TW200745745A - Black photosensitive composition - Google Patents

Black photosensitive composition

Info

Publication number
TW200745745A
TW200745745A TW096104845A TW96104845A TW200745745A TW 200745745 A TW200745745 A TW 200745745A TW 096104845 A TW096104845 A TW 096104845A TW 96104845 A TW96104845 A TW 96104845A TW 200745745 A TW200745745 A TW 200745745A
Authority
TW
Taiwan
Prior art keywords
black
photosensitive composition
black photosensitive
pigment
black matrix
Prior art date
Application number
TW096104845A
Other languages
Chinese (zh)
Inventor
Hiroyuki Ohnishi
Kiyoshi Uchikawa
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200745745A publication Critical patent/TW200745745A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Abstract

To provide: a black photosensitive composition capable of forming a black matrix having high shape stability to heat; provide a black matrix formed from the black photosensitive composition; partitions for a color filter by an ink jet system; and spacers for a liquid crystal display element. In the black photosensitive composition containing a photopolymerizable compound, a photopolymerization initiator and a black pigment such as carbon black, an organic pigment is contained as a shape stabilizer.
TW096104845A 2006-03-17 2007-02-09 Black photosensitive composition TW200745745A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006075284A JP4745093B2 (en) 2006-03-17 2006-03-17 Black photosensitive composition

Publications (1)

Publication Number Publication Date
TW200745745A true TW200745745A (en) 2007-12-16

Family

ID=38593381

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096104845A TW200745745A (en) 2006-03-17 2007-02-09 Black photosensitive composition

Country Status (4)

Country Link
JP (1) JP4745093B2 (en)
KR (1) KR100860432B1 (en)
CN (1) CN101038438A (en)
TW (1) TW200745745A (en)

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JP5124341B2 (en) * 2008-05-20 2013-01-23 東洋インキＳｃホールディングス株式会社 Photosensitive coloring composition for color filter and color filter
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KR101368539B1 (en) * 2009-06-26 2014-02-27 코오롱인더스트리 주식회사 Photopolymerizable resin composition
JP5385729B2 (en) * 2009-09-01 2014-01-08 昭和電工株式会社 Photosensitive resin
JP5535842B2 (en) * 2009-09-30 2014-07-02 富士フイルム株式会社 Black curable composition for wafer level lens and wafer level lens
KR101705360B1 (en) * 2010-03-15 2017-02-09 동우 화인켐 주식회사 A black photosensitive resin composition, color filter and liquid crystal display device having the same
WO2011138176A1 (en) * 2010-05-03 2011-11-10 Basf Se Color filter for low temperature applications
JP6119104B2 (en) * 2012-03-27 2017-04-26 東レ株式会社 Photosensitive black resin composition, resin black matrix substrate and touch panel using the same
KR102028489B1 (en) 2013-06-25 2019-10-04 동우 화인켐 주식회사 A black photosensitive resin composition, color filter and display device comprising the same
CN103558706A (en) * 2013-11-05 2014-02-05 京东方科技集团股份有限公司 Display substrate and preparation method thereof and display device
JP6217404B2 (en) * 2014-01-17 2017-10-25 東洋インキＳｃホールディングス株式会社 Black composition and black coating film
JP6815717B2 (en) * 2015-03-05 2021-01-20 日鉄ケミカル＆マテリアル株式会社 A black resin composition for a light-shielding film, a substrate with a light-shielding film having a light-shielding film obtained by curing the composition, and a color filter and a touch panel having the substrate with the light-shielding film.
JP6464764B2 (en) * 2015-01-16 2019-02-06 Jsr株式会社 Radiation-sensitive coloring composition, spacer, method for forming the same, and liquid crystal display device
JP2016177190A (en) * 2015-03-20 2016-10-06 三菱化学株式会社 Photosensitive coloring composition for forming colored spacer, cured product, colored spacer, and image display device
JP6278933B2 (en) * 2015-09-02 2018-02-14 株式会社タムラ製作所 Insulating film forming method, electronic substrate manufacturing method, and photosensitive resin composition
KR101755318B1 (en) * 2015-11-19 2017-07-10 롬엔드하스전자재료코리아유한회사 Method for preparing column spacer
KR102487545B1 (en) 2016-10-21 2023-01-11 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter and image display device produced using the same
KR102529781B1 (en) 2016-11-25 2023-05-08 동우 화인켐 주식회사 Black photosensitive resin composition, black matrix, column sapcer and column spacer combined with black matrix for image display device produced using the same
KR20180085231A (en) 2017-01-18 2018-07-26 동우 화인켐 주식회사 Black photosensitive resin composition, black matrix, column sapcer and column spacer combined with black matrix for image display device produced using the same
KR101970325B1 (en) 2017-01-20 2019-08-13 동우 화인켐 주식회사 Black photosensitive resin composition, black matrix, column sapcer and column spacer combined with black matrix for image display device produced using the same
KR102386493B1 (en) * 2018-01-15 2022-04-14 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter and image display device using the same
KR102202344B1 (en) 2019-01-04 2021-01-13 동우 화인켐 주식회사 Black photosensitive resin composition, black matrix, column sapcer and column spacer combined with black matrix for image display device produced using the same
KR102221151B1 (en) 2019-03-20 2021-02-26 동우 화인켐 주식회사 A photo sensitive resin composition, a display partition wall structure prepared using the composition, and a display devide comprising the same
CN111722471B (en) 2019-03-20 2024-04-09 东友精细化工有限公司 Photosensitive resin composition, display partition wall structure and display device
KR102542250B1 (en) 2019-03-28 2023-06-12 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter comprising black matrix and/or column spacer produced using the same, and image display device including color filter
KR20210061933A (en) 2019-11-20 2021-05-28 동우 화인켐 주식회사 A photo sensitive resin composition, a wall structure for a color conversion pixel prepared using the composition, and a display device comprising the same
KR20210094780A (en) 2020-01-22 2021-07-30 동우 화인켐 주식회사 Black photosensitive resin composition, cured film and black matrix produced using the same
KR20210102646A (en) 2020-02-12 2021-08-20 동우 화인켐 주식회사 Black photosensitive resin composition, cured film and black matrix produced using the same
KR20210115839A (en) 2020-03-16 2021-09-27 동우 화인켐 주식회사 A photosensitive resin composition for forming partition wall, a partition wall structure prepared using the composition, and a display device comprising the partition wall structure
KR20220122372A (en) 2021-02-26 2022-09-02 동우 화인켐 주식회사 A photosensitive resin composition for forming partition wall, a partition wall structure prepared using the composition, and a display device comprising the partition wall structure
KR20220122893A (en) 2021-02-26 2022-09-05 동우 화인켐 주식회사 A photosensitive resin composition for forming partition wall, a partition wall structure prepared using the composition, and a display device comprising the partition wall structure
KR20220122892A (en) 2021-02-26 2022-09-05 동우 화인켐 주식회사 A photosensitive resin composition for forming partition wall, a partition wall structure prepared using the composition, and a display device comprising the partition wall structure

