TW200708894A - Photosensitive resin composition comprising organic and inorganic compounds - Google Patents
Photosensitive resin composition comprising organic and inorganic compoundsInfo
- Publication number
- TW200708894A TW200708894A TW095126177A TW95126177A TW200708894A TW 200708894 A TW200708894 A TW 200708894A TW 095126177 A TW095126177 A TW 095126177A TW 95126177 A TW95126177 A TW 95126177A TW 200708894 A TW200708894 A TW 200708894A
- Authority
- TW
- Taiwan
- Prior art keywords
- film
- resin
- organic
- compounds
- resin composition
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0044—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists involving an interaction between the metallic and non-metallic component, e.g. photodope systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Abstract
The purpose of this invention is to provide a photosensitive resin composition. It comprises organic and inorganic compounds. This resin possesses the characteristics of excellent adhesive, heat-resistant, insulated, flat, and chemical-resistant, etc. This resin is the material suitable for forming the pattern of a LCD component. Especially, since the resin becomes the organic insulating film of the aforementioned LCD component, the film has an outstanding dielectric value, uniformity, sensitivity, film residual ratio, and UV transparency. Therefore, this film is not only suitable for the organic insulating film of a gate. At the same time, it is also utilized as the corrosion-resisting resin of a protecting film, a black array, a pillar spacer, or a color filter. Further, the resin increases the sensitivity, and film residual ratio. In addition, the photosensitive resin composition organic compounds and inorganic compounds comprises: (A) The metal oxide groups of the metal oxides related to the III, IV, V, or XIII groups, or the metal oxides related to transition elements. (B) (a) Propylene series compounds. (b) Optical trigger. (c) Multifunctional monomers of ethylene unsaturated bond (d) Silicon series compounds of epoxide group or amino group, and (e) Solvent.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050065510A KR101221450B1 (en) | 2005-07-19 | 2005-07-19 | Photosensitive resin composition comprising organic and inorganic compound |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200708894A true TW200708894A (en) | 2007-03-01 |
Family
ID=37656735
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095126177A TW200708894A (en) | 2005-07-19 | 2006-07-18 | Photosensitive resin composition comprising organic and inorganic compounds |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5194224B2 (en) |
KR (1) | KR101221450B1 (en) |
CN (1) | CN1900821B (en) |
TW (1) | TW200708894A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI392909B (en) * | 2007-07-16 | 2013-04-11 | Korea Electrotech Res Inst | Organic-inorganic hybrid photosensitive resin composition and liquid crystal display comprising cured body thereof |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101305528B1 (en) * | 2006-02-03 | 2013-09-05 | 주식회사 동진쎄미켐 | Organic-inorganic composite photosensitive resin composition, liquid crystal display having that curing product, method of forming a pattern of liquid crystal display using the same |
KR101482552B1 (en) * | 2008-04-30 | 2015-01-21 | 주식회사 동진쎄미켐 | Negative photosensitive resin composition |
KR101316397B1 (en) | 2008-09-30 | 2013-10-10 | 코오롱인더스트리 주식회사 | Photosensitive resin composition for organic insulator |
WO2011030580A1 (en) * | 2009-09-10 | 2011-03-17 | 積水化学工業株式会社 | Photosensitive composition and printed wiring board |
JP5540689B2 (en) * | 2009-12-18 | 2014-07-02 | Jsr株式会社 | Radiation-sensitive composition, cured film and method for forming the same |
CN103038705B (en) * | 2010-05-03 | 2016-04-20 | 巴斯夫欧洲公司 | For the color filter of cryogenic applications |
TW201213420A (en) * | 2010-06-02 | 2012-04-01 | Sumitomo Chemical Co | Curable resin composition |
JP4924776B2 (en) * | 2010-06-07 | 2012-04-25 | 日立化成工業株式会社 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING THE SAME, METHOD FOR FORMING PARTICLE OF IMAGE DISPLAY DEVICE, METHOD FOR PRODUCING IMAGE DISPLAY DEVICE, AND IMAGE DISPLAY DEVICE |
KR20120021488A (en) * | 2010-08-03 | 2012-03-09 | 주식회사 동진쎄미켐 | Negative photosensitive resin composition |
KR20120118600A (en) * | 2011-04-19 | 2012-10-29 | 삼성디스플레이 주식회사 | Photosensitive composition and method of manufacturing a substrate for a display device using the photosensitive composition |
JP5699096B2 (en) * | 2012-01-26 | 2015-04-08 | 東京応化工業株式会社 | Photosensitive composition, pattern and display device having pattern |
JP6171677B2 (en) * | 2013-07-26 | 2017-08-02 | 東洋インキScホールディングス株式会社 | Photocurable resin composition |
JP6255806B2 (en) * | 2013-09-04 | 2018-01-10 | Jsr株式会社 | Gate insulating film, radiation sensitive resin composition, cured film, method for forming gate insulating film, semiconductor element, and display device |
KR102142648B1 (en) * | 2013-12-16 | 2020-08-10 | 삼성디스플레이 주식회사 | Photo-sensitive resin composition, method for manufacturing organic layer using the composition, and display device comprising the organic layer |
JP6764636B2 (en) * | 2014-10-08 | 2020-10-07 | 東京応化工業株式会社 | Radiation-sensitive resin composition, pattern manufacturing method, transparent insulating film, and display device |
JPWO2017169440A1 (en) * | 2016-03-28 | 2019-02-14 | Jsr株式会社 | Radiation-sensitive composition and pattern forming method |
CN107586387B (en) * | 2017-08-25 | 2021-01-26 | 无锡龙驰氟硅新材料有限公司 | UV photoinitiator compound for fluorosilicone resin and preparation method thereof |
CN110894367A (en) * | 2019-11-28 | 2020-03-20 | 江苏胜帆电子科技有限公司 | Preparation method of high-strength LCP composite material |
CN117210141B (en) * | 2023-11-07 | 2024-01-26 | 明士(北京)新材料开发有限公司 | Development-resistant photosensitive adhesive film and preparation and application thereof |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3870463B2 (en) * | 1996-12-11 | 2007-01-17 | 東レ株式会社 | Photosensitive green sheet and plasma display manufacturing method |
JP4175591B2 (en) | 1999-11-26 | 2008-11-05 | 日本化薬株式会社 | Photosensitive resin composition and photosensitive film using the same |
DE60043239D1 (en) * | 2000-06-12 | 2009-12-10 | Lg Chemical Ltd | COMPOSITION ON TRIAZINE BASE WITH FUNCTIONALIZED ALKYLTHIOGRUPPES AND PHOTOPOLYMERIZATION INITIATOR |
CN1226752C (en) * | 2001-01-29 | 2005-11-09 | 捷时雅株式会社 | Composite particle for dielectrics, ultramicro particulate composite resin particle, composition for forming dielectrics and use thereof |
JP2003316000A (en) * | 2002-04-24 | 2003-11-06 | Toray Ind Inc | Photosensitive ceramic composition |
KR100995451B1 (en) | 2003-07-03 | 2010-11-18 | 삼성전자주식회사 | Organic Thin Film Transistor comprising Gate Insulator having Multi-layered Structure |
JP4292985B2 (en) * | 2003-12-25 | 2009-07-08 | Jsr株式会社 | Radiation-sensitive composition, microlens and method for forming the same, and liquid crystal display device |
-
2005
- 2005-07-19 KR KR1020050065510A patent/KR101221450B1/en active IP Right Grant
-
2006
- 2006-07-13 JP JP2006192409A patent/JP5194224B2/en active Active
- 2006-07-18 TW TW095126177A patent/TW200708894A/en unknown
- 2006-07-19 CN CN2006101063215A patent/CN1900821B/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI392909B (en) * | 2007-07-16 | 2013-04-11 | Korea Electrotech Res Inst | Organic-inorganic hybrid photosensitive resin composition and liquid crystal display comprising cured body thereof |
Also Published As
Publication number | Publication date |
---|---|
CN1900821B (en) | 2011-08-31 |
KR101221450B1 (en) | 2013-01-11 |
CN1900821A (en) | 2007-01-24 |
JP5194224B2 (en) | 2013-05-08 |
JP2007025678A (en) | 2007-02-01 |
KR20070010712A (en) | 2007-01-24 |
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