TW200731033A - Exposure apparatus - Google Patents

Exposure apparatus

Info

Publication number
TW200731033A
TW200731033A TW095139074A TW95139074A TW200731033A TW 200731033 A TW200731033 A TW 200731033A TW 095139074 A TW095139074 A TW 095139074A TW 95139074 A TW95139074 A TW 95139074A TW 200731033 A TW200731033 A TW 200731033A
Authority
TW
Taiwan
Prior art keywords
photomask
exposure
color filter
filter substrate
exposure light
Prior art date
Application number
TW095139074A
Other languages
English (en)
Other versions
TWI446124B (zh
Inventor
Koichi Kajiyama
Yoshio Watanabe
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Publication of TW200731033A publication Critical patent/TW200731033A/zh
Application granted granted Critical
Publication of TWI446124B publication Critical patent/TWI446124B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
TW95139074A 2005-10-25 2006-10-24 曝光裝置 TWI446124B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005309205A JP5382899B2 (ja) 2005-10-25 2005-10-25 露光装置

Publications (2)

Publication Number Publication Date
TW200731033A true TW200731033A (en) 2007-08-16
TWI446124B TWI446124B (zh) 2014-07-21

Family

ID=37967554

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95139074A TWI446124B (zh) 2005-10-25 2006-10-24 曝光裝置

Country Status (5)

Country Link
JP (1) JP5382899B2 (zh)
KR (1) KR101306917B1 (zh)
CN (1) CN101268420B (zh)
TW (1) TWI446124B (zh)
WO (1) WO2007049436A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI421546B (zh) * 2009-10-02 2014-01-01 Unique Instr Co Ltd A Method for Copying Production of 3D Parallax Gratings
TWI486644B (zh) * 2009-04-30 2015-06-01 Toppan Printing Co Ltd 彩色濾光片及液晶顯示裝置以及曝光遮罩

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5235061B2 (ja) * 2007-08-30 2013-07-10 株式会社ブイ・テクノロジー 露光装置
JP5098041B2 (ja) * 2007-08-31 2012-12-12 株式会社ブイ・テクノロジー 露光方法
JP5256434B2 (ja) * 2008-06-11 2013-08-07 株式会社ブイ・テクノロジー 近接露光装置
WO2010070988A1 (ja) * 2008-12-16 2010-06-24 株式会社ブイ・テクノロジー 凸状パターン形成方法、露光装置及びフォトマスク
JP5360620B2 (ja) * 2009-02-26 2013-12-04 凸版印刷株式会社 カラーフィルタ及びカラーフィルタの製造方法
JP5258051B2 (ja) * 2009-04-03 2013-08-07 株式会社ブイ・テクノロジー 露光方法及び露光装置
KR20120018151A (ko) 2009-04-28 2012-02-29 도판 인사츠 가부시키가이샤 컬러 필터, 액정 표시 장치, 컬러 필터의 제조 방법
JPWO2010125824A1 (ja) 2009-04-30 2012-10-25 凸版印刷株式会社 液晶表示装置
JP5633021B2 (ja) * 2009-06-29 2014-12-03 株式会社ブイ・テクノロジー アライメント方法、アライメント装置及び露光装置
CN102667627B (zh) 2009-12-24 2014-11-12 凸版印刷株式会社 曝光方法及曝光装置
JP5542456B2 (ja) * 2010-01-18 2014-07-09 凸版印刷株式会社 カラーフィルタ基板の露光方法
JP5549233B2 (ja) * 2010-01-18 2014-07-16 凸版印刷株式会社 カラーフィルタ基板の露光方法
JPWO2011105461A1 (ja) * 2010-02-24 2013-06-20 Ｎｓｋテクノロジー株式会社 露光装置用光照射装置、露光装置、露光方法、基板の製造方法、マスク、及び被露光基板
JP5382456B2 (ja) * 2010-04-08 2014-01-08 株式会社ブイ・テクノロジー 露光方法及び露光装置
KR101681143B1 (ko) 2010-07-19 2016-12-02 삼성디스플레이 주식회사 노광 장치 및 이를 이용한 노광 방법
KR101104367B1 (ko) * 2011-07-27 2012-01-16 주식회사 필옵틱스 Ｌｅｄ 광원 노광 장치
US9081297B2 (en) 2012-05-01 2015-07-14 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography apparatus having dual reticle edge masking assemblies and method of use
CN103955087B (zh) * 2014-05-12 2017-01-04 青岛斯博锐意电子技术有限公司 一种液晶光掩膜、其应用及制版装置
CN103955088B (zh) * 2014-05-12 2017-02-22 青岛斯博锐意电子技术有限公司 一种液晶光掩膜及其应用
CN106324892B (zh) * 2016-10-11 2019-08-02 武汉华星光电技术有限公司 一种用于制备显示基板的曝光系统及曝光控制方法
CN114252014A (zh) * 2021-12-24 2022-03-29 长飞光纤光缆股份有限公司 一种光掩膜基板标记尺寸测试系统及方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02177317A (ja) * 1988-12-28 1990-07-10 Canon Inc 露光装置
JP3348476B2 (ja) * 1993-08-09 2002-11-20 株式会社ニコン 走査型露光装置及び走査露光方法
JPH09199402A (ja) * 1996-01-12 1997-07-31 Canon Inc 走査型露光装置
JPH09274323A (ja) * 1996-04-04 1997-10-21 Toppan Printing Co Ltd パターン露光方法
JPH1010745A (ja) * 1996-06-19 1998-01-16 Toppan Printing Co Ltd パターン露光方法
JPH1197343A (ja) * 1997-09-24 1999-04-09 Canon Inc 露光装置
JP4581262B2 (ja) * 2000-02-18 2010-11-17 株式会社ニコン 露光装置及び露光方法
JP2002222761A (ja) * 2000-11-22 2002-08-09 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP4346320B2 (ja) * 2003-02-05 2009-10-21 大日本印刷株式会社 露光方法及び露光装置
JP2005221596A (ja) * 2004-02-04 2005-08-18 Dainippon Screen Mfg Co Ltd パターン描画装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI486644B (zh) * 2009-04-30 2015-06-01 Toppan Printing Co Ltd 彩色濾光片及液晶顯示裝置以及曝光遮罩
TWI421546B (zh) * 2009-10-02 2014-01-01 Unique Instr Co Ltd A Method for Copying Production of 3D Parallax Gratings

Also Published As

Publication number Publication date
KR101306917B1 (ko) 2013-09-10
CN101268420A (zh) 2008-09-17
WO2007049436A1 (ja) 2007-05-03
TWI446124B (zh) 2014-07-21
JP5382899B2 (ja) 2014-01-08
JP2007121344A (ja) 2007-05-17
CN101268420B (zh) 2010-10-27
KR20080059546A (ko) 2008-06-30

Similar Documents

Publication Publication Date Title
TW200731033A (en) Exposure apparatus
EP1336898A3 (en) Exposure apparatus and method, and device fabricating method using the same
EP1947513A3 (en) Continuous direct-write optical lithography
EP1355194A3 (en) Projection exposure apparatus and device manufacturing method
EP1708028A3 (en) Optical element, exposure apparatus, and device manufacturing method
EP2284615A3 (en) Optical element and exposure apparatus
WO2005096098A3 (en) Projection objective, projection exposure apparatus and reflective reticle for microlithography
EP1463337A3 (en) Electronic imaging system using organic laser array illuminating an area light valve
EP1357426A3 (en) Method for setting mask pattern and its illumination condition
KR950004373A (ko) 투영 노광장치 및 방법
WO2005026843A3 (en) Illumination system for a microlithography projection exposure installation
EP0825473A3 (en) Projector apparatus
EP2259138A3 (en) Illumination optical system and exposure apparatus
EP1717639A3 (en) An exposure apparatus
TW200741328A (en) Illumination optical apparatus, projection exposure apparatus, projection optical system, and device manufacturing method
EP1331519A3 (en) Exposure control
EP1286218A3 (en) Lithographic patterning using a high transmission attenuated phase-shift mask and multiple exposures of optimised coherence
JP2007036016A5 (zh)
EP1788447A3 (en) Exposure apparatus and device manufacturing method
JP2005236088A5 (zh)
EP1164407A3 (en) Illumination system and scanning exposure apparatus using the same
EP2253997A3 (en) Illumination system for a microlithographic contact and proximity exposure apparatus
WO2006041544A3 (en) Solid immersion lens lithography
EP1698940A3 (en) Exposure method and apparatus
JP2005109304A5 (zh)

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees