TW200831618A - Pigment dispersed composition for black matrix and photoresist including the same - Google Patents

Pigment dispersed composition for black matrix and photoresist including the same Download PDF

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TW200831618A
TW200831618A TW096145337A TW96145337A TW200831618A TW 200831618 A TW200831618 A TW 200831618A TW 096145337 A TW096145337 A TW 096145337A TW 96145337 A TW96145337 A TW 96145337A TW 200831618 A TW200831618 A TW 200831618A
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Taiwan
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pigment
acid
black matrix
pigment dispersion
composition
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TW096145337A
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Chinese (zh)
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TWI453260B (en
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Kazunori Itoh
Naoyuki Kitaoka
Tomohiro Kita
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Sakata Inc Corp
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/44Carbon
    • C09C1/48Carbon black
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00Pigment pastes, e.g. for mixing in paints
    • C09D17/002Pigment pastes, e.g. for mixing in paints in organic medium
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/19Oil-absorption capacity, e.g. DBP values
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/60Optical properties, e.g. expressed in CIELAB-values
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Materials For Photolithography (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Optical Filters (AREA)

Abstract

Pigment dispersed composition for black matrix in which solvent is dispersed with carbon black having an oil absorption value of 10-150 ml/100g and showing a pH-value of larger than 9. The photoresist including the pigment dispersed composition for black matrix shows excellent light-block effect and gives wide Development Latitude.

Description

200831618 九、發明說明: 【發明所屬之技術領域】 本發明係有關於一種使用在液晶面板黑矩陣形成之黑 矩陣用_分散組成物以及含有此黑矩陣_料分散組成 物之黑矩陣用顏料分散光阻組成物。 【先前技術】</ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> < Desc/Clms Page number> Photoresist composition. [Prior Art]

/夜晶顯示方式多使用於電腦、彩色電視、手機及攝影 為等之〜像颂不件上。液晶影像顯示元件係利用形成有 各色畫素之彩色濾光片及具有光閘作用之液晶,來將影像 於晝面上。 /、人,衫色濾光片通常是先在玻璃、塑膠片等透明基 板的表面上’形成具有條狀(stiP)或馬賽克狀(mosaic) 等之開一的黑色矩陣(黑矩陣,随计⑴,接著, 再依序於開口部上形成紅、#、藍等3種以上不同顏色之 晝素,而完成者。 在此處,黑矩陣的功能是控制各顏色間的混合及藉由 防止漏光而達到提升對比的效果。因此,基於高遮光性的 要求ϋ去;|膜皆使用遮光性高之鉻等蒸鑛膜。然而,由 於其形成步驟複雜且價格高等理由,近來已改為使用含有 顏料及感光性樹脂之顯影成像法(phGtQlithQgraphy,顏料 法)ο 上述的顏料法,係將碳黑等之黑色顏料或數種顏料以 調成黑色之方式來組合使用之。 2066-9284-PP;Ahddub 5 200831618 進而,為了得到咼遮光性,勢必要大大提高顏料本身 的含I,然而當顏料濃度愈高時.,顯影性、解析度、密著 1*生、穩定性等之其他必要特性會降低,而對遮光性之提高 造成限制。另一方面,就形成彩色濾光片之皮膜而言,亦 被要求薄膜化,在顏料必須以高濃度來因應的狀況下,更 加助長導致了分散穩定性及流動性降低之結果。 因此,為了解決上述問題,遂有以下方案被提出:使 用了比表面積ll〇m2/g以下、pH為2〜9之碳黑,以及由 具有鹼性官能基之聚酯或聚醚所構成的高分子分散劑而組 成之感光性樹脂(例如,特開平1〇-〇829〇8號公報);使用 了平均一次粒子徑20〜30nm、DBP吸油量i4〇ml/i〇〇 g以 下、?11為2.5〜4之碳黑,以及胺值1〜1〇〇111找〇11/§的有 機化合物系分散劑所組成之碳黑分散液(例如,特開 2004-292672號公報)。如上所述般的顏料分散物,具有即 使疋在咼顏料濃度下,分散穩定性、流動性皆非常良好之 特徵。 然而,近來在彩色液晶顯示裝置中,色彩鮮明度與銷 售量的增加幅度成正比關係,故市場對於提升色彩鮮明度 之期待也非常地強烈。因此,對於肇因於彩色濾、光片或專 矩陣圖案之形成不良,而導致了色漏等會損及色彩绎明度 之成因,已變成非常重大的研究課題。 就以顯影成像法來形成黑矩陣而言,首先,係將黑矩 陣用光阻組成物塗佈於基板上。之後,再藉由具有既定圖 案之光罩以紫外線進行曝光’並使曝光部的塗膜硬化。接 2〇66-9284~PF;Ahddub 6 200831618 著,利用顯影液去除未曝光坤 九邛伤之塗膜,就形成出如同上 述既定圖案之黑矩陣。此時 ^ 夸,為了得到良好的圖案,就必 須要求光p旦組成物具有良好的 的圖案再現性。例如,在顯影 終了時,必須達到在未曝光 ” |切τ /又有顯影殘 &gt;查,曝光部 具有足夠的細線再現性,以;5 l a w ’ M及北形成出銳利的邊緣之圖案 等。 八 然而’作為黑矩陣’不只遮光性很高,對於紫外線之 遮光性也高。因此,在曝光部份中,即使塗膜表面已硬化, 靠近基板之邊緣仍會因紫外線無法到達,而呈現未硬化前 的原狀態。然後’未硬化的殘餘部分就會被顯影液慢慢地 侵蝕而變細,最終導致曝光部份也被全部去除,而產生黑 矩陣消失之現象。 從完全地去除如上所述般的未曝光部,到曝光部變細 而無法得到符合當作黑矩陣之規定機能間的時間長度,稱 為『顯影寬容度(margin)』(Development Utitude)。此 馨顯影寬容度較少者,由於未曝光部份去除後,馬上會造成 曝光σ卩隻細或消失’因此很難弄清楚停止顯影的時機點。 特別是前述的已高顏料濃度化之光阻組成物,因其在曝光 4中之未硬化比例容易變高’所以無法取得足夠的顯影寬 谷度。因此,會產生未曝光部無法完全地被去除,曝光部 變細而無法得到符合規定之機能等在工程管理層面而言非 常大的問題。 【發明内容】 2066-9284-PF;Ahddub 7 200831618 在此處,本發明之課題係提供一種遮光性良好、且顯 影寬容度大的黑矩陣用顏料分散組成物及含有此黑矩陣用 顏料分散組成物之黑矩陣用顏料分散光阻組成物。 本發明者等,經過反覆研究之結果,發現藉由使用吸 油量為^⑽^^^邱值範圍大^之碳^就可解 決上述之課題,本發明於是完成。 亦即,本發明(1 )係有關於一種黑矩陣用顏料分散組成 物,其特徵在於:令吸油量為10〜150ml/100g、PH值範圍 大於9之碳黑,分散於溶劑中。 、 · 又,本發明(2)係有關於:如上述(1)中所述之黑矩陣 用顏料分散組成物,其中上述碳黑#吸油量為1〇〜 八100g 〇 又,本發明(3)係有關於:如上述(1)或(2)中所述之黑 矩陣用顏料分散組成物,其中為了令上述碳黑分散,更= 括有:含鹼性基顏料分散劑。 又,本發明⑷係有關於:如上述⑻中所述之黑矩陣 用顏料分散組成物,其中為了令上述碳黑分散,更包括有: 擇自於由含酸基顏料衍生物、含酸基色素衍生物、含酸基 色素中間體及含酸基樹脂所構成之族群中至少!種物質。 又’本發明⑸係有關於:如上述(3)或⑷中所述之黑 ^陣用顏料分散組成物,其中上述含驗性基顏料分散劑係 自於:由切性基純系高分子_分散劑、含驗性基 ^系高分子顏料分散劑及含驗性基丙婦系高分子顏料分 散劑所構成之族群中至少1種物質。 2〇66~9284-PF;Ahddub 200831618 又,本發明(6 )係有關於:如上述(5 )中所述之黑矩陣 用顏料分散組成物,其中上述含鹼性基尿烷系高分子顏料 刀政劑係具有:擇自於由聚酯鏈、聚醚鏈及聚碳酸酯鏈所 構成之族群中至少1種物質。 又’本發明(7)係有關於:如上述(4)〜(6)中所述之任 黑矩陣用顏料分散組成物,其中上述含酸基顏料衍生物 係為具有磺酸基之酞菁(Phthal〇cyanine)衍生物。 又,本發明(8)係有關於:如上述(4)〜(6)中所述之任 ”Ί陣用顏料分散組成物’其中上述含酸基樹脂係為酸 值10〜30〇mgK〇H/g之含酸基共聚合物樹脂。 、又’本發明⑼係有關於_種黑料用顏料分散光阻組 成物,包括:如上述⑴〜⑻中所述之任一黑矩陣用顏料 分散組成物、鹼可溶性樹脂、光聚合性化合物、以及光聚 以下,就本發明之黑矩陣用顏料分散組成物以及 此黑矩陣用顏料分散組成物 物進行詳細的說明。 轉用顏枓分散先阻組成 說明首先,針對本發明之黑矩陣用顏料分散組成物來進行 以構成本發明的里拓隍田力 ▲ ”’、㈣用顏料分散組成物之碳里而 石:黑:使用吸油量為lG〜15GmI/彻g、pH值範圍大於9、之 ’必須在1 〇 g的範圍内 吸油量'若從對於溶劑的分散性之觀點來 的範圍内,細在10〜7_] 2066-9284-PF;Ahddub 9 200831618 較佳、30〜60ml/l〇〇g的範圍内更佳。 在此處,本發明所謂的吸油量,係指將碳黑與亞麻仁 油混合後,於其混合漿料中,相對於〗〇〇克碳黑開始出現 流動性時之亞麻仁油ml數(德國工業品標準規袼 DIN53601 )。又,PH值範圍必須大於9,並以在9·丨〜12的 pH值範圍内為較佳。若pH值範圍在9以下,則顯影寬容 度就會降低,故較不佳。 pH值之測定,係先將碳黑lg加入在已去除掉碳酸的 蒸餾水(pH為7· 0)20ml中,並以磁力攪拌器進行混合而調 製出水性懸浮液,再使用玻璃電極於25。〇下完成測量(德 國工業品標準規格DIN ISO 78779)。 以具體的碳黑之例而言,例如:CAB〇T公司製的 ELFTEX8 ; DEGUSSA 公司製的 prINTEX3、25、3〇、35、4〇、 55 、 60 、 75 、 85 、 95 、 200 、 300 等。 以構成本發明的黑矩陣用顏料分散組成物之溶劑而 言,係以可使習知以來所使用的顏料穩定地分散、且能溶 解後述之含鹼性基顏料分散劑及含酸基樹脂者為佳,其中 更佳者係為:在常壓(1〇13*1〇2kPa)下之沸點為1〇〇〜25〇 C之酯系有機溶劑、醚系有機溶劑、醚酯系有機溶劑、酮 系有機溶蜊、专香族碳氫化合物系有機溶劑及含氮系有機 溶劑等。 ” 以上述般的溶劑來說,具體而言可舉例如:乙二醇一 甲趣乙—醇一乙鱗、乙二醇一異丙_、乙二醇一丁醚、 醇甲_、二乙二醇一乙醚、丙二醇一甲醚、丙二 2066~9284^PF;Ahddub 1〇 200831618 醇一乙醚、丙二醇一丁鱗、二乙二醇二乙鱗、二乙二醇 甲醚、二乙二醇甲乙醚等之醚系有機溶劑類.;乙二醇一曱 it乙酸酯、乙二醇一乙醚乙酸酯、乙二醇一 丁醚乙酸酯、 丙二醇一甲醚乙酸酯、丙二醇一乙醚乙酸酯等之醚醋系有 機溶劑類;甲基異.丁基曱酮、環己酮、2-庚烷、5 -丁内醯 胺等之酮系有機溶劑類;2-經基丙酸甲酯、2-經基丙酸乙 酯、2-羥基_2-曱基丙酸乙酯、3-曱基-3-甲氧基丁基丙酸 酯、3-曱氧基丙酸甲酯、3-甲氧基丙酸乙酯、3一乙氧基丙 酸甲酯、3-乙氧基丙酸乙酯、乙氧基6酸乙酯.、羥基乙酸/ Night crystal display mode is mostly used in computers, color TVs, mobile phones, and photography. The liquid crystal image display element uses a color filter formed with respective color pixels and a liquid crystal having a shutter function to image the surface. /, person, shirt color filter is usually first on the surface of a transparent substrate such as glass, plastic sheet, etc. to form a black matrix (black matrix) with a strip (stiP) or mosaic (mosaic), etc. (1) Then, three or more different colors of red, #, and blue are sequentially formed on the opening, and the completion is performed. Here, the function of the black matrix is to control the mixing between the colors and to prevent Light leakage achieves the effect of improving contrast. Therefore, it is based on the requirement of high light-shielding; the film uses a vapor-deposited film such as chrome with high opacity. However, due to its complicated forming steps and high price, it has recently been used. Development imaging method containing pigment and photosensitive resin (phGtQlithQgraphy, pigment method) ο The pigment method described above is a combination of a black pigment such as carbon black or a plurality of pigments in a black form. 2066-9284-PP Ahddub 5 200831618 Further, in order to obtain the ruthenium shielding property, it is necessary to greatly increase the content I of the pigment itself, but when the pigment concentration is higher, the developability, the resolution, the adhesion, the stability, etc. The characteristics are lowered, and the improvement of the light-shielding property is limited. On the other hand, the film forming the color filter is also required to be thinned, and the pigment is required to be high in concentration, which is further promoted. As a result of the dispersion stability and fluidity reduction, in order to solve the above problems, the following schemes have been proposed: carbon black having a specific surface area of ll 〇 m 2 /g or less, pH of 2 to 9, and having a basic function A photosensitive resin composed of a polymer dispersing agent composed of a polyester or a polyether (for example, JP-A No. 〇-〇829〇8); an average primary particle diameter of 20 to 30 nm and a DBP oil absorption amount i4 are used.碳ml/i〇〇g or less, ?11 is 2.5~4 carbon black, and amine value 1~1〇〇111 finds 11/§ organic compound dispersant composed of carbon black dispersion (for example, special JP-A-2004-292672. The pigment dispersion as described above has a characteristic that dispersion stability and fluidity are excellent even when the ruthenium pigment concentration is used. However, recently, in a color liquid crystal display device, the color is vivid. Degree and sales The increase is proportional to the increase, so the market is also very strong in anticipation of improving the vividness of color. Therefore, due to the poor formation of color filters, light films or special matrix patterns, color leaks and other colors may be damaged. The cause of the brightness has become a very important research topic. To form a black matrix by the development imaging method, first, a black matrix photoresist composition is applied onto a substrate, and then, by having a predetermined pattern. The photomask is exposed to ultraviolet light' and the coating film of the exposed portion is hardened. Connected to 2〇66-9284~PF; Ahddub 6 200831618, the developer is used to remove the unexposed film of the Nine Nine Injury, which is formed as described above. A black matrix of a given pattern. At this time, it is boasted that in order to obtain a good pattern, it is necessary to require the light pdan composition to have good pattern reproducibility. For example, at the end of the development, it is necessary to achieve the unexposed "cutting τ / and the developing residue", and the exposed portion has sufficient fine line reproducibility; 5 law 'M and the north form a sharp edge pattern, etc. 8. However, 'as a black matrix' is not only highly opaque, but also highly opaque to ultraviolet light. Therefore, even in the exposed portion, even if the surface of the coating is hardened, the edge near the substrate is still unreachable due to ultraviolet rays. The original state before the hardening. Then the 'unhardened residual portion is slowly eroded and thinned by the developer, and finally the exposed portion is also completely removed, and the black matrix disappears. The complete removal of the above In the above-mentioned unexposed portion, when the exposed portion is thinned and the length of time between the functions defined as the black matrix cannot be obtained, it is called "development margin" (Development Utitude). In the lesser case, since the unexposed part is removed, the exposure σ卩 will be fine or disappeared immediately. Therefore, it is difficult to find out the timing of stopping the development. Especially the above is high. The photoresist composition having a pigment concentration is likely to be high in the unhardened ratio in the exposure 4, so that sufficient development wideness cannot be obtained. Therefore, the unexposed portion cannot be completely removed, and the exposed portion is thinned. However, it is not possible to obtain a problem that is in conformity with the prescribed functions and the like in terms of engineering management. [Summary of the Invention] 2066-9284-PF; Ahddub 7 200831618 Here, the subject of the present invention is to provide a good light-shielding property and development tolerance. The pigment dispersion composition of the black matrix and the pigment dispersion composition of the black matrix containing the pigment dispersion composition for the black matrix. The inventors of the present invention have found that the oil absorption by using the oil absorption is (10) The above-mentioned problem can be solved by the above-mentioned problem, and the present invention is completed. That is, the present invention (1) relates to a pigment dispersion composition for a black matrix, which is characterized in that oil absorption is achieved. The carbon black having an amount of 10 to 150 ml/100 g and a pH range of more than 9 is dispersed in a solvent. Further, the invention (2) relates to a pigment for a black matrix as described in the above (1). The composition, wherein the carbon black # oil absorption amount is 1 〇 to 八 100 g 〇, the invention (3) is related to the pigment dispersion composition for a black matrix as described in the above (1) or (2), wherein In addition, the present invention (4) relates to the pigment dispersion composition for a black matrix as described in the above (8), wherein the carbon black is used in order to disperse the carbon black. Dispersion, further includes: at least a substance selected from the group consisting of an acid-based pigment derivative, an acid-based pigment derivative, an acid-based pigment intermediate, and an acid-containing resin. Further, the invention (5) The pigment dispersion composition of the black matrix according to the above (3) or (4), wherein the above-mentioned pigment-based pigment dispersant is derived from: a cleavage-based pure polymer-dispersant, and a test At least one substance selected from the group consisting of a polymer pigment dispersant and a polymer pigment dispersant containing an inhibitory base. Further, the present invention (6) relates to the pigment dispersion composition for a black matrix as described in the above (5), wherein the above-mentioned basic urethane-containing polymer pigment The knife solution has at least one selected from the group consisting of a polyester chain, a polyether chain, and a polycarbonate chain. Further, the present invention (7) is the pigment dispersion composition for a black matrix as described in the above (4) to (6), wherein the acid-based pigment derivative is a phthalocyanine having a sulfonic acid group. (Phthal〇cyanine) derivative. Further, the present invention (8) relates to any one of the above-mentioned (4) to (6), wherein the acid-containing resin is an acid value of 10 to 30 〇 mgK 任. The acid-containing copolymer resin of H/g. The invention (9) relates to a pigment dispersion resist composition for a black material, comprising: any of the black matrix pigments as described in the above (1) to (8) The pigment dispersion composition for a black matrix of the present invention and the pigment dispersion composition for a black matrix of the present invention will be described in detail below with respect to the dispersion composition, the alkali-soluble resin, the photopolymerizable compound, and the photopolymerization. Description of the resistance composition First, the pigment dispersion composition for a black matrix of the present invention is used to form the carbon of the composition of the present invention, which is composed of the pigment dispersion composition of the present invention: </ br>: (4) The use of the oil absorption amount is 1G. ~15GmI / ng, pH range is greater than 9, 'must absorb oil in the range of 1 〇g', within the range from the viewpoint of solvent dispersibility, fine in 10~7_] 2066-9284-PF ; Ahddub 9 200831618 is better, within the range of 30~60ml/l〇〇g Good. Here, the so-called oil absorption amount in the present invention refers to the number of ml of linseed oil in which the carbon black and the linseed oil are mixed and the fluidity starts to appear in the mixed slurry relative to the gram of carbon black ( German industrial product standard specification DIN53601). Further, the pH range must be greater than 9, and is preferably in the range of pH of 9 丨 12 12 . If the pH is in the range of 9 or less, the development latitude is lowered, which is not preferable. The pH was measured by first adding carbon black lg to 20 ml of distilled water (pH 7.0) from which carbonic acid had been removed, and mixing it with a magnetic stirrer to prepare an aqueous suspension, and then using a glass electrode at 25. The measurement is completed under the arm (the German industrial product standard specification DIN ISO 78779). In the case of specific carbon black, for example, ELFTEX8 manufactured by CAB〇T Co., Ltd.; prINTEX3, 25, 3〇, 35, 4〇, 55, 60, 75, 85, 95, 200, 300, etc. manufactured by DEGUSSA. . The solvent constituting the pigment dispersion composition for a black matrix of the present invention is such that the pigment used in the prior art can be stably dispersed and the base-based pigment-dispersing agent and the acid-containing resin described later can be dissolved. Preferably, the best one is an ester organic solvent having a boiling point of 1 〇〇 to 25 〇C under normal pressure (1〇13*1〇2kPa), an ether organic solvent, an ether ester organic solvent, A ketone is an organic solvent, an organic solvent of an aromatic hydrocarbon, and a nitrogen-containing organic solvent. For the above-mentioned solvent, specifically, for example, ethylene glycol monomethyl alcohol - alcohol monoethyl sulphate, ethylene glycol monoisopropyl s, ethylene glycol monobutyl ether, alcohol methyl _, two Glycol monoethyl ether, propylene glycol monomethyl ether, propane 2066~9284^PF; Ahddub 1〇200831618 alcohol monoethyl ether, propylene glycol monobutyl sulphate, diethylene glycol diethylene sulphate, diethylene glycol methyl ether, diethylene glycol An ether-based organic solvent such as methyl ethyl ether; ethylene glycol mono-acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol An ethereal vinegar-based organic solvent such as diethyl ether acetate; a ketone-based organic solvent such as methyl isobutyl ketone, cyclohexanone, 2-heptane or 5-butylide; 2-aminopropyl Methyl ester, 2-ethyl propyl propionate, ethyl 2-hydroxy-2-mercaptopropionate, 3-mercapto-3-methoxybutylpropionate, 3-methoxypropionic acid Ester, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxylate 6 acid, glycolic acid

