SG124383A1 - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
SG124383A1
SG124383A1 SG200600384A SG200600384A SG124383A1 SG 124383 A1 SG124383 A1 SG 124383A1 SG 200600384 A SG200600384 A SG 200600384A SG 200600384 A SG200600384 A SG 200600384A SG 124383 A1 SG124383 A1 SG 124383A1
Authority
SG
Singapore
Prior art keywords
resin composition
photosensitive resin
photosensitive
composition
resin
Prior art date
Application number
SG200600384A
Inventor
Hyoc-Min Youn
Byung-Uk Kim
Sang-Gak Choi
Ki-Hyuk Koo
Joo-Pyo Yun
Dong-Min Kim
Tae-Hoon Yeo
Ui-Cheol Jeong
Dong-Myung Kim
Ho-Jin Lee
Original Assignee
Dongjin Semichem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongjin Semichem Co Ltd filed Critical Dongjin Semichem Co Ltd
Publication of SG124383A1 publication Critical patent/SG124383A1/en

Links

Classifications

    • E—FIXED CONSTRUCTIONS
    • E04—BUILDING
    • E04F—FINISHING WORK ON BUILDINGS, e.g. STAIRS, FLOORS
    • E04F21/00—Implements for finishing work on buildings
    • E04F21/02—Implements for finishing work on buildings for applying plasticised masses to surfaces, e.g. plastering walls
    • E04F21/16—Implements for after-treatment of plaster or the like before it has hardened or dried, e.g. smoothing-tools, profile trowels
    • E04F21/161—Trowels

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
SG200600384A 2005-01-27 2006-01-19 Photosensitive resin composition SG124383A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020050007727A KR101221468B1 (en) 2005-01-27 2005-01-27 Photosensitive resin composition

Publications (1)

Publication Number Publication Date
SG124383A1 true SG124383A1 (en) 2006-08-30

Family

ID=36844586

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200600384A SG124383A1 (en) 2005-01-27 2006-01-19 Photosensitive resin composition

Country Status (5)

Country Link
JP (1) JP4906356B2 (en)
KR (1) KR101221468B1 (en)
CN (1) CN1811597B (en)
SG (1) SG124383A1 (en)
TW (1) TWI395054B (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100758879B1 (en) * 2006-07-13 2007-09-14 제일모직주식회사 One-solution type thermosetting composition for protective film of color filter
JP4766268B2 (en) * 2007-03-01 2011-09-07 Ｊｓｒ株式会社 Radiation-sensitive resin composition, interlayer insulating film and microlens, and production method thereof
JP5630852B2 (en) * 2010-06-30 2014-11-26 エルジー・ケム・リミテッド Optical film containing acrylic copolymer
JP5636839B2 (en) * 2010-09-16 2014-12-10 Jsr株式会社 Radiation-sensitive resin composition, interlayer insulating film, method for forming interlayer insulating film, and display element
JP5966268B2 (en) * 2011-07-22 2016-08-10 Jsr株式会社 Array substrate, liquid crystal display element, and method of manufacturing array substrate
JP2017198833A (en) * 2016-04-27 2017-11-02 京セラドキュメントソリューションズ株式会社 Quinone derivatives and electrophotographic photoreceptors
JP2019174793A (en) 2018-03-26 2019-10-10 Jsr株式会社 Radiation-sensitive composition and 1,2-naphthoquinone-2-diazide sulfonic acid derivative
CN108535960B (en) * 2018-04-04 2022-09-20 倍晶新材料(山东)有限公司 Heat-resistant photoresist composition
US20210309846A1 (en) * 2018-08-10 2021-10-07 Osaka Soda Co., Ltd. Acrylic copolymer and rubber material

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH063544B2 (en) * 1988-07-07 1994-01-12 住友化学工業株式会社 Positive type radiation sensitive resist composition
DE4003025A1 (en) * 1990-02-02 1991-08-08 Hoechst Ag RADIATION-SENSITIVE MIXTURE, RADIATION-SENSITIVE RECORDING MATERIAL PRODUCED THEREOF AND METHOD FOR THE PRODUCTION OF RELIEF RECORDS
JP3965868B2 (en) 2000-06-12 2007-08-29 Ｊｓｒ株式会社 Interlayer insulation film and microlens
TWI285298B (en) * 2003-01-14 2007-08-11 Sumitomo Chemical Co Photosensitive resin composition
JP4403805B2 (en) 2003-01-17 2010-01-27 住友化学株式会社 Radiation sensitive resin composition
JP4127150B2 (en) * 2003-07-31 2008-07-30 Ｊｓｒ株式会社 Radiation-sensitive resin composition, interlayer insulating film and microlens, and production method thereof

Also Published As

Publication number Publication date
TW200632549A (en) 2006-09-16
CN1811597A (en) 2006-08-02
KR101221468B1 (en) 2013-01-11
TWI395054B (en) 2013-05-01
JP2006209113A (en) 2006-08-10
CN1811597B (en) 2010-09-22
JP4906356B2 (en) 2012-03-28
KR20060087033A (en) 2006-08-02

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