SG78282A1 - A method for removing surface contaminants on moulds used in semiconductor packaging tools - Google Patents
A method for removing surface contaminants on moulds used in semiconductor packaging toolsInfo
- Publication number
- SG78282A1 SG78282A1 SG1997004544A SG1997004544A SG78282A1 SG 78282 A1 SG78282 A1 SG 78282A1 SG 1997004544 A SG1997004544 A SG 1997004544A SG 1997004544 A SG1997004544 A SG 1997004544A SG 78282 A1 SG78282 A1 SG 78282A1
- Authority
- SG
- Singapore
- Prior art keywords
- semiconductor packaging
- removing surface
- surface contaminants
- moulds used
- packaging tools
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
- B08B7/0042—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by laser
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Cleaning In General (AREA)
- Laser Beam Processing (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG1997004544A SG78282A1 (en) | 1997-12-18 | 1997-12-18 | A method for removing surface contaminants on moulds used in semiconductor packaging tools |
TW087106779A TW480689B (en) | 1997-12-18 | 1998-05-01 | An efficient semiconductor packaging process suitable for high-volume production of semiconductor devices |
MYPI98002099A MY136708A (en) | 1997-12-18 | 1998-05-08 | A method for removing surface contaminants on moulds used in semiconductor packaging tools |
EP98936795A EP1039977A4 (en) | 1997-12-18 | 1998-07-06 | PROCESS FOR REMOVING SURFACE CONTAMINANTS FROM MOLDS USED ON SEMICONDUCTOR ENCAPSULATION TOOLS |
PCT/SG1998/000058 WO1999030845A1 (en) | 1997-12-18 | 1998-07-06 | A method for removing surface contaminants on moulds used in semiconductor packaging tools |
CNB988122863A CN1210113C (zh) | 1997-12-18 | 1998-07-06 | 清除半导体封装设备中模具表面污物的方法 |
JP2000538813A JP2002508249A (ja) | 1997-12-18 | 1998-07-06 | 半導体パッケージツールで用いられるモールドの表面汚染物を除去するための方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG1997004544A SG78282A1 (en) | 1997-12-18 | 1997-12-18 | A method for removing surface contaminants on moulds used in semiconductor packaging tools |
Publications (1)
Publication Number | Publication Date |
---|---|
SG78282A1 true SG78282A1 (en) | 2001-02-20 |
Family
ID=20429813
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG1997004544A SG78282A1 (en) | 1997-12-18 | 1997-12-18 | A method for removing surface contaminants on moulds used in semiconductor packaging tools |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP1039977A4 (zh) |
JP (1) | JP2002508249A (zh) |
CN (1) | CN1210113C (zh) |
MY (1) | MY136708A (zh) |
SG (1) | SG78282A1 (zh) |
TW (1) | TW480689B (zh) |
WO (1) | WO1999030845A1 (zh) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4630442B2 (ja) * | 2000-10-19 | 2011-02-09 | Towa株式会社 | 樹脂成形装置及び樹脂成形方法 |
JP3789349B2 (ja) * | 2001-11-16 | 2006-06-21 | Towa株式会社 | 樹脂成形用金型のクリーニング方法及び装置 |
TW552188B (en) * | 2001-11-16 | 2003-09-11 | Towa Corp | Apparatus and method for evaluating degree of adhesion of adherents to mold surface, apparatus and method for surface treatment of mold surface and method and apparatus for cleaning mold used for molding resin |
JP2004230750A (ja) * | 2003-01-31 | 2004-08-19 | Sumitomo Heavy Ind Ltd | 金型クリーニング方法及び金型クリーニング装置 |
KR100626037B1 (ko) | 2004-11-18 | 2006-09-20 | 삼성에스디아이 주식회사 | 마스크 세정방법 |
JP2006317726A (ja) * | 2005-05-13 | 2006-11-24 | Nec Lcd Technologies Ltd | 断線修正方法及びアクティブマトリックス基板の製造方法並びに表示装置 |
JP5314876B2 (ja) * | 2006-11-22 | 2013-10-16 | アピックヤマダ株式会社 | 樹脂モールド装置および樹脂モールド方法 |
CN104043617A (zh) * | 2014-05-19 | 2014-09-17 | 南京南车浦镇城轨车辆有限责任公司 | 金属表面油污激光清洗设备 |
WO2018054595A1 (de) | 2016-09-26 | 2018-03-29 | Saint-Gobain Glass France | Vorrichtung und verfahren zur herstellung einer strukturierten funktionellen beschichtung auf einer gebogenen glas-schicht |
GB201701607D0 (en) * | 2017-01-31 | 2017-03-15 | Advanced Laser Tech Ltd | Scanning and cleaning of moulds |
CN107377532A (zh) * | 2017-08-25 | 2017-11-24 | 济南高能清扬激光清洗有限公司 | 一种橡胶制品模具的复合清洗方法 |
CN108816960B (zh) * | 2018-06-14 | 2020-06-26 | 爱阔特(上海)清洗设备制造有限公司 | 一种半导体光刻板清洗装置 |
CN108807129B (zh) * | 2018-06-21 | 2020-09-01 | 北京蜃景光电科技有限公司 | 镀膜腔室清洗装置及镀膜腔室清洗方法 |
CN108787631A (zh) * | 2018-07-09 | 2018-11-13 | 江苏峰钛激光科技有限公司 | 一种重锈蚀层的激光清洗方法 |
JP6930946B2 (ja) * | 2018-07-10 | 2021-09-01 | Towa株式会社 | 成形型クリーニング装置、成形型クリーニング方法、樹脂成形装置、及び樹脂成形品製造方法 |
JP2020006600A (ja) * | 2018-07-10 | 2020-01-16 | Towa株式会社 | 成形型クリーニング装置及び方法、樹脂成形装置、並びに樹脂成形品製造方法 |
CN111375603A (zh) * | 2018-12-29 | 2020-07-07 | 膳魔师(江苏)家庭制品有限公司 | 一种保温杯的褪漆方法及装置 |
CN110303009B (zh) | 2019-06-26 | 2020-10-16 | 深圳市华星光电技术有限公司 | 紫外光清洁装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DD242760A1 (de) * | 1985-11-19 | 1987-02-11 | Akad Wissenschaften Ddr | Verfahren zur pruefung der reinheit von substratoberflaechen und zur reinigung derselben |
DE3767890D1 (de) * | 1986-02-14 | 1991-03-14 | Amoco Corp | Behandlung von geformten oberflaechen mit ultraviolettlaser. |
DE3721940A1 (de) * | 1987-07-02 | 1989-01-12 | Ibm Deutschland | Entfernen von partikeln von oberflaechen fester koerper durch laserbeschuss |
JPH01122417A (ja) * | 1987-11-06 | 1989-05-15 | Rohm Co Ltd | 合成樹脂モールド用金型の清掃方法 |
US5023424A (en) * | 1990-01-22 | 1991-06-11 | Tencor Instruments | Shock wave particle removal method and apparatus |
US5373140A (en) * | 1993-03-16 | 1994-12-13 | Vernay Laboratories, Inc. | System for cleaning molding equipment using a laser |
IT1282722B1 (it) * | 1996-03-01 | 1998-03-31 | Pirelli | Metodo ed apparato per la pulitura di stampi di vulcanizzazione di articoli in materiale elastomerico |
-
1997
- 1997-12-18 SG SG1997004544A patent/SG78282A1/en unknown
-
1998
- 1998-05-01 TW TW087106779A patent/TW480689B/zh not_active IP Right Cessation
- 1998-05-08 MY MYPI98002099A patent/MY136708A/en unknown
- 1998-07-06 EP EP98936795A patent/EP1039977A4/en not_active Withdrawn
- 1998-07-06 JP JP2000538813A patent/JP2002508249A/ja active Pending
- 1998-07-06 CN CNB988122863A patent/CN1210113C/zh not_active Expired - Fee Related
- 1998-07-06 WO PCT/SG1998/000058 patent/WO1999030845A1/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
EP1039977A4 (en) | 2003-08-13 |
MY136708A (en) | 2008-11-28 |
CN1210113C (zh) | 2005-07-13 |
EP1039977A1 (en) | 2000-10-04 |
WO1999030845A1 (en) | 1999-06-24 |
CN1282277A (zh) | 2001-01-31 |
JP2002508249A (ja) | 2002-03-19 |
TW480689B (en) | 2002-03-21 |
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