顔矜分敢劑而言,可使用例如: 如··陰離子性界面活性劑、含 含鹼性基丙烯系顏料分散劑、 儀| 鹼性基聚酯系顏料分散劑、令 合鹼性基碳化二亞胺系顏料 含驗性基尿烷系顏料分散劑、 分散劑等。 上述等之含鹼性基顏料分散劑 可單獨使用,或者,For example, an anionic surfactant, a basic propylene-based pigment dispersant, an alkali-based polyester pigment dispersant, and a basic base carbonization can be used. The diimine pigment contains an organic urethane pigment dispersant, a dispersant, and the like. The above-mentioned basic-based pigment dispersant may be used alone or,

劑之具體例來說 可舉例 2066-9284-PF;Ahddub 200831618 (i)由聚胺化合物(例如,聚烯丙胺、聚乙烯胺、聚乙烯聚 亞胺等之聚(低級烷撐胺)等)之胺基及/或亞胺基,以及擇 自從具有游離的羧基之聚酯、聚烯胺和聚酯醯胺等所構成 之族群中至少1種物質所得出的反應生成物(特開 2001-59906 號公報); (2)由聚(低級)烷撐亞胺、曱基亞氨基雙丙基胺等之低分子 氨基化合物,以及具有游離的羧基之聚酯所得出的反應生Specific examples of the agent can be exemplified by 2066-9284-PF; Ahddub 200831618 (i) by polyamine compound (for example, polyallylamine, polyvinylamine, polyethylene polyimine or the like (lower alkyleneamine), etc.) a reaction product obtained from at least one of a group consisting of a polyester having a free carboxyl group, a polyenamine, and a polyester decylamine, and an amine group and/or an imine group (Special Open 2001- (No. 59906); (2) Reactions derived from low molecular weight amino compounds such as poly(lower) alkyleneimine, mercaptoiminobispropylamine, and polyesters having free carboxyl groups

成物(特開昭54-37082號公報、特開平〇1一311177號公報); (3 )於聚異氣酸i旨化合物的異氰酸酯基中,依序加入下述物 質進行反應所得到的反應生成物(特開平02-612號公 報):具有1個曱氧基;聚乙二醇等之醇類或己内醋聚酯等之 氳氧基的聚酯類,具有2〜3個異氰酸酯基反應性官能基之 化合物,具有異氰酸酯基反應性官能基及第3級氨基之脂 肪族或雜壤碳氮化合物; (4)於具有醇性氫氧基之丙烯酸酯的聚合物中,加入聚異氰 酸醋化合物及具有氨基之碳氫化合物所反應得到的^ (5)於低分子氨基化合物中, 反應生成物; 進行聚醚鏈加成反應所得到的 (6)於具有聚異氰酸酯丞之化合物中,令具有氨美 乂 進行反應所得到的反應生成物(特開平〇4二二=广^ 報); 之直鏈狀聚 反應所得到 (7)於聚環氧基化合物中,加入具有游離的鲮基 合物及具有1個2級氨基之有機胺化合物進^ 2066-9284-PF;Ahddub 12 200831618 的反應生成物(特開平09 —87537號公報); (8) 由在片末端具有可跟氨基反應的官能基之聚碳酸酯化 合物跟聚胺化合物所得出的反應生成物(特開平09_194585 號公報); (9) 由擇自曱基甲基丙烯酸酯、乙基甲基丙烯酸酯、丙基甲 基丙烯酸酉曰、丁基甲基丙烯酸酯、硬脂醯甲基丙烯酸酯、 苄基曱基丙烯酸酯、甲基丙烯酸酯、乙基丙烯酸酯、丙基 丙烯酸酯、丁基丙烯酸酯、硬脂醯丙稀酸酯、苄基丙烯酸 醋善之甲基丙烯酸酯或丙烯酸酯中至少1種物質,丙浠醯 胺、甲基丙烯醯胺、N-甲撐醯胺、乙烯基咪唑(vinyl imidazole)、乙烯基吡啶(vinyi pyridine)、具有氨基和 聚已内酯骨幹之單體等的含鹼性基聚合單體中至少丨種物 質,以及苯乙烯、苯乙烯衍生物、其他聚合性單體中至少 1種物質’所共同反應得到的共聚合物(特開平〇 1 _ 164429 號公報); — (10) 含驗性基碳化二亞胺系顏料分散劑(國際公開 04/000950 號公報); (11) 由具有3級氨基、4級銨鹽基等鹼性基之嵌塊,以及 不具有官能基的篏塊所構成之嵌塊共聚合物(參照特開 2005-55814號之記載); (12) 於聚烯丙基胺中,令聚碳酸酯化合物進行麥可加成 (Michael addition)反應所得到之顏料分散劑(特開平 09-194585 號公報); (13) 分別具有至少1個聚丁二烯鏈和鹼性含氮基之碳化二 2066*-9284-PF;Ahddub 13 200831618 亞胺系化合物(特開2006 - 257243號公報); (14)分別具有至少1彳八工Ητ» ρ, * 八筒美m ;刀子内具有醯胺基的側鏈和鹼性 等等。 亞知系化合物(特開2_-1 76657號公報) 在上述等之含驗性基高分子_分散财,係 性基尿烧系高分早雜Μ人I W 3 m 刀子顏枓分散劑、含鹼性基聚醋系高分子麴 料分散劑、含驗性基丙稀系高分子顏料分散劑為較佳,; 以含氣基尿W高分子顏料分散劑、含氨基聚㈣^ 顏料分散劑、含氨基丙稀系高分子顏料分散劑更及。尤1, 又以含鹼性基尿烷系高分子顏料分散劑為特佳,尤其 择自於從«鏈、聚㈣及聚碳酸醋鏈所構成的族群中至 ::種物質之含驗性基(氨基)尿燒系高分子顏料分散劑為 含驗性基分散劑之使用量,係以相對於碳黑⑽質量 份而言…〜20。質量份較佳、卜6。質量份更佳。(3) In the isocyanate group of the polyisoxalic acid-based compound, the following reaction is carried out by adding the following substances; (Production: JP-A-2002-612): A polyester having one decyloxy group, an alcohol such as polyethylene glycol or a decyloxy group such as hexyl vinegar polyester, having 2 to 3 isocyanate groups. a reactive functional group compound having an isocyanate-reactive functional group and a third-order amino group of an aliphatic or hetero-aqua carbonitride; (4) adding a polyisomeric to a polymer having an alcoholic hydroxyl group-containing acrylate (5) a reaction product obtained by reacting a cyanate vinegar compound and a hydrocarbon having an amino group in a low molecular weight amino compound; (6) a compound having a polyisocyanate oxime obtained by performing a polyether chain addition reaction In the case of a reaction product obtained by the reaction of ammonohydrazine (specially open 〇 4 22 = broad report); a linear polycondensation reaction is obtained (7) in a polyepoxy compound, and the addition is free Ruthenium complex and organic with one grade 2 amino group The reaction product of the compound of 2066-9284-PF; Ahddub 12 200831618 (JP-A-09-87537); (8) a polycarbonate compound and a polyamine compound having a functional group reactive with an amino group at the end of the sheet The obtained reaction product (Japanese Unexamined Patent Publication No. Hei 09-194585); (9) selected from mercapto methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, stearin Methacrylate, benzyl methacrylate, methacrylate, ethacrylate, propyl acrylate, butyl acrylate, stearic acid acrylate, methacrylate methacrylate or At least one substance in acrylate, acrylamide, methacrylamide, N-methyl decylamine, vinyl imidazole, vinyi pyridine, having amino and polycaprolactone backbone a copolymer of at least one of a basic group-containing polymerizable monomer such as a monomer, and a copolymer of at least one of styrene, a styrene derivative, and another polymerizable monomer.1 _ 164 429); (10) An organic phthalocyanine-based pigment dispersant (International Publication No. 04/000950); (11) Alkaline having a 3-stage amino group and a 4-stage ammonium salt group a block co-polymer composed of a block and a block having no functional group (refer to JP-A-2005-55814); (12) in a polyallylamine, a polycarbonate compound is subjected to A pigment dispersing agent obtained by a Michael addition reaction (JP-A-09-194585); (13) Carbonized 2066* having at least one polybutadiene chain and a basic nitrogen-containing group, respectively 9284-PF; Ahddub 13 200831618 Imine-based compound (JP-A-2006-257243); (14) each having at least 1 彳 8 Η » » » ρ, * 八 美 美 m; a side chain having a guanamine group in the knife and Alkaline and so on. Amin-based compound (Japanese Unexamined Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Alkaline-based polyglycol polymer dispersing agent, polyacrylic polymer pigment dispersing agent is preferred; gas-based urine W polymer pigment dispersing agent, amino-containing poly(tetra) pigment dispersing agent The amino-acrylic polymer pigment dispersant is further included. In particular, it is particularly preferable to use a basic urethane-based polymer pigment dispersant, especially from the group consisting of «chain, poly(tetra) and polycarbonate chains to:: the testability of the substance The base (amino) urethane-based polymer pigment dispersant is used in an amount of the test-based dispersant, and is -20 parts by mass with respect to carbon black (10) parts by mass. The mass is better, and the weight is 6. Better quality.

進而,在本發明之黑矩陣用顏料分散組成物中,為了 讓碳黑之分散性更提高,亦可進—步包括:擇自於由含酸 基顏料衍生物、含酸基色素衍生物、含酸基色素中間體及 合酸基樹脂所構成之族群中至少!種物質。 百先’以含酸基顏料衍生物、含酸基色素衍生物而古, 可舉例如:具有酸基之醜以顏料衍生物、具有酸基之窗 職Unthraquinone)系顏料衍生物、具有酸基之萘系顏料衍 ^物等。其中,若從碳黑之分散性的觀點來看,係以具有 磺酸基之酞菁系顏料衍生物為較佳。 2〇66-9284~PF/Ahddub 200831618 含酸基顏料衍生物、含酸基色素衍♦ 何生物及含酸基色素 中間體之使用量,係相對於碳黑100 f暑 貝里切而言為0〜20 質量份,並以0 · 5〜10質量份為較佳。 其次,以含酸基樹脂而言,可使用含酸基共聚合物樹 脂、含酸基聚S旨樹脂及含酸基尿燒樹脂等。 、 以上述含酸基樹脂之酸基而言,可舉例如:敌美、石至 酸基、磷酸基等。 土 尹、 在上述含酸基樹脂中,較佳者為由含有至少i種具酸 基單體之單體成份進行自由基聚合所得到之酸值^〜 300mgKOH/g(較佳為20〜300mgKOH/g)、重量平均分子量 1,000〜1 00, 000之含酸基共聚合物樹脂(特別是含酸基丙 烯系共聚合物樹脂)。 具體而言,可使用擇自於由下列物質所構成之族群中 至少1種之單體成份來進行自由基聚合所得到的含酸基共 聚合物樹脂··丙烯酸、甲基丙烯酸、衣康酸(Hac〇nic acid)、馬來酸(maieic acid)、馬來酸酐、馬來酸一烷基 酯、檸康酸(citraconic acid)、檸康酸酐、檸康酸一烷基 酯、磺基甲基丙烯酸酯、丁基丙烯基氨基磺酸、磷基乙基 甲基丙烯酸酯等之含酸基不飽和單體成份;苯乙烯、甲基 苯乙烯' 2-經基乙基丙烯酸酯、2 —羥基乙基甲基丙烯酸酯、 婦丙基丙烯酸醋、烯丙基曱基丙烯酸酯、苄基丙烯酸酯、 节基甲基丙烯酸酯、甲基甲基丙烯酸酯、聚苯乙烯巨單體、 聚甲基甲基丙稀酸酉旨巨單體等。 另外’在本發明中,上述含酸基樹脂之重量平均分子 15 2066-9284-PF;Ahddub 200831618 量係為基於GPC所得到之聚苯乙烯換算的重量平均分子 量。在本發明中,係使用Water 2690(Waters公司製)作為 GPC 破置、pLgei 5/z MIXED-D(Polymer Laboratories 公 司製)作為柱管(co;[umn)。 含酸基樹脂之使用量,係以相對於碳黑1〇〇質 言為0〜100質量份’並以為05〜6〇質量份較佳 本發明之黑矩陣用顏料分散組成物,乃為包括碳黑、 含鹼性基顏料分散劑及溶劑的混合物,必要時還可對應加 入.擇自於由含酸基顏料衍生物、含酸基色素衍生物、含 酸基色素中間體及含酸基樹月旨所構成之族群中至少1種物 質。黑矩陣用顏料分散組成物,可利用輥輾機(roller Hie小混練機(kneader)、高速授掉機、珠磨機⑽ds 球磨機(ballmiller)、砂磨機(sandier)、 超音波分散機或高昼分散奘署望 m刀政衣置#,來將上述等之混合物進 行分散處理而得到。 本發明的黑矩陣用顏料分 曰 竹刀月文組成物中之碳黑的含有 篁,係以3〜70質量%為較佳,〗 乎乂住10〜50質量%為更佳。若碏 黑的含有量未達前述範圍,則M 1右反 固則黑矩陣形成完了 會有降低的傾向,另一方面,若 的八-魷备傲〜/ 起過刖述靶圍時,則顏料 的刀政就會變得很困難。 其次’就本發明之g拓陸 行說明。 ”、、車用顏料分散光阻組成物來進 本發明之黑矩陣用顏料分Further, in the pigment dispersion composition for a black matrix of the present invention, in order to further improve the dispersibility of the carbon black, the method further includes: selecting an acid-based pigment derivative, an acid group-containing pigment derivative, At least the group consisting of acid-based pigment intermediates and acid-based resins! Kind of substance. "Bai Xian" is an acid-based pigment derivative and an acid-based pigment derivative, and may, for example, be an ugly pigment derivative having an acid group, an Unthraquinone pigment derivative having an acid group, and having an acid group. Naphthalene pigments and the like. Among them, a phthalocyanine-based pigment derivative having a sulfonic acid group is preferred from the viewpoint of dispersibility of carbon black. 2〇66-9284~PF/Ahddub 200831618 The amount of acid-based pigment derivatives, acid-containing pigment derivatives, and acid-containing pigment intermediates is relative to carbon black 100 f. 0 to 20 parts by mass, and preferably 0 to 5 to 10 parts by mass. Next, as the acid group-containing resin, an acid group-containing copolymer resin, an acid group-containing poly S resin, an acid group-containing urea resin, or the like can be used. The acid group of the acid group-containing resin may, for example, be an enemy, a stone to an acid group or a phosphoric acid group. In the above acid-containing resin, preferably, the acid value obtained by radical polymerization of at least one monomer component having an acid group monomer is from 300 to 300 mgKOH/g (preferably from 20 to 300 mgKOH). /g) An acid group-containing copolymer resin (especially an acid group-containing propylene-based copolymer resin) having a weight average molecular weight of 1,000 to 1,00,000. Specifically, an acid group-containing copolymer resin obtained by radical polymerization using at least one monomer component selected from the group consisting of the following substances: acrylic acid, methacrylic acid, itaconic acid can be used. (Hac〇nic acid), maleic acid, maleic anhydride, monoalkyl maleate, citraconic acid, citraconic anhydride, monoalkyl citrate, sulfoyl Acrylate-containing unsaturated monomer component such as acrylate, butyl acrylsulfonic acid, phosphorus ethyl methacrylate, etc.; styrene, methyl styrene '2-ylethyl acrylate, 2 — Hydroxyethyl methacrylate, propyl acrylate acrylate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, methyl methacrylate, polystyrene macromonomer, polymethyl Methyl methacrylate is a macromonomer. Further, in the present invention, the weight average molecular weight of the above acid-containing resin is 15 2066-9284-PF; and the amount of Ahddub 200831618 is a polystyrene-equivalent weight average molecular weight obtained based on GPC. In the present invention, Water 2690 (manufactured by Waters Corporation) was used as a GPC fracture, pLgei 5/z MIXED-D (manufactured by Polymer Laboratories Co., Ltd.) as a column tube (co; [umn). The amount of the acid-containing resin used is preferably from 0 to 100 parts by mass relative to the carbon black, and is preferably from 05 to 6 parts by mass. The pigment dispersion composition of the black matrix of the present invention is preferably included. a mixture of carbon black, a base-based pigment dispersant and a solvent, if necessary, may be added. Selecting from an acid-based pigment derivative, an acid-based pigment derivative, an acid-containing pigment intermediate, and an acid-containing tree At least one substance in the group consisting of the government. Black matrix pigment dispersion composition, roller hoe machine (kneader, high speed feeder, bead mill (10) ds ball miller, sandier, ultrasonic disperser or high昼 奘 奘 m m m m m m , , , m m m m m m m m m m m m m m m m m m 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 70% by mass is preferred, and it is better to hold 10 to 50% by mass. If the content of black is less than the above range, then the M 1 right anti-solid will tend to decrease when the black matrix is formed, and the other On the other hand, if the eight-鱿 鱿 〜 ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ The composition of the black matrix for use in the present invention

r刀政光阻組成物,主I 述黑矩陣用顏料組成物中加入 要係於上 皮膜形成樹脂、光聚合性化 2066-9284-PF/Ahddub 16 200831618 合物、光聚合引發劑及溶劑而構成,必要時亦可對應再適 當加入♦合禁止劑專各種添加物來得出。 以構成本發明的黑矩陣用顏料分散光阻組成物之皮膜 形成樹脂而言,例如,係以使用可跟擇自從下列物質所構 成之族群中至少1種進行反應而得到的共聚合物之具有羧 基的鹼可溶性樹脂為.較佳:丙烯酸、曱基丙烯酸、衣康酸、 馬來lie馬來k酐、馬來酸一烧基酯、檸康酸、檸康酸酐、 檸康酸-烷基酯等之含羧基不飽和單體;苯乙烯'2 —羥基 乙基丙浠酸酉旨、2-經基乙基甲基丙烯酸酯、稀丙基丙稀酸 酯、烯丙基甲基丙烯酸酯、节基丙婦酸醋、节基甲基丙婦 ㈣:丙三醇一丙烯酸醋、丙三醇甲基丙烯酸醋、具有二 农j一烯月幹之單(甲基)丙婦酸醋、N—苯基馬來醯亞胺、 聚苯乙婦巨單體以1 m # 及♦甲基甲基丙烯酸酯巨單體等。上 等物質可單獨使用或、、曰 …&quot;h/U兩種以上❹之。皮膜形成樹月旨 右攸皮膜形成性、鹼顯影性的觀點來看 3〇〇mgK〇H/g、重量平的八工θ^ ZU ,,千均刀子ι ΐοοο〜200,000為較佳。皮 膜形成樹脂亦可對瘅被兩 . 種以… 于應被而求的機能,單獨或適當的組合2r knife-shaped photoresist composition, the main composition of the black matrix pigment composition is added to the epithelial film-forming resin, photopolymerization 2066-9284-PF/Ahddub 16 200831618 compound, photopolymerization initiator and solvent. If necessary, it can be correspondingly added to the appropriate additives. The film-forming resin constituting the pigment-dispersed photoresist composition for a black matrix of the present invention has, for example, a copolymer obtained by reacting at least one selected from the group consisting of the following substances. The alkali-soluble resin of a carboxyl group is preferably: acrylic acid, mercaptoacrylic acid, itaconic acid, male lie maleic anhydride, maleic acid monoalkyl ester, citraconic acid, citraconic anhydride, citraconic acid-alkyl group a carboxyl group-containing unsaturated monomer such as an ester; styrene '2-hydroxyethyl propyl phthalate, 2-ethylidene methacrylate, propyl acrylate, allyl methacrylate , ketone-fed vinegar vinegar, benzyl propyl ketone (four): glycerol-acrylic acid vinegar, glycerol methacrylic acid vinegar, single (methyl) propylene vinegar N-phenyl maleimide, polystyrene giant monomer with 1 m # and ♦ methyl methacrylate macromonomer. The superior substances can be used alone or in combination with 曰...&quot;h/U. From the viewpoint of the formation of the right sputum film and the alkali developability, it is preferable that 3 〇〇 mg K 〇 H / g, a flat weight of the work θ ^ ZU , and a thousand knives ι ΐ οοο 200,000. The film-forming resin can also be used for the function of the two, in a single or appropriate combination.

種u上來使用之。重 口 L 量平均八子θ 里千均刀子置則為聚苯乙烯換算之重 里卞巧刀子置,可同前 • Μ 1之情況來進行測定。 量,若以里㈣ 放先阻組成物中之皮膜形成樹脂含有 -、、矩陣用顏料分散光阻組成 皮膜形成樹浐m4入 战物中其固形成份中的 風树煸跟财述含酸基樹 的話,係以碴&amp; , 曰之口叶里的質量%來表現 係以達到5〜50質量%的範圍為較佳。 以構成本發明的$ 益 …、車用顏料分散光阻組成物之光聚 2066 一 928卜 π·— i7 200831618 合性化合物而言,.可舉例如:具有光聚合性不飽和鍵之單 體、寡聚物(oligomer)等。 具體來說,在分子内具有1個光聚合性不飽和鍵之單 體’可使用例如·甲基甲基丙浠酸酉旨、丁基曱基丙烯酸酉旨、 2-乙基己基甲基丙烯酸酯、甲基丙烯酸酯、丁基丙烯酸酯、 2-乙基己基丙烯酸酯等之烷基甲基丙烯酸酯或丙烯酸酯; 节基甲基丙烯酸酯、苄基丙烯酸酯等之芳烷基甲基丙烯酸 酉旨或丙烯酸酯;丁氧基乙基曱基丙烯酸酯、丁氡基乙基丙 _1 i曰荨之芳乳基烧基甲基丙烯酸酯或丙烯酸酯; N,N-二甲基氨基乙基甲基丙烯酸酯、N,N-二甲基氨基 乙基丙烯酸酯等之氨基烷基甲基丙烯酸酯或丙烯酸酯;二 乙一醇乙_、二乙二醇一丁醚、二丙烯乙二醇一曱_等 之聚烷烯基乙二醇一烷醚的甲基丙烯酸酯或丙烯酸酯;六 乙一醇一苯醚等之聚烷烯基乙二醇一芳醚的甲基丙烯酸酯 或丙烯酸酯,異冰片基(isobornyl)甲基丙烯酸酯或丙烯酸 西曰’丙三醇甲基丙烯酸酯或丙烯酸酯;2-羥基乙基曱基丙 浠酸酯或丙烯酸酯等等。 在分子内具有2個以上光聚合性不飽和鍵之單體,可 使用例如:雙苯酚A二甲基丙烯酸酯、1,4-丁二醇二曱基 丙烯酸酯、1,3-丁二醇二甲基丙烯酸酯、二乙二醇二甲基 丙烯酸酯、丙三醇二曱基丙烯酸酯、異戊二醇二曱基丙烯 攻®曰 ^乙一醇二甲基丙烯酸酯、聚丙二醇二甲基丙婦酸 酉曰、四乙二醇二甲基丙烯酸酯、三羥甲基丙烷三曱基丙烯 -夂酉曰季戊四醇三甲基丙烯酸酯、季戊四醇四甲基丙烯酸 2〇66-9284^PF;Ahddub 18 200831618Kind to use it. The weight of the L is an average of eight θ. The kiln knife is set to the weight of the polystyrene. The knives can be measured in the same way as before • Μ 1. The amount, if the inner (4) first block the composition of the film to form a resin containing -,, matrix with a pigment dispersion photoresist to form a film to form a tree 浐 m4 into the war in its solid part of the wind tree 煸 with the accounting acid-based tree In the case of 碴&amp;, the mass % in the mouth of the sputum is preferably in the range of 5 to 50% by mass. In the case of a conjugated compound, for example, a monomer having a photopolymerizable unsaturated bond is exemplified by the photopolymerization of the composition of the present invention. , oligomer, and the like. Specifically, a monomer having one photopolymerizable unsaturated bond in the molecule can be, for example, methyl methyl propyl phthalate, butyl methacrylate, 2-ethylhexyl methacrylic acid. An alkyl methacrylate or acrylate such as an ester, a methacrylate, a butyl acrylate or a 2-ethylhexyl acrylate; an aralkyl methacrylic acid such as a benzyl acrylate or a benzyl acrylate;芳 or acrylate; butoxyethyl decyl acrylate, butyl thioethyl propyl i ary aryl lactyl methacrylate or acrylate; N, N-dimethylaminoethyl Aminoalkyl methacrylate or acrylate such as acrylate, N,N-dimethylaminoethyl acrylate, etc.; ethylene glycol, diethylene glycol monobutyl ether, dipropylene glycol mono a methacrylate or acrylate of a polyalkenyl glycol monoalkyl ether such as hexadecane glycol monoalkyl ether; a methacrylate or acrylate of a polyalkenyl glycol monoaryl ether such as hexaethylol monophenyl ether; Isobornyl methacrylate or acrylonitrile glycerol glycerol methacrylate Or acrylate; 2-hydroxyethyl Yue propionic Hay or acrylate and the like. A monomer having two or more photopolymerizable unsaturated bonds in the molecule, for example, bisphenol A dimethacrylate, 1,4-butanediol dimercapto acrylate, and 1,3-butylene glycol can be used. Dimethacrylate, diethylene glycol dimethacrylate, glycerol dimercapto acrylate, isoprene diol dimercapto propylene 曰 曰 ^ ethoxylated dimethacrylate, polypropylene glycol dimethyl Bismuth acrylate, tetraethylene glycol dimethacrylate, trimethylolpropane tridecyl propylene-pent pentaerythritol trimethacrylate, pentaerythritol tetramethyl acrylate 2〇66-9284^PF; Ahddub 18 200831618

θ 一 、四醇四甲基丙烯酸酯、二季戊四醇六甲基丙烯 酸醋、一季戊四醇五甲基丙烯酸S旨、雙苯齡Α二丙稀酸醋、 1,4-丁二醇二丙烯酸酯、】,3_丁二醇二丙烯酸酯、二乙二 :二丙烯酸醋、丙三醇二丙烯酸醋、異戊二醇二丙烯酸酿、 聚乙二醇二丙烯酸酯、聚丙二醇二丙烯酸酯、目乙二醇二 丙烯酸醋、三經甲基丙烷三丙烯酸醋、季戊四醇三丙烯: 酿、季戊四醇四丙烯酸§旨、二季戊四醇四丙烯酸S旨、二季 戊四醇六丙稀酸醋、二季戊四醇五丙烯酸醋等。 就.具有上述光聚合性不飽和鍵之寡聚物來說,可使用 能使上述單體適當聚合而得到聚合物者。上述等之光聚合 !生化s物’可單獨使用或組合兩種以上來使用之。 在本發明中,上述光聚合性化合物之使用量,係以基 於本發明的黑矩陣用顏料分散光阻組成物中之全固形成份 而言,為3〜50質量%的範圍較佳。 以構成本發明的黑㈣用顏料分散光阻組成物之光聚 合引發劑而言,並未予以特別限^。可使用例如:二苯甲 酮N,N -四乙基一4,4 -二氨基二苯甲酮、4-甲氧基一4,一 二甲基氨基二苯甲酮、苯偶醯(benzil)、2,2 —二乙氧基苯 乙酮、笨偶因(be.nzoiη)、苯偶因甲醚、苯偶因異丁醚、苄 基二甲縮酮、α -羥基異丁苯_、噻嘲酮(thi〇xanth〇ne)、 2氯噻噸酮、1-羥基環己基苯酮、第三丁基蒽醌— 抓讣!^11^110此)、1-氯蒽醌、2,3一二氯蒽醌、3一氯—2—甲基 I 醌、2-乙基蒽醌、!,4-萘驢(1,4 —naphth〇(luin〇ne)、!,2一 苯并蒽醌、1,4_二甲基蒽醌、2-苯基蒽醌、三嗪(i:riazine) 2066-9284-PF/Ahddub 19 200831618 系光聚合引發劑、肟酯(oxime ester).光聚合引發劑。上 述等之光聚合引發劑可單獨使用或混合兩種以上併用之。 在本發明令,上述光聚合引發劑之使用量,係以基於 本發明的黑矩陣用顏料分散光阻組成物中之全固形成份而 言,為1〜20質量%的範圍較佳。 以構成本發明的黑矩陣用顏料分散光阻組成物之溶劑 而言’可使用同前述所舉例之溶劑。特別又以使用在常髮 (l.〇13x1(PkPa)下之沸點為副〜25(rc之醋系有機溶劑、 醚糸有機溶劑、醚醋系有機溶劑、㈣有機溶劑、芳香族 碳氫化合物系有機溶劑及含氮系有機溶劑等較佳。若含有 ;多量之滞點超過25°°c的有機溶劑時,則已塗佈成形的 ς膜在施行預供烤之際,就會發生有機溶劑無法充分地基 Γ殘留於乾燥塗膜内之情況,導致乾燥塗膜之财熱性降 I、:又,若含有較多量之沸點未m的有機溶劑時, 勻地塗佈而沒有斑紋產生是很困難的事,因而會 域有無法得到表面平滑性優良的塗膜之情況。 :轉、乙二醇-乙,、乙二醇一異丙 二乙二醇一甲醚、一一 醢7 一乙一醇一乙醚、丙二醇一甲醚、丙.一 醇一乙醚、丙二醇一丁_ 一,— 叼一 甲醚一 Ύ 心、一乙二醇二乙醚、二乙二醇二 -、、-乙二醇甲乙驗等之⑽有 喊乙酸醋、乙二醇一乙喊乙酸醋、乙二醇、,:马―甲 丙二醇-甲醚乙酸酯丁醚乙酸酯、 機溶劑類;曱基 w “曰專之醚西曰糸有 丁基甲,、環己_、2-庚燒、5-丁内醯 以亡述般的溶劑來說’具體而言可舉例如:乙二醇_ 乙二醇一丁轉 2〇66-9284-PF;Ahddub 20 200831618 胺等之酮系有機溶劑類;2-羥基丙酸甲酯、2一羥基丙酸乙 酉曰2羧基-2-甲基丙酸乙酯、3-甲基一.3—甲氧基丁基丙酸 酉曰3甲氧基丙酸曱酯、3-曱氧基丙酸乙酯、3—乙氧基丙 酉文曱自曰3—乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸 酉曰甲酉欠正戊酯等之酯系有機溶劑類;n -甲基吼嘻烧酮、 N,N-:甲基甲醯胺、N,N-二甲基乙醯胺等之含氮系有機溶 劑類等等。上述等有機溶劑可單獨使用或混合兩種以上來 使用之。 • … 上述等之有機,溶劑中,若從溶解性、分散性、塗佈性 等觀點來看,又以下述者較佳:二乙二醇二乙鱗、二乙二 户甲敎:乙一醇r甲鱗乙酸酯、丙二醇一甲醚乙酸酯、 丙醇乙醚乙酸酯、環己酮、2-庚烷、2-羥基丙酸乙酯、 3-曱基-3-甲氧基丁基丙酸酯、3一甲氧基丙酸乙酯、3一乙氧 丙駄甲S曰、甲酸正戊酯等。其中更以丙二醇一甲醚乙酸 酯為特佳。 _ 更進步,上述等之有機溶劑若從上述顏料分散劑、 •欠基树知、皮膜形成樹脂的溶解性、顏料分散性、塗佈 性等觀點來看,係以在上述黑矩陣用顏料分散光阻組成物 所使用的全部有機溶劑中,含有達50質量%以上較佳、70 質量%以上更佳。 u本發明之黑矩陣用顏料分散光阻組成物,於必要時亦 7對應適當使用前述物質以外之其他光聚合性化合物、熱 聚合禁止劑、抗氧化劑等各種添加劑。 另外’黑矩陣用顏料分散光阻組成物中之碳黑,係以 2〇66-9284-PF;Ahddub 21 200831618 佔黑矩陣用顏料分散光阻組成物其固形成份 〜80質量%為較佳。 、町利 最後’就使用以上之構成材料來製造本發明之黑矩陣 用顏料分散光阻組成物的方法進行說明。 以下所述本發明之黑矩陣用顏料分散光阻組成物的製 J方法,僅係本發明之較佳實施例的-例,並非用以限定 本發明。例如,亦可在黑矩陣用顏料分散組成物中,加入 光聚合性化合物、光聚合引發劑、皮膜形成用樹脂,甚至 必要時可再對應加入有機溶劑、其 裝置等進行攪拌混合之方法等等Γ &quot; 1,再使用攪拌 i ' 【實施方式】 以下’雖利用實施例來對本發明進行具體的說明,缺 而在不脫離本發明之主要意旨及適用範圍的情況下,皆屬 ==範圍内。另外,若未特別說明,則本實施例 :广的份』及『%』’乃分別表示『質量份』及『質 里/6』 。 的黑矩陣用顏料分散組成物 〈實施例1〜12、比較例】〜 之調製&gt; 以如表1所示之組成(表〗中 …將各種—以珠磨二的:&quot;為質量 屮每竑你丨1 19, 東晝攸,而調製 出一&quot;〜!2、比較例卜3的黑矩陣 &lt;實施例1〜12、比較例】 刀政、,且成物 成物之調1&gt; 料肖_分散光阻組 2066-9284-PF;Ahddub 22 200831618 使用高速授拌機,將實施例卜12、比較例卜 黑矩陣用顏料分散組成物及其他材料 、各 1.,/ . 双丄所不之 1中之各材料的使用量為質量%)混合均句後,利用 孔徑的過濾器進行過濾,即可得到實制列卜12、用 較例1〜3的各黑矩陣用顏料分散光阻組成物。 比 〈評價試驗&gt; (分散穩定性) • ^將實施例1〜12、比較例1〜3的各黑矩陣用顏料分散 、且成物,以及實施例卜12、比較例卜3的各黑矩陣 料分散光阻組成物,分別取樣裝入玻璃瓶令密封之,於室 溫下保存7天後,將其狀態依據下述評價基準進行評價。至 A:無增粘及沉澱物 ' B:有輕輕晃動就會恢復原狀程度之增粘及沉澱物 C:有大力搖晃也不會恢復原狀程度之料及沉殺物 (光阻圖案之顯影性) • 使用光阻塗佈機,將實施例1〜12、比較例】〜3的各 黑矩陣用顏料分散光阻組成物以令其形成i㈣膜厚的方 式塗佈於玻璃基板上,並於10(rc下預烘烤3分鐘。之後, 使用可得到硬化部份與未硬化部份面積比為20:80之線寬 的格子狀圖案之光罩,利用高壓水銀燈,以uv累積 光量400mJ/cm2完成曝光。使用0.05%氫氧化鉀水溶液令 所得到的塗膜顯影,並從可除去未曝光部份的光阻組成物 的時間’依據下述評價基準來評價顯影性。 A :可在30秒以内完全地去除者 2066-9284-PF;Ahddub 23 200831618 B :超過30秒但可在60秒以内完全地去除者 c :超過60秒亦無法完全地去除者 (光阻圖案之顯影寬容度) 使用光阻塗佈機,將實施例i〜12、比較例的各 黑矩陣用顏料分散光阻組成物以令其形成_膜厚的方 式塗佈於玻璃基板上,並於10(rCT預烘烤3分鐘。之後, 使用可得到硬化部份與未硬化部份面積比為2〇: 8〇之線寬 25//πι的格子狀圖案之光罩,利甩高壓水銀燈,以叭累積θ mono-tetraol tetramethacrylate, dipentaerythritol hexamethacrylate vinegar, pentaerythritol pentamethyl acrylate S, bisphenol phthalate diacetate vinegar, 1,4-butanediol diacrylate, , 3_butylene glycol diacrylate, diethylene glycol: diacrylate vinegar, glycerol diacrylate vinegar, isoprene glycol diacrylic acid brewing, polyethylene glycol diacrylate, polypropylene glycol diacrylate, Methyl Alcohol diacrylate vinegar, trimethyl methacrylate triacetic acid vinegar, pentaerythritol tripropylene: brewing, pentaerythritol tetraacrylic acid §, dipentaerythritol tetraacrylic acid S, dipentaerythritol hexaacetic acid vinegar, dipentaerythritol penta acrylate vinegar and the like. In the oligomer having the above photopolymerizable unsaturated bond, those obtained by appropriately polymerizing the above monomers to obtain a polymer can be used. The above-mentioned photopolymerization! Biochemical s objects can be used singly or in combination of two or more. In the present invention, the amount of the photopolymerizable compound used is preferably in the range of from 3 to 50% by mass based on the total solid content of the pigment dispersion resist composition for a black matrix of the present invention. The photopolymerization initiator constituting the black (tetra) pigment dispersion resist composition of the present invention is not particularly limited. For example, benzophenone N,N-tetraethyl-4,4-diaminobenzophenone, 4-methoxy-4, dimethylaminobenzophenone, benzil (benzil) can be used. , 2,2-diethoxyacetophenone, stupid (be.nzoiη), benzoin methyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, α-hydroxyisobutylbenzene _ , thiazole (thi〇xanth〇ne), 2 chlorothioxanthone, 1-hydroxycyclohexyl benzophenone, tert-butyl hydrazine - 讣 讣! ^ 11 ^ 110 this), 1-chloroguanidine, 2 , 3 - dichloropurine, 3 -chloro-2-methyl I oxime, 2-ethyl oxime,! , 4-naphthoquinone (1,4—naphth〇(luin〇ne), !, 2-benzopyrene, 1,4-dimethylindole, 2-phenylindole, triazine (i:riazine 2066-9284-PF/Ahddub 19 200831618 A photopolymerization initiator, an oxime ester, and a photopolymerization initiator. The photopolymerization initiators of the above may be used singly or in combination of two or more. The amount of the photopolymerization initiator to be used is preferably in the range of 1 to 20% by mass based on the total solid content of the pigment dispersion resist composition for a black matrix of the present invention. For the solvent of the pigment dispersion resist composition of the matrix, the solvent exemplified above can be used. In particular, it is used in the conventional hair (1. 〇 13x1 (PkPa), the boiling point is sub ~ 25 (rc vinegar organic) The solvent, the ether hydrazine organic solvent, the ether vinegar organic solvent, the (IV) organic solvent, the aromatic hydrocarbon organic solvent, and the nitrogen-containing organic solvent are preferably contained; if necessary, a large amount of the organic solvent having a hysteresis exceeding 25 ° C At the time when the coated ruthenium film is applied for pre-bake, organic solvents cannot occur. When the base film is sufficiently left in the dried coating film, the heat of the dried coating film is lowered by I. Further, if a large amount of the organic solvent having a boiling point of not m is contained, it is difficult to uniformly apply without speckle formation. In this case, there is a case where a coating film having excellent surface smoothness cannot be obtained in the field.: Ethylene glycol-B, ethylene glycol-isopropylidene glycol monomethyl ether, and one-to-one 7-ethyl alcohol Ether, propylene glycol monomethyl ether, propanol monoethyl ether, propylene glycol monobutyl _ _, 叼 甲 甲 Ύ Ύ heart, monoethylene glycol diethyl ether, diethylene glycol di-, - ethylene glycol Waiting for (10) shouting acetic acid vinegar, ethylene glycol-ethyl shark acetate, ethylene glycol,: horse-propylene glycol-methyl ether acetate butyl ether acetate, organic solvent; 曱基w The ether oxime may have a butyl group, a cyclohexyl group, a 2-heptanol group, or a 5-butane ruthenium as a solvent as described above. Specifically, for example, ethylene glycol _ ethylene glycol monobutylene 2 〇 66-9284-PF; Ahddub 20 200831618 Ketone-based organic solvents such as amine; methyl 2-hydroxypropionate, 2-hydroxyl-propionic acid 2-carboxyl-2-methylpropionic acid Ethyl ester, decyl 3-methyl-1,3-methoxybutylpropionate, methoxy 3-methoxypropionate, 3-methoxypropionic acid ethyl ester, 3-ethoxypropyl hydrazine 3-ethyl ethoxypropionate, ethyl ethoxyacetate, hydroxyacetic acid hydrazide, n-pentyl ester and other ester-based organic solvents; n-methyl ketone ketone, N, N-: A A nitrogen-containing organic solvent such as carbamide or N,N-dimethylacetamide, or the like. The organic solvent may be used singly or in combination of two or more kinds thereof. Among them, from the viewpoints of solubility, dispersibility, coating properties, etc., it is preferred to use diethylene glycol di-butyl sulphate, diethylene succinimide: ethyl sulphate, propylene glycol, propylene glycol Monomethyl ether acetate, propanol ethyl ether acetate, cyclohexanone, 2-heptane, ethyl 2-hydroxypropionate, 3-mercapto-3-methoxybutylpropionate, 3-methyl Ethyl oxypropionate, 3-ethoxypropane S oxime, n-amyl formate, and the like. Among them, propylene glycol monomethyl ether acetate is particularly preferred. Further, the above-mentioned organic solvent is dispersed in the above-mentioned black matrix pigment from the viewpoints of the above-mentioned pigment dispersant, the underlying structure, the solubility of the film-forming resin, the pigment dispersibility, and the coating property. The total amount of the organic solvent used in the photoresist composition is preferably 50% by mass or more, more preferably 70% by mass or more. In the case of the pigment dispersion-dispersing composition for a black matrix of the present invention, various additives such as a photopolymerizable compound, a thermal polymerization inhibitor, and an antioxidant other than the above-mentioned materials are used as appropriate. Further, the carbon black in the pigment dispersion resist composition for the black matrix is 2〇66-9284-PF; Ahddub 21 200831618 is preferably a solid dispersion of the pigment dispersion composition for the black matrix, preferably 80% by mass.町町 Finally, the method of producing the pigment dispersion photoresist composition for a black matrix of the present invention by using the above constituent materials will be described. The method for producing a pigment dispersion resist composition for a black matrix of the present invention described below is merely an example of a preferred embodiment of the present invention, and is not intended to limit the present invention. For example, a photopolymerizable compound, a photopolymerization initiator, a film-forming resin may be added to the pigment dispersion composition for a black matrix, and a method of stirring and mixing may be carried out by adding an organic solvent, a device, or the like, if necessary. Γ &quot; 1, and then use the stirring i'. [Embodiment] The following description of the present invention will be specifically described by way of examples, without departing from the scope of the invention and the scope of application. Inside. In addition, unless otherwise stated, the present embodiment: "a wide portion" and "%" are "mass parts" and "quality/6", respectively. The pigment dispersion composition of the black matrix <Examples 1 to 12, Comparative Example> Preparation of the composition> The composition shown in Table 1 (in the table] ... various types - beaded two: &quot; quality 屮Every time you read 1 19, Dong Hao, and prepare a &quot;~! 2, the black matrix of Comparative Example 3&lt;Examples 1~12, Comparative Example] Knife, and the composition of the object 1&gt; 肖 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The amount of each material in the first of the two is not the mass%. After mixing the average sentence, the filter is used to filter the filter to obtain the actual column 12, and the black matrix for the comparative examples 1 to 3 is used. The pigment disperses the photoresist composition. (Evaluation Test) (Dispersion Stability) • Each of the black matrix pigments of Examples 1 to 12 and Comparative Examples 1 to 3 was dispersed and formed, and the respective blacks of Example 12 and Comparative Example 3 were obtained. The matrix material dispersion resist composition was sampled and placed in a glass bottle to be sealed, and after storage at room temperature for 7 days, the state was evaluated according to the following evaluation criteria. To A: no thickening and sedimentation 'B: thickening and sedimentation with a slight sway to restore the original degree C: material with strong shaking and will not return to the original state and sinking matter (developability of photoresist pattern) • Using a photoresist coater, the pigment dispersion resist compositions of the black matrix of Examples 1 to 12 and Comparative Examples ~3 were applied onto a glass substrate so as to form an i (four) film thickness, and 10 (pre-bake for 3 minutes under rc. Thereafter, a reticle with a grid pattern of a line width of 20:80 in area ratio of hardened portion to unhardened portion is used, and a high-pressure mercury lamp is used to accumulate light amount of 400 mJ/in uv. The exposure was completed in cm2. The obtained coating film was developed using a 0.05% aqueous potassium hydroxide solution, and the developability was evaluated from the time when the photoresist composition of the unexposed portion was removed. A: Available at 30. Completely removes 2066-9284-PF within seconds; Ahddub 23 200831618 B: More than 30 seconds but can be completely removed within 60 seconds c: Can not be completely removed after more than 60 seconds (development tolerance of photoresist pattern) Using Examples 1 to 12 and Comparative Examples using a photoresist coater Each black matrix is coated on the glass substrate with a pigment-dispersed photoresist composition so as to form a film thickness, and pre-baked at 10 (rCT for 3 minutes. Thereafter, the hardened portion and the unhardened portion are obtained. The area ratio is 2〇: 8〇 line width 25//πι grid pattern mask, Lee high pressure mercury lamp, accumulate

