TWI314151B - - Google Patents

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Publication number
TWI314151B
TWI314151B TW95118614A TW95118614A TWI314151B TW I314151 B TWI314151 B TW I314151B TW 95118614 A TW95118614 A TW 95118614A TW 95118614 A TW95118614 A TW 95118614A TW I314151 B TWI314151 B TW I314151B
Authority
TW
Taiwan
Prior art keywords
polymer material
nanoimprinting
photopolymerizable polymer
solventless
pattern
Prior art date
Application number
TW95118614A
Other languages
English (en)
Chinese (zh)
Other versions
TW200743650A (en
Inventor
Wenchang Liao
Lian-Chong Xu
Min Hsiung Hon
Chau Nan Hong
Original Assignee
Univ Nat Cheng Kung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Nat Cheng Kung filed Critical Univ Nat Cheng Kung
Priority to TW095118614A priority Critical patent/TW200743650A/zh
Publication of TW200743650A publication Critical patent/TW200743650A/zh
Application granted granted Critical
Publication of TWI314151B publication Critical patent/TWI314151B/zh

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW095118614A 2006-05-25 2006-05-25 Solvent free photo polymerization polymer material for nano-imprinting lithography TW200743650A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW095118614A TW200743650A (en) 2006-05-25 2006-05-25 Solvent free photo polymerization polymer material for nano-imprinting lithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW095118614A TW200743650A (en) 2006-05-25 2006-05-25 Solvent free photo polymerization polymer material for nano-imprinting lithography

Publications (2)

Publication Number Publication Date
TW200743650A TW200743650A (en) 2007-12-01
TWI314151B true TWI314151B (https=) 2009-09-01

Family

ID=45072889

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095118614A TW200743650A (en) 2006-05-25 2006-05-25 Solvent free photo polymerization polymer material for nano-imprinting lithography

Country Status (1)

Country Link
TW (1) TW200743650A (https=)

Also Published As

Publication number Publication date
TW200743650A (en) 2007-12-01

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