TW200606248A - Fluorinated sulfonamide surfactants for aqueous cleaning solutions - Google Patents

Fluorinated sulfonamide surfactants for aqueous cleaning solutions

Info

Publication number
TW200606248A
TW200606248A TW094104882A TW94104882A TW200606248A TW 200606248 A TW200606248 A TW 200606248A TW 094104882 A TW094104882 A TW 094104882A TW 94104882 A TW94104882 A TW 94104882A TW 200606248 A TW200606248 A TW 200606248A
Authority
TW
Taiwan
Prior art keywords
aqueous cleaning
cleaning solutions
fluorinated sulfonamide
sulfonamide surfactants
cleaning
Prior art date
Application number
TW094104882A
Other languages
English (en)
Other versions
TWI370175B (en
Inventor
Patricia Marie Savu
William Mario Lamanna
Michael Joseph Parent
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of TW200606248A publication Critical patent/TW200606248A/zh
Application granted granted Critical
Publication of TWI370175B publication Critical patent/TWI370175B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D11/00—Special methods for preparing compositions containing mixtures of detergents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/004—Surface-active compounds containing F
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/042—Acids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/046—Salts
    • C11D3/048—Nitrates or nitrites
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/39—Organic or inorganic per-compounds
    • C11D3/3947—Liquid compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
TW094104882A 2004-03-03 2005-02-18 Fluorinated sulfonamide surfactants for aqueous cleaning solutions TWI370175B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/792,456 US7294610B2 (en) 2004-03-03 2004-03-03 Fluorinated sulfonamide surfactants for aqueous cleaning solutions

Publications (2)

Publication Number Publication Date
TW200606248A true TW200606248A (en) 2006-02-16
TWI370175B TWI370175B (en) 2012-08-11

Family

ID=34911857

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094104882A TWI370175B (en) 2004-03-03 2005-02-18 Fluorinated sulfonamide surfactants for aqueous cleaning solutions

Country Status (7)

Country Link
US (3) US7294610B2 (zh)
EP (1) EP1743014B1 (zh)
JP (1) JP2007526944A (zh)
KR (1) KR101146389B1 (zh)
CN (1) CN1926227B (zh)
TW (1) TWI370175B (zh)
WO (1) WO2005095567A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI585552B (zh) * 2010-09-08 2017-06-01 三菱瓦斯化學股份有限公司 由氧化矽構成之微細構造體之製造方法

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7294610B2 (en) * 2004-03-03 2007-11-13 3M Innovative Properties Company Fluorinated sulfonamide surfactants for aqueous cleaning solutions
KR100606187B1 (ko) * 2004-07-14 2006-08-01 테크노세미켐 주식회사 반도체 기판 세정용 조성물, 이를 이용한 반도체 기판세정방법 및 반도체 장치 제조 방법
US7179159B2 (en) * 2005-05-02 2007-02-20 Applied Materials, Inc. Materials for chemical mechanical polishing
KR100650828B1 (ko) * 2005-06-16 2006-11-27 주식회사 하이닉스반도체 반도체 소자의 리세스 게이트 형성 방법
KR100673228B1 (ko) * 2005-06-30 2007-01-22 주식회사 하이닉스반도체 낸드 플래쉬 메모리 소자의 제조방법
US7393787B2 (en) * 2005-08-22 2008-07-01 Texas Instruments Incorporated Formation of nitrogen containing dielectric layers having a uniform nitrogen distribution therein using a high temperature chemical treatment
US7572848B2 (en) * 2005-12-21 2009-08-11 3M Innovative Properties Company Coatable composition
US7425374B2 (en) * 2005-12-22 2008-09-16 3M Innovative Properties Company Fluorinated surfactants
US8084367B2 (en) * 2006-05-24 2011-12-27 Samsung Electronics Co., Ltd Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods
US7684332B2 (en) * 2006-08-22 2010-03-23 Embarq Holdings Company, Llc System and method for adjusting the window size of a TCP packet through network elements
US20080125342A1 (en) * 2006-11-07 2008-05-29 Advanced Technology Materials, Inc. Formulations for cleaning memory device structures
EP2128897B1 (en) * 2007-03-16 2015-05-06 Fujitsu Limited Silicon dielectric treating agent for use after etching, process for producing semiconductor device, and semiconductor device
WO2009014144A1 (ja) * 2007-07-24 2009-01-29 Shin-Etsu Handotai Co., Ltd. 半導体基板の製造方法
US8153019B2 (en) 2007-08-06 2012-04-10 Micron Technology, Inc. Methods for substantially equalizing rates at which material is removed over an area of a structure or film that includes recesses or crevices
US7638650B2 (en) * 2007-08-06 2009-12-29 E.I. Du Pont De Nemours And Company Fluoroalkyl surfactants
US7728163B2 (en) * 2007-08-06 2010-06-01 E.I. Du Pont De Nemours And Company Mixed fluoroalkyl-alkyl surfactants
JP2009050920A (ja) * 2007-08-23 2009-03-12 Asahi Glass Co Ltd 磁気ディスク用ガラス基板の製造方法
US8212064B2 (en) * 2008-05-14 2012-07-03 E.I. Du Pont De Nemours And Company Ethylene tetrafluoroethylene intermediates
US8318877B2 (en) * 2008-05-20 2012-11-27 E.I. Du Pont De Nemours And Company Ethylene tetrafluoroethylene (meth)acrylate copolymers
EP2246324A1 (en) * 2009-04-21 2010-11-03 Maflon S.R.L. Sulphonic function fluorine compounds and their use
US7910393B2 (en) * 2009-06-17 2011-03-22 Innovalight, Inc. Methods for forming a dual-doped emitter on a silicon substrate with a sub-critical shear thinning nanoparticle fluid
US9040393B2 (en) * 2010-01-14 2015-05-26 Taiwan Semiconductor Manufacturing Company, Ltd. Method of forming semiconductor structure
EP2655544A4 (en) 2010-12-21 2015-01-14 3M Innovative Properties Co METHOD FOR TREATING HYDROCARBON-BASED FORMATIONS WITH FLUORINATED AMINE
EP2666833A1 (en) * 2012-05-23 2013-11-27 Basf Se A process for the manufacture of semiconductor devices comprising the chemical mechanical polishing (cmp) of iii-v material in the presence of a cmp composition comprising a specific non-ionic surfactant
JP5943195B2 (ja) * 2012-05-25 2016-06-29 東亞合成株式会社 導電性高分子のエッチング液、およびエッチング液を用いた導電性高分子パターンの形成方法。
US8809577B2 (en) * 2012-07-20 2014-08-19 E I Du Pont De Nemours And Company Process to produce fluorinated betaines
DE102012022441A1 (de) 2012-11-15 2014-05-28 Merck Patent Gmbh Neue Phosphinsäureamide, deren Herstellung und Verwendung
EP2951217B1 (en) * 2013-01-29 2017-08-16 3M Innovative Properties Company Surfactants and methods of making and using same
US10767143B2 (en) * 2014-03-06 2020-09-08 Sage Electrochromics, Inc. Particle removal from electrochromic films using non-aqueous fluids
EP3191532B1 (en) * 2014-09-11 2019-08-28 3M Innovative Properties Company Fluorinated surfactant containing compositions
US11193059B2 (en) 2016-12-13 2021-12-07 Current Lighting Solutions, Llc Processes for preparing color stable red-emitting phosphor particles having small particle size
TW202035361A (zh) 2018-12-12 2020-10-01 美商3M新設資產公司 氟化胺氧化物界面活性劑
US11261375B2 (en) 2019-05-22 2022-03-01 General Electric Company Method to enhance phosphor robustness and dispersability and resulting phosphors
CN115698199A (zh) 2020-04-14 2023-02-03 通用电气公司 具有窄带发射磷光体材料的油墨组合物和膜
JP7495317B2 (ja) * 2020-09-25 2024-06-04 株式会社フジミインコーポレーテッド 表面処理組成物、表面処理組成物の製造方法、表面処理方法、および半導体基板の製造方法
CN113980748B (zh) * 2021-11-15 2024-01-26 安徽冠宇光电科技有限公司 一种太阳能单多晶硅片清洗液及其制备方法
CN115011348B (zh) * 2022-06-30 2023-12-29 湖北兴福电子材料股份有限公司 一种氮化铝蚀刻液及其应用

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2806990A (en) * 1953-08-21 1957-09-17 North American Aviation Inc Regulator for an alternator
US2809990A (en) 1955-12-29 1957-10-15 Minnesota Mining & Mfg Fluorocarbon acids and derivatives
US2803656A (en) * 1956-01-23 1957-08-20 Minnesota Mining & Mfg Fluorocarbonsulfonamidoalkanols and sulfates thereof
US2803615A (en) * 1956-01-23 1957-08-20 Minnesota Mining & Mfg Fluorocarbon acrylate and methacrylate esters and polymers
DE2024909B2 (de) * 1970-05-22 1977-09-29 Bayer Ag, 5090 Leverkusen Verfahren zur herstellung von n-hydroxyalkyl-perfluoralkansulfonamiden und einige n,n-bis-(hydroxyalkyl)-perfluor-alkansulfonamide
DE2424243A1 (de) * 1974-05-18 1975-11-27 Bayer Ag Perfluoralkansulfonamidoalkanphosphonsaeure- bzw. -phosphinsaeurederivate
GB1599414A (en) 1977-04-18 1981-09-30 Unilever Ltd Shampoo with anti-grease properties
DE2921142A1 (de) * 1979-05-25 1980-12-11 Bayer Ag Verwendung von perfluoralkansulfonamid- salzen als tenside
EP0073863B1 (en) 1981-09-08 1985-07-03 Dainippon Ink And Chemicals, Inc. Fluorine-containing aminosulfonate
JPS62109985A (ja) * 1985-11-08 1987-05-21 Asahi Glass Co Ltd エツチング用組成物
JP2894717B2 (ja) 1989-03-15 1999-05-24 日産化学工業株式会社 低表面張力硫酸組成物
US5227493A (en) * 1990-08-31 1993-07-13 Air Products And Chemicals, Inc. Fluorinated sulfonamide derivatives
JP3217116B2 (ja) 1992-03-06 2001-10-09 日産化学工業株式会社 低表面張力洗浄用組成物
JPH05275406A (ja) 1992-03-24 1993-10-22 Mitsubishi Kasei Corp 硫酸組成物
US5466389A (en) * 1994-04-20 1995-11-14 J. T. Baker Inc. PH adjusted nonionic surfactant-containing alkaline cleaner composition for cleaning microelectronics substrates
DE4435840C1 (de) * 1994-10-07 1996-03-21 Bayer Ag Verwendung von alkylsubstituierten Perfluoralkylsulfonamiden als Sprühnebelinhibitoren für basische Elektrolysebäder
US5688884A (en) * 1995-08-31 1997-11-18 E. I. Du Pont De Nemours And Company Polymerization process
EP0882124B1 (en) * 1995-12-15 2002-04-10 Minnesota Mining And Manufacturing Company Cleaning process and composition
JPH09286999A (ja) * 1996-04-19 1997-11-04 Kanto Chem Co Inc シリコンウェハ洗浄用組成物
JP4855616B2 (ja) * 1999-10-27 2012-01-18 スリーエム イノベイティブ プロパティズ カンパニー フルオロケミカルスルホンアミド界面活性剤
US6753380B2 (en) * 2001-03-09 2004-06-22 3M Innovative Properties Company Water-and oil-repellency imparting ester oligomers comprising perfluoroalkyl moieties
US6890452B2 (en) * 2002-11-08 2005-05-10 3M Innovative Properties Company Fluorinated surfactants for aqueous acid etch solutions
US7169323B2 (en) * 2002-11-08 2007-01-30 3M Innovative Properties Company Fluorinated surfactants for buffered acid etch solutions
US6858124B2 (en) * 2002-12-16 2005-02-22 3M Innovative Properties Company Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor
US6752380B1 (en) * 2003-02-12 2004-06-22 Dasco Pro, Inc. Pry bar
US7294610B2 (en) * 2004-03-03 2007-11-13 3M Innovative Properties Company Fluorinated sulfonamide surfactants for aqueous cleaning solutions

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI585552B (zh) * 2010-09-08 2017-06-01 三菱瓦斯化學股份有限公司 由氧化矽構成之微細構造體之製造方法

Also Published As

Publication number Publication date
CN1926227B (zh) 2010-06-23
US7294610B2 (en) 2007-11-13
EP1743014A1 (en) 2007-01-17
WO2005095567A1 (en) 2005-10-13
US20080078747A1 (en) 2008-04-03
JP2007526944A (ja) 2007-09-20
EP1743014B1 (en) 2012-06-27
KR20070004022A (ko) 2007-01-05
US7811978B2 (en) 2010-10-12
TWI370175B (en) 2012-08-11
US7985723B2 (en) 2011-07-26
US20100320416A1 (en) 2010-12-23
CN1926227A (zh) 2007-03-07
KR101146389B1 (ko) 2012-05-17
US20050197273A1 (en) 2005-09-08

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees