TW200741344A - Photosensitive composition comprising triazine-based photoactive compound containing oxime ester - Google Patents
Photosensitive composition comprising triazine-based photoactive compound containing oxime esterInfo
- Publication number
- TW200741344A TW200741344A TW095144514A TW95144514A TW200741344A TW 200741344 A TW200741344 A TW 200741344A TW 095144514 A TW095144514 A TW 095144514A TW 95144514 A TW95144514 A TW 95144514A TW 200741344 A TW200741344 A TW 200741344A
- Authority
- TW
- Taiwan
- Prior art keywords
- triazine
- photosensitive composition
- oxime ester
- compound containing
- present
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20050116609 | 2005-12-01 | ||
KR20050134925 | 2005-12-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200741344A true TW200741344A (en) | 2007-11-01 |
TWI340871B TWI340871B (en) | 2011-04-21 |
Family
ID=38092409
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095144514A TWI340871B (en) | 2005-12-01 | 2006-11-30 | Photosensitive composition comprising triazine-based photoactive compound containing oxime ester |
Country Status (7)
Country | Link |
---|---|
US (1) | US7556910B2 (zh) |
EP (1) | EP1922585B1 (zh) |
JP (1) | JP4615602B2 (zh) |
KR (2) | KR100814231B1 (zh) |
CN (1) | CN101263426B (zh) |
TW (1) | TWI340871B (zh) |
WO (1) | WO2007064102A1 (zh) |
Cited By (1)
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CN105541659A (zh) * | 2003-02-19 | 2016-05-04 | 西巴特殊化学品控股有限公司 | 卤代肟衍生物和其作为潜在的酸的用途 |
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2006
- 2006-09-29 KR KR1020060095897A patent/KR100814231B1/ko active IP Right Grant
- 2006-09-29 KR KR1020060095910A patent/KR100814232B1/ko active IP Right Grant
- 2006-11-22 JP JP2008531030A patent/JP4615602B2/ja active Active
- 2006-11-22 CN CN200680033957XA patent/CN101263426B/zh active Active
- 2006-11-22 EP EP06823675.1A patent/EP1922585B1/en active Active
- 2006-11-22 WO PCT/KR2006/004921 patent/WO2007064102A1/en active Application Filing
- 2006-11-29 US US11/605,329 patent/US7556910B2/en active Active
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN107492505A (zh) * | 2016-06-13 | 2017-12-19 | 三星电子株式会社 | 制造半导体封装的方法和用于其的载带膜 |
TWI720145B (zh) * | 2016-06-13 | 2021-03-01 | 南韓商三星電子股份有限公司 | 製造扇出板級封裝的方法和用於其的載帶膜 |
CN107492505B (zh) * | 2016-06-13 | 2023-03-24 | 三星电子株式会社 | 制造半导体封装的方法和用于其的载带膜 |
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US20070128548A1 (en) | 2007-06-07 |
WO2007064102A1 (en) | 2007-06-07 |
EP1922585B1 (en) | 2016-06-15 |
CN101263426B (zh) | 2011-11-09 |
JP4615602B2 (ja) | 2011-01-19 |
KR100814232B1 (ko) | 2008-03-17 |
TWI340871B (en) | 2011-04-21 |
KR20070057652A (ko) | 2007-06-07 |
JP2009511939A (ja) | 2009-03-19 |
EP1922585A1 (en) | 2008-05-21 |
US7556910B2 (en) | 2009-07-07 |
KR20070072344A (ko) | 2007-07-04 |
KR100814231B1 (ko) | 2008-03-17 |
EP1922585A4 (en) | 2010-07-28 |
CN101263426A (zh) | 2008-09-10 |
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