TW200700927A - Lithographic device, device manufacturing method and device manufactured thereby - Google Patents

Lithographic device, device manufacturing method and device manufactured thereby

Info

Publication number
TW200700927A
TW200700927A TW095110752A TW95110752A TW200700927A TW 200700927 A TW200700927 A TW 200700927A TW 095110752 A TW095110752 A TW 095110752A TW 95110752 A TW95110752 A TW 95110752A TW 200700927 A TW200700927 A TW 200700927A
Authority
TW
Taiwan
Prior art keywords
substrate
radiation
hollow tube
mask
substrate table
Prior art date
Application number
TW095110752A
Other languages
English (en)
Other versions
TWI330762B (en
Inventor
Johannes Henricus Wilhelmus Jacobs
Vadim Yevgenyevich Banine
Barrie Dudley Brewster
Vladimir Vitalevitch Ivanov
Bastiaan Matthias Mertens
Johannes Hubertus Josephina Moors
Robert Gordon Livesey
Bastiaan Theodoor Wolschrijn
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/091,926 external-priority patent/US7502095B2/en
Priority claimed from US11/252,240 external-priority patent/US20070085984A1/en
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of TW200700927A publication Critical patent/TW200700927A/zh
Application granted granted Critical
Publication of TWI330762B publication Critical patent/TWI330762B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW095110752A 2005-03-29 2006-03-28 Seal of a lithographic apparatus, lithographic apparatus, device manufacturing method and data storage medium TWI330762B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/091,926 US7502095B2 (en) 2005-03-29 2005-03-29 Lithographic apparatus, device manufacturing method, and device manufactured thereby
US11/252,240 US20070085984A1 (en) 2005-10-18 2005-10-18 Lithographic projection apparatus, device manufacturing method and device manufactured thereby

Publications (2)

Publication Number Publication Date
TW200700927A true TW200700927A (en) 2007-01-01
TWI330762B TWI330762B (en) 2010-09-21

Family

ID=36659715

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095110752A TWI330762B (en) 2005-03-29 2006-03-28 Seal of a lithographic apparatus, lithographic apparatus, device manufacturing method and data storage medium

Country Status (6)

Country Link
US (1) US7684012B2 (zh)
EP (1) EP1708032A3 (zh)
JP (1) JP4922638B2 (zh)
KR (1) KR100772158B1 (zh)
SG (1) SG126120A1 (zh)
TW (1) TWI330762B (zh)

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TWI742384B (zh) * 2018-06-15 2021-10-11 荷蘭商Ａｓｍｌ荷蘭公司 反射器及其製造方法、光學單元及檢測裝置

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US20070085984A1 (en) * 2005-10-18 2007-04-19 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method and device manufactured thereby
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US7655925B2 (en) 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US7812329B2 (en) 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
NL1036153A1 (nl) 2007-11-08 2009-05-11 Asml Netherlands Bv Method and system for determining a suppression factor of a suppression system and a lithographic apparatus.
NL1036181A1 (nl) * 2007-11-30 2009-06-04 Asml Netherlands Bv A lithographic apparatus, a projection system and a device manufacturing method.
NL1036543A1 (nl) * 2008-02-20 2009-08-24 Asml Netherlands Bv Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method.
JP5339742B2 (ja) 2008-03-04 2013-11-13 ウシオ電機株式会社 極端紫外光が出射する装置と極端紫外光が導入される装置との接続装置
DE102009016319A1 (de) * 2009-04-06 2010-10-14 Carl Zeiss Smt Ag Verfahren zur Kontaminationsvermeidung und EUV-Lithographieanlage
CA3030747C (en) 2013-12-02 2020-11-10 Austin Star Detonator Company Method and apparatus for wireless blasting
CN106997150B (zh) * 2016-01-22 2018-10-16 上海微电子装备（集团）股份有限公司 一种降低光刻物镜压力灵敏度的方法及其应用
CN110161808B (zh) * 2019-05-09 2022-02-22 上海华力微电子有限公司 光栅尺清洁装置和方法、光刻机
GB2605940A (en) * 2021-02-12 2022-10-26 Edwards Vacuum Llc Electrochemical hydrogen pump

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US5063568A (en) 1988-09-05 1991-11-05 Fujitsu Limited Wavelength stabilized light source
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JP2002151400A (ja) 2000-11-15 2002-05-24 Canon Inc 露光装置、その保守方法並びに同装置を用いた半導体デバイス製造方法及び半導体製造工場
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EP1429189B1 (en) * 2002-12-13 2008-10-08 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
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KR101123187B1 (ko) * 2004-03-31 2012-03-19 에이에스엠엘 네델란즈 비.브이. 단파 방사의 생성 동안 방사원에 의해 생성되는 입자를제거하기 위한 방법 및 장치
US8094288B2 (en) 2004-05-11 2012-01-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7126664B2 (en) 2004-07-12 2006-10-24 Asml Netherlands B.V. Lithographic apparatus and a device manufacturing method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI742384B (zh) * 2018-06-15 2021-10-11 荷蘭商Ａｓｍｌ荷蘭公司 反射器及其製造方法、光學單元及檢測裝置
US11145428B2 (en) 2018-06-15 2021-10-12 Asml Netherlands B.V. Reflector and method of manufacturing a reflector
US11694821B2 (en) 2018-06-15 2023-07-04 Asml Netherlands B.V. Reflector and method of manufacturing a reflector

Also Published As

Publication number Publication date
KR20060104951A (ko) 2006-10-09
SG126120A1 (en) 2006-10-30
EP1708032A2 (en) 2006-10-04
EP1708032A3 (en) 2007-01-03
TWI330762B (en) 2010-09-21
KR100772158B1 (ko) 2007-10-31
JP2006279051A (ja) 2006-10-12
US20060268246A1 (en) 2006-11-30
JP4922638B2 (ja) 2012-04-25
US7684012B2 (en) 2010-03-23

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees