TW200736814A - Optical system for transforming numerical aperture - Google Patents
Optical system for transforming numerical apertureInfo
- Publication number
- TW200736814A TW200736814A TW096102729A TW96102729A TW200736814A TW 200736814 A TW200736814 A TW 200736814A TW 096102729 A TW096102729 A TW 096102729A TW 96102729 A TW96102729 A TW 96102729A TW 200736814 A TW200736814 A TW 200736814A
- Authority
- TW
- Taiwan
- Prior art keywords
- defining element
- numerical aperture
- optical system
- pupil
- transforming numerical
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0955—Lenses
- G02B27/0961—Lens arrays
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0013—Means for improving the coupling-in of light from the light source into the light guide
- G02B6/0023—Means for improving the coupling-in of light from the light source into the light guide provided by one optical element, or plurality thereof, placed between the light guide and the light source, or around the light source
- G02B6/003—Lens or lenticular sheet or layer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Elements Other Than Lenses (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/347,282 US7532403B2 (en) | 2006-02-06 | 2006-02-06 | Optical system for transforming numerical aperture |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200736814A true TW200736814A (en) | 2007-10-01 |
TWI344062B TWI344062B (en) | 2011-06-21 |
Family
ID=37963464
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096102729A TWI344062B (en) | 2006-02-06 | 2007-01-24 | Optical system for transforming numerical aperture |
Country Status (7)
Country | Link |
---|---|
US (2) | US7532403B2 (zh) |
EP (1) | EP1816520A3 (zh) |
JP (1) | JP4551415B2 (zh) |
KR (1) | KR100869307B1 (zh) |
CN (1) | CN101025474B (zh) |
SG (1) | SG134315A1 (zh) |
TW (1) | TWI344062B (zh) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7532403B2 (en) * | 2006-02-06 | 2009-05-12 | Asml Holding N.V. | Optical system for transforming numerical aperture |
US7839487B2 (en) * | 2006-04-13 | 2010-11-23 | Asml Holding N.V. | Optical system for increasing illumination efficiency of a patterning device |
US8441730B2 (en) * | 2006-11-14 | 2013-05-14 | Xiper Innovations, Inc. | Non-attenuating light collimating articles for graphic arts |
US8115904B2 (en) * | 2008-05-30 | 2012-02-14 | Corning Incorporated | Illumination system for sizing focused spots of a patterning system for maskless lithography |
KR101650878B1 (ko) * | 2010-03-22 | 2016-08-25 | 삼성디스플레이 주식회사 | 박막 트랜지스터의 제조 방법 및 이를 이용한 표시 기판의 제조 방법 |
NL2006556A (en) | 2010-05-13 | 2011-11-15 | Asml Holding Nv | Optical system, inspection system and manufacturing method. |
US20120224172A1 (en) * | 2010-12-10 | 2012-09-06 | Nikon Corporation | Optical components for use in measuring projection lens distortion or focus of an optical imaging system that images a substrate |
JP5637931B2 (ja) * | 2011-05-17 | 2014-12-10 | キヤノン株式会社 | インプリント装置、インプリント方法およびデバイス製造方法 |
WO2014157709A1 (ja) * | 2013-03-28 | 2014-10-02 | Sasaki Makoto | 撮像光学系及び撮像装置 |
NL2017493B1 (en) * | 2016-09-19 | 2018-03-27 | Kulicke & Soffa Liteq B V | Optical beam homogenizer based on a lens array |
KR102087081B1 (ko) * | 2017-09-13 | 2020-03-10 | 네이버랩스 주식회사 | 영상센서 방식 라이다의 측정거리 향상을 위한 광 집속 시스템 |
EP4286919B1 (en) * | 2022-05-29 | 2024-02-14 | Laserworld (Switzerland) AG | Multi-wavelength laser beam homogenizer-expander light engine |
Family Cites Families (54)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US156269A (en) * | 1874-10-27 | Improvement in refrigerators | ||
US7572A (en) * | 1850-08-20 | Improvement in gun harpoons and lances | ||
