SU912065A3 - Способ изготовлени интегральных полупроводниковых схем - Google Patents

Способ изготовлени интегральных полупроводниковых схем Download PDF

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Publication number
SU912065A3
SU912065A3 SU772542550A SU2542550A SU912065A3 SU 912065 A3 SU912065 A3 SU 912065A3 SU 772542550 A SU772542550 A SU 772542550A SU 2542550 A SU2542550 A SU 2542550A SU 912065 A3 SU912065 A3 SU 912065A3
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SU
USSR - Soviet Union
Prior art keywords
disclosed
integrated circuits
semiconductor integrated
making semiconductor
logic
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Application number
SU772542550A
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English (en)
Inventor
Х.Бергер Хорст
Курт Видманн Зигфрид
Original Assignee
Интернэшнл Бизнес Машинз Корпорейшн (Фирма)
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Application filed by Интернэшнл Бизнес Машинз Корпорейшн (Фирма) filed Critical Интернэшнл Бизнес Машинз Корпорейшн (Фирма)
Application granted granted Critical
Publication of SU912065A3 publication Critical patent/SU912065A3/ru

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/082Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only
    • H01L27/0821Combination of lateral and vertical transistors only
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0214Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
    • H01L27/0229Particular design considerations for integrated circuits for internal polarisation, e.g. I2L of bipolar structures
    • H01L27/0233Integrated injection logic structures [I2L]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/038Diffusions-staged
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/106Masks, special
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/167Two diffusions in one hole

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Bipolar Integrated Circuits (AREA)
  • Bipolar Transistors (AREA)
  • Element Separation (AREA)

Description

ионного легировани , создава  области PI, Р2 и РЗ. Последующим окислением выращивают OKHccjr 6 в окнах толщиной пор дка 0,1 мкм вновь нанос т изолирующее нокрытие 7 (фиг.4 п котором вскрьтают фотолитографией окно 8,-некритичное по своим размерам (так называема  чернова  маска). Через эту маску улщл ют тонкий окисел над областью РЗ путем жидкостного травлени . Затем маску 7 удал ют, провод т легирование примесью
/г-гипа, например диффузией фосфора и повторным травлением удал ют тонкий окисел над област ми Р1 и Р2 (фиг. 5).
Предлагаемый способ позвол ет упростить известный за счет одновреметюго создани  областей первого тина проводимости и С1шжени  требований к совмещению, имеющем место при многократных фотолитографических операци х. В свою очередь, едина  маска позвол ет максимально приблизить элементы интегралькых схем, позвол   существенно повысить плотность компановки, а следовательно, и степень интеграции.
Некрити1ша  по размерам маска дл  вскрыти  эмиттерных или коллекторных областей позвол ет осуществл ть фотолитографию без точного совмещени , что даже упрощаёт способ, а следовательно, снижает затраты на из готов ле1ше интегральных полупроводниковых схем с инжекционным питанием.

Claims (2)

1.Патент ФРГ № 1789055, кл. 21 q 11/02, опублик. 1978.
2.За вка ФРГ N 2419817, кл. 21 q 11/02, опублик. 1974 (прототип).
Фг/f. /
Фиг. г
SU772542550A 1976-11-16 1977-11-15 Способ изготовлени интегральных полупроводниковых схем SU912065A3 (ru)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2652103A DE2652103C2 (de) 1976-11-16 1976-11-16 Integrierte Halbleiteranordnung für ein logisches Schaltungskonzept und Verfahren zu ihrer Herstellung

Publications (1)

Publication Number Publication Date
SU912065A3 true SU912065A3 (ru) 1982-03-07

Family

ID=5993241

Family Applications (1)

Application Number Title Priority Date Filing Date
SU772542550A SU912065A3 (ru) 1976-11-16 1977-11-15 Способ изготовлени интегральных полупроводниковых схем

Country Status (15)

Country Link
US (1) US4158783A (ru)
JP (1) JPS5363874A (ru)
AT (1) AT382261B (ru)
BE (1) BE859759A (ru)
BR (1) BR7707519A (ru)
CA (1) CA1092722A (ru)
DD (1) DD137771A5 (ru)
DE (1) DE2652103C2 (ru)
ES (1) ES464138A1 (ru)
FR (1) FR2371063A1 (ru)
GB (1) GB1592334A (ru)
IT (1) IT1115741B (ru)
NL (1) NL7711778A (ru)
SE (1) SE7712741L (ru)
SU (1) SU912065A3 (ru)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4199776A (en) * 1978-08-24 1980-04-22 Rca Corporation Integrated injection logic with floating reinjectors
JPS55170895U (ru) * 1979-05-26 1980-12-08
US4338622A (en) * 1979-06-29 1982-07-06 International Business Machines Corporation Self-aligned semiconductor circuits and process therefor
US4794277A (en) * 1986-01-13 1988-12-27 Unitrode Corporation Integrated circuit under-voltage lockout
US5177029A (en) * 1989-03-28 1993-01-05 Matsushita Electric Works, Ltd. Method for manufacturing static induction type semiconductor device enhancement mode power

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7107040A (ru) * 1971-05-22 1972-11-24
NL7200294A (ru) * 1972-01-08 1973-07-10
US3919005A (en) * 1973-05-07 1975-11-11 Fairchild Camera Instr Co Method for fabricating double-diffused, lateral transistor
US3959809A (en) * 1974-05-10 1976-05-25 Signetics Corporation High inverse gain transistor
DE2446649A1 (de) * 1974-09-30 1976-04-15 Siemens Ag Bipolare logikschaltung
US3993513A (en) * 1974-10-29 1976-11-23 Fairchild Camera And Instrument Corporation Combined method for fabricating oxide-isolated vertical bipolar transistors and complementary oxide-isolated lateral bipolar transistors and the resulting structures
US4058419A (en) * 1974-12-27 1977-11-15 Tokyo Shibaura Electric, Co., Ltd. Method of manufacturing integrated injection logic semiconductor devices utilizing self-aligned double-diffusion techniques
DE2509530C2 (de) * 1975-03-05 1985-05-23 Ibm Deutschland Gmbh, 7000 Stuttgart Halbleiteranordnung für die Grundbausteine eines hochintegrierbaren logischen Halbleiterschaltungskonzepts basierend auf Mehrfachkollektor-Umkehrtransistoren

Also Published As

Publication number Publication date
US4158783A (en) 1979-06-19
ES464138A1 (es) 1978-12-16
NL7711778A (nl) 1978-05-18
JPS5363874A (en) 1978-06-07
SE7712741L (sv) 1978-05-17
DE2652103C2 (de) 1982-10-28
DD137771A5 (de) 1979-09-19
FR2371063A1 (fr) 1978-06-09
FR2371063B1 (ru) 1980-08-01
BR7707519A (pt) 1978-08-01
ATA470677A (de) 1986-06-15
AT382261B (de) 1987-02-10
JPS5615589B2 (ru) 1981-04-10
GB1592334A (en) 1981-07-08
DE2652103A1 (de) 1978-05-24
CA1092722A (en) 1980-12-30
IT1115741B (it) 1986-02-03
BE859759A (fr) 1978-02-01

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