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JPH10114836A (en) * 1996-10-11 1998-05-06 Nippon Kayaku Co Ltd Black pigment composition, black radiation-sensitive resin composition, and black cured film
JP4302075B2 (en) * 1997-02-28 2009-07-22 三菱化学株式会社 Black resist composition for forming black matrix
TW575799B (en) * 1998-07-14 2004-02-11 Brewer Science Inc Photosensitive black matrix
JP2001154009A (en) * 1999-11-26 2001-06-08 Canon Inc Ink for color filter, color filter, method of producing the color filter, and liquid crystal element using the color filter
JP2002365795A (en) * 2001-06-06 2002-12-18 Jsr Corp Radiation sensitive composition for color liquid crystal display
JP2004219809A (en) * 2003-01-16 2004-08-05 Fuji Photo Film Co Ltd Light-shielding photosensitive resin composition, light-shielding photosensitive resin transfer material, method for forming light-shielding picture and color filter
JP3938375B2 (en) 2003-03-12 2007-06-27 三菱化学株式会社 Photosensitive coloring composition, color filter, and liquid crystal display device
JP4595374B2 (en) * 2003-04-24 2010-12-08 住友化学株式会社 Black photosensitive resin composition
JP2005140993A (en) * 2003-11-06 2005-06-02 Sekisui Chem Co Ltd Photocurable resin composition, columnar spacer, particle spacer fixing agent and liquid crystal display element
JP4745092B2 (en) * 2006-03-17 2011-08-10 東京応化工業株式会社 Black photosensitive composition, light-shielding film and EL device manufactured from this black photosensitive composition

Also Published As

Publication number Publication date
CN101038438A (en) 2007-09-19
JP4745093B2 (en) 2011-08-10
KR20070094460A (en) 2007-09-20
JP2007249046A (en) 2007-09-27
KR100860432B1 (en) 2008-09-25

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