TR201910906T4 - Bir gaz ortamında elektronik siklotron rezonansı (RCE) yoluyla bir eksen boyunca büyük bir kapsama sahip bir plazma üretmeye yönelik cihaz - Google Patents
Bir gaz ortamında elektronik siklotron rezonansı (RCE) yoluyla bir eksen boyunca büyük bir kapsama sahip bir plazma üretmeye yönelik cihaz Download PDFInfo
- Publication number
- TR201910906T4 TR201910906T4 TR2019/10906T TR201910906T TR201910906T4 TR 201910906 T4 TR201910906 T4 TR 201910906T4 TR 2019/10906 T TR2019/10906 T TR 2019/10906T TR 201910906 T TR201910906 T TR 201910906T TR 201910906 T4 TR201910906 T4 TR 201910906T4
- Authority
- TR
- Turkey
- Prior art keywords
- rce
- generating
- large range
- gas environment
- cyclotron resonance
- Prior art date
Links
- 239000004020 conductor Substances 0.000 abstract 2
- 238000002347 injection Methods 0.000 abstract 1
- 239000007924 injection Substances 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
- H01J37/32678—Electron cyclotron resonance
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/463—Microwave discharges using antennas or applicators
Abstract
Cihaz, mikrodalgaları bir muamele haznesi içine taşımaya yönelik her birinin bir merkezi iletken (1) ve bir dış iletkenden (2) oluşturulduğu eş eksenel en az iki dalga boyunu (4) içerir, elektromanyetik dalgaların en az iki enjeksiyon kılavuzunun (4), bir yönde uzatılan bir manyetik devre (21-22) ile kombine edilmesi ile karakterize edilir, söz konusu manyetik devre, söz konusu dalga kılavuzları yakınında bir RCE koşulunu gerçekleştirebilen bir manyetik alan oluşturarak dalga kılavuzlarını (4) çevreler.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1258495A FR2995493B1 (fr) | 2012-09-11 | 2012-09-11 | Dispositif pour generer un plasma presentant une etendue importante le long d'un axe par resonnance cyclotronique electronique rce a partir d'un milieu gazeux |
Publications (1)
Publication Number | Publication Date |
---|---|
TR201910906T4 true TR201910906T4 (tr) | 2019-08-21 |
Family
ID=47902052
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TR2019/10906T TR201910906T4 (tr) | 2012-09-11 | 2013-09-04 | Bir gaz ortamında elektronik siklotron rezonansı (RCE) yoluyla bir eksen boyunca büyük bir kapsama sahip bir plazma üretmeye yönelik cihaz |
Country Status (22)
Country | Link |
---|---|
US (1) | US9490102B2 (tr) |
EP (1) | EP2896278B1 (tr) |
JP (1) | JP6265997B2 (tr) |
KR (1) | KR102107510B1 (tr) |
CN (1) | CN104620682B (tr) |
AR (1) | AR092517A1 (tr) |
BR (1) | BR112015004624B1 (tr) |
CA (1) | CA2883570C (tr) |
DK (1) | DK2896278T3 (tr) |
ES (1) | ES2742884T3 (tr) |
FR (1) | FR2995493B1 (tr) |
HU (1) | HUE045110T2 (tr) |
LT (1) | LT2896278T (tr) |
MX (1) | MX342253B (tr) |
PL (1) | PL2896278T3 (tr) |
PT (1) | PT2896278T (tr) |
RU (1) | RU2642424C2 (tr) |
SG (1) | SG11201501338XA (tr) |
SI (1) | SI2896278T1 (tr) |
TR (1) | TR201910906T4 (tr) |
TW (1) | TWI587752B (tr) |
WO (1) | WO2014041280A1 (tr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI758589B (zh) * | 2018-03-01 | 2022-03-21 | 美商應用材料股份有限公司 | 電漿源組件和提供電漿的方法 |
FR3082526B1 (fr) | 2018-06-18 | 2020-09-18 | Hydromecanique & Frottement | Piece revetue par un revetement de carbone amorphe hydrogene sur une sous-couche comportant du chrome, du carbone et du silicium |
FR3082527B1 (fr) | 2018-06-18 | 2020-09-18 | Hydromecanique & Frottement | Piece revetue par un revetement de carbone amorphe non-hydrogene sur une sous-couche comportant du chrome, du carbone et du silicium |
US11037765B2 (en) * | 2018-07-03 | 2021-06-15 | Tokyo Electron Limited | Resonant structure for electron cyclotron resonant (ECR) plasma ionization |
CN111140454B (zh) * | 2020-02-13 | 2021-05-04 | 哈尔滨工业大学 | 一种微型电子回旋共振离子推力器点火装置 |
RU2771009C1 (ru) * | 2021-06-01 | 2022-04-25 | Федеральное государственное бюджетное учреждение науки Физико-технологический институт имени К.А. Валиева Российской академии наук | Способ и устройство для повышения латеральной однородности и плотности низкотемпературной плазмы в широкоапертурных технологических реакторах микроэлектроники |
Family Cites Families (24)
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JPH0627323B2 (ja) * | 1983-12-26 | 1994-04-13 | 株式会社日立製作所 | スパツタリング方法及びその装置 |
FR2583250B1 (fr) * | 1985-06-07 | 1989-06-30 | France Etat | Procede et dispositif d'excitation d'un plasma par micro-ondes a la resonance cyclotronique electronique |
US4883968A (en) * | 1988-06-03 | 1989-11-28 | Eaton Corporation | Electron cyclotron resonance ion source |
JPH03191068A (ja) * | 1989-12-20 | 1991-08-21 | Matsushita Electric Ind Co Ltd | マイクロ波プラズマ装置 |
DE4037091C2 (de) * | 1990-11-22 | 1996-06-20 | Leybold Ag | Vorrichtung für die Erzeugung eines homogenen Mikrowellenfeldes |
US5283538A (en) * | 1990-11-22 | 1994-02-01 | Leybold Aktiengesellschaft | Apparatus for coupling microwave power out of a first space into a second space |
DE4136297A1 (de) | 1991-11-04 | 1993-05-06 | Plasma Electronic Gmbh, 7024 Filderstadt, De | Vorrichtung zur lokalen erzeugung eines plasmas in einer behandlungskammer mittels mikrowellenanregung |
JPH0828350B2 (ja) * | 1992-12-09 | 1996-03-21 | 雄一 坂本 | Ecr型プラズマ発生装置 |
JPH06251896A (ja) * | 1992-12-28 | 1994-09-09 | Hitachi Ltd | プラズマ処理方法及び装置 |
US5446137B1 (en) * | 1993-12-09 | 1998-10-06 | Behringwerke Ag | Oligonucleotides containing 4'-substituted nucleotides |
JPH07296991A (ja) * | 1994-04-25 | 1995-11-10 | Kokusai Electric Co Ltd | マイクロ波プラズマ発生装置 |
FR2726729B1 (fr) * | 1994-11-04 | 1997-01-31 | Metal Process | Dispositif de production d'un plasma permettant une dissociation entre les zones de propagation et d'absorption des micro-ondes |
JPH09186000A (ja) * | 1995-12-28 | 1997-07-15 | Anelva Corp | プラズマ処理装置 |
JPH09266096A (ja) * | 1996-03-28 | 1997-10-07 | Hitachi Ltd | プラズマ処理装置及びこれを用いたプラズマ処理方法 |
JP2875221B2 (ja) * | 1996-11-15 | 1999-03-31 | ニチメン電子工研株式会社 | プラズマ発生装置 |
DE19812558B4 (de) | 1998-03-21 | 2010-09-23 | Roth & Rau Ag | Vorrichtung zur Erzeugung linear ausgedehnter ECR-Plasmen |
FR2797372B1 (fr) | 1999-08-04 | 2002-10-25 | Metal Process | Procede de production de plasmas elementaires en vue de creer un plasma uniforme pour une surface d'utilisation et dispositif de production d'un tel plasma |
JP4678905B2 (ja) * | 1999-12-20 | 2011-04-27 | 徳芳 佐藤 | プラズマ処理装置 |
JP2000306901A (ja) * | 2000-01-01 | 2000-11-02 | Hitachi Ltd | プラズマ処理装置及びプラズマ処理方法 |
DE10341239B4 (de) | 2003-09-08 | 2006-05-24 | Roth & Rau Ag | ECR-Plasmaquelle mit linearer Plasmaaustrittsöffnung |
FR2904177B1 (fr) * | 2006-07-21 | 2008-11-07 | Centre Nat Rech Scient | Dispositif et procede de production et de confinement d'un plasma. |
DE102006037144B4 (de) * | 2006-08-09 | 2010-05-20 | Roth & Rau Ag | ECR-Plasmaquelle |
EP1976346A1 (en) * | 2007-03-30 | 2008-10-01 | Ecole Polytechnique | Apparatus for generating a plasma |
FR2922358B1 (fr) * | 2007-10-16 | 2013-02-01 | Hydromecanique & Frottement | Procede de traitement de surface d'au moins une piece au moyen de sources elementaires de plasma par resonance cyclotronique electronique |
-
2012
- 2012-09-11 FR FR1258495A patent/FR2995493B1/fr not_active Expired - Fee Related
-
2013
- 2013-09-04 RU RU2015108163A patent/RU2642424C2/ru active
- 2013-09-04 US US14/425,409 patent/US9490102B2/en active Active
- 2013-09-04 PT PT13774719T patent/PT2896278T/pt unknown
- 2013-09-04 LT LTEP13774719.2T patent/LT2896278T/lt unknown
- 2013-09-04 CN CN201380046725.8A patent/CN104620682B/zh active Active
- 2013-09-04 JP JP2015530475A patent/JP6265997B2/ja active Active
- 2013-09-04 DK DK13774719.2T patent/DK2896278T3/da active
- 2013-09-04 PL PL13774719T patent/PL2896278T3/pl unknown
- 2013-09-04 HU HUE13774719A patent/HUE045110T2/hu unknown
- 2013-09-04 MX MX2015003170A patent/MX342253B/es active IP Right Grant
- 2013-09-04 TR TR2019/10906T patent/TR201910906T4/tr unknown
- 2013-09-04 EP EP13774719.2A patent/EP2896278B1/fr active Active
- 2013-09-04 KR KR1020157006130A patent/KR102107510B1/ko active IP Right Grant
- 2013-09-04 ES ES13774719T patent/ES2742884T3/es active Active
- 2013-09-04 SG SG11201501338XA patent/SG11201501338XA/en unknown
- 2013-09-04 WO PCT/FR2013/052035 patent/WO2014041280A1/fr active Application Filing
- 2013-09-04 CA CA2883570A patent/CA2883570C/fr active Active
- 2013-09-04 SI SI201331536T patent/SI2896278T1/sl unknown
- 2013-09-04 BR BR112015004624-0A patent/BR112015004624B1/pt active IP Right Grant
- 2013-09-09 TW TW102132427A patent/TWI587752B/zh active
- 2013-09-11 AR ARP130103235A patent/AR092517A1/es active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
FR2995493A1 (fr) | 2014-03-14 |
DK2896278T3 (da) | 2019-08-19 |
EP2896278A1 (fr) | 2015-07-22 |
AR092517A1 (es) | 2015-04-22 |
CN104620682B (zh) | 2017-09-05 |
TWI587752B (zh) | 2017-06-11 |
CN104620682A (zh) | 2015-05-13 |
JP6265997B2 (ja) | 2018-01-24 |
PL2896278T3 (pl) | 2019-10-31 |
JP2015534214A (ja) | 2015-11-26 |
US20150214008A1 (en) | 2015-07-30 |
LT2896278T (lt) | 2019-08-12 |
KR102107510B1 (ko) | 2020-05-07 |
US9490102B2 (en) | 2016-11-08 |
MX2015003170A (es) | 2015-07-14 |
MX342253B (es) | 2016-09-21 |
SG11201501338XA (en) | 2015-04-29 |
CA2883570C (fr) | 2020-03-24 |
WO2014041280A1 (fr) | 2014-03-20 |
HUE045110T2 (hu) | 2019-12-30 |
TW201415958A (zh) | 2014-04-16 |
BR112015004624A2 (pt) | 2017-07-04 |
RU2642424C2 (ru) | 2018-01-25 |
EP2896278B1 (fr) | 2019-06-12 |
SI2896278T1 (sl) | 2019-10-30 |
BR112015004624B1 (pt) | 2021-01-12 |
PT2896278T (pt) | 2019-07-30 |
CA2883570A1 (fr) | 2014-03-20 |
RU2015108163A (ru) | 2016-09-27 |
FR2995493B1 (fr) | 2014-08-22 |
KR20150053918A (ko) | 2015-05-19 |
ES2742884T3 (es) | 2020-02-17 |
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