光量400mJ/cm2完成曝光。將所得到的塗膜使用〇 〇5%氫 氧化鉀水/谷液進行顯影,並測量從已去除完未曝光部份的 光阻組成物時、到除去硬化部份的光阻組成物之時間,再 依據下述評價基準來評價顯影寬容度。 A ·從已去除完未曝光部份的光阻組成物時、到除去硬 化部份的光阻組成物之#間為秒以上 B ·從已去除完未曝光部份的光阻組成物時、到除去硬 化部份的光阻組成物之時間為3〇秒以上,但不到秒 C :從已去除完未曝光部份的光阻組成物時、到除去硬 化部份的光阻組成物之時間不到3 〇秒 以上所付到的結果如表1中所示。 2066-9284-PF/Ahddub 24 200831618The exposure was completed with a light amount of 400 mJ/cm2. The obtained coating film was developed using 〇〇5% potassium hydroxide water/guar solution, and the time from when the photoresist composition of the unexposed portion was removed to when the photoresist composition of the hardened portion was removed was measured. Then, the development latitude was evaluated in accordance with the following evaluation criteria. A. When the photoresist composition of the unexposed portion has been removed, and the photoresist composition from which the hardened portion is removed is between seconds and B. When the photoresist composition of the unexposed portion has been removed, The time until the photoresist composition of the hardened portion is removed is 3 sec seconds or more, but less than seconds C: from the photoresist composition from which the unexposed portion has been removed, to the photoresist composition from which the hardened portion is removed The results paid for less than 3 sec. are shown in Table 1. 2066-9284-PF/Ahddub 24 200831618

