AT382261B - Verfahren zur herstellung einer integrierten halbleiteranordnung fuer ein logisches schaltungskonzept - Google Patents

Verfahren zur herstellung einer integrierten halbleiteranordnung fuer ein logisches schaltungskonzept

Info

Publication number
AT382261B
AT382261B AT0470677A AT470677A AT382261B AT 382261 B AT382261 B AT 382261B AT 0470677 A AT0470677 A AT 0470677A AT 470677 A AT470677 A AT 470677A AT 382261 B AT382261 B AT 382261B
Authority
AT
Austria
Prior art keywords
producing
logical circuit
integrated semiconductor
semiconductor arrangement
circuit concept
Prior art date
Application number
AT0470677A
Other languages
English (en)
Other versions
ATA470677A (de
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of ATA470677A publication Critical patent/ATA470677A/de
Application granted granted Critical
Publication of AT382261B publication Critical patent/AT382261B/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/082Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only
    • H01L27/0821Combination of lateral and vertical transistors only
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0214Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
    • H01L27/0229Particular design considerations for integrated circuits for internal polarisation, e.g. I2L of bipolar structures
    • H01L27/0233Integrated injection logic structures [I2L]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/038Diffusions-staged
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/106Masks, special
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/167Two diffusions in one hole
AT0470677A 1976-11-16 1977-07-01 Verfahren zur herstellung einer integrierten halbleiteranordnung fuer ein logisches schaltungskonzept AT382261B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2652103A DE2652103C2 (de) 1976-11-16 1976-11-16 Integrierte Halbleiteranordnung für ein logisches Schaltungskonzept und Verfahren zu ihrer Herstellung

Publications (2)

Publication Number Publication Date
ATA470677A ATA470677A (de) 1986-06-15
AT382261B true AT382261B (de) 1987-02-10

Family

ID=5993241

Family Applications (1)

Application Number Title Priority Date Filing Date
AT0470677A AT382261B (de) 1976-11-16 1977-07-01 Verfahren zur herstellung einer integrierten halbleiteranordnung fuer ein logisches schaltungskonzept

Country Status (15)

Country Link
US (1) US4158783A (de)
JP (1) JPS5363874A (de)
AT (1) AT382261B (de)
BE (1) BE859759A (de)
BR (1) BR7707519A (de)
CA (1) CA1092722A (de)
DD (1) DD137771A5 (de)
DE (1) DE2652103C2 (de)
ES (1) ES464138A1 (de)
FR (1) FR2371063A1 (de)
GB (1) GB1592334A (de)
IT (1) IT1115741B (de)
NL (1) NL7711778A (de)
SE (1) SE7712741L (de)
SU (1) SU912065A3 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4199776A (en) * 1978-08-24 1980-04-22 Rca Corporation Integrated injection logic with floating reinjectors
JPS55170895U (de) * 1979-05-26 1980-12-08
US4338622A (en) * 1979-06-29 1982-07-06 International Business Machines Corporation Self-aligned semiconductor circuits and process therefor
US4794277A (en) * 1986-01-13 1988-12-27 Unitrode Corporation Integrated circuit under-voltage lockout
US5177029A (en) * 1989-03-28 1993-01-05 Matsushita Electric Works, Ltd. Method for manufacturing static induction type semiconductor device enhancement mode power

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7107040A (de) * 1971-05-22 1972-11-24
NL7200294A (de) * 1972-01-08 1973-07-10
US3919005A (en) * 1973-05-07 1975-11-11 Fairchild Camera Instr Co Method for fabricating double-diffused, lateral transistor
US3959809A (en) * 1974-05-10 1976-05-25 Signetics Corporation High inverse gain transistor
DE2446649A1 (de) * 1974-09-30 1976-04-15 Siemens Ag Bipolare logikschaltung
US3993513A (en) * 1974-10-29 1976-11-23 Fairchild Camera And Instrument Corporation Combined method for fabricating oxide-isolated vertical bipolar transistors and complementary oxide-isolated lateral bipolar transistors and the resulting structures
US4058419A (en) * 1974-12-27 1977-11-15 Tokyo Shibaura Electric, Co., Ltd. Method of manufacturing integrated injection logic semiconductor devices utilizing self-aligned double-diffusion techniques
DE2509530C2 (de) * 1975-03-05 1985-05-23 Ibm Deutschland Gmbh, 7000 Stuttgart Halbleiteranordnung für die Grundbausteine eines hochintegrierbaren logischen Halbleiterschaltungskonzepts basierend auf Mehrfachkollektor-Umkehrtransistoren

Also Published As

Publication number Publication date
DE2652103A1 (de) 1978-05-24
SE7712741L (sv) 1978-05-17
JPS5363874A (en) 1978-06-07
US4158783A (en) 1979-06-19
ES464138A1 (es) 1978-12-16
IT1115741B (it) 1986-02-03
SU912065A3 (ru) 1982-03-07
DE2652103C2 (de) 1982-10-28
FR2371063A1 (fr) 1978-06-09
FR2371063B1 (de) 1980-08-01
DD137771A5 (de) 1979-09-19
ATA470677A (de) 1986-06-15
BR7707519A (pt) 1978-08-01
CA1092722A (en) 1980-12-30
BE859759A (fr) 1978-02-01
JPS5615589B2 (de) 1981-04-10
NL7711778A (nl) 1978-05-18
GB1592334A (en) 1981-07-08

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee