JP2007250686A5 - - Google Patents
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- Publication number
- JP2007250686A5 JP2007250686A5 JP2006069901A JP2006069901A JP2007250686A5 JP 2007250686 A5 JP2007250686 A5 JP 2007250686A5 JP 2006069901 A JP2006069901 A JP 2006069901A JP 2006069901 A JP2006069901 A JP 2006069901A JP 2007250686 A5 JP2007250686 A5 JP 2007250686A5
- Authority
- JP
- Japan
- Prior art keywords
- pressure
- space
- exposure apparatus
- optical system
- regulator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006069901A JP4378357B2 (ja) | 2006-03-14 | 2006-03-14 | 露光装置及びその圧力制御方法並びにデバイス製造方法 |
US11/684,953 US7525106B2 (en) | 2006-03-14 | 2007-03-12 | Exposure apparatus, pressure control method for the same, and device manufacturing method |
TW096108630A TW200745774A (en) | 2006-03-14 | 2007-03-13 | Exposure apparatus, pressure control method for the same, and device manufacturing method |
KR1020070024881A KR100880617B1 (ko) | 2006-03-14 | 2007-03-14 | 노광장치, 그 압력제어방법, 및 디바이스 제조방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006069901A JP4378357B2 (ja) | 2006-03-14 | 2006-03-14 | 露光装置及びその圧力制御方法並びにデバイス製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007250686A JP2007250686A (ja) | 2007-09-27 |
JP2007250686A5 true JP2007250686A5 (zh) | 2007-11-29 |
JP4378357B2 JP4378357B2 (ja) | 2009-12-02 |
Family
ID=38594682
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006069901A Expired - Fee Related JP4378357B2 (ja) | 2006-03-14 | 2006-03-14 | 露光装置及びその圧力制御方法並びにデバイス製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7525106B2 (zh) |
JP (1) | JP4378357B2 (zh) |
KR (1) | KR100880617B1 (zh) |
TW (1) | TW200745774A (zh) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006044591A1 (de) * | 2006-09-19 | 2008-04-03 | Carl Zeiss Smt Ag | Optische Anordnung, insbesondere Projektionsbelichtungsanlage für die EUV-Lithographie, sowie reflektives optisches Element mit verminderter Kontamination |
JP4656115B2 (ja) | 2007-09-27 | 2011-03-23 | ソニー株式会社 | 撮像装置、画像信号処理回路、および画像信号処理方法、並びにコンピュータ・プログラム |
JP2009294439A (ja) * | 2008-06-05 | 2009-12-17 | Toshiba Corp | レジストパターン形成方法 |
NL2005741A (en) * | 2009-12-23 | 2011-06-27 | Asml Netherlands Bv | Lithographic apparatus and method. |
JP2012114140A (ja) * | 2010-11-22 | 2012-06-14 | Renesas Electronics Corp | 露光方法および露光装置 |
NL2008186A (en) * | 2011-03-14 | 2012-09-17 | Asml Netherlands Bv | Projection system, lithographic apparatus and device manufacturing method. |
US9506478B2 (en) * | 2012-01-13 | 2016-11-29 | Edwards Limited | Vacuum system |
JP2015127837A (ja) * | 2015-04-03 | 2015-07-09 | ルネサスエレクトロニクス株式会社 | 露光方法および露光装置 |
JP6748461B2 (ja) * | 2016-03-22 | 2020-09-02 | キヤノン株式会社 | インプリント装置、インプリント装置の動作方法および物品製造方法 |
US11979971B2 (en) * | 2018-06-29 | 2024-05-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | EUV light source and apparatus for lithography |
CN113646699A (zh) * | 2019-04-01 | 2021-11-12 | Asml荷兰有限公司 | 光刻设备和相关方法 |
US11150564B1 (en) * | 2020-09-29 | 2021-10-19 | Taiwan Semiconductor Manufacturing Co., Ltd. | EUV wafer defect improvement and method of collecting nonconductive particles |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20010023314A (ko) | 1997-08-26 | 2001-03-26 | 오노 시게오 | 노광 장치, 노광 방법, 투영 광학계의 압력 조정 방법 및노광 장치의 조립 방법 |
US7109483B2 (en) * | 2000-11-17 | 2006-09-19 | Ebara Corporation | Method for inspecting substrate, substrate inspecting system and electron beam apparatus |
WO2002045153A1 (en) * | 2000-12-01 | 2002-06-06 | Ebara Corporation | Inspection method and apparatus using electron beam, and device production method using it |
TWI242690B (en) | 2002-08-15 | 2005-11-01 | Asml Netherlands Bv | Reflector assembly, lithographic projection apparatus, radiation system with the reflector assembly, and method of manufacturing an integrated structure by a lithographic process |
JP2005057154A (ja) | 2003-08-07 | 2005-03-03 | Canon Inc | 露光装置 |
-
2006
- 2006-03-14 JP JP2006069901A patent/JP4378357B2/ja not_active Expired - Fee Related
-
2007
- 2007-03-12 US US11/684,953 patent/US7525106B2/en not_active Expired - Fee Related
- 2007-03-13 TW TW096108630A patent/TW200745774A/zh unknown
- 2007-03-14 KR KR1020070024881A patent/KR100880617B1/ko active IP Right Grant
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