比較例 〇 O LO 〇 r-H &lt;=&gt; | 100.0 丨 〇 :· CO oi &lt;35 CD s | loo.o 1 o 1-H O o LO o cz&gt; | 100.0 ! 〇 :· CO c&lt;i CD CZ&gt; 50.4 100· 0 o 實施例 CO 20.0 ◦ CO o r-H CD CO c=&gt; g T-H 〇 LO LO CN1 OO &lt;=&gt; 50.8 100.0 &lt; CD 〇 LO 〇) 7—i ◦ | 100.0 1 〇 :· CO oi CX&gt; CD 1 50.4 c=&gt; g r—i o O 〇· CN1 C=&gt; iri 〇 H o | 100.0 | | 40.0 I T—i CD CO c&gt;i CT&gt; 〇· 50.4 100.0 CD O cz&gt; LO ο 寸· cz&gt; r-^ 卜 I 100. 0J 40.0 CO LO CO OO CZ&gt; CO T—&lt; LO o g r—l &lt; oo 20.0 O ιή CD r-H ο 寸· &lt;=&gt; c=&gt; g t—H 〇 Csl &lt;NI 卜 〇· CD csi LO 100.0 卜 O S O co CD r—i I 76.0 I I 100.0 I | 40:0 I CO cd OO csi &lt;=&gt; r—i 49.6 : I 100.0 CO O § O LO o r—t o o g y—&lt; 〇 r-H CD CD cvi cn&gt; CD I 50.4 I 100.0 : LO o s 〇 LO 0 1 &lt; o I 100.0 I ◦ r-4 cd CO oi C75 cr&gt; S I 100.0 I &lt; 寸 o § CD LO o r—( o I 100.0 I &lt; ί 40.0 I :· CO oi ⑦ 〇· 1 50.4 100.0 I CO ο o LO o i—H CD 100.0 〇 :· CO oi cz&gt; 50.4 100.0 &lt; &lt; &lt;NI ο o cd &lt;=&gt; c=&gt; CO | 100.0 | 〇 cx&gt; m* LTD oi OO c=&gt; 50.8 100.0 CD ύ CD LO o r—&lt; o CD g i 1 1 40.0 I CO cvi CJ5 cz&gt; S 100.0 &lt; ELFTEX 8^υ ELFTEX 415, [Printex 25^} Printex 25*3; Printex 35*4; [Printex 55^) (Printex 60*6) 細ecial Black 25(T | Special Black 350*8) | ^)isperbyk-161*9) EFKA—4046^ bisperbyk-20〇riu I ΡΒ—82Γ2) 酞菁系 丙烯樹脂w ^GMEA*l4; BzMA/MMA共聚合物#15) DPEHA*16) IRGACURE %TW PGMEA”4) 顏料分散組成物 碳黑 顏料分散劑 顏料衍生物 含酸基樹脂 溶劑 IM__1 分散穩定性 顏料分散光阻組成物 上述顏料分散組成物 皮膜形成樹脂 光聚合性化合物 光聚合引發劑 溶劑 合計 分散穩定性 顯影性 顯影寬容度 qnppqvi:d-ss6-99s 200831618 *1)CAB0T 公司製,吸油量:U7ml/1〇〇g,pH : 9· 5 *2)DEGUSSA 公司製,吸油量:45ml/1〇〇g,ρΗ : 9· 3 *3)DEGUSSA 公司製,吸油量:45ml/1〇〇g,pH : 9. 1 〔雖與上述*2)者之製品編號相同,但是批次編號不同〕 *4)DEGUSSA 公司製,吸油量:42ml/1〇〇g,pH : 9· 9 *5)DEGUSSA 公司製,吸油量:46ml/1〇〇g,pH : 9. 5 *6)DEGUSSA 公司製,吸油量:U4ml/1〇〇g,pH ·· 1〇· 〇 *7)CAB0T 公司製,吸油量:46ml/1〇〇g,pH : 3· i ⑩ *18)CAB0T 公司製,埤油量:55ml/100g,pH : 9· 5 *8)CAB0T 公司製,吸油量:45ml/1〇〇g,ρΗ : 3· 5 *9)BYK-Chemie公司省,含氨基聚尿烷系高分子分散 劑 *10)EFCA公司製,含氨基尿烷系高分子分散劑 *11)BYK-Chemie公司製,含氨基丙烯系高分子分散劑 *12)味之素(股份有限)製,含氨基聚酯系高分子分散 •劑 *13)BzMA/MMA共聚合物,酸值i〇〇mgj[〇{j/g,重量平均 分子量30000 * 14 )丙二醇一甲_乙酸酯 *15)BzMA/MMA共聚合物,g复值l〇〇mgK〇H/g,重量平均 分子量23000 , *16)二季戊四醇五甲基丙烯酸酯 *17)Ciba Specialty Chemicals 公司製 2-曱基-[4-(甲硫基)苯基]-2-嗎琳基丙烧-1-醇 2066-9284-PF;Ahddub 26 200831618Comparative Example LOO LO 〇rH &lt;=&gt; | 100.0 丨〇:· CO oi &lt;35 CD s | loo.o 1 o 1-HO o LO o cz&gt; | 100.0 ! 〇:· CO c&lt;i CD CZ&gt; 50.4 100· 0 o Example CO 20.0 ◦ CO o rH CD CO c=&gt; g TH 〇LO LO CN1 OO &lt;=&gt; 50.8 100.0 &lt; CD 〇LO 〇) 7—i ◦ | 100.0 1 〇 :· CO oi CX&gt; CD 1 50.4 c=&gt; gr—io O 〇· CN1 C=&gt; iri 〇H o | 100.0 | | 40.0 IT—i CD CO c&gt;i CT&gt; 〇· 50.4 100.0 CD O cz&gt LO ο inch · cz&gt; r-^ 卜 I 100. 0J 40.0 CO LO CO OO CZ&gt; CO T—&lt; LO ogr—l &lt; oo 20.0 O ιή CD rH ο inch· &lt;=&gt;c=&gt; gt-H 〇Csl &lt;NI 〇 〇 · CD csi LO 100.0 卜 OSO co CD r-i I 76.0 II 100.0 I | 40:0 I CO cd OO csi &lt;=&gt; r-i 49.6 : I 100.0 CO O § O LO or—toogy—&lt; 〇rH CD CD cvi cn&gt; CD I 50.4 I 100.0 : LO os 〇LO 0 1 &lt; o I 100.0 I ◦ r-4 cd CO oi C75 cr&gt; SI 100.0 I &lt; inch o § CD LO or—( o I 100.0 I &lt; ί 40.0 I :· CO oi 7 〇· 1 50.4 100.0 I CO ο o LO oi —H CD 100.0 〇:· CO oi cz&gt; 50.4 100.0 &lt;&lt;&lt;NI ο o cd &lt;=&gt;c=&gt; CO | 100.0 | 〇cx&gt; m* LTD oi OO c=&gt; 50.8 100.0 CD ύ CD LO or—&lt; o CD gi 1 1 40.0 I CO cvi CJ5 cz&gt; S 100.0 &lt; ELFTEX 8^υ ELFTEX 415, [Printex 25^} Printex 25*3; Printex 35*4; [Printex 55^ (Printex 60*6) Fine ecial Black 25(T | Special Black 350*8) | ^)isperbyk-161*9) EFKA—4046^ bisperbyk-20〇riu I ΡΒ—82Γ2) Phthalocyanine acrylic resin w ^ GMEA*l4; BzMA/MMA copolymer#15) DPEHA*16) IRGACURE %TW PGMEA”4) Pigment dispersion composition Carbon black pigment dispersant Pigment derivative Acid-based resin solvent IM__1 Dispersion stability Pigment dispersion resist composition The above pigment dispersion composition film forming resin photopolymerizable compound photopolymerization initiator solvent total score Stability developability development latitude qnppqvi: d-ss6-99s 200831618 *1) CAB0T company, oil absorption: U7ml/1〇〇g, pH: 9· 5 *2) DEGUSSA company, oil absorption: 45ml/1 〇〇g, ρΗ : 9· 3 *3) Made by DEGUSSA, oil absorption: 45ml/1〇〇g, pH: 9. 1 [Although the product number of the above *2) is the same, but the batch number is different] *4) Made by DEGUSSA, oil absorption: 42ml/1〇〇g, pH: 9·9 *5) Made by DEGUSSA, oil absorption: 46ml/1〇〇g, pH: 9. 5 *6) manufactured by DEGUSSA Oil absorption: U4ml/1〇〇g, pH ·· 1〇· 〇*7) CAB0T company, oil absorption: 46ml/1〇〇g, pH: 3· i 10 *18) CAB0T company, oyster sauce Amount: 55ml/100g, pH: 9· 5 *8) CAB0T company, oil absorption: 45ml/1〇〇g, ρΗ: 3· 5 *9) BYK-Chemie company, amino-containing polyurethane polymer Dispersant *10) EFCA company, containing amino urethane polymer dispersant *11) BYK-Chemie company, containing amino propylene polymer dispersant *12) Ajinomoto (limited by shares), containing amino group Ester-based polymer dispersion agent*13)BzMA/MMA copolymer, acid value i〇 〇mgj[〇{j/g, weight average molecular weight 30000 * 14) propylene glycol monomethyl acetate * 15) BzMA / MMA copolymer, g complex value l 〇〇 mgK 〇 H / g, weight average molecular weight 23000, *16) Dipentaerythritol pentamethyl acrylate *17) 2-mercapto-[4-(methylthio)phenyl]-2-morphinylpropan-1-ol 2066-9284 manufactured by Ciba Specialty Chemicals PF; Ahddub 26 200831618

BzMA :苄基甲基丙烯酸酯 MMA :甲基丙烯酸 從表1的結果可明白得知,使用了吸油量為1 〇〜 l5〇ml/10〇g、pH值範圍大於9之碳黑的實施例ι〜12,比 起使用了吸油量為1 〇〜15〇m 1 /1 〇〇g、pH值範圍在9以下之 石反黑的比較例1〜2而言,其顯影寬容度明顯變大。 【產業上可利性】 本贅明係提供一種黑矩陣用顏料分散組成物,藉由使 用吸油量為10〜l50ml/100g、pH值範圍大於9之碳黑,得 tH遮光性良好、且顯影寬容度大的黑矩陣用顏料分散光阻 組成物。 【圖式簡單說明】 無。 【主要元件符號說明】 益〇 2066-9284-PF;Ahddub 27BzMA: benzyl methacrylate MMA: methacrylic acid As is apparent from the results of Table 1, examples using carbon black having an oil absorption of 1 〇 to 15 〇 ml/10 〇g and a pH range of more than 9 were used. ι~12, the development latitude is significantly larger than that of the comparative examples 1 to 2 in which the oil absorption amount is 1 〇 15 15 m 1 /1 〇〇 g and the pH value is 9 or less. . [Industrial Applicability] Benjamin provides a pigment dispersion composition for a black matrix. By using carbon black having an oil absorption of 10 to 150 ml/100 g and a pH range of more than 9, a light-shielding property is good and development is achieved. A black matrix with a large tolerance is used to disperse the photoresist composition. [Simple description of the diagram] None. [Main component symbol description] 益〇 2066-9284-PF; Ahddub 27

Claims (1)

200831618 十、申請專利範圍: 1一·種黑矩陣用顏料分散組成物,其特徵在於·· 令吸油置為10〜15〇ml/l〇〇g、pH值範圍大於9 黑,分散於溶劑中。 A I如I專利範11第1項所述之黑矩陣用顏料分散址 成物,其中上述碳黑的吸油量為i〇〜7〇ml/i〇〇g。、、 I 士申明專利靶圍第1或2項所述之黑矩陣用顏料分 散組成物,其中為了令上述碳黑分散,更包括有性 基顏料分散劑。 阪既 4·如申請專利範圍第3項所述之黑轉用顏料分散紙 成物’其中為了令上述碳黑分散,更包括有:擇 酸基顏料衍生物、含酸基色素衍生物、含酸基色素中間體 及含酸基樹脂所構成之族群中至少丨種物質。 _ 4 &amp;如中請專利範圍第3或4項所述之黑矩陣用顏料分 政組成物,其中上述含驗性基顏料分散劑係擇自於人 鹼性基尿烧系高分子顏料分散劑、含驗性基聚酿系古八: 顏料分散劑及含驗性基丙稀系高分子顏料分散劑所才Hi 族群中至少1種物質。 项1之 2066-9284-PF;Ahddub 28 200831618 磺酸基之酞菁衍生物。 8. 如申請專利範圍第4至6項核-項所述之黑矩陣 用顏料分散組成物’其巾上述含酸基樹㈣為酸值2〇〜 300mgKOH/g之含酸基共聚合物樹脂。 9. -種黑矩陣用顏料分散光阻組成物,包括: 如申請專利範圍第1 R + 乐1至8項中任一項所述之黑矩陣用 顏料分散組成物、驗可、、交地科窃匕 贩j /合性树月日、光聚合性化合物、以及 光聚合引發劑。200831618 X. Patent application scope: 1 1. A pigment dispersion composition for a black matrix, characterized in that the oil absorption is set to 10~15〇ml/l〇〇g, the pH range is greater than 9 black, and dispersed in a solvent. . A. The pigment dispersion site for a black matrix according to the first aspect of the invention, wherein the carbon black has an oil absorption of i〇~7〇ml/i〇〇g. The pigment dispersion composition for a black matrix according to Item 1 or 2 of the patent specification, wherein the carbon black is dispersed to further include a base-based pigment dispersant. The invention relates to a black pigment dispersion paper as described in claim 3, wherein in order to disperse the carbon black, an acid-based pigment derivative, an acid-based pigment derivative, and the like are included. At least a substance of the group consisting of an acid-based pigment intermediate and an acid-containing resin. The pigment composition of the black matrix according to the third or fourth aspect of the patent, wherein the above-mentioned pigment-based pigment dispersant is selected from a human base-based urethane polymer pigment dispersion. The agent and the test-based base are the at least one substance of the Hi group of the pigment dispersant and the acryl-based polymer pigment dispersant. Item 1 of 2066-9284-PF; Ahddub 28 200831618 A sulfonate-based phthalocyanine derivative. 8. The pigment dispersion composition for a black matrix according to the invention of claim 4 to 6 wherein the acid group-containing tree (4) is an acid group-containing copolymer resin having an acid value of 2 to 300 mgKOH/g. 9. A pigment dispersion-dispersing composition for a black matrix, comprising: a pigment dispersion composition for a black matrix according to any one of claims 1 to 5, and a test for dispensing, A smuggler, a j-synthetic tree, a photopolymerizable compound, and a photopolymerization initiator. 2066-9284-PF;Ahddub 29 200831618 七、指定代表圖: (一) 本案指定代表圖為:無。 (二) 本代表圖之元件符號簡單說明:無。2066-9284-PF; Ahddub 29 200831618 VII. Designated representative map: (1) The representative representative of the case is: None. (2) A brief description of the symbol of the representative figure: None. 八、本案若有化學式時,請揭示最能顯示發明特的化學式 無08. If there is a chemical formula in this case, please reveal the chemical formula that best shows the invention. 2 0 6 6-92 8 4-PF;Ahddub2 0 6 6-92 8 4-PF; Ahddub
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