TW200719084A - Photosensitive resin composition for forming functional pattern, and functional pattern forming method - Google Patents

Photosensitive resin composition for forming functional pattern, and functional pattern forming method

Info

Publication number
TW200719084A
TW200719084A TW095128027A TW95128027A TW200719084A TW 200719084 A TW200719084 A TW 200719084A TW 095128027 A TW095128027 A TW 095128027A TW 95128027 A TW95128027 A TW 95128027A TW 200719084 A TW200719084 A TW 200719084A
Authority
TW
Taiwan
Prior art keywords
functional pattern
forming
resin composition
photosensitive resin
functional
Prior art date
Application number
TW095128027A
Other languages
English (en)
Other versions
TWI322332B (zh
Inventor
Taisuke Shiroyama
Yukihiko Tanaka
Hitoshi Setsuda
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200719084A publication Critical patent/TW200719084A/zh
Application granted granted Critical
Publication of TWI322332B publication Critical patent/TWI322332B/zh

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Landscapes

  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Liquid Crystal (AREA)
  • Glass Compositions (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
TW095128027A 2005-08-11 2006-07-31 Photosensitive resin composition for forming functional pattern, and functional pattern forming method TW200719084A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005233768A JP4642593B2 (ja) 2005-08-11 2005-08-11 機能性パターン形成用感光性樹脂組成物および機能性パターン形成方法

Publications (2)

Publication Number Publication Date
TW200719084A true TW200719084A (en) 2007-05-16
TWI322332B TWI322332B (zh) 2010-03-21

Family

ID=37721707

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095128027A TW200719084A (en) 2005-08-11 2006-07-31 Photosensitive resin composition for forming functional pattern, and functional pattern forming method

Country Status (3)

Country Link
JP (1) JP4642593B2 (zh)
CN (1) CN1912743B (zh)
TW (1) TW200719084A (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5286777B2 (ja) * 2007-12-26 2013-09-11 セントラル硝子株式会社 感光性導電ペースト
KR101068622B1 (ko) * 2009-12-22 2011-09-28 주식회사 엘지화학 기판접착력이 향상된 고차광성 블랙매트릭스 조성물
CN103917917B (zh) * 2012-02-27 2017-02-15 株式会社村田制作所 感光性树脂组合物以及使用其的感光性膏
CN103310869B (zh) * 2012-03-08 2016-06-08 清华大学 碳纳米管浆料，其制备方法以及采用该碳纳米管浆料制备阴极发射体的方法
KR101557536B1 (ko) 2012-12-21 2015-10-06 제일모직주식회사 태양전지 전극용 페이스트 조성물 및 이로부터 제조된 전극
CN104061531B (zh) * 2013-03-21 2015-11-25 深圳市绎立锐光科技开发有限公司 一种波长转换装置的制作方法
CN105586037B (zh) * 2016-01-05 2017-12-05 重庆理工大学 一种钨酸钾红色荧光粉及制备方法
JP6591948B2 (ja) * 2016-09-29 2019-10-16 三菱マテリアル電子化成株式会社 窒化ジルコニウム粉末及びその製造方法
JP6745977B2 (ja) * 2017-03-21 2020-08-26 富士フイルム株式会社 硬化性組成物、硬化膜、遮光膜、固体撮像素子、固体撮像装置、及び、硬化膜の製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5723274A (en) * 1996-09-11 1998-03-03 Eastman Kodak Company Film former and non-film former coating composition for imaging elements
JP3371745B2 (ja) * 1997-03-28 2003-01-27 東レ株式会社 感光性導電ペーストおよび電極の製造方法
JP4238384B2 (ja) * 1998-07-31 2009-03-18 東レ株式会社 感光性導電ペーストおよびプラズマディスプレイ用電極の製造方法
JP2000319548A (ja) * 1999-05-11 2000-11-21 Daicel Chem Ind Ltd アルカリ現像型光硬化性ガラスペースト組成物及びそれを用いたプラズマディスプレイパネル隔壁の製造方法
JP3538408B2 (ja) * 2001-10-23 2004-06-14 太陽インキ製造株式会社 光硬化性組成物及びそれを用いて電極形成したプラズマディスプレイパネル
JP2003330164A (ja) * 2002-05-10 2003-11-19 Sumitomo Bakelite Co Ltd 感光性銀ペースト及びそれを用いた画像表示装置
JP4299021B2 (ja) * 2003-02-19 2009-07-22 ヤマト電子株式会社 封着加工材及び封着加工用ペースト

Also Published As

Publication number Publication date
JP2007047610A (ja) 2007-02-22
CN1912743A (zh) 2007-02-14
TWI322332B (zh) 2010-03-21
JP4642593B2 (ja) 2011-03-02
CN1912743B (zh) 2010-06-16

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