TW200714528A - Pellicle storing container - Google Patents

Pellicle storing container

Info

Publication number
TW200714528A
TW200714528A TW095135729A TW95135729A TW200714528A TW 200714528 A TW200714528 A TW 200714528A TW 095135729 A TW095135729 A TW 095135729A TW 95135729 A TW95135729 A TW 95135729A TW 200714528 A TW200714528 A TW 200714528A
Authority
TW
Taiwan
Prior art keywords
pellicle
cover
storing container
tray
abrasion powder
Prior art date
Application number
TW095135729A
Other languages
English (en)
Chinese (zh)
Inventor
Wataru Kikuchi
Toshitsugu Yajima
Original Assignee
Shinetsu Polymer Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Polymer Co filed Critical Shinetsu Polymer Co
Publication of TW200714528A publication Critical patent/TW200714528A/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67353—Closed carriers specially adapted for a single substrate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67366—Closed carriers characterised by materials, roughness, coatings or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67376—Closed carriers characterised by sealing arrangements

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Library & Information Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Packaging Frangible Articles (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Packages (AREA)
  • Closures For Containers (AREA)
TW095135729A 2005-10-07 2006-09-27 Pellicle storing container TW200714528A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005294607 2005-10-07
JP2006142826A JP2007128030A (ja) 2005-10-07 2006-05-23 ペリクル用収納容器

Publications (1)

Publication Number Publication Date
TW200714528A true TW200714528A (en) 2007-04-16

Family

ID=37942479

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095135729A TW200714528A (en) 2005-10-07 2006-09-27 Pellicle storing container

Country Status (4)

Country Link
JP (1) JP2007128030A (ko)
KR (1) KR101131688B1 (ko)
TW (1) TW200714528A (ko)
WO (1) WO2007043217A1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112389846A (zh) * 2019-08-16 2021-02-23 家登精密工业股份有限公司 光罩收容装置

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008083618A (ja) * 2006-09-29 2008-04-10 Asahi Kasei Electronics Co Ltd ペリクル収納容器の補強材
JP4822357B2 (ja) * 2007-04-20 2011-11-24 信越化学工業株式会社 ペリクル収納容器、および、その製造方法
JP4973403B2 (ja) * 2007-09-07 2012-07-11 株式会社豊田自動織機 シールキャップ用抜止具
JP5528190B2 (ja) * 2010-04-23 2014-06-25 信越化学工業株式会社 ペリクル収納容器
JP2012046239A (ja) * 2010-08-30 2012-03-08 Shin-Etsu Chemical Co Ltd ペリクル収納ケース用コーナークリップ
JP5767730B2 (ja) * 2014-03-20 2015-08-19 旭化成イーマテリアルズ株式会社 収納容器からの大型ペリクルの取出し方法
JP6308676B2 (ja) * 2014-12-18 2018-04-11 信越化学工業株式会社 リソグラフィ用ペリクル容器。
JP7245893B2 (ja) * 2017-03-30 2023-03-24 旭化成株式会社 ペリクル用緩衝材、及び梱包体
EP3705943A1 (en) * 2019-08-23 2020-09-09 ASML Netherlands B.V. Pod for housing patterning device
WO2024039587A1 (en) * 2022-08-17 2024-02-22 Entegris, Inc. Reticle container having plating with reduced edge build

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49127678U (ko) * 1973-03-02 1974-11-01
JPS5752405Y2 (ko) * 1975-09-29 1982-11-15
JPS5729095Y2 (ko) * 1979-09-08 1982-06-25
JPS5771802U (ko) * 1980-10-20 1982-05-01
JPS57101698U (ko) * 1980-12-13 1982-06-22
JPS5824609A (ja) * 1982-07-05 1983-02-14 明邦株式会社 Ｕ字形クリップ組立体
JPH0769016B2 (ja) * 1991-11-20 1995-07-26 日本バルカー工業株式会社 ウレタンパッキン
JP3356897B2 (ja) * 1994-12-16 2002-12-16 信越化学工業株式会社 ペリクル収納容器
JP3718074B2 (ja) * 1999-03-05 2005-11-16 信越化学工業株式会社 ペリクル収納容器
JP3978768B2 (ja) * 2001-11-28 2007-09-19 日本ポリウレタン工業株式会社 熱硬化性ポリウレタンエラストマーの製造方法
KR20030064084A (ko) * 2002-01-25 2003-07-31 김진희 용기 뚜껑 밀폐용 클립
JP4525960B2 (ja) * 2002-08-01 2010-08-18 住友ゴム工業株式会社 導電性ウレタン組成物及び該組成物を用いた導電性ローラ
JP4382338B2 (ja) * 2002-10-07 2009-12-09 日本クラウンコルク株式会社 耐熱性キャップ
JP2005002171A (ja) * 2003-06-10 2005-01-06 Nippon Polyurethane Ind Co Ltd 熱硬化性ポリウレタン組成物及び該組成物を用いて得られるｏａ機器用ロール又はベルト
JP4556441B2 (ja) * 2004-02-12 2010-10-06 Ｄｉｃ株式会社 熱硬化性ポリウレタンエラストマー用組成物及び熱硬化性ポリウレタンエラストマー

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112389846A (zh) * 2019-08-16 2021-02-23 家登精密工业股份有限公司 光罩收容装置

Also Published As

Publication number Publication date
WO2007043217A1 (ja) 2007-04-19
JP2007128030A (ja) 2007-05-24
KR20080059627A (ko) 2008-06-30
KR101131688B1 (ko) 2012-03-28

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