SG126120A1 - Lithographic device, device manufacturing method and device manufactured thereby - Google Patents
Lithographic device, device manufacturing method and device manufactured therebyInfo
- Publication number
- SG126120A1 SG126120A1 SG200602061A SG200602061A SG126120A1 SG 126120 A1 SG126120 A1 SG 126120A1 SG 200602061 A SG200602061 A SG 200602061A SG 200602061 A SG200602061 A SG 200602061A SG 126120 A1 SG126120 A1 SG 126120A1
- Authority
- SG
- Singapore
- Prior art keywords
- substrate
- radiation
- hollow tube
- mask
- substrate table
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
Landscapes
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/091,926 US7502095B2 (en) | 2005-03-29 | 2005-03-29 | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US11/252,240 US20070085984A1 (en) | 2005-10-18 | 2005-10-18 | Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
Publications (1)
Publication Number | Publication Date |
---|---|
SG126120A1 true SG126120A1 (en) | 2006-10-30 |
Family
ID=36659715
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200602061A SG126120A1 (en) | 2005-03-29 | 2006-03-28 | Lithographic device, device manufacturing method and device manufactured thereby |
Country Status (6)
Country | Link |
---|---|
US (1) | US7684012B2 (zh) |
EP (1) | EP1708032A3 (zh) |
JP (1) | JP4922638B2 (zh) |
KR (1) | KR100772158B1 (zh) |
SG (1) | SG126120A1 (zh) |
TW (1) | TWI330762B (zh) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7671349B2 (en) | 2003-04-08 | 2010-03-02 | Cymer, Inc. | Laser produced plasma EUV light source |
US20070085984A1 (en) * | 2005-10-18 | 2007-04-19 | Asml Netherlands B.V. | Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
US7279690B2 (en) * | 2005-03-31 | 2007-10-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
GB0709509D0 (en) * | 2007-05-18 | 2007-06-27 | Boc Group Plc | Method of operating a lithography tool |
US7812329B2 (en) | 2007-12-14 | 2010-10-12 | Cymer, Inc. | System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus |
US7655925B2 (en) | 2007-08-31 | 2010-02-02 | Cymer, Inc. | Gas management system for a laser-produced-plasma EUV light source |
NL1036153A1 (nl) * | 2007-11-08 | 2009-05-11 | Asml Netherlands Bv | Method and system for determining a suppression factor of a suppression system and a lithographic apparatus. |
NL1036181A1 (nl) | 2007-11-30 | 2009-06-04 | Asml Netherlands Bv | A lithographic apparatus, a projection system and a device manufacturing method. |
NL1036543A1 (nl) * | 2008-02-20 | 2009-08-24 | Asml Netherlands Bv | Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method. |
JP5339742B2 (ja) * | 2008-03-04 | 2013-11-13 | ウシオ電機株式会社 | 極端紫外光が出射する装置と極端紫外光が導入される装置との接続装置 |
DE102009016319A1 (de) * | 2009-04-06 | 2010-10-14 | Carl Zeiss Smt Ag | Verfahren zur Kontaminationsvermeidung und EUV-Lithographieanlage |
EP3077725B1 (en) | 2013-12-02 | 2018-05-30 | Austin Star Detonator Company | Method and apparatus for wireless blasting |
CN106997150B (zh) * | 2016-01-22 | 2018-10-16 | 上海微电子装备(集团)股份有限公司 | 一种降低光刻物镜压力灵敏度的方法及其应用 |
EP3582009A1 (en) * | 2018-06-15 | 2019-12-18 | ASML Netherlands B.V. | Reflector and method of manufacturing a reflector |
CN110161808B (zh) * | 2019-05-09 | 2022-02-22 | 上海华力微电子有限公司 | 光栅尺清洁装置和方法、光刻机 |
GB2605940A (en) * | 2021-02-12 | 2022-10-26 | Edwards Vacuum Llc | Electrochemical hydrogen pump |
Family Cites Families (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4692934A (en) * | 1984-11-08 | 1987-09-08 | Hampshire Instruments | X-ray lithography system |
JP2545897B2 (ja) * | 1987-12-11 | 1996-10-23 | 日本電気株式会社 | 光cvd装置 |
US5063568A (en) * | 1988-09-05 | 1991-11-05 | Fujitsu Limited | Wavelength stabilized light source |
US5079112A (en) * | 1989-08-07 | 1992-01-07 | At&T Bell Laboratories | Device manufacture involving lithographic processing |
JP3127511B2 (ja) | 1991-09-19 | 2001-01-29 | 株式会社日立製作所 | 露光装置および半導体装置の製造方法 |
US5260151A (en) * | 1991-12-30 | 1993-11-09 | At&T Bell Laboratories | Device manufacture involving step-and-scan delineation |
JPH05315075A (ja) * | 1992-05-07 | 1993-11-26 | Fuji Electric Co Ltd | エレクトロルミネッセンス発光膜の成膜方法 |
US5559584A (en) * | 1993-03-08 | 1996-09-24 | Nikon Corporation | Exposure apparatus |
US5696623A (en) * | 1993-08-05 | 1997-12-09 | Fujitsu Limited | UV exposure with elongated service lifetime |
US6341006B1 (en) * | 1995-04-07 | 2002-01-22 | Nikon Corporation | Projection exposure apparatus |
JP4075966B2 (ja) | 1996-03-06 | 2008-04-16 | エーエスエムエル ネザーランズ ビー.ブイ. | 差分干渉計システム及びこのシステムを具えたリソグラフステップアンドスキャン装置 |
DE69717975T2 (de) | 1996-12-24 | 2003-05-28 | Asml Netherlands B.V., Veldhoven | In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät |
USRE40043E1 (en) * | 1997-03-10 | 2008-02-05 | Asml Netherlands B.V. | Positioning device having two object holders |
TW444270B (en) * | 1997-11-12 | 2001-07-01 | Nippon Kogaku Kk | Exposure apparatus, apparatus for fabricating device and fabricating method of exposure apparatus |
US6459472B1 (en) * | 1998-05-15 | 2002-10-01 | Asml Netherlands B.V. | Lithographic device |
EP0957402B1 (en) | 1998-05-15 | 2006-09-20 | ASML Netherlands B.V. | Lithographic device |
US6429440B1 (en) * | 1998-06-16 | 2002-08-06 | Asml Netherlands B.V. | Lithography apparatus having a dynamically variable illumination beam |
US6198792B1 (en) * | 1998-11-06 | 2001-03-06 | Euv Llc | Wafer chamber having a gas curtain for extreme-UV lithography |
US6333775B1 (en) * | 1999-01-13 | 2001-12-25 | Euv Llc | Extreme-UV lithography vacuum chamber zone seal |
KR20020036951A (ko) * | 1999-05-28 | 2002-05-17 | 시마무라 테루오 | 노광방법 및 장치 |
EP1229573A4 (en) * | 1999-07-16 | 2006-11-08 | Nikon Corp | EXPOSURE METHOD AND SYSTEM |
JP2001118783A (ja) * | 1999-10-21 | 2001-04-27 | Nikon Corp | 露光方法及び装置、並びにデバイス製造方法 |
EP1098225A3 (en) * | 1999-11-05 | 2002-04-10 | Asm Lithography B.V. | Lithographic projection apparatus with purge gas system and method using the same |
JP2001345263A (ja) * | 2000-03-31 | 2001-12-14 | Nikon Corp | 露光装置及び露光方法、並びにデバイス製造方法 |
CN1420982A (zh) * | 2000-03-31 | 2003-05-28 | 株式会社尼康 | 计测方法以及计测装置、曝光方法以及曝光装置 |
KR100833275B1 (ko) | 2000-05-03 | 2008-05-28 | 에이에스엠엘 유에스, 인크. | 정화 가스를 이용한 비접촉식 시일 |
US6972421B2 (en) * | 2000-06-09 | 2005-12-06 | Cymer, Inc. | Extreme ultraviolet light source |
JP2002151400A (ja) * | 2000-11-15 | 2002-05-24 | Canon Inc | 露光装置、その保守方法並びに同装置を用いた半導体デバイス製造方法及び半導体製造工場 |
JP2002158154A (ja) * | 2000-11-16 | 2002-05-31 | Canon Inc | 露光装置 |
US7346093B2 (en) | 2000-11-17 | 2008-03-18 | Cymer, Inc. | DUV light source optical element improvements |
JP2004519868A (ja) * | 2001-04-17 | 2004-07-02 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Euvに透明な境界構造 |
EP1329772B1 (en) | 2001-12-28 | 2009-03-25 | ASML Netherlands B.V. | Lithographic projection apparatus and device manufacturing method |
JP2003257821A (ja) * | 2002-02-28 | 2003-09-12 | Nikon Corp | 光学装置及び露光装置 |
DE10215469B4 (de) * | 2002-04-05 | 2005-03-17 | Xtreme Technologies Gmbh | Anordnung zur Unterdrückung von Teilchenemission bei einer Strahlungserzeugung auf Basis eines heißen Plasmas |
EP1389747B1 (en) | 2002-08-15 | 2008-10-15 | ASML Netherlands B.V. | Lithographic projection apparatus and reflector asembly for use in said apparatus |
JP2004186179A (ja) * | 2002-11-29 | 2004-07-02 | Canon Inc | 露光装置 |
EP1429189B1 (en) * | 2002-12-13 | 2008-10-08 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2005101537A (ja) * | 2003-08-29 | 2005-04-14 | Canon Inc | 露光装置及びそれを用いたデバイスの製造方法 |
US8173975B2 (en) * | 2004-03-31 | 2012-05-08 | Koninklijke Philips Electronics N.V. | Method and device for removing particles generated by means of a radiation source during generation of short-wave radiation |
US8094288B2 (en) * | 2004-05-11 | 2012-01-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7126664B2 (en) * | 2004-07-12 | 2006-10-24 | Asml Netherlands B.V. | Lithographic apparatus and a device manufacturing method |
-
2006
- 2006-03-28 JP JP2006088069A patent/JP4922638B2/ja not_active Expired - Fee Related
- 2006-03-28 SG SG200602061A patent/SG126120A1/en unknown
- 2006-03-28 TW TW095110752A patent/TWI330762B/zh not_active IP Right Cessation
- 2006-03-29 KR KR1020060028667A patent/KR100772158B1/ko not_active IP Right Cessation
- 2006-03-29 US US11/391,731 patent/US7684012B2/en active Active
- 2006-03-29 EP EP06251739A patent/EP1708032A3/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
US20060268246A1 (en) | 2006-11-30 |
KR100772158B1 (ko) | 2007-10-31 |
TW200700927A (en) | 2007-01-01 |
EP1708032A3 (en) | 2007-01-03 |
US7684012B2 (en) | 2010-03-23 |
TWI330762B (en) | 2010-09-21 |
EP1708032A2 (en) | 2006-10-04 |
JP4922638B2 (ja) | 2012-04-25 |
JP2006279051A (ja) | 2006-10-12 |
KR20060104951A (ko) | 2006-10-09 |
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