TW200714528A - Pellicle storing container - Google Patents

Pellicle storing container

Info

Publication number
TW200714528A
TW200714528A TW095135729A TW95135729A TW200714528A TW 200714528 A TW200714528 A TW 200714528A TW 095135729 A TW095135729 A TW 095135729A TW 95135729 A TW95135729 A TW 95135729A TW 200714528 A TW200714528 A TW 200714528A
Authority
TW
Taiwan
Prior art keywords
pellicle
cover
storing container
tray
abrasion powder
Prior art date
Application number
TW095135729A
Other languages
Chinese (zh)
Inventor
Wataru Kikuchi
Toshitsugu Yajima
Original Assignee
Shinetsu Polymer Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Polymer Co filed Critical Shinetsu Polymer Co
Publication of TW200714528A publication Critical patent/TW200714528A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67353—Closed carriers specially adapted for a single substrate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67366—Closed carriers characterised by materials, roughness, coatings or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67376—Closed carriers characterised by sealing arrangements

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Library & Information Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Packaging Frangible Articles (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Packages (AREA)
  • Closures For Containers (AREA)

Abstract

A pellicle storing container capable of reducing of abrasion powder. There is provided pellicle storing container (1) for transporting of pellicle (5), comprising pellicle membrane (6) and, supporting the pellicle membrane (6), support frame (7), which pellicle storing container (1) is equipped with tray (3), cover (2) as a lid thereof and block members (4,50,60,70) for closing up any gap between the tray (3) and the cover (2) on the outer side or inner side of the tray (3) and cover (2). The block members (4,50,60,70) can be seal member (79), clip (4), composite clip (50) and cover sheet (60). The occurrence/penetration of abrasion powder can be reduced by constituting al least a part brought into contact with the tray (3) or cover (2) by a urethane elastomer.
TW095135729A 2005-10-07 2006-09-27 Pellicle storing container TW200714528A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005294607 2005-10-07
JP2006142826A JP2007128030A (en) 2005-10-07 2006-05-23 Pellicle storing container

Publications (1)

Publication Number Publication Date
TW200714528A true TW200714528A (en) 2007-04-16

Family

ID=37942479

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095135729A TW200714528A (en) 2005-10-07 2006-09-27 Pellicle storing container

Country Status (4)

Country Link
JP (1) JP2007128030A (en)
KR (1) KR101131688B1 (en)
TW (1) TW200714528A (en)
WO (1) WO2007043217A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112389846A (en) * 2019-08-16 2021-02-23 家登精密工业股份有限公司 Light shield containing device

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008083618A (en) * 2006-09-29 2008-04-10 Asahi Kasei Electronics Co Ltd Reinforcing material for pellicle storage container
JP4822357B2 (en) * 2007-04-20 2011-11-24 信越化学工業株式会社 Pellicle storage container and manufacturing method thereof
JP4973403B2 (en) * 2007-09-07 2012-07-11 株式会社豊田自動織機 Seal cap stopper
JP5528190B2 (en) * 2010-04-23 2014-06-25 信越化学工業株式会社 Pellicle storage container
JP2012046239A (en) * 2010-08-30 2012-03-08 Shin-Etsu Chemical Co Ltd Corner clip for pellicle container case
JP5767730B2 (en) * 2014-03-20 2015-08-19 旭化成イーマテリアルズ株式会社 How to remove a large pellicle from a storage container
JP6308676B2 (en) * 2014-12-18 2018-04-11 信越化学工業株式会社 Pellicle container for lithography.
JP7245893B2 (en) * 2017-03-30 2023-03-24 旭化成株式会社 Cushioning material for pellicle and package
EP3705943A1 (en) * 2019-08-23 2020-09-09 ASML Netherlands B.V. Pod for housing patterning device
WO2024039587A1 (en) * 2022-08-17 2024-02-22 Entegris, Inc. Reticle container having plating with reduced edge build

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49127678U (en) * 1973-03-02 1974-11-01
JPS5752405Y2 (en) * 1975-09-29 1982-11-15
JPS5729095Y2 (en) * 1979-09-08 1982-06-25
JPS5771802U (en) * 1980-10-20 1982-05-01
JPS57101698U (en) * 1980-12-13 1982-06-22
JPS5824609A (en) * 1982-07-05 1983-02-14 明邦株式会社 Assembled body of u-shaped clip
JPH0769016B2 (en) * 1991-11-20 1995-07-26 日本バルカー工業株式会社 Urethane packing
JP3356897B2 (en) * 1994-12-16 2002-12-16 信越化学工業株式会社 Pellicle storage container
JP3718074B2 (en) * 1999-03-05 2005-11-16 信越化学工業株式会社 Pellicle storage container
JP3978768B2 (en) * 2001-11-28 2007-09-19 日本ポリウレタン工業株式会社 Method for producing thermosetting polyurethane elastomer
KR20030064084A (en) * 2002-01-25 2003-07-31 김진희 A clip for airtight case and cover
JP4525960B2 (en) * 2002-08-01 2010-08-18 住友ゴム工業株式会社 Conductive urethane composition and conductive roller using the composition
JP4382338B2 (en) * 2002-10-07 2009-12-09 日本クラウンコルク株式会社 Heat resistant cap
JP2005002171A (en) * 2003-06-10 2005-01-06 Nippon Polyurethane Ind Co Ltd Thermosetting polyurethane composition and roll or belt for oa equipment obtained using the same
JP4556441B2 (en) * 2004-02-12 2010-10-06 Ｄｉｃ株式会社 Composition for thermosetting polyurethane elastomer and thermosetting polyurethane elastomer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112389846A (en) * 2019-08-16 2021-02-23 家登精密工业股份有限公司 Light shield containing device

Also Published As

Publication number Publication date
WO2007043217A1 (en) 2007-04-19
JP2007128030A (en) 2007-05-24
KR20080059627A (en) 2008-06-30
KR101131688B1 (en) 2012-03-28

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