SG91328A1 - Crackstop and oxygen barrier for low-k dielectric integrated circuits - Google Patents
Crackstop and oxygen barrier for low-k dielectric integrated circuitsInfo
- Publication number
- SG91328A1 SG91328A1 SG200100288A SG200100288A SG91328A1 SG 91328 A1 SG91328 A1 SG 91328A1 SG 200100288 A SG200100288 A SG 200100288A SG 200100288 A SG200100288 A SG 200100288A SG 91328 A1 SG91328 A1 SG 91328A1
- Authority
- SG
- Singapore
- Prior art keywords
- crackstop
- low
- integrated circuits
- oxygen barrier
- dielectric integrated
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/564—Details not otherwise provided for, e.g. protection against moisture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/585—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries comprising conductive layers or plates or strips or rods or rings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/501,649 US6261945B1 (en) | 2000-02-10 | 2000-02-10 | Crackstop and oxygen barrier for low-K dielectric integrated circuits |
Publications (1)
Publication Number | Publication Date |
---|---|
SG91328A1 true SG91328A1 (en) | 2002-09-17 |
Family
ID=23994453
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200100288A SG91328A1 (en) | 2000-02-10 | 2001-01-17 | Crackstop and oxygen barrier for low-k dielectric integrated circuits |
Country Status (7)
Country | Link |
---|---|
US (1) | US6261945B1 (zh) |
JP (1) | JP3627009B2 (zh) |
KR (1) | KR100368088B1 (zh) |
CN (1) | CN1219318C (zh) |
MY (1) | MY119966A (zh) |
SG (1) | SG91328A1 (zh) |
TW (1) | TW506052B (zh) |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6495918B1 (en) * | 2000-09-05 | 2002-12-17 | Infineon Technologies Ag | Chip crack stop design for semiconductor chips |
US6555467B2 (en) * | 2001-09-28 | 2003-04-29 | Sharp Laboratories Of America, Inc. | Method of making air gaps copper interconnect |
US7098676B2 (en) * | 2003-01-08 | 2006-08-29 | International Business Machines Corporation | Multi-functional structure for enhanced chip manufacturibility and reliability for low k dielectrics semiconductors and a crackstop integrity screen and monitor |
US20050095835A1 (en) * | 2003-09-26 | 2005-05-05 | Tessera, Inc. | Structure and method of making capped chips having vertical interconnects |
EP1521300A1 (en) * | 2003-09-30 | 2005-04-06 | STMicroelectronics S.r.l. | Circuit structure integrated on a semiconductor substrate and relevant manufacturing method |
US20050116344A1 (en) * | 2003-10-29 | 2005-06-02 | Tessera, Inc. | Microelectronic element having trace formed after bond layer |
JP4855973B2 (ja) * | 2003-11-10 | 2012-01-18 | パナソニック株式会社 | 半導体装置およびその製造方法 |
US7453128B2 (en) | 2003-11-10 | 2008-11-18 | Panasonic Corporation | Semiconductor device and method for fabricating the same |
US20050112957A1 (en) * | 2003-11-26 | 2005-05-26 | International Business Machines Corporation | Partial inter-locking metal contact structure for semiconductor devices and method of manufacture |
US7109093B2 (en) * | 2004-03-22 | 2006-09-19 | International Business Machines Corporation | Crackstop with release layer for crack control in semiconductors |
CN100388480C (zh) * | 2004-05-11 | 2008-05-14 | 中芯国际集成电路制造(上海)有限公司 | 低介电常数薄膜及其制造方法 |
JP4759229B2 (ja) * | 2004-05-12 | 2011-08-31 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
JP4636839B2 (ja) * | 2004-09-24 | 2011-02-23 | パナソニック株式会社 | 電子デバイス |
US20060183270A1 (en) * | 2005-02-14 | 2006-08-17 | Tessera, Inc. | Tools and methods for forming conductive bumps on microelectronic elements |
US8143095B2 (en) | 2005-03-22 | 2012-03-27 | Tessera, Inc. | Sequential fabrication of vertical conductive interconnects in capped chips |
US7795615B2 (en) * | 2005-11-08 | 2010-09-14 | Infineon Technologies Ag | Capacitor integrated in a structure surrounding a die |
US20070138644A1 (en) * | 2005-12-15 | 2007-06-21 | Tessera, Inc. | Structure and method of making capped chip having discrete article assembled into vertical interconnect |
US7936062B2 (en) | 2006-01-23 | 2011-05-03 | Tessera Technologies Ireland Limited | Wafer level chip packaging |
US8604605B2 (en) | 2007-01-05 | 2013-12-10 | Invensas Corp. | Microelectronic assembly with multi-layer support structure |
US20080173985A1 (en) * | 2007-01-24 | 2008-07-24 | International Business Machines Corporation | Dielectric cap having material with optical band gap to substantially block uv radiation during curing treatment, and related methods |
US7544602B2 (en) * | 2007-03-29 | 2009-06-09 | International Business Machines Corporation | Method and structure for ultra narrow crack stop for multilevel semiconductor device |
JP5448304B2 (ja) | 2007-04-19 | 2014-03-19 | パナソニック株式会社 | 半導体装置 |
JP4926918B2 (ja) * | 2007-11-14 | 2012-05-09 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
US7812424B2 (en) * | 2007-12-21 | 2010-10-12 | Infineon Technologies Ag | Moisture barrier capacitors in semiconductor components |
US8187897B2 (en) | 2008-08-19 | 2012-05-29 | International Business Machines Corporation | Fabricating product chips and die with a feature pattern that contains information relating to the product chip |
US7821104B2 (en) * | 2008-08-29 | 2010-10-26 | Freescale Semiconductor, Inc. | Package device having crack arrest feature and method of forming |
US8237246B2 (en) * | 2009-02-12 | 2012-08-07 | International Business Machines Corporation | Deep trench crackstops under contacts |
JP2010034595A (ja) * | 2009-11-12 | 2010-02-12 | Renesas Technology Corp | 半導体集積回路装置およびその製造方法 |
JP5879774B2 (ja) * | 2011-06-30 | 2016-03-08 | 富士通セミコンダクター株式会社 | 半導体装置とその製造方法 |
US8604618B2 (en) * | 2011-09-22 | 2013-12-10 | International Business Machines Corporation | Structure and method for reducing vertical crack propagation |
US8729664B2 (en) | 2012-04-02 | 2014-05-20 | International Business Machines Corporation | Discontinuous guard ring |
US8937009B2 (en) | 2013-04-25 | 2015-01-20 | International Business Machines Corporation | Far back end of the line metallization method and structures |
JP6406138B2 (ja) * | 2014-07-18 | 2018-10-17 | 株式会社デンソー | 半導体装置およびその製造方法 |
US9589895B2 (en) | 2015-04-15 | 2017-03-07 | Globalfoundries Inc. | Whole wafer edge seal |
US10126260B2 (en) | 2015-05-07 | 2018-11-13 | International Business Machines Corporation | Moisture detection and ingression monitoring systems and methods of manufacture |
US10199461B2 (en) * | 2015-10-27 | 2019-02-05 | Texas Instruments Incorporated | Isolation of circuit elements using front side deep trench etch |
US10438902B2 (en) | 2017-09-07 | 2019-10-08 | Globalfoundries Inc. | Arc-resistant crackstop |
US10090258B1 (en) | 2017-09-25 | 2018-10-02 | Globalfoundries Inc. | Crack-stop structure for an IC product and methods of making such a crack-stop structure |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2776457B2 (ja) * | 1992-12-29 | 1998-07-16 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 半導体デバイスのクラックストップ形成方法及び半導体デバイス |
US5789302A (en) * | 1997-03-24 | 1998-08-04 | Siemens Aktiengesellschaft | Crack stops |
US6022791A (en) * | 1997-10-15 | 2000-02-08 | International Business Machines Corporation | Chip crack stop |
US6091131A (en) * | 1998-04-28 | 2000-07-18 | International Business Machines Corporation | Integrated circuit having crack stop for interlevel dielectric layers |
-
2000
- 2000-02-10 US US09/501,649 patent/US6261945B1/en not_active Expired - Lifetime
-
2001
- 2001-01-09 TW TW090100406A patent/TW506052B/zh not_active IP Right Cessation
- 2001-01-17 SG SG200100288A patent/SG91328A1/en unknown
- 2001-01-23 MY MYPI20010319A patent/MY119966A/en unknown
- 2001-01-26 KR KR10-2001-0003736A patent/KR100368088B1/ko not_active IP Right Cessation
- 2001-02-07 JP JP2001031135A patent/JP3627009B2/ja not_active Expired - Fee Related
- 2001-02-08 CN CNB011032553A patent/CN1219318C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
MY119966A (en) | 2005-08-30 |
TW506052B (en) | 2002-10-11 |
KR20010082015A (ko) | 2001-08-29 |
CN1219318C (zh) | 2005-09-14 |
JP3627009B2 (ja) | 2005-03-09 |
KR100368088B1 (ko) | 2003-01-15 |
JP2001267325A (ja) | 2001-09-28 |
CN1308372A (zh) | 2001-08-15 |
US6261945B1 (en) | 2001-07-17 |
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