TW200720858A - Method for producing a photoresist composition, a filtering device, an application device of the photoresist composition, and the photoresist composition - Google Patents

Method for producing a photoresist composition, a filtering device, an application device of the photoresist composition, and the photoresist composition

Info

Publication number
TW200720858A
TW200720858A TW095125935A TW95125935A TW200720858A TW 200720858 A TW200720858 A TW 200720858A TW 095125935 A TW095125935 A TW 095125935A TW 95125935 A TW95125935 A TW 95125935A TW 200720858 A TW200720858 A TW 200720858A
Authority
TW
Taiwan
Prior art keywords
photoresist composition
filtering device
producing
composition
application device
Prior art date
Application number
TW095125935A
Other languages
English (en)
Other versions
TWI360723B (en
Inventor
Masaaki Muroi
Hirokazu Ozaki
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200720858A publication Critical patent/TW200720858A/zh
Application granted granted Critical
Publication of TWI360723B publication Critical patent/TWI360723B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/58—Multistep processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D63/00—Apparatus in general for separation processes using semi-permeable membranes
    • B01D63/02—Hollow fibre modules
    • B01D63/032—More than two tube sheets for one bundle
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
    • B01D69/02—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor characterised by their properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
    • B01D69/08—Hollow fibre membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/06—Organic material
    • B01D71/26—Polyalkenes
    • B01D71/261—Polyethylene
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/06—Organic material
    • B01D71/30—Polyalkenyl halides
    • B01D71/32—Polyalkenyl halides containing fluorine atoms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/06—Organic material
    • B01D71/56—Polyamides, e.g. polyester-amides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2325/00—Details relating to properties of membranes
    • B01D2325/02—Details relating to pores or porosity of the membranes
    • B01D2325/0283—Pore size
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Water Supply & Treatment (AREA)
  • Materials For Photolithography (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW095125935A 2005-07-19 2006-07-14 Method for producing a photoresist composition, a TWI360723B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005208543A JP4786238B2 (ja) 2005-07-19 2005-07-19 レジスト組成物の製造方法、ろ過装置、レジスト組成物の塗布装置

Publications (2)

Publication Number Publication Date
TW200720858A true TW200720858A (en) 2007-06-01
TWI360723B TWI360723B (en) 2012-03-21

Family

ID=37668676

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095125935A TWI360723B (en) 2005-07-19 2006-07-14 Method for producing a photoresist composition, a

Country Status (6)

Country Link
US (1) US20090286178A1 (zh)
JP (1) JP4786238B2 (zh)
KR (1) KR100982151B1 (zh)
CN (2) CN101223482A (zh)
TW (1) TWI360723B (zh)
WO (1) WO2007010794A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11429018B2 (en) 2016-03-31 2022-08-30 Fujifilm Corporation Method of manufacturing chemical fluid for manufacturing electronic material, pattern forming method, method of manufacturing semiconductor device, chemical fluid for manufacturing electronic material, container, and quality inspection method

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5500765B2 (ja) * 2007-05-02 2014-05-21 三菱レイヨン株式会社 脱気用複合中空糸膜及びその製造方法
JP5217627B2 (ja) * 2008-05-22 2013-06-19 Ｊｓｒ株式会社 レジスト用樹脂含有溶液の製造方法
JP5753749B2 (ja) * 2010-09-27 2015-07-22 富士フイルム株式会社 インプリント用硬化性組成物の製造方法
JP5728517B2 (ja) * 2013-04-02 2015-06-03 富士フイルム株式会社 化学増幅型レジスト膜のパターニング用有機系処理液の製造方法、パターン形成方法、及び、電子デバイスの製造方法
US11351509B2 (en) * 2013-12-06 2022-06-07 Taiwan Semiconductor Manufacturing Company, Ltd. Filter with seal treatment
US9360758B2 (en) * 2013-12-06 2016-06-07 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device process filter and method
JP2017064711A (ja) * 2015-09-30 2017-04-06 東京応化工業株式会社 濾過フィルター及び濾過方法、並びにリソグラフィー用薬液精製品の製造方法
JP6869680B2 (ja) * 2015-09-30 2021-05-12 東京応化工業株式会社 濾過フィルター及び濾過方法、並びにリソグラフィー用薬液精製品の製造方法
US10429738B2 (en) * 2015-09-30 2019-10-01 Tokyo Ohka Kogyo Co., Ltd. Filtration filter, filtration method, production method of purified liquid chemical product for lithography, and method of forming resist pattern
KR102509747B1 (ko) * 2015-12-09 2023-03-15 에이씨엠 리서치 (상하이), 인코포레이티드 고온 화학물 및 초음파 장치를 이용한 기판 세정 방법 및 장치
WO2018180735A1 (ja) * 2017-03-31 2018-10-04 富士フイルム株式会社 薬液の精製方法、薬液の製造方法、及び、薬液
JP6900274B2 (ja) 2017-08-16 2021-07-07 株式会社Ｓｃｒｅｅｎホールディングス 薬液供給装置、基板処理装置、薬液供給方法、および基板処理方法
JPWO2019044871A1 (ja) * 2017-08-30 2020-10-08 富士フイルム株式会社 薬液の精製方法

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NZ190436A (en) * 1978-05-15 1981-12-15 Pall Corp Preparation of skinless hydrophilic alcohol insoluble polyamide membranes membranes casting resin solutions
JPS6247651A (ja) * 1985-08-27 1987-03-02 Canon Inc 画像形成方法
US5019723A (en) * 1987-12-07 1991-05-28 Controlled Release Technologies, Inc. Self-regulated therapeutic agent delivery system and method
US5215662A (en) * 1988-12-16 1993-06-01 Micron Separations Inc. Heat resistant microporous material production and products
JPH06106034A (ja) * 1992-09-25 1994-04-19 Kitz Corp 弗素樹脂製フィルタ
US5350714A (en) * 1993-11-08 1994-09-27 Shipley Company Inc. Point-of-use purification
JP3632992B2 (ja) * 1994-07-15 2005-03-30 東京応化工業株式会社 ホトレジスト溶液供給方法
KR20000016329A (ko) * 1996-07-30 2000-03-25 티모시비.카니 필터시트 및 이 필터시트를 사용하는 포토레지스트 조성물 정제방법
US6623637B1 (en) * 1996-12-24 2003-09-23 Kitz Corporation Hollow-fiber membrane module
US6015493A (en) * 1997-07-14 2000-01-18 Teleparts International, Inc. Multiple filtration bypass method and apparatus for reducing particles in liquid distribution systems
JP4139456B2 (ja) * 1997-10-02 2008-08-27 三菱レイヨン株式会社 脱気膜
JPH11244607A (ja) * 1998-03-03 1999-09-14 Mitsubishi Rayon Co Ltd 薬液の脱気方法及び脱気装置
US6712966B1 (en) * 1999-02-04 2004-03-30 Cuno Incorporated Graded particle-size retention filter medium for cell-type filter unit
JP2000317211A (ja) * 1999-05-13 2000-11-21 Mitsubishi Rayon Co Ltd 薬液脱気方法
JP4550216B2 (ja) * 1999-04-02 2010-09-22 三菱レイヨン株式会社 中空糸膜モジュール、そのポッティング材並びに薬液の脱気方法
US6596458B1 (en) * 1999-05-07 2003-07-22 Fuji Photo Film Co., Ltd. Positive-working photoresist composition
JP2000317210A (ja) * 1999-05-13 2000-11-21 Mitsubishi Rayon Co Ltd 薬液脱気装置および薬液脱気方法
US6787283B1 (en) * 1999-07-22 2004-09-07 Fuji Photo Film Co., Ltd. Positive photoresist composition for far ultraviolet exposure
JP4082833B2 (ja) * 1999-10-28 2008-04-30 富士フイルム株式会社 化学増幅型レジスト組成物の調製方法
US6616760B2 (en) * 1999-12-17 2003-09-09 Tokyo Electron Limited Film forming unit
JP4006937B2 (ja) * 2000-09-22 2007-11-14 住友化学株式会社 微細粒子量の低減されたフォトレジスト組成物の製造法
JP4006936B2 (ja) * 2000-09-22 2007-11-14 住友化学株式会社 微細粒子量の低減されたフォトレジスト組成物の製法
JP2002113334A (ja) * 2000-10-05 2002-04-16 Mitsubishi Rayon Co Ltd 中空糸膜モジュール及び中空糸膜モジュールを用いた液体の処理方法
JP3945741B2 (ja) * 2000-12-04 2007-07-18 東京応化工業株式会社 ポジ型レジスト組成物
JP4190146B2 (ja) * 2000-12-28 2008-12-03 富士フイルム株式会社 電子線またはｘ線用ポジ型レジスト組成物
JP2002273113A (ja) * 2001-03-15 2002-09-24 Koganei Corp 濾過器および薬液供給装置並びに薬液供給方法
JP4779220B2 (ja) * 2001-03-21 2011-09-28 東レ株式会社 液状物の濾過方法、顔料分散カラーペースト、透明保護膜形成材料、液晶表示装置用配向膜材料およびフォトリソグラフィー用レジスト
JP4117112B2 (ja) * 2001-03-30 2008-07-16 富士フイルム株式会社 ポジ型フォトレジスト組成物
US7264912B2 (en) * 2001-04-13 2007-09-04 Sumitomo Chemical Company, Limited Method of producing photoresist
JP4216494B2 (ja) * 2001-09-21 2009-01-28 富士フイルム株式会社 平版印刷版原版
JP3827290B2 (ja) * 2001-10-03 2006-09-27 富士写真フイルム株式会社 ポジ型感光性組成物
US20040106062A1 (en) * 2001-10-31 2004-06-03 Petrov Viacheslav Alexandrovich Photoacid generators in photoresist compositions for microlithography
JP3890229B2 (ja) * 2001-12-27 2007-03-07 株式会社コガネイ 薬液供給装置および薬液供給装置の脱気方法
JP4637476B2 (ja) * 2002-12-19 2011-02-23 東京応化工業株式会社 ホトレジスト組成物の製造方法
US7276575B2 (en) * 2003-02-06 2007-10-02 Tokyo Ohka Kogyo Co., Ltd. Process for refining crude resin for resist
JP4393910B2 (ja) * 2004-04-08 2010-01-06 東京応化工業株式会社 ホトレジスト組成物の製造方法、ろ過装置、塗布装置及びホトレジスト組成物
US7707266B2 (en) * 2004-11-23 2010-04-27 Intel Corporation Scalable, high-performance, global interconnect scheme for multi-threaded, multiprocessing system-on-a-chip network processor unit
US20060191854A1 (en) * 2005-02-27 2006-08-31 Rohm And Haas Electronic Materials Llc Filtration systems and methods

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11429018B2 (en) 2016-03-31 2022-08-30 Fujifilm Corporation Method of manufacturing chemical fluid for manufacturing electronic material, pattern forming method, method of manufacturing semiconductor device, chemical fluid for manufacturing electronic material, container, and quality inspection method

Also Published As

Publication number Publication date
KR100982151B1 (ko) 2010-09-14
TWI360723B (en) 2012-03-21
CN101223482A (zh) 2008-07-16
CN103399467A (zh) 2013-11-20
US20090286178A1 (en) 2009-11-19
KR20080022226A (ko) 2008-03-10
JP2007025341A (ja) 2007-02-01
JP4786238B2 (ja) 2011-10-05
WO2007010794A1 (ja) 2007-01-25

Similar Documents

Publication Publication Date Title
TW200720858A (en) Method for producing a photoresist composition, a filtering device, an application device of the photoresist composition, and the photoresist composition
WO2010061977A3 (en) Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method
DE602005026403D1 (de) Verfahren zur herstellung eines intrinsischen polarisierers
TW200722938A (en) Producing method for photoresist composition, filtration equipment, application equipment, and photoresist composition
WO2008153109A1 (ja) ネガ型現像用レジスト組成物及びこれを用いたパターン形成方法
EP1698937A3 (en) Positive resist composition and pattern-forming method using the same
EP1764652A3 (en) Positive resist composition and pattern-forming method using the same
FI20085760A7 (fi) Muunnettu komposiittituote ja menetelmä sen valmistamiseksi
DE602006000961D1 (de) Positive lichtempfindliche Zusammensetzung und Verfahren zur Strukturformung damit
DE102006032810A8 (de) Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, Mikrolithografie-Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, mikrolithografisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
EP3537217A3 (en) Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
WO2009019848A1 (ja) 撮影装置、撮影方法、およびプログラム
TW200705106A (en) Positive photosensitive composition and pattern forming method using the same
WO2008147741A3 (en) In-process debugging using external debugging infrastructure
WO2007104750A3 (de) Verfahren zur herstellung von polymeren nanopartikeln
ATE545066T1 (de) Fotopolymerisierbare flexodruckelemente für den druck mit uv-farben
TW200732840A (en) Resist composition and patterning process using the same
TW200942970A (en) Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor
TW200719088A (en) Method for forming positive resist composition, positive resist composition, and method for forming resist pattern
TW200745760A (en) Positive photoresist composition for forming thick resist film, thick resist laminate and method for forming resist pattern
EP1947907A3 (en) Stereo lithographic manufacturing process for hearing-aids
EP1703322A3 (en) Positive resist composition and pattern forming method using the resist composition
TW200628856A (en) Polarizing film and manufacturing method thereof, and optical element using the same
EP1748318A3 (en) Chemical amplification-type resist composition and production process thereof
ATE417074T1 (de) Polyelektrolytzusammensetzung für feuchtigkeitssensor, polyelektrolyttinte und verfahren zur herstellung einer polyelektrolytmembran für einen sensor durch tintenstrahldruck