TW201614759A - Plasma processing apparatus - Google Patents

Plasma processing apparatus

Info

Publication number
TW201614759A
TW201614759A TW104129813A TW104129813A TW201614759A TW 201614759 A TW201614759 A TW 201614759A TW 104129813 A TW104129813 A TW 104129813A TW 104129813 A TW104129813 A TW 104129813A TW 201614759 A TW201614759 A TW 201614759A
Authority
TW
Taiwan
Prior art keywords
inductively coupled
antenna
chamber
holding
antennas
Prior art date
Application number
TW104129813A
Other languages
Chinese (zh)
Other versions
TWI581354B (en
Inventor
Koji Hada
Satoshi Yamamoto
Original Assignee
Screen Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd filed Critical Screen Holdings Co Ltd
Publication of TW201614759A publication Critical patent/TW201614759A/en
Application granted granted Critical
Publication of TWI581354B publication Critical patent/TWI581354B/en

Links

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Plasma Technology (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

The present invention aims to increase the uniformity of plasma ion density. The plasma processing apparatus of this invention comprises: a chamber; an object holding part to hold the object to be processed in the chamber; at least an inductively coupled antennas, the turns number of which is less than one; a high-frequency power source to supply the high-frequency power to at least one inductively coupled antennas; and at least an antenna holding parts to hold at least an inductively coupled antennas respectively opposed to a wall part in the manner of having at least an inductively coupled antenna protruded into the chamber from one wall part of chamber; each of the at least an antenna holding parts holding, in the manner of varying the direction of line segment connecting both end parts of the corresponding inductively coupled antenna of the at least an inductively coupled antennas, the corresponding inductively coupled antenna at both end parts in the plane intersecting the protruding direction of the inductively coupled antenna.
TW104129813A 2014-09-30 2015-09-09 Plasma processing apparatus TWI581354B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014199708A JP6373707B2 (en) 2014-09-30 2014-09-30 Plasma processing equipment

Publications (2)

Publication Number Publication Date
TW201614759A true TW201614759A (en) 2016-04-16
TWI581354B TWI581354B (en) 2017-05-01

Family

ID=55609984

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104129813A TWI581354B (en) 2014-09-30 2015-09-09 Plasma processing apparatus

Country Status (4)

Country Link
JP (1) JP6373707B2 (en)
KR (1) KR101699177B1 (en)
CN (1) CN105472857B (en)
TW (1) TWI581354B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6999368B2 (en) * 2017-11-01 2022-01-18 東京エレクトロン株式会社 Plasma processing equipment
CN113889391B (en) * 2020-07-02 2024-03-12 中微半导体设备(上海)股份有限公司 Plasma processing apparatus and insulating window assembly thereof
TWI786417B (en) * 2020-07-14 2022-12-11 大氣電漿股份有限公司 Atmospheric pressure plasma generator

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003514388A (en) * 1999-11-15 2003-04-15 ラム リサーチ コーポレーション Materials and gas chemicals for treatment systems
JP3751909B2 (en) * 2002-07-01 2006-03-08 独立行政法人科学技術振興機構 Plasma apparatus and plasma processing substrate
JP4451392B2 (en) * 2003-01-16 2010-04-14 独立行政法人科学技術振興機構 Plasma generator
KR101121418B1 (en) * 2005-02-17 2012-03-16 주성엔지니어링(주) Plasma generation apparatus comprising toroidal core
JP2007123008A (en) * 2005-10-27 2007-05-17 Nissin Electric Co Ltd Plasma generation method and its device, and plasma processing device
JP5162108B2 (en) * 2005-10-28 2013-03-13 日新電機株式会社 Plasma generating method and apparatus, and plasma processing apparatus
JP2007220594A (en) * 2006-02-20 2007-08-30 Nissin Electric Co Ltd Plasma generation method and plasma generation device as well as plasma treatment device
JP5138342B2 (en) * 2007-11-14 2013-02-06 株式会社イー・エム・ディー Plasma processing equipment
WO2011042949A1 (en) * 2009-10-05 2011-04-14 株式会社島津製作所 Surface wave plasma cvd device and film-forming method
WO2011061787A1 (en) * 2009-11-17 2011-05-26 日新電機株式会社 Plasma device
WO2011104803A1 (en) * 2010-02-25 2011-09-01 シャープ株式会社 Plasma generator
JP5735232B2 (en) * 2010-08-02 2015-06-17 株式会社イー・エム・ディー Plasma processing equipment
JP2012049176A (en) * 2010-08-24 2012-03-08 Nissin Electric Co Ltd Plasma device
TWI559819B (en) * 2010-09-10 2016-11-21 Emd Corp Plasma processing device
KR101542905B1 (en) * 2013-04-26 2015-08-07 (주)얼라이드 테크 파인더즈 Semiconductor device
JP2015074792A (en) * 2013-10-07 2015-04-20 株式会社Ｓｃｒｅｅｎホールディングス Plasma cvd device
US9653253B2 (en) * 2014-03-07 2017-05-16 Advanced Ion Beam Technology, Inc. Plasma-based material modification using a plasma source with magnetic confinement

Also Published As

Publication number Publication date
CN105472857B (en) 2018-04-10
CN105472857A (en) 2016-04-06
JP6373707B2 (en) 2018-08-15
KR20160038787A (en) 2016-04-07
JP2016072065A (en) 2016-05-09
TWI581354B (en) 2017-05-01
KR101699177B1 (en) 2017-01-23

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees