TW200743650A - Solvent free photo polymerization polymer material for nano-imprinting lithography - Google Patents
Solvent free photo polymerization polymer material for nano-imprinting lithographyInfo
- Publication number
- TW200743650A TW200743650A TW095118614A TW95118614A TW200743650A TW 200743650 A TW200743650 A TW 200743650A TW 095118614 A TW095118614 A TW 095118614A TW 95118614 A TW95118614 A TW 95118614A TW 200743650 A TW200743650 A TW 200743650A
- Authority
- TW
- Taiwan
- Prior art keywords
- solvent free
- photo polymerization
- polymerization polymer
- free photo
- nano
- Prior art date
Links
- 238000006116 polymerization reaction Methods 0.000 title abstract 6
- 239000002904 solvent Substances 0.000 title abstract 6
- 238000001127 nanoimprint lithography Methods 0.000 title abstract 3
- 239000002861 polymer material Substances 0.000 title abstract 3
- 229920000642 polymer Polymers 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- 238000005530 etching Methods 0.000 abstract 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 abstract 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract 1
- 239000012965 benzophenone Substances 0.000 abstract 1
- 238000007334 copolymerization reaction Methods 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 abstract 1
- 239000004926 polymethyl methacrylate Substances 0.000 abstract 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW095118614A TW200743650A (en) | 2006-05-25 | 2006-05-25 | Solvent free photo polymerization polymer material for nano-imprinting lithography |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW095118614A TW200743650A (en) | 2006-05-25 | 2006-05-25 | Solvent free photo polymerization polymer material for nano-imprinting lithography |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200743650A true TW200743650A (en) | 2007-12-01 |
| TWI314151B TWI314151B (https=) | 2009-09-01 |
Family
ID=45072889
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW095118614A TW200743650A (en) | 2006-05-25 | 2006-05-25 | Solvent free photo polymerization polymer material for nano-imprinting lithography |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TW200743650A (https=) |
-
2006
- 2006-05-25 TW TW095118614A patent/TW200743650A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TWI314151B (https=) | 2009-09-01 |
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