TW200804976A - Thermosetting composition for protective film, hardened product and liquid crystal display device - Google Patents

Thermosetting composition for protective film, hardened product and liquid crystal display device Download PDF

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Publication number
TW200804976A
TW200804976A TW096119465A TW96119465A TW200804976A TW 200804976 A TW200804976 A TW 200804976A TW 096119465 A TW096119465 A TW 096119465A TW 96119465 A TW96119465 A TW 96119465A TW 200804976 A TW200804976 A TW 200804976A
Authority
TW
Taiwan
Prior art keywords
acid
compound
acrylate
film
meth
Prior art date
Application number
TW096119465A
Other languages
English (en)
Chinese (zh)
Inventor
Yasuhiroa Kameyama
Original Assignee
Mitsubishi Chem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chem Corp filed Critical Mitsubishi Chem Corp
Publication of TW200804976A publication Critical patent/TW200804976A/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
TW096119465A 2006-05-31 2007-05-31 Thermosetting composition for protective film, hardened product and liquid crystal display device TW200804976A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006152051 2006-05-31
JP2006206555 2006-07-28
JP2007134317A JP5256646B2 (ja) 2006-05-31 2007-05-21 液晶表示装置

Publications (1)

Publication Number Publication Date
TW200804976A true TW200804976A (en) 2008-01-16

Family

ID=38778526

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096119465A TW200804976A (en) 2006-05-31 2007-05-31 Thermosetting composition for protective film, hardened product and liquid crystal display device

Country Status (5)

Country Link
JP (1) JP5256646B2 (ko)
KR (1) KR101217952B1 (ko)
CN (1) CN101395535B (ko)
TW (1) TW200804976A (ko)
WO (1) WO2007139006A1 (ko)

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* Cited by examiner, † Cited by third party
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JP5284833B2 (ja) * 2008-03-31 2013-09-11 富士フイルム株式会社 フォトスペーサーの製造方法
JP5136239B2 (ja) * 2008-06-26 2013-02-06 住友ベークライト株式会社 感光性樹脂組成物、接着フィルムおよび受光装置
JP5274151B2 (ja) 2008-08-21 2013-08-28 富士フイルム株式会社 感光性樹脂組成物、カラーフィルタ及びその製造方法、並びに、固体撮像素子
JP5121644B2 (ja) * 2008-09-24 2013-01-16 富士フイルム株式会社 感光性樹脂組成物、カラーフィルタ及びその製造方法、並びに、固体撮像素子
JP2010117481A (ja) * 2008-11-12 2010-05-27 Toppan Printing Co Ltd カラーフィルタ
KR20100099048A (ko) * 2009-03-02 2010-09-10 주식회사 동진쎄미켐 감광성 수지 조성물
JP2011150137A (ja) * 2010-01-21 2011-08-04 Asahi Kasei E-Materials Corp 光重合性樹脂組成物、光重合性樹脂積層体、レジストパターンの形成方法、並びに回路基板、リードフレーム及び半導体パッケージの製造方法
JP5884325B2 (ja) * 2011-07-15 2016-03-15 Jsr株式会社 カラーフィルタ、液晶表示素子およびカラーフィルタの製造方法
CN104246609A (zh) * 2012-04-26 2014-12-24 三菱化学株式会社 感光性树脂组合物、固化物、层间绝缘膜、tft 有源阵列基板及液晶显示装置
CN103376657B (zh) * 2013-07-15 2016-12-28 京东方科技集团股份有限公司 光阻组合物及其制备方法、彩膜基板和显示装置
CN103360857B (zh) * 2013-07-15 2015-01-07 京东方科技集团股份有限公司 平坦保护层用组合物及其制备方法和显示装置
JP6750685B2 (ja) * 2017-10-11 2020-09-02 東レ株式会社 感光性導電ペーストおよび導電パターン形成用フィルム
CN108530987A (zh) * 2018-05-16 2018-09-14 江苏海田电子材料有限公司 一种液态显影白色感光阻焊油墨及其制备方法
CN108530988A (zh) * 2018-05-17 2018-09-14 江苏海田电子材料有限公司 一种液态显影感光阻焊油墨及其制备方法

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DE3114931A1 (de) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial
JPH08123016A (ja) * 1994-10-27 1996-05-17 Hitachi Chem Co Ltd 感光性ソルダーレジスト組成物、これを用いたプリント回路板の製造法、プリント回路板及びこのプリント回路板を用いた機器
JP3887046B2 (ja) * 1996-10-17 2007-02-28 新日鐵化学株式会社 カラーフィルター用材料及びカラーフィルター
JPH10319592A (ja) * 1997-05-16 1998-12-04 Jsr Corp 感放射線性樹脂組成物
JP3981968B2 (ja) * 1998-03-11 2007-09-26 Ｊｓｒ株式会社 感放射線性樹脂組成物
JP4839525B2 (ja) * 2000-09-29 2011-12-21 大日本印刷株式会社 感光性樹脂組成物および液晶ディスプレイ用カラーフィルタ
JP2003277484A (ja) * 2002-03-26 2003-10-02 Jsr Corp 保護膜および液晶表示素子
JP2003345015A (ja) * 2002-05-29 2003-12-03 Sumitomo Chem Co Ltd 感光性樹脂組成物
JP2004077653A (ja) * 2002-08-13 2004-03-11 Toagosei Co Ltd 架橋硬化型樹脂組成物
JP4232410B2 (ja) * 2002-08-19 2009-03-04 チッソ株式会社 光硬化性樹脂組成物およびそれを用いた表示素子
JP4384570B2 (ja) * 2003-12-01 2009-12-16 東京応化工業株式会社 厚膜用ホトレジスト組成物及びレジストパターンの形成方法
JP2006119441A (ja) * 2004-10-22 2006-05-11 Fujifilm Electronic Materials Co Ltd 光熱重合性組成物、並びに樹脂被膜及びカラーフィルタ
JP2006235371A (ja) * 2005-02-25 2006-09-07 Nitto Denko Corp 感光性樹脂組成物およびそれを用いて得られるソルダーレジストを有する配線回路基板
JP4816917B2 (ja) * 2006-03-17 2011-11-16 Ｊｓｒ株式会社 感放射線性樹脂組成物、液晶表示パネル用スペーサー、液晶表示パネル用スペーサーの形成方法、および液晶表示パネル
JP2008122924A (ja) * 2006-10-17 2008-05-29 Jsr Corp スペーサー形成用感放射線性樹脂組成物、スペーサーおよびその形成方法

Also Published As

Publication number Publication date
KR20090013749A (ko) 2009-02-05
JP2008052250A (ja) 2008-03-06
JP5256646B2 (ja) 2013-08-07
WO2007139006A1 (ja) 2007-12-06
CN101395535A (zh) 2009-03-25
KR101217952B1 (ko) 2013-01-02
CN101395535B (zh) 2013-03-20

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