US130561A (en) * | 1872-08-20 | Improvement in truss-bridges | ||
US263821A (en) * | 1882-09-05 | solviy | ||
US41104A (en) * | 1864-01-05 | Improved washing-machine | ||
US4516832A (en) | 1982-06-23 | 1985-05-14 | International Business Machines Corporation | Apparatus for transformation of a collimated beam into a source of _required shape and numerical aperture |
US4516963A (en) * | 1983-05-23 | 1985-05-14 | Borg-Warner Corporation | Power transmission chain-belt |
US5523193A (en) | 1988-05-31 | 1996-06-04 | Texas Instruments Incorporated | Method and apparatus for patterning and imaging member |
EP0527166B1 (de) | 1990-05-02 | 1995-06-14 | Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. | Belichtungsvorrichtung |
US5229872A (en) | 1992-01-21 | 1993-07-20 | Hughes Aircraft Company | Exposure device including an electrically aligned electronic mask for micropatterning |
US6219015B1 (en) | 1992-04-28 | 2001-04-17 | The Board Of Directors Of The Leland Stanford, Junior University | Method and apparatus for using an array of grating light valves to produce multicolor optical images |
JP3224041B2 (ja) | 1992-07-29 | 2001-10-29 | 株式会社ニコン | 露光方法及び装置 |
JPH06177007A (ja) | 1992-12-01 | 1994-06-24 | Nippon Telegr & Teleph Corp <Ntt> | 投影露光装置 |
US5729331A (en) | 1993-06-30 | 1998-03-17 | Nikon Corporation | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
JP3339149B2 (ja) | 1993-12-08 | 2002-10-28 | 株式会社ニコン | 走査型露光装置ならびに露光方法 |
US5677703A (en) | 1995-01-06 | 1997-10-14 | Texas Instruments Incorporated | Data loading circuit for digital micro-mirror device |
US5530482A (en) | 1995-03-21 | 1996-06-25 | Texas Instruments Incorporated | Pixel data processing for spatial light modulator having staggered pixels |
US6133986A (en) | 1996-02-28 | 2000-10-17 | Johnson; Kenneth C. | Microlens scanner for microlithography and wide-field confocal microscopy |
WO1998032054A1 (en) | 1997-01-21 | 1998-07-23 | The University Of New Mexico | Methods and apparatus for integrating optical and interferometric lithography to produce complex patterns |
DE69711929T2 (de) | 1997-01-29 | 2002-09-05 | Micronic Laser Systems Ab Taeb | Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl |
US6177980B1 (en) | 1997-02-20 | 2001-01-23 | Kenneth C. Johnson | High-throughput, maskless lithography system |
SE509062C2 (sv) | 1997-02-28 | 1998-11-30 | Micronic Laser Systems Ab | Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster |
US5982553A (en) | 1997-03-20 | 1999-11-09 | Silicon Light Machines | Display device incorporating one-dimensional grating light-valve array |
SE9800665D0 (sv) | 1998-03-02 | 1998-03-02 | Micronic Laser Systems Ab | Improved method for projection printing using a micromirror SLM |
JP4051473B2 (ja) * | 1998-12-17 | 2008-02-27 | 株式会社ニコン | 照明光学装置および該照明光学装置を備えた露光装置 |
US6563567B1 (en) * | 1998-12-17 | 2003-05-13 | Nikon Corporation | Method and apparatus for illuminating a surface using a projection imaging apparatus |
SE522531C2 (sv) | 1999-11-24 | 2004-02-17 | Micronic Laser Systems Ab | Metod och anordning för märkning av halvledare |
WO2001061411A1 (en) | 2000-02-16 | 2001-08-23 | Asml Us, Inc. | Zoom illumination system for use in photolithography |
TW520526B (en) | 2000-05-22 | 2003-02-11 | Nikon Corp | Exposure apparatus, method for manufacturing thereof, method for exposing and method for manufacturing micro-device |
JP2002033259A (ja) * | 2000-07-17 | 2002-01-31 | Nikon Corp | 投影露光方法、投影露光装置および照明光学装置 |
JP2002075835A (ja) * | 2000-08-30 | 2002-03-15 | Nikon Corp | 照明光学装置および該照明光学装置を備えた露光装置 |
WO2002025373A2 (en) | 2000-09-13 | 2002-03-28 | Massachusetts Institute Of Technology | Method of design and fabrication of integrated circuits using regular arrays and gratings |
JP2002222761A (ja) * | 2000-11-22 | 2002-08-09 | Nikon Corp | 照明光学装置および該照明光学装置を備えた露光装置 |
DE10148167A1 (de) | 2001-09-28 | 2003-04-17 | Zeiss Carl Jena Gmbh | Beleuchtungsanordnung |
US7006295B2 (en) | 2001-10-18 | 2006-02-28 | Asml Holding N.V. | Illumination system and method for efficiently illuminating a pattern generator |
US6813003B2 (en) | 2002-06-11 | 2004-11-02 | Mark Oskotsky | Advanced illumination system for use in microlithography |
US6775069B2 (en) | 2001-10-18 | 2004-08-10 | Asml Holding N.V. | Advanced illumination system for use in microlithography |
US7079321B2 (en) | 2001-10-18 | 2006-07-18 | Asml Holding N.V. | Illumination system and method allowing for varying of both field height and pupil |
JP3563384B2 (ja) | 2001-11-08 | 2004-09-08 | 大日本スクリーン製造株式会社 | 画像記録装置 |
TW200307179A (en) * | 2002-05-27 | 2003-12-01 | Nikon Corp | Lighting device, exposing device and exposing method |
SG130007A1 (en) | 2002-06-12 | 2007-03-20 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
US7053985B2 (en) | 2002-07-19 | 2006-05-30 | Applied Materials, Isreal, Ltd. | Printer and a method for recording a multi-level image |
AU2003278865A1 (en) | 2002-09-19 | 2004-04-08 | Dmetrix, Inc. | A multi-axis projection imaging system |
JP2004157219A (ja) * | 2002-11-05 | 2004-06-03 | Fuji Photo Film Co Ltd | 露光ヘッドおよび露光装置 |
US6870554B2 (en) | 2003-01-07 | 2005-03-22 | Anvik Corporation | Maskless lithography with multiplexed spatial light modulators |
US6717736B1 (en) | 2003-02-13 | 2004-04-06 | Zetetic Institute | Catoptric and catadioptric imaging systems |
EP1482373A1 (en) | 2003-05-30 | 2004-12-01 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
TWI278912B (en) * | 2003-06-03 | 2007-04-11 | Nikon Corp | Exposure method and device, and device manufacturing method |
US7187399B2 (en) * | 2003-07-31 | 2007-03-06 | Fuji Photo Film Co., Ltd. | Exposure head with spatial light modulator |
DE10338244A1 (de) | 2003-08-20 | 2005-03-10 | Zeiss Carl Sms Gmbh | Kohärenzminderer und Herstellungsverfahren eines Kohärenzminderers |
DE10345784A1 (de) | 2003-10-01 | 2005-04-21 | Zeiss Carl Sms Gmbh | Kohärenzminderer |
US7180577B2 (en) * | 2004-12-17 | 2007-02-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a microlens array at an image plane |
JP2007017925A (ja) * | 2005-06-07 | 2007-01-25 | Fujifilm Holdings Corp | 合波レーザ光源 |
US7532403B2 (en) | 2006-02-06 | 2009-05-12 | Asml Holding N.V. | Optical system for transforming numerical aperture |
-
2006
- 2006-02-06 US US11/347,282 patent/US7532403B2/en not_active Expired - Fee Related
-
2007
- 2007-01-24 TW TW096102729A patent/TWI344062B/zh not_active IP Right Cessation
- 2007-01-27 EP EP07250344A patent/EP1816520A3/en not_active Withdrawn
- 2007-02-01 SG SG200700794-1A patent/SG134315A1/en unknown
- 2007-02-01 KR KR1020070010624A patent/KR100869307B1/ko not_active IP Right Cessation
- 2007-02-05 JP JP2007025792A patent/JP4551415B2/ja not_active Expired - Fee Related
- 2007-02-06 CN CN2007100840023A patent/CN101025474B/zh not_active Expired - Fee Related
-
2009
- 2009-03-30 US US12/413,963 patent/US7859756B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TWI344062B (en) | 2011-06-21 |
KR100869307B1 (ko) | 2008-11-18 |
US7859756B2 (en) | 2010-12-28 |
JP2007293271A (ja) | 2007-11-08 |
JP4551415B2 (ja) | 2010-09-29 |
EP1816520A3 (en) | 2007-08-15 |
US20070183054A1 (en) | 2007-08-09 |
CN101025474B (zh) | 2012-04-18 |
CN101025474A (zh) | 2007-08-29 |
EP1816520A2 (en) | 2007-08-08 |
KR20070080220A (ko) | 2007-08-09 |
US7532403B2 (en) | 2009-05-12 |
US20090251786A1 (en) | 2009-10-08 |
SG134315A1 (en) | 2007-08-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |