TR201901997T4 - Kalsiyum klorür ortamlarında korozyona karşı arttırılmış dirence sahip krom alaşımı kaplama. - Google Patents
Kalsiyum klorür ortamlarında korozyona karşı arttırılmış dirence sahip krom alaşımı kaplama. Download PDFInfo
- Publication number
- TR201901997T4 TR201901997T4 TR2019/01997T TR201901997T TR201901997T4 TR 201901997 T4 TR201901997 T4 TR 201901997T4 TR 2019/01997 T TR2019/01997 T TR 2019/01997T TR 201901997 T TR201901997 T TR 201901997T TR 201901997 T4 TR201901997 T4 TR 201901997T4
- Authority
- TR
- Turkey
- Prior art keywords
- corrosion
- calcium chloride
- increased resistance
- alloy coating
- electroplating solution
- Prior art date
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title abstract 4
- 239000011248 coating agent Substances 0.000 title abstract 3
- 238000000576 coating method Methods 0.000 title abstract 3
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 title abstract 2
- 229910001628 calcium chloride Inorganic materials 0.000 title abstract 2
- 239000001110 calcium chloride Substances 0.000 title abstract 2
- 238000005260 corrosion Methods 0.000 title abstract 2
- 230000007797 corrosion Effects 0.000 title abstract 2
- 239000000956 alloy Substances 0.000 title 1
- 229910045601 alloy Inorganic materials 0.000 title 1
- 238000009713 electroplating Methods 0.000 abstract 3
- 229910052804 chromium Inorganic materials 0.000 abstract 2
- 239000011651 chromium Substances 0.000 abstract 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract 1
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 230000003139 buffering effect Effects 0.000 abstract 1
- 150000001844 chromium Chemical class 0.000 abstract 1
- 229910001430 chromium ion Inorganic materials 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- -1 hydrogen ions Chemical class 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 150000002894 organic compounds Chemical class 0.000 abstract 1
- 229910052717 sulfur Inorganic materials 0.000 abstract 1
- 239000011593 sulfur Substances 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Buluş, aşağıdakileri içeren bir krom elektrolizle kaplama çözeltisini içeren bir krom elektrolizle kaplama çözeltisinden oluşur: (1) suda çözünür üç-değerli bir krom tuzu; (2) üç değerli krom iyonları için en azından bir kompleks oluşturucu; (3) 2.8-4.2?lik bir pH oluşturmak için yeterli bir hidrojen iyonları kaynağı; (4) bir pH tamponlama bileşiği; ve (5) kükürt içeren bir organik bileşik. Krom elektrolizle kaplama çözeltisi, dekoratif bir eşya üzerinde yapışkan bir metalik kaplamanın üretilmesi için bir usulde kullanılabilir; bu tür bir kaplama, kalsiyum klorür içeren ortamlarda korozyona karşı arttırılmış dirence sahiptir.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/409,629 US9765437B2 (en) | 2009-03-24 | 2009-03-24 | Chromium alloy coating with enhanced resistance to corrosion in calcium chloride environments |
Publications (1)
Publication Number | Publication Date |
---|---|
TR201901997T4 true TR201901997T4 (tr) | 2019-03-21 |
Family
ID=42781304
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TR2019/01997T TR201901997T4 (tr) | 2009-03-24 | 2009-06-26 | Kalsiyum klorür ortamlarında korozyona karşı arttırılmış dirence sahip krom alaşımı kaplama. |
Country Status (9)
Country | Link |
---|---|
US (2) | US9765437B2 (tr) |
EP (1) | EP2411567B1 (tr) |
JP (1) | JP5696134B2 (tr) |
CN (1) | CN102362012A (tr) |
ES (1) | ES2709506T3 (tr) |
PL (1) | PL2411567T3 (tr) |
TR (1) | TR201901997T4 (tr) |
TW (1) | TW201035388A (tr) |
WO (1) | WO2010110812A1 (tr) |
Families Citing this family (21)
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---|---|---|---|---|
BR122019020336B1 (pt) | 2011-05-03 | 2020-08-11 | Atotech Deutschland Gmbh | Banho de galvanização e método eletrodeposição de uma camada de cromo escuro em uma peça de trabalho |
US20130220819A1 (en) * | 2012-02-27 | 2013-08-29 | Faraday Technology, Inc. | Electrodeposition of chromium from trivalent chromium using modulated electric fields |
MX350889B (es) * | 2012-03-30 | 2017-09-25 | Tata Steel Ijmuiden Bv | Substrato recubierto para empacar aplicaciones y un metodo para producir dicho substrato recubierto. |
WO2014126067A1 (ja) * | 2013-02-13 | 2014-08-21 | 日本化学工業株式会社 | 三価クロムめっき液 |
US10415148B2 (en) * | 2014-03-07 | 2019-09-17 | Macdermid Acumen, Inc. | Passivation of micro-discontinuous chromium deposited from a trivalent electrolyte |
JP6327655B2 (ja) * | 2014-06-23 | 2018-05-23 | 奥野製薬工業株式会社 | 多層めっき皮膜及び該多層めっき皮膜を有する物品 |
US9809899B2 (en) * | 2014-08-07 | 2017-11-07 | Macdermid Acumen, Inc. | Treatment for electroplating racks to avoid rack metallization |
CN104388989A (zh) * | 2014-11-14 | 2015-03-04 | 无锡信大气象传感网科技有限公司 | 一种三价铬电镀液及制备方法 |
CN104789996A (zh) * | 2015-04-15 | 2015-07-22 | 吉林莱德化学科技有限公司 | 三价铬镀铬电镀液 |
EP3147388A1 (en) * | 2015-09-25 | 2017-03-29 | Enthone, Incorporated | Flexible color adjustment for dark cr(iii)-platings |
CN105671599A (zh) * | 2016-04-11 | 2016-06-15 | 济南德锡科技有限公司 | 一种硫酸盐三价铬电镀液及其制备方法 |
US20170306515A1 (en) * | 2016-04-21 | 2017-10-26 | Macdermid Acumen, Inc | Dark Colored Chromium Based Electrodeposits |
CN107313078A (zh) * | 2016-04-27 | 2017-11-03 | 中国科学院金属研究所 | 一种三价铬电镀溶液及其制备方法 |
EP3725920A4 (en) | 2017-12-13 | 2021-04-21 | JCU Corporation | TRIVALENT CHROME PLATING SOLUTION AND CHROME PLATING PROCESS USING IT |
EP3725919A4 (en) * | 2017-12-14 | 2021-09-01 | JCU Corporation | TRIVALENT CHROME PLATING SOLUTION AND TRIVALENT CHROME PLATING PROCESS EMPLOYER |
ES2823149T3 (es) * | 2017-12-22 | 2021-05-06 | Atotech Deutschland Gmbh | Un método para incrementar la resistencia a la corrosión de un sustrato que comprende una capa externa de aleación de cromo |
EP3819404A4 (en) * | 2018-07-03 | 2022-02-09 | JCU Corporation | TRIVAL CHROME PLATING SOLUTION AND CHROME COATING PROCESS WITH IT |
CN110759441B (zh) * | 2018-07-27 | 2022-02-01 | 广州超邦化工有限公司 | 含氨基乙酸配位剂的三价铬钝化废水的处理方法 |
CA3155524C (en) | 2019-10-31 | 2024-02-27 | Diego DAL ZILIO | Sulfate based, ammonium free trivalent chromium decorative plating process |
EP3859053A1 (en) | 2020-01-31 | 2021-08-04 | COVENTYA S.p.A. | Sulfate based, ammonium free trivalent chromium decorative plating process |
JP2023018744A (ja) * | 2021-07-28 | 2023-02-09 | 株式会社Jcu | 白色3価クロムめっき浴およびこれを利用した被めっき物への白色3価クロムめっき方法 |
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US3681210A (en) * | 1971-04-08 | 1972-08-01 | Industrial Filter Pump Mfg Co | Recovery of mixed plating rinses |
GB1488381A (en) | 1975-09-01 | 1977-10-12 | Bnf Metals Tech Centre | Trivalent chromium plating bath |
DE2550615A1 (de) * | 1975-11-11 | 1977-05-18 | Int Lead Zinc Res | Waessriges verchromungsbad und verfahren zu seiner herstellung |
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US20080169199A1 (en) * | 2007-01-17 | 2008-07-17 | Chang Gung University | Trivalent chromium electroplating solution and an electroplating process with the solution |
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-
2009
- 2009-03-24 US US12/409,629 patent/US9765437B2/en active Active
- 2009-06-26 CN CN2009801582365A patent/CN102362012A/zh active Pending
- 2009-06-26 PL PL09842435T patent/PL2411567T3/pl unknown
- 2009-06-26 EP EP09842435.1A patent/EP2411567B1/en active Active
- 2009-06-26 WO PCT/US2009/048819 patent/WO2010110812A1/en active Application Filing
- 2009-06-26 JP JP2012501983A patent/JP5696134B2/ja active Active
- 2009-06-26 TR TR2019/01997T patent/TR201901997T4/tr unknown
- 2009-06-26 ES ES09842435T patent/ES2709506T3/es active Active
- 2009-07-20 TW TW098124405A patent/TW201035388A/zh unknown
-
2017
- 2017-08-16 US US15/678,771 patent/US20170342582A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP2411567B1 (en) | 2018-12-19 |
US20100243463A1 (en) | 2010-09-30 |
TW201035388A (en) | 2010-10-01 |
US20170342582A1 (en) | 2017-11-30 |
JP2012521495A (ja) | 2012-09-13 |
PL2411567T3 (pl) | 2019-07-31 |
WO2010110812A1 (en) | 2010-09-30 |
US9765437B2 (en) | 2017-09-19 |
EP2411567A1 (en) | 2012-02-01 |
JP5696134B2 (ja) | 2015-04-08 |
EP2411567A4 (en) | 2016-04-20 |
ES2709506T3 (es) | 2019-04-16 |
CN102362012A (zh) | 2012-02-22 |
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