TW200731024A - Plotting method and device - Google Patents

Plotting method and device

Info

Publication number
TW200731024A
TW200731024A TW095135683A TW95135683A TW200731024A TW 200731024 A TW200731024 A TW 200731024A TW 095135683 A TW095135683 A TW 095135683A TW 95135683 A TW95135683 A TW 95135683A TW 200731024 A TW200731024 A TW 200731024A
Authority
TW
Taiwan
Prior art keywords
exposed
micro
substrate
picture
mirror
Prior art date
Application number
TW095135683A
Other languages
English (en)
Inventor
Mitsuru Mushano
Katsuto Sumi
Yuji Shimoyama
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200731024A publication Critical patent/TW200731024A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW095135683A 2005-09-30 2006-09-27 Plotting method and device TW200731024A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005285929A JP4532381B2 (ja) 2005-09-30 2005-09-30 描画方法および装置

Publications (1)

Publication Number Publication Date
TW200731024A true TW200731024A (en) 2007-08-16

Family

ID=37906109

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095135683A TW200731024A (en) 2005-09-30 2006-09-27 Plotting method and device

Country Status (3)

Country Link
JP (1) JP4532381B2 (zh)
TW (1) TW200731024A (zh)
WO (1) WO2007040066A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007240596A (ja) * 2006-03-06 2007-09-20 Fujifilm Corp 描画用画像データ作成方法および装置並びに描画方法および装置
US7508491B2 (en) * 2006-04-12 2009-03-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilized to reduce quantization influence of datapath SLM interface to dose uniformity
JP4904301B2 (ja) * 2008-03-27 2012-03-28 大日本スクリーン製造株式会社 データ変換方法、描画システムおよびプログラム
JP6131108B2 (ja) * 2013-06-03 2017-05-17 株式会社アドテックエンジニアリング 露光描画装置、露光描画方法およびプログラム
JP6867028B2 (ja) * 2017-09-20 2021-04-28 株式会社ブイ・テクノロジー パターン露光方法及びパターン露光装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004184921A (ja) * 2002-12-06 2004-07-02 Fuji Photo Film Co Ltd 露光装置
JP2005022250A (ja) * 2003-07-02 2005-01-27 Fuji Photo Film Co Ltd 画像記録方法及び画像記録装置
JP2005055881A (ja) * 2003-07-22 2005-03-03 Fuji Photo Film Co Ltd 描画方法および描画装置
JP4203649B2 (ja) * 2003-09-05 2009-01-07 株式会社オーク製作所 多重露光描画方法及び多重露光描画装置
JP4510429B2 (ja) * 2003-11-19 2010-07-21 財団法人国際科学振興財団 マスク描画手法、及びマスク描画装置
JP2005189714A (ja) * 2003-12-26 2005-07-14 Fuji Photo Film Co Ltd 露光装置
JP2005210112A (ja) * 2003-12-26 2005-08-04 Fuji Photo Film Co Ltd 露光方法および装置
JP2005201972A (ja) * 2004-01-13 2005-07-28 Fuji Photo Film Co Ltd 画像記録方法および画像記録装置

Also Published As

Publication number Publication date
WO2007040066A1 (ja) 2007-04-12
JP2007094227A (ja) 2007-04-12
JP4532381B2 (ja) 2010-08-25

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