PL2411567T3 - Powłoka ze stopu chromu o zwiększonej odporności na korozję w środowiskach chlorku wapnia - Google Patents

Powłoka ze stopu chromu o zwiększonej odporności na korozję w środowiskach chlorku wapnia

Info

Publication number
PL2411567T3
PL2411567T3 PL09842435T PL09842435T PL2411567T3 PL 2411567 T3 PL2411567 T3 PL 2411567T3 PL 09842435 T PL09842435 T PL 09842435T PL 09842435 T PL09842435 T PL 09842435T PL 2411567 T3 PL2411567 T3 PL 2411567T3
Authority
PL
Poland
Prior art keywords
corrosion
calcium chloride
chromium alloy
alloy coating
enhanced resistance
Prior art date
Application number
PL09842435T
Other languages
English (en)
Inventor
Roderick D. HERDMAN
Stacey Handy
Trevor Pearson
Toshiyuki Yamamoto
Kotaro Ishiwata
Masahiro Hara
Tatsuya Nishiyama
Original Assignee
Macdermid Acumen, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=42781304&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=PL2411567(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Macdermid Acumen, Inc. filed Critical Macdermid Acumen, Inc.
Publication of PL2411567T3 publication Critical patent/PL2411567T3/pl

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/06Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/10Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • C25D5/12Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C25D5/14Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/623Porosity of the layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
PL09842435T 2009-03-24 2009-06-26 Powłoka ze stopu chromu o zwiększonej odporności na korozję w środowiskach chlorku wapnia PL2411567T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/409,629 US9765437B2 (en) 2009-03-24 2009-03-24 Chromium alloy coating with enhanced resistance to corrosion in calcium chloride environments
PCT/US2009/048819 WO2010110812A1 (en) 2009-03-24 2009-06-26 Chromium alloy coating with enhanced resistance to corrosion in calcium chloride environments
EP09842435.1A EP2411567B1 (en) 2009-03-24 2009-06-26 Chromium alloy coating with enhanced resistance to corrosion in calcium chloride environments

Publications (1)

Publication Number Publication Date
PL2411567T3 true PL2411567T3 (pl) 2019-07-31

Family

ID=42781304

Family Applications (1)

Application Number Title Priority Date Filing Date
PL09842435T PL2411567T3 (pl) 2009-03-24 2009-06-26 Powłoka ze stopu chromu o zwiększonej odporności na korozję w środowiskach chlorku wapnia

Country Status (9)

Country Link
US (2) US9765437B2 (pl)
EP (1) EP2411567B1 (pl)
JP (1) JP5696134B2 (pl)
CN (1) CN102362012A (pl)
ES (1) ES2709506T3 (pl)
PL (1) PL2411567T3 (pl)
TR (1) TR201901997T4 (pl)
TW (1) TW201035388A (pl)
WO (1) WO2010110812A1 (pl)

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US9689081B2 (en) * 2011-05-03 2017-06-27 Atotech Deutschland Gmbh Electroplating bath and method for producing dark chromium layers
US20130220819A1 (en) * 2012-02-27 2013-08-29 Faraday Technology, Inc. Electrodeposition of chromium from trivalent chromium using modulated electric fields
RU2627076C2 (ru) * 2012-03-30 2017-08-03 Тата Стил Эймейден Б.В. Подложка с покрытием для упаковочных применений и способ получения упомянутой подложки
CN105143520A (zh) * 2013-02-13 2015-12-09 日本化学工业株式会社 活塞环及其制造方法
US10415148B2 (en) * 2014-03-07 2019-09-17 Macdermid Acumen, Inc. Passivation of micro-discontinuous chromium deposited from a trivalent electrolyte
WO2015198914A1 (ja) * 2014-06-23 2015-12-30 奥野製薬工業株式会社 多層めっき皮膜及び該多層めっき皮膜を有する物品
US9809899B2 (en) 2014-08-07 2017-11-07 Macdermid Acumen, Inc. Treatment for electroplating racks to avoid rack metallization
CN104388989A (zh) * 2014-11-14 2015-03-04 无锡信大气象传感网科技有限公司 一种三价铬电镀液及制备方法
CN104789996A (zh) * 2015-04-15 2015-07-22 吉林莱德化学科技有限公司 三价铬镀铬电镀液
EP3147388A1 (en) * 2015-09-25 2017-03-29 Enthone, Incorporated Flexible color adjustment for dark cr(iii)-platings
CN105671599A (zh) * 2016-04-11 2016-06-15 济南德锡科技有限公司 一种硫酸盐三价铬电镀液及其制备方法
US20170306515A1 (en) * 2016-04-21 2017-10-26 Macdermid Acumen, Inc Dark Colored Chromium Based Electrodeposits
CN107313078A (zh) * 2016-04-27 2017-11-03 中国科学院金属研究所 一种三价铬电镀溶液及其制备方法
WO2019117178A1 (ja) 2017-12-13 2019-06-20 株式会社Jcu 3価クロムメッキ液およびこれを用いたクロムメッキ方法
WO2019117230A1 (ja) * 2017-12-14 2019-06-20 株式会社Jcu 3価クロムメッキ液およびこれを用いた3価クロムメッキ方法
PL3502320T3 (pl) 2017-12-22 2021-03-08 Atotech Deutschland Gmbh Sposób zwiększania odporności na korozję podłoża zawierającego najbardziej zewnętrzną warstwę ze stopu chromu
EP3819404A4 (en) * 2018-07-03 2022-02-09 JCU Corporation TRIVAL CHROME PLATING SOLUTION AND CHROME COATING PROCESS WITH IT
CN110759441B (zh) * 2018-07-27 2022-02-01 广州超邦化工有限公司 含氨基乙酸配位剂的三价铬钝化废水的处理方法
EP3859053A1 (en) 2020-01-31 2021-08-04 COVENTYA S.p.A. Sulfate based, ammonium free trivalent chromium decorative plating process
JP7342253B2 (ja) 2019-10-31 2023-09-11 コヴェンティア ソチエタ ペル アツィオーニ 硫酸系、アンモニア不含三価クロム装飾めっきプロセス
JP2023018744A (ja) * 2021-07-28 2023-02-09 株式会社Jcu 白色3価クロムめっき浴およびこれを利用した被めっき物への白色3価クロムめっき方法

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Also Published As

Publication number Publication date
JP2012521495A (ja) 2012-09-13
ES2709506T3 (es) 2019-04-16
EP2411567A4 (en) 2016-04-20
TR201901997T4 (tr) 2019-03-21
US9765437B2 (en) 2017-09-19
WO2010110812A1 (en) 2010-09-30
EP2411567A1 (en) 2012-02-01
US20170342582A1 (en) 2017-11-30
EP2411567B1 (en) 2018-12-19
US20100243463A1 (en) 2010-09-30
CN102362012A (zh) 2012-02-22
TW201035388A (en) 2010-10-01
JP5696134B2 (ja) 2015-04-08

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