TW200630646A - Radiatoin sensitive composition for color filters, method for the preparation of the same, color filter and color liquid crystal display device - Google Patents

Radiatoin sensitive composition for color filters, method for the preparation of the same, color filter and color liquid crystal display device

Info

Publication number
TW200630646A
TW200630646A TW094126601A TW94126601A TW200630646A TW 200630646 A TW200630646 A TW 200630646A TW 094126601 A TW094126601 A TW 094126601A TW 94126601 A TW94126601 A TW 94126601A TW 200630646 A TW200630646 A TW 200630646A
Authority
TW
Taiwan
Prior art keywords
meth
acrylate
color
sensitive composition
radiation sensitive
Prior art date
Application number
TW094126601A
Other languages
English (en)
Other versions
TWI374293B (en
Inventor
Isamu Makihira
Shingo Naruse
Tomio Nagatsuka
Megumi Yoshihara
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200630646A publication Critical patent/TW200630646A/zh
Application granted granted Critical
Publication of TWI374293B publication Critical patent/TWI374293B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
TW094126601A 2004-08-04 2005-08-04 Radiatoin sensitive composition for color filters, method for the preparation of the same , color filter and color liquid crystal display device TWI374293B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004228508A JP2006047686A (ja) 2004-08-04 2004-08-04 カラーフィルタ用感放射線性組成物、その調製法、カラーフィルタおよびカラー液晶表示装置

Publications (2)

Publication Number Publication Date
TW200630646A true TW200630646A (en) 2006-09-01
TWI374293B TWI374293B (en) 2012-10-11

Family

ID=36026310

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094126601A TWI374293B (en) 2004-08-04 2005-08-04 Radiatoin sensitive composition for color filters, method for the preparation of the same , color filter and color liquid crystal display device

Country Status (5)

Country Link
JP (1) JP2006047686A (zh)
KR (1) KR100899938B1 (zh)
CN (1) CN100578266C (zh)
SG (1) SG119373A1 (zh)
TW (1) TWI374293B (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007277502A (ja) * 2006-03-13 2007-10-25 Soken Chem & Eng Co Ltd 耐黄変性樹脂およびその用途
JP4752649B2 (ja) * 2006-07-12 2011-08-17 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
WO2008013031A1 (fr) * 2006-07-27 2008-01-31 Mitsubishi Chemical Corporation Composition durcissable, objet durci, filtre couleur et affichage à cristaux liquides
KR100881860B1 (ko) 2007-01-17 2009-02-06 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 이미지센서컬러필터
JP5056025B2 (ja) * 2007-01-22 2012-10-24 Ｊｓｒ株式会社 感放射線性樹脂組成物およびカラーフィルタ
KR101030022B1 (ko) 2007-09-11 2011-04-20 제일모직주식회사 안료 분산액 조성물, 이를 포함하는 컬러필터용 레지스트조성물 및 이로부터 제조된 컬러필터
JP2009079121A (ja) * 2007-09-26 2009-04-16 Fujifilm Corp 顔料分散組成物、光硬化性組成物、カラーフィルタ及びカラーフィルタの製造方法
JP2010002886A (ja) * 2008-05-21 2010-01-07 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
CN101727003B (zh) 2008-10-24 2012-07-18 第一毛织株式会社 用于彩色滤光片的光敏树脂组合物以及使用其制备的彩色滤光片
JP5460204B2 (ja) * 2009-09-24 2014-04-02 株式会社Ｄｎｐファインケミカル カラーフィルター用感光性赤色組成物及びそれを用いたカラーフィルター
JP2012181509A (ja) * 2011-02-08 2012-09-20 Mitsubishi Chemicals Corp 着色感光性組成物、着色スペーサ、カラーフィルター、及び液晶表示装置
KR20140083620A (ko) 2012-12-26 2014-07-04 제일모직주식회사 차광층용 감광성 수지 조성물 및 이를 이용한 차광층
JP6183029B2 (ja) * 2013-07-25 2017-08-23 日本ゼオン株式会社 ネガ型感光性樹脂組成物および電子部品
CN104007618B (zh) * 2014-06-18 2017-09-29 杭州福斯特应用材料股份有限公司 一种pcb用高粘附力感光干膜

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001081416A (ja) 1999-09-13 2001-03-27 Nippon Steel Chem Co Ltd 硬化膜並びにこれを用いたカラーフィルター
JP2001139848A (ja) 1999-11-16 2001-05-22 Chisso Corp 着色組成物、光硬化性着色組成物、カラーフィルター及び液晶表示素子
JP4428880B2 (ja) * 2001-04-11 2010-03-10 富士フイルム株式会社 着色組成物および感光性着色組成物
JP3900078B2 (ja) * 2001-12-18 2007-04-04 Ｊｓｒ株式会社 カラーフィルタ用感放射線性組成物、カラーフィルタおよびカラー液晶表示装置
TWI257527B (en) * 2001-12-18 2006-07-01 Jsr Corp Radiation sensitive composition for color filter, method to form color filter, color filter and color liquid crystal display device
JP4428911B2 (ja) * 2002-07-05 2010-03-10 Ｊｓｒ株式会社 カラーフィルタ用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子

Also Published As

Publication number Publication date
SG119373A1 (en) 2006-02-28
CN100578266C (zh) 2010-01-06
CN1782748A (zh) 2006-06-07
JP2006047686A (ja) 2006-02-16
KR100899938B1 (ko) 2009-05-28
KR20060049066A (ko) 2006-05-18
TWI374293B (en) 2012-10-11

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