JP2016082180A5 - - Google Patents
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- Publication number
- JP2016082180A5 JP2016082180A5 JP2014214964A JP2014214964A JP2016082180A5 JP 2016082180 A5 JP2016082180 A5 JP 2016082180A5 JP 2014214964 A JP2014214964 A JP 2014214964A JP 2014214964 A JP2014214964 A JP 2014214964A JP 2016082180 A5 JP2016082180 A5 JP 2016082180A5
- Authority
- JP
- Japan
- Prior art keywords
- plasma processing
- frequency power
- processing apparatus
- plasma
- power source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 230000001939 inductive effect Effects 0.000 claims description 9
- 210000002381 Plasma Anatomy 0.000 claims description 5
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014214964A JP2016082180A (ja) | 2014-10-22 | 2014-10-22 | プラズマ処理装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014214964A JP2016082180A (ja) | 2014-10-22 | 2014-10-22 | プラズマ処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016082180A JP2016082180A (ja) | 2016-05-16 |
JP2016082180A5 true JP2016082180A5 (tr) | 2017-08-17 |
Family
ID=55959264
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014214964A Pending JP2016082180A (ja) | 2014-10-22 | 2014-10-22 | プラズマ処理装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2016082180A (tr) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10242845B2 (en) * | 2017-01-17 | 2019-03-26 | Lam Research Corporation | Near-substrate supplemental plasma density generation with low bias voltage within inductively coupled plasma processing chamber |
JP6976279B2 (ja) * | 2019-03-25 | 2021-12-08 | 株式会社Kokusai Electric | 基板処理装置、半導体装置の製造方法及びプログラム |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6632322B1 (en) * | 2000-06-30 | 2003-10-14 | Lam Research Corporation | Switched uniformity control |
JP4332894B2 (ja) * | 2003-10-02 | 2009-09-16 | セイコーエプソン株式会社 | 表面処理装置および表面処理方法 |
IES20050301A2 (en) * | 2005-05-11 | 2006-11-15 | Univ Dublin City | Plasma source |
JP4659771B2 (ja) * | 2007-02-13 | 2011-03-30 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
JP5172928B2 (ja) * | 2010-09-30 | 2013-03-27 | 株式会社東芝 | 基板処理方法および基板処理装置 |
JP5639866B2 (ja) * | 2010-12-03 | 2014-12-10 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
-
2014
- 2014-10-22 JP JP2014214964A patent/JP2016082180A/ja active Pending
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