TW200824817A - Method of manufacturing sputtering target material - Google Patents
Method of manufacturing sputtering target material Download PDFInfo
- Publication number
- TW200824817A TW200824817A TW95146984A TW95146984A TW200824817A TW 200824817 A TW200824817 A TW 200824817A TW 95146984 A TW95146984 A TW 95146984A TW 95146984 A TW95146984 A TW 95146984A TW 200824817 A TW200824817 A TW 200824817A
- Authority
- TW
- Taiwan
- Prior art keywords
- pressure
- target
- hot pressing
- temperature
- psi
- Prior art date
Links
- 238000005477 sputtering target Methods 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- 239000013077 target material Substances 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 claims abstract description 43
- 238000007731 hot pressing Methods 0.000 claims abstract description 33
- 239000000843 powder Substances 0.000 claims abstract description 23
- 239000011148 porous material Substances 0.000 claims abstract description 10
- 238000005245 sintering Methods 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims description 27
- 210000001161 mammalian embryo Anatomy 0.000 claims description 19
- 239000000956 alloy Substances 0.000 claims description 14
- 229910045601 alloy Inorganic materials 0.000 claims description 14
- 239000002994 raw material Substances 0.000 claims description 11
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 7
- 229910052804 chromium Inorganic materials 0.000 claims description 7
- 229910052707 ruthenium Inorganic materials 0.000 claims description 7
- 229910052681 coesite Inorganic materials 0.000 claims description 6
- 229910052906 cristobalite Inorganic materials 0.000 claims description 6
- 229910052697 platinum Inorganic materials 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052682 stishovite Inorganic materials 0.000 claims description 6
- 229910052905 tridymite Inorganic materials 0.000 claims description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052796 boron Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 239000002131 composite material Substances 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 238000005507 spraying Methods 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- 238000009924 canning Methods 0.000 abstract description 2
- 238000001513 hot isostatic pressing Methods 0.000 abstract 2
- 210000002257 embryonic structure Anatomy 0.000 description 6
- 239000002245 particle Substances 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 239000013078 crystal Substances 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000003723 Smelting Methods 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- -1 nails Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000004663 powder metallurgy Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Powder Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW95146984A TW200824817A (en) | 2006-12-15 | 2006-12-15 | Method of manufacturing sputtering target material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW95146984A TW200824817A (en) | 2006-12-15 | 2006-12-15 | Method of manufacturing sputtering target material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200824817A true TW200824817A (en) | 2008-06-16 |
| TWI304757B TWI304757B (enExample) | 2009-01-01 |
Family
ID=44771644
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW95146984A TW200824817A (en) | 2006-12-15 | 2006-12-15 | Method of manufacturing sputtering target material |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TW200824817A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105772730A (zh) * | 2016-03-10 | 2016-07-20 | 江苏耐尔特钻石有限公司 | 一种金刚石珩磨油石的制备方法 |
| CN111842900A (zh) * | 2020-07-31 | 2020-10-30 | 河南科技大学 | 一种高纯钴靶材的热压烧结方法 |
-
2006
- 2006-12-15 TW TW95146984A patent/TW200824817A/zh not_active IP Right Cessation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105772730A (zh) * | 2016-03-10 | 2016-07-20 | 江苏耐尔特钻石有限公司 | 一种金刚石珩磨油石的制备方法 |
| CN111842900A (zh) * | 2020-07-31 | 2020-10-30 | 河南科技大学 | 一种高纯钴靶材的热压烧结方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI304757B (enExample) | 2009-01-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |