives wobbler action, eccentric wheel drives the spray dish and moves reciprocatingly, and waves automatically to begin, and solution sprays, waving is along perpendicular to line direction before the substrate, and whole spray dish is reciprocating, makes each place of whole base plate can both receive identical spray pressure.
3. the developing machine spray equipment of realizing uniform and stable development as claimed in claim 1, it is characterized in that: described spray dish is provided with some jet pipes that are parallel to each other and are parallel to the developing machine direction of transfer, described jet pipe equal intervals is provided with nozzle, stagger mutually in the position of adjacent two jet pipe top nozzles, and the staggered positions unanimity; During developing machine work, the solution shape that the nozzle of described developing machine gushes out is covering of the fan, and covering of the fan is perpendicular to the developing machine direction of transfer.
4. as claim 2 or the 3 described developing machine spray equipments of realizing uniform and stable development, it is characterized in that: described nozzle is installed on each parallel nozzle, jet pipe is fixed on the spray dish, on the spray web jet pipe feed liquor is arranged, and the whole spray dish in start back that develops begins swing.
5. the developing machine spray equipment of realizing uniform and stable development as claimed in claim 4 is characterized in that: after developing machine is opened, and motor start-up, the pump entry into service, pump pumps solution from reservoir, sprayed by nozzle; The solution of nozzle ejection forms covering of the fan one by one, along with the motion of waving, and the covering of the fan solution of ejection sweeping back and forth.
6. the developing machine spray equipment of realizing uniform and stable development as claimed in claim 5, it is characterized in that: when the development substrate enters from the front end of spray dish, covering of the fan solution sweeps back and forth, the unexposed dry film dissolving of developer solution will can be dissolved on the substrate, enter in the solution, the exposure dry film that is insoluble to developer solution is stayed on the substrate, forms needed figure.
7. the developing machine spray equipment of realizing uniform and stable development as claimed in claim 6 is characterized in that: can control the developing machine development capability by the wobble frequency apart from S and spray dish of adjusting nozzle and the distance L of core, the angle θ of covering of the fan, adjacent two nozzles.
8. the developing machine spray equipment of realizing uniform and stable development as claimed in claim 7 is characterized in that: during developing machine work, be provided with intersection to a certain degree between the covering of the fan solution spraying edges of regions of adjacent jet pipe top nozzle ejection.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012100650015A CN103207540A (en) | 2012-01-13 | 2012-01-13 | Developing machine spraying device realizing uniform and stable development |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012100650015A CN103207540A (en) | 2012-01-13 | 2012-01-13 | Developing machine spraying device realizing uniform and stable development |
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| Publication Number | Publication Date |
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| CN103207540A true CN103207540A (en) | 2013-07-17 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2012100650015A Pending CN103207540A (en) | 2012-01-13 | 2012-01-13 | Developing machine spraying device realizing uniform and stable development |
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| CN (1) | CN103207540A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103576470A (en) * | 2013-10-31 | 2014-02-12 | 清华大学深圳研究生院 | Development process nozzle |
| CN105549345A (en) * | 2016-01-22 | 2016-05-04 | 京东方科技集团股份有限公司 | Spray control method, device thereof and spray system |
| CN105607434A (en) * | 2016-04-05 | 2016-05-25 | 京东方科技集团股份有限公司 | Developing apparatus and developing method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030121991A1 (en) * | 2001-12-28 | 2003-07-03 | Samsung Electro-Mechanics Co., Ltd. | Nozzle with cover for spraying printed circuit board |
| CN2636588Y (en) * | 2003-07-03 | 2004-08-25 | 呈新科技股份有限公司 | Acid washing machine having vertical swinging spray device |
| CN101216672A (en) * | 2007-01-04 | 2008-07-09 | 显示器生产服务株式会社 | Flow jet device |
| CN102036485A (en) * | 2010-09-30 | 2011-04-27 | 北大方正集团有限公司 | Spraying device and liquid medicine tank |
| CN202533711U (en) * | 2012-01-13 | 2012-11-14 | 昆山允升吉光电科技有限公司 | Developer spraying device capable of realizing uniform and stable development |
-
2012
- 2012-01-13 CN CN2012100650015A patent/CN103207540A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030121991A1 (en) * | 2001-12-28 | 2003-07-03 | Samsung Electro-Mechanics Co., Ltd. | Nozzle with cover for spraying printed circuit board |
| CN2636588Y (en) * | 2003-07-03 | 2004-08-25 | 呈新科技股份有限公司 | Acid washing machine having vertical swinging spray device |
| CN101216672A (en) * | 2007-01-04 | 2008-07-09 | 显示器生产服务株式会社 | Flow jet device |
| CN102036485A (en) * | 2010-09-30 | 2011-04-27 | 北大方正集团有限公司 | Spraying device and liquid medicine tank |
| CN202533711U (en) * | 2012-01-13 | 2012-11-14 | 昆山允升吉光电科技有限公司 | Developer spraying device capable of realizing uniform and stable development |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103576470A (en) * | 2013-10-31 | 2014-02-12 | 清华大学深圳研究生院 | Development process nozzle |
| CN103576470B (en) * | 2013-10-31 | 2016-04-06 | 清华大学深圳研究生院 | A kind of developing process nozzle |
| CN105549345A (en) * | 2016-01-22 | 2016-05-04 | 京东方科技集团股份有限公司 | Spray control method, device thereof and spray system |
| CN105607434A (en) * | 2016-04-05 | 2016-05-25 | 京东方科技集团股份有限公司 | Developing apparatus and developing method |
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Application publication date: 20130717 |