TW200401948A - Radiation sensitive composition, color filter, black matrix and liquid crystal display element - Google Patents

Radiation sensitive composition, color filter, black matrix and liquid crystal display element Download PDF

Info

Publication number
TW200401948A
TW200401948A TW092107407A TW92107407A TW200401948A TW 200401948 A TW200401948 A TW 200401948A TW 092107407 A TW092107407 A TW 092107407A TW 92107407 A TW92107407 A TW 92107407A TW 200401948 A TW200401948 A TW 200401948A
Authority
TW
Taiwan
Prior art keywords
acid
radiation
sensitive composition
color filter
weight
Prior art date
Application number
TW092107407A
Other languages
English (en)
Chinese (zh)
Inventor
Atsushi Numata
Shigeru Abe
Yasumasa Shinyama
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200401948A publication Critical patent/TW200401948A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
TW092107407A 2002-04-09 2003-04-01 Radiation sensitive composition, color filter, black matrix and liquid crystal display element TW200401948A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002106220A JP3693035B2 (ja) 2002-04-09 2002-04-09 放射線性組成物、カラーフィルタ、ブラックマトリクスおよび液晶表示素子

Publications (1)

Publication Number Publication Date
TW200401948A true TW200401948A (en) 2004-02-01

Family

ID=29390603

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092107407A TW200401948A (en) 2002-04-09 2003-04-01 Radiation sensitive composition, color filter, black matrix and liquid crystal display element

Country Status (3)

Country Link
JP (1) JP3693035B2 (ko)
KR (1) KR20030081068A (ko)
TW (1) TW200401948A (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4578269B2 (ja) * 2005-02-23 2010-11-10 旭化成イーマテリアルズ株式会社 光重合性樹脂組成物
JP2006317924A (ja) * 2005-04-14 2006-11-24 Mitsubishi Chemicals Corp カラーフィルタ用硬化性樹脂組成物、カラーフィルタ、および液晶表示装置
KR101246699B1 (ko) * 2007-11-29 2013-03-25 주식회사 엘지화학 감광성 수지 조성물 및 이를 포함하는 블랙 매트릭스
WO2010036080A2 (ko) * 2008-09-26 2010-04-01 주식회사 엘지화학 블랙 매트릭스 감광성수지조성물
JP5177914B2 (ja) 2008-09-26 2013-04-10 エルジー ケム． エルティーディ． ブラックマトリックス感光性樹脂組成物、ブラックマトリックス感光性樹脂組成物の製造方法、ブラックマトリックス及び液晶表示素子
JP2019179111A (ja) 2018-03-30 2019-10-17 Jsr株式会社 表示素子用積層体、及び隔壁形成用組成物
JP2019182899A (ja) 2018-04-02 2019-10-24 Jsr株式会社 硬化性組成物、及び硬化膜の形成方法

Also Published As

Publication number Publication date
KR20030081068A (ko) 2003-10-17
JP2003302515A (ja) 2003-10-24
JP3693035B2 (ja) 2005-09-07

Similar Documents

Publication Publication Date Title
JP3867177B2 (ja) カラーフィルタ用感放射線性組成物
KR101134278B1 (ko) 감방사선성 조성물 및 그의 제조 방법
JP4998735B2 (ja) 感放射線性組成物、カラーフィルタ、ブラックマトリックスおよび液晶表示素子
JP3940535B2 (ja) ブラックレジスト用感放射線性組成物
JPH09145915A (ja) カラーフィルタ用感放射線性組成物
JP2007183534A (ja) 感光性樹脂組成物及びこれを用いたブラックマトリックス
JP3940547B2 (ja) カラーフィルタ
JP2008209533A (ja) 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
KR20000035567A (ko) 칼라 필터용 감방사선성 조성물
JP2000056118A (ja) カラーフィルタ用感放射線性組成物
JP4075243B2 (ja) カラーフィルタ用感放射線性組成物およびカラーフィルタ
JP3632532B2 (ja) 青色カラーフィルタ用感放射線性組成物およびカラーフィルタ
TW200401948A (en) Radiation sensitive composition, color filter, black matrix and liquid crystal display element
TW405047B (en) Radiation sensitive composition for color filter
JP2002365795A (ja) カラー液晶表示装置用感放射線性組成物
JP2003248115A (ja) カラーフィルタ用感放射線性組成物、カラーフィルタおよびカラー液晶表示装置
JP3661399B2 (ja) カラーフィルタ用感放射線性組成物
JP4196548B2 (ja) カラーフィルタ用感放射線性組成物、カラーフィルタ、および液晶表示素子、
TW200533960A (en) Radiation sensitive composition for color filters, process for preparing the same, color filter and color liquid crystal display
JP2004177498A (ja) 光硬化性樹脂組成物およびその用途
JP4207261B2 (ja) カラーフィルタ用感放射線性組成物
JP2000047018A (ja) カラーフィルタ用感放射線性組成物
JPH10273525A (ja) アルカリ可溶性重合体
JP3875642B2 (ja) 着色画像形成用材料、着色画像形成用感光液及びこれを用いたカラーフィルタの製造方法
JP4839545B2 (ja) カラーフィルタ用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子