TW200746348A - Support for wafer singulation - Google Patents

Support for wafer singulation

Info

Publication number
TW200746348A
TW200746348A TW096103684A TW96103684A TW200746348A TW 200746348 A TW200746348 A TW 200746348A TW 096103684 A TW096103684 A TW 096103684A TW 96103684 A TW96103684 A TW 96103684A TW 200746348 A TW200746348 A TW 200746348A
Authority
TW
Taiwan
Prior art keywords
wafer
islands
support substrate
support
laser
Prior art date
Application number
TW096103684A
Other languages
English (en)
Other versions
TWI376010B (en
Inventor
John Tully
Billy Diggin
Richard Toftness
John O'halloran
Original Assignee
Xsil Technology Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xsil Technology Ltd filed Critical Xsil Technology Ltd
Publication of TW200746348A publication Critical patent/TW200746348A/zh
Application granted granted Critical
Publication of TWI376010B publication Critical patent/TWI376010B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T279/00—Chucks or sockets
    • Y10T279/11—Vacuum

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Dicing (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Laser Beam Processing (AREA)
TW096103684A 2006-02-02 2007-02-01 Support for wafer singulation TWI376010B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0602114A GB2434913A (en) 2006-02-02 2006-02-02 Support for wafer singulation

Publications (2)

Publication Number Publication Date
TW200746348A true TW200746348A (en) 2007-12-16
TWI376010B TWI376010B (en) 2012-11-01

Family

ID=36100922

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096103684A TWI376010B (en) 2006-02-02 2007-02-01 Support for wafer singulation

Country Status (9)

Country Link
US (1) US20120208349A1 (zh)
EP (1) EP1979931A2 (zh)
JP (1) JP2009525601A (zh)
KR (1) KR20080098018A (zh)
CN (1) CN101379590B (zh)
GB (1) GB2434913A (zh)
SG (1) SG171639A1 (zh)
TW (1) TWI376010B (zh)
WO (1) WO2007088058A2 (zh)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2458475B (en) * 2008-03-18 2011-10-26 Xsil Technology Ltd Processing of multilayer semiconductor wafers
TW201243930A (en) * 2011-04-21 2012-11-01 Lingsen Precision Ind Ltd Wafer dicing method
CN104838483B (zh) * 2012-12-17 2019-05-21 新加坡科技研究局 晶片划切装置和晶片划切方法
EP3920200A1 (en) 2014-05-05 2021-12-08 3D Glass Solutions, Inc. 2d and 3d inductors antenna and transformers fabricating photoactive substrates
USD754516S1 (en) * 2014-12-19 2016-04-26 Leatherman Tool Group, Inc. Multipurpose tool
WO2017147511A1 (en) 2016-02-25 2017-08-31 3D Glass Solutions, Inc. 3d capacitor and capacitor array fabricating photoactive substrates
WO2017177171A1 (en) 2016-04-08 2017-10-12 3D Glass Solutions, Inc. Methods of fabricating photosensitive substrates suitable for optical coupler
JP7150342B2 (ja) 2017-04-28 2022-10-11 スリーディー グラス ソリューションズ，インク Ｒｆサーキュレータ
EP3649733A1 (en) 2017-07-07 2020-05-13 3D Glass Solutions, Inc. 2d and 3d rf lumped element devices for rf system in a package photoactive glass substrates
WO2019118761A1 (en) 2017-12-15 2019-06-20 3D Glass Solutions, Inc. Coupled transmission line resonate rf filter
WO2019136024A1 (en) 2018-01-04 2019-07-11 3D Glass Solutions, Inc. Impedance matching conductive structure for high efficiency rf circuits
US11076489B2 (en) 2018-04-10 2021-07-27 3D Glass Solutions, Inc. RF integrated power condition capacitor
KR102475010B1 (ko) 2018-05-29 2022-12-07 3디 글래스 솔루션즈 인코포레이티드 저 삽입 손실 rf 전송 라인
AU2019344542B2 (en) 2018-09-17 2022-02-24 3D Glass Solutions, Inc. High efficiency compact slotted antenna with a ground plane
WO2020139951A1 (en) 2018-12-28 2020-07-02 3D Glass Solutions, Inc. Heterogenous integration for rf, microwave and mm wave systems in photoactive glass substrates
WO2020139955A1 (en) 2018-12-28 2020-07-02 3D Glass Solutions, Inc. Annular capacitor rf, microwave and mm wave systems
AU2020253553A1 (en) 2019-04-05 2021-10-28 3D Glass Solutions, Inc. Glass based empty substrate integrated waveguide devices
EP3948954B1 (en) 2019-04-18 2023-06-14 3D Glass Solutions, Inc. High efficiency die dicing and release
EP4121988A4 (en) 2020-04-17 2023-08-30 3D Glass Solutions, Inc. BROADBAND INDUCTOR
US11551970B2 (en) 2020-10-22 2023-01-10 Innolux Corporation Method for manufacturing an electronic device

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US3809050A (en) * 1971-01-13 1974-05-07 Cogar Corp Mounting block for semiconductor wafers
US3976288A (en) * 1975-11-24 1976-08-24 Ibm Corporation Semiconductor wafer dicing fixture
JPS63301543A (ja) * 1987-06-01 1988-12-08 Nec Corp 半導体素子の製造方法
JPH01238907A (ja) * 1988-03-18 1989-09-25 Nec Corp 半導体組立治具
JPH06269968A (ja) 1993-03-23 1994-09-27 Hitachi Cable Ltd ガラスの切断方法及びその装置
US5445559A (en) * 1993-06-24 1995-08-29 Texas Instruments Incorporated Wafer-like processing after sawing DMDs
US5609148A (en) * 1995-03-31 1997-03-11 Siemens Aktiengesellschaft Method and apparatus for dicing semiconductor wafers
US5618759A (en) * 1995-05-31 1997-04-08 Texas Instruments Incorporated Methods of and apparatus for immobilizing semiconductor wafers during sawing thereof
US5803797A (en) * 1996-11-26 1998-09-08 Micron Technology, Inc. Method and apparatus to hold intergrated circuit chips onto a chuck and to simultaneously remove multiple intergrated circuit chips from a cutting chuck
US5809987A (en) * 1996-11-26 1998-09-22 Micron Technology,Inc. Apparatus for reducing damage to wafer cutting blades during wafer dicing
SG132495A1 (en) * 1998-03-13 2007-06-28 Towa Corp Nest for dicing, and method and apparatus for cutting tapeless substrate using the same
US6136137A (en) * 1998-07-06 2000-10-24 Micron Technology, Inc. System and method for dicing semiconductor components
US6572944B1 (en) * 2001-01-16 2003-06-03 Amkor Technology, Inc. Structure for fabricating a special-purpose die using a polymerizable tape
JP4886937B2 (ja) 2001-05-17 2012-02-29 リンテック株式会社 ダイシングシート及びダイシング方法
KR100476591B1 (ko) * 2002-08-26 2005-03-18 삼성전자주식회사 웨이퍼 테이블과, 이를 이용한 웨이퍼 쏘잉/소자 접착장치와, 웨이퍼 쏘잉/소자 분류 장치
JP2004322157A (ja) 2003-04-25 2004-11-18 Nitto Denko Corp 被加工物の加工方法、及びこれに用いる粘着シート
US20050064683A1 (en) * 2003-09-19 2005-03-24 Farnworth Warren M. Method and apparatus for supporting wafers for die singulation and subsequent handling
JP4342992B2 (ja) * 2004-03-17 2009-10-14 株式会社ディスコ レーザー加工装置のチャックテーブル
JP4571850B2 (ja) * 2004-11-12 2010-10-27 東京応化工業株式会社 レーザーダイシング用保護膜剤及び該保護膜剤を用いたウエーハの加工方法

Also Published As

Publication number Publication date
TWI376010B (en) 2012-11-01
JP2009525601A (ja) 2009-07-09
GB2434913A (en) 2007-08-08
CN101379590B (zh) 2011-10-26
EP1979931A2 (en) 2008-10-15
CN101379590A (zh) 2009-03-04
WO2007088058A2 (en) 2007-08-09
SG171639A1 (en) 2011-06-29
US20120208349A1 (en) 2012-08-16
WO2007088058A3 (en) 2007-09-20
KR20080098018A (ko) 2008-11-06
GB0602114D0 (en) 2006-03-15

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees