TW200632549A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
TW200632549A
TW200632549A TW095101866A TW95101866A TW200632549A TW 200632549 A TW200632549 A TW 200632549A TW 095101866 A TW095101866 A TW 095101866A TW 95101866 A TW95101866 A TW 95101866A TW 200632549 A TW200632549 A TW 200632549A
Authority
TW
Taiwan
Prior art keywords
resin composition
photosensitive resin
compound
provides
interlayer dielectrics
Prior art date
Application number
TW095101866A
Other languages
English (en)
Other versions
TWI395054B (zh
Inventor
Ui-Cheol Jeong
Dong-Myung Kim
Byung-Uk Kim
Ho-Jin Lee
Dong-Min Kim
Ki Hyuk Koo
Hyoc Min Youn
Joo Pyo Yun
Tae Hoon Yeo
Sang Gak Choi
Original Assignee
Dongjin Semichem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongjin Semichem Co Ltd filed Critical Dongjin Semichem Co Ltd
Publication of TW200632549A publication Critical patent/TW200632549A/zh
Application granted granted Critical
Publication of TWI395054B publication Critical patent/TWI395054B/zh

Links

Classifications

    • E—FIXED CONSTRUCTIONS
    • E04—BUILDING
    • E04F—FINISHING WORK ON BUILDINGS, e.g. STAIRS, FLOORS
    • E04F21/00—Implements for finishing work on buildings
    • E04F21/02—Implements for finishing work on buildings for applying plasticised masses to surfaces, e.g. plastering walls
    • E04F21/16—Implements for after-treatment of plaster or the like before it has hardened or dried, e.g. smoothing-tools, profile trowels
    • E04F21/161—Trowels

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
TW095101866A 2005-01-27 2006-01-18 感光性樹脂組成物（二） TWI395054B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020050007727A KR101221468B1 (ko) 2005-01-27 2005-01-27 감광성 수지 조성물

Publications (2)

Publication Number Publication Date
TW200632549A true TW200632549A (en) 2006-09-16
TWI395054B TWI395054B (zh) 2013-05-01

Family

ID=36844586

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095101866A TWI395054B (zh) 2005-01-27 2006-01-18 感光性樹脂組成物（二）

Country Status (5)

Country Link
JP (1) JP4906356B2 (zh)
KR (1) KR101221468B1 (zh)
CN (1) CN1811597B (zh)
SG (1) SG124383A1 (zh)
TW (1) TWI395054B (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100758879B1 (ko) * 2006-07-13 2007-09-14 제일모직주식회사 컬러필터 보호막용 일액형 열경화성 수지 조성물
JP4766268B2 (ja) * 2007-03-01 2011-09-07 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
CN102985454B (zh) * 2010-06-30 2015-11-25 Lg化学株式会社 丙烯酸类共聚物以及包含该丙烯酸类共聚物的光学膜
JP5636839B2 (ja) * 2010-09-16 2014-12-10 Jsr株式会社 感放射線性樹脂組成物、層間絶縁膜、層間絶縁膜の形成方法及び表示素子
JP5966268B2 (ja) * 2011-07-22 2016-08-10 Jsr株式会社 アレイ基板、液晶表示素子およびアレイ基板の製造方法
JP2017198833A (ja) * 2016-04-27 2017-11-02 京セラドキュメントソリューションズ株式会社 キノン誘導体及び電子写真感光体
JP2019174793A (ja) 2018-03-26 2019-10-10 Jsr株式会社 感放射線性組成物および１，２−ナフトキノン−２−ジアジドスルホン酸誘導体
CN108535960B (zh) * 2018-04-04 2022-09-20 倍晶新材料(山东)有限公司 一种耐热性光刻胶组合物
EP3835331A4 (en) * 2018-08-10 2022-05-25 Osaka Soda Co., Ltd. ACRYLIC COPOLYMER AND RUBBER MATERIAL

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE68928823T2 (de) * 1988-07-07 1999-02-25 Sumitomo Chemical Co., Ltd., Osaka Strahlungsempfindliche, positiv arbeitende Resistzusammensetzung
DE4003025A1 (de) * 1990-02-02 1991-08-08 Hoechst Ag Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
JP3965868B2 (ja) 2000-06-12 2007-08-29 Ｊｓｒ株式会社 層間絶縁膜およびマイクロレンズ
TWI285298B (en) * 2003-01-14 2007-08-11 Sumitomo Chemical Co Photosensitive resin composition
JP4403805B2 (ja) 2003-01-17 2010-01-27 住友化学株式会社 感放射線性樹脂組成物
JP4127150B2 (ja) * 2003-07-31 2008-07-30 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法

Also Published As

Publication number Publication date
CN1811597B (zh) 2010-09-22
SG124383A1 (en) 2006-08-30
KR101221468B1 (ko) 2013-01-11
KR20060087033A (ko) 2006-08-02
JP2006209113A (ja) 2006-08-10
CN1811597A (zh) 2006-08-02
TWI395054B (zh) 2013-05-01
JP4906356B2 (ja) 2012-03-28

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