SG11201607824YA - Microwave plasma applicator with improved power uniformity - Google Patents
Microwave plasma applicator with improved power uniformityInfo
- Publication number
- SG11201607824YA SG11201607824YA SG11201607824YA SG11201607824YA SG11201607824YA SG 11201607824Y A SG11201607824Y A SG 11201607824YA SG 11201607824Y A SG11201607824Y A SG 11201607824YA SG 11201607824Y A SG11201607824Y A SG 11201607824YA SG 11201607824Y A SG11201607824Y A SG 11201607824YA
- Authority
- SG
- Singapore
- Prior art keywords
- microwave plasma
- improved power
- plasma applicator
- power uniformity
- uniformity
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/32229—Waveguides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32201—Generating means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32311—Circuits specially adapted for controlling the microwave discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32522—Temperature
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/4622—Microwave discharges using waveguides
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/226,994 US20150279626A1 (en) | 2014-03-27 | 2014-03-27 | Microwave plasma applicator with improved power uniformity |
| US14/645,837 US9653266B2 (en) | 2014-03-27 | 2015-03-12 | Microwave plasma applicator with improved power uniformity |
| PCT/US2015/021382 WO2015148246A1 (en) | 2014-03-27 | 2015-03-19 | Microwave plasma applicator with improved power uniformity |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201607824YA true SG11201607824YA (en) | 2016-10-28 |
Family
ID=52824562
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201607824YA SG11201607824YA (en) | 2014-03-27 | 2015-03-19 | Microwave plasma applicator with improved power uniformity |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US9653266B2 (en) |
| EP (2) | EP3123840B1 (en) |
| JP (1) | JP6484645B2 (en) |
| KR (1) | KR101837884B1 (en) |
| CN (1) | CN106465530B (en) |
| ES (1) | ES2768714T3 (en) |
| SG (1) | SG11201607824YA (en) |
| TW (1) | TWI638586B (en) |
| WO (1) | WO2015148246A1 (en) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10187966B2 (en) * | 2015-07-24 | 2019-01-22 | Applied Materials, Inc. | Method and apparatus for gas abatement |
| US9831066B1 (en) * | 2016-05-27 | 2017-11-28 | Mks Instruments, Inc. | Compact microwave plasma applicator utilizing conjoining electric fields |
| KR101820242B1 (en) * | 2016-08-02 | 2018-01-18 | 한국기초과학지원연구원 | Water-cooled type surface wave plasma generating apparatus |
| US10790118B2 (en) * | 2017-03-16 | 2020-09-29 | Mks Instruments, Inc. | Microwave applicator with solid-state generator power source |
| CN107995767A (en) * | 2017-12-27 | 2018-05-04 | 中国科学技术大学 | A kind of arc plasma source of efficient stable |
| CN107949145A (en) * | 2017-12-27 | 2018-04-20 | 长沙新材料产业研究院有限公司 | A kind of microwave-excited plasma device |
| US11087961B2 (en) | 2018-03-02 | 2021-08-10 | Lam Research Corporation | Quartz component with protective coating |
| CN112335342B (en) * | 2018-06-14 | 2023-07-14 | Mks仪器公司 | Radical output monitor for remote plasma source and method of use |
| US11019715B2 (en) * | 2018-07-13 | 2021-05-25 | Mks Instruments, Inc. | Plasma source having a dielectric plasma chamber with improved plasma resistance |
| FR3088797B1 (en) * | 2018-11-21 | 2021-01-29 | Sairem Soc Pour Lapplication Industrielle De La Recherche En Electronique Et Micro Ondes | Microwave reactor for continuous microwave processing of a flowing fluid medium |
| CN110022627A (en) * | 2019-03-05 | 2019-07-16 | 四川大学 | A kind of microwave separation field reconfiguration technique |
| WO2022054072A1 (en) * | 2020-09-13 | 2022-03-17 | Sigma Carbon Technologies | System for growth of crystalline material(s) |
| CN112888134B (en) * | 2021-01-19 | 2024-03-08 | 成都奋羽电子科技有限公司 | Microwave plasma generating device |
| WO2023028034A1 (en) * | 2021-08-24 | 2023-03-02 | University Of Delaware | Coaxial dielectric barrier discharge plasma biphasic microreactor for continuous oxidative processes |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5939178B2 (en) * | 1977-04-25 | 1984-09-21 | 株式会社東芝 | Activated gas generator |
| JP2805009B2 (en) | 1988-05-11 | 1998-09-30 | 株式会社日立製作所 | Plasma generator and plasma element analyzer |
| JPH07116593B2 (en) * | 1988-05-19 | 1995-12-13 | 日本電信電話株式会社 | Thin film forming equipment |
| JPH01297141A (en) * | 1988-05-25 | 1989-11-30 | Canon Inc | Microwave plasma processing device |
| JPH02107778A (en) | 1988-10-18 | 1990-04-19 | Canon Inc | Polarized wave control microwave plasma processing device |
| JPH07130492A (en) * | 1993-11-04 | 1995-05-19 | Mitsubishi Heavy Ind Ltd | Method and device for generating plasma |
| JPH08222397A (en) * | 1995-02-16 | 1996-08-30 | Applied Sci & Technol Inc | Liquid cooling microwave plasma applicator and liquid cooling dielectric window for microwave plasma system |
| US5625259A (en) | 1995-02-16 | 1997-04-29 | Applied Science And Technology, Inc. | Microwave plasma applicator with a helical fluid cooling channel surrounding a microwave transparent discharge tube |
| US6150628A (en) | 1997-06-26 | 2000-11-21 | Applied Science And Technology, Inc. | Toroidal low-field reactive gas source |
| US6263830B1 (en) * | 1999-04-12 | 2001-07-24 | Matrix Integrated Systems, Inc. | Microwave choke for remote plasma generator |
| US6761796B2 (en) * | 2001-04-06 | 2004-07-13 | Axcelis Technologies, Inc. | Method and apparatus for micro-jet enabled, low-energy ion generation transport in plasma processing |
| DE50208353D1 (en) | 2001-08-28 | 2006-11-16 | Jeng-Ming Wu | PLASMABRENNER WITH MICROWAVE EXCITEMENT |
| JP2004055614A (en) * | 2002-07-16 | 2004-02-19 | Tokyo Electron Ltd | Plasma processing apparatus |
| JP4099074B2 (en) * | 2003-01-27 | 2008-06-11 | 東京エレクトロン株式会社 | Plasma processing apparatus and plasma processing method |
| US7183514B2 (en) * | 2003-01-30 | 2007-02-27 | Axcelis Technologies, Inc. | Helix coupled remote plasma source |
| KR100725105B1 (en) | 2006-07-12 | 2007-06-04 | 삼성전자주식회사 | Appilicator semiconductor manufacture device |
| CN101647101B (en) * | 2007-03-29 | 2012-06-20 | 东京毅力科创株式会社 | Plasma process apparatus |
| JP5408566B2 (en) * | 2008-10-18 | 2014-02-05 | 独立行政法人産業技術総合研究所 | Microwave heating of conductive thin films |
| US9174296B2 (en) * | 2010-10-20 | 2015-11-03 | Lam Research Corporation | Plasma ignition and sustaining methods and apparatuses |
-
2015
- 2015-03-12 US US14/645,837 patent/US9653266B2/en active Active
- 2015-03-19 CN CN201580016675.8A patent/CN106465530B/en active Active
- 2015-03-19 ES ES15715899T patent/ES2768714T3/en active Active
- 2015-03-19 KR KR1020167029541A patent/KR101837884B1/en active IP Right Grant
- 2015-03-19 JP JP2016558175A patent/JP6484645B2/en active Active
- 2015-03-19 EP EP15715899.9A patent/EP3123840B1/en active Active
- 2015-03-19 WO PCT/US2015/021382 patent/WO2015148246A1/en active Application Filing
- 2015-03-19 EP EP19209218.7A patent/EP3641507B1/en active Active
- 2015-03-19 SG SG11201607824YA patent/SG11201607824YA/en unknown
- 2015-03-26 TW TW104109842A patent/TWI638586B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| EP3641507B1 (en) | 2022-05-04 |
| JP6484645B2 (en) | 2019-03-13 |
| TWI638586B (en) | 2018-10-11 |
| JP2017513189A (en) | 2017-05-25 |
| EP3123840A1 (en) | 2017-02-01 |
| KR101837884B1 (en) | 2018-03-12 |
| US9653266B2 (en) | 2017-05-16 |
| CN106465530A (en) | 2017-02-22 |
| US20150318148A1 (en) | 2015-11-05 |
| EP3641507A1 (en) | 2020-04-22 |
| WO2015148246A1 (en) | 2015-10-01 |
| EP3123840B1 (en) | 2019-12-25 |
| ES2768714T3 (en) | 2020-06-23 |
| CN106465530B (en) | 2019-01-25 |
| KR20160136420A (en) | 2016-11-29 |
| TW201542043A (en) | 2015-11-